JPS5919401B2 - Manufacturing method of copper oxide film wire insulated conductor - Google Patents

Manufacturing method of copper oxide film wire insulated conductor

Info

Publication number
JPS5919401B2
JPS5919401B2 JP8534879A JP8534879A JPS5919401B2 JP S5919401 B2 JPS5919401 B2 JP S5919401B2 JP 8534879 A JP8534879 A JP 8534879A JP 8534879 A JP8534879 A JP 8534879A JP S5919401 B2 JPS5919401 B2 JP S5919401B2
Authority
JP
Japan
Prior art keywords
temperature
oxidation treatment
chamber
oxide film
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8534879A
Other languages
Japanese (ja)
Other versions
JPS569912A (en
Inventor
正孝 望月
道雄 高岡
恒明 馬渡
政一郎 関
昭太郎 吉田
和夫 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP8534879A priority Critical patent/JPS5919401B2/en
Publication of JPS569912A publication Critical patent/JPS569912A/en
Publication of JPS5919401B2 publication Critical patent/JPS5919401B2/en
Expired legal-status Critical Current

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  • Chemical Treatment Of Metals (AREA)
  • Processes Specially Adapted For Manufacturing Cables (AREA)

Description

【発明の詳細な説明】 発明の背景 たとえば、電力ケーブル導体の素線絶縁のために、銅素
線の表面に薄い酸化銅の皮膜を作ることが提案されてい
る。
DETAILED DESCRIPTION OF THE INVENTION BACKGROUND OF THE INVENTION For example, it has been proposed to form a thin copper oxide film on the surface of copper strands for strand insulation of power cable conductors.

また酸化皮膜を作る方法として、銅線を加熱してから酸
化処理液の中に浸せきすることも提案されている。しか
し酸化処理液の中に銅線を入れると、温度が急に下がる
。そのため酸化反応速度が遅くなる。線速を上げること
ができない。目的と概要 酸化反応のとき、銅線の温度があまり下がらないように
する。
Furthermore, as a method of forming an oxide film, it has been proposed to heat a copper wire and then immerse it in an oxidation treatment solution. However, when a copper wire is placed in an oxidizing solution, the temperature drops suddenly. This slows down the oxidation reaction rate. It is not possible to increase the linear speed. Purpose and Overview To prevent the temperature of the copper wire from dropping too much during the oxidation reaction.

そして反応速度を速め、線速を上げることができるよう
にする。そのため、この発明においては、加熱した銅線
に、酸化処理液をスプレー状にして吹きつけるようにし
た。
It also speeds up the reaction rate, making it possible to increase the linear velocity. Therefore, in this invention, the oxidation treatment liquid is sprayed onto the heated copper wire.

実施例 初めに装置の概略を述べる(第1図)、なお、これは伸
線、焼鈍とタンデムにした場合の例である。
First, an outline of the apparatus will be described (FIG. 1). This is an example in which wire drawing and annealing are used in tandem.

10は伸線機、12は銅線、14は引取りキヤプスタン
、16は巻取りドラムである。
10 is a wire drawing machine, 12 is a copper wire, 14 is a take-up capstan, and 16 is a winding drum.

18は予熱室で、入口にはガスシール20が設けられる
18 is a preheating chamber, and a gas seal 20 is provided at the inlet.

22は加熱室である。22 is a heating chamber.

予熱室18との間にシール24を設ける。ただしこれは
完全なシールでなく、ガスが漏れるようにする。26は
高周波誘導加熱装置、28は加熱コイルである。
A seal 24 is provided between the preheating chamber 18 and the preheating chamber 18 . However, this is not a perfect seal and allows gas to escape. 26 is a high frequency induction heating device, and 28 is a heating coil.

なおその他の公知の加熱装置(たとえば通電加熱装置な
ど)を使うこともできる。30は酸化処理室である。
Note that other known heating devices (for example, electrical heating devices, etc.) can also be used. 30 is an oxidation treatment chamber.

加熱室22との隔壁32にすき間34を設け、ガスが通
れるようにする。36はシャワー筒で、銅線12を取り
巻いて設けられる。
A gap 34 is provided between the partition wall 32 and the heating chamber 22 to allow gas to pass therethrough. 36 is a shower tube, which is provided surrounding the copper wire 12.

38は、酸化処理室30の底の一部に貯えた酸化処理液
で、たとえば5q1)の亜鉛素酸ナトリウムと5%の水
酸化ナトリウムの混合水溶液を使う。
Reference numeral 38 denotes an oxidation treatment liquid stored in a part of the bottom of the oxidation treatment chamber 30, which is, for example, a mixed aqueous solution of 5q1) sodium zincate and 5% sodium hydroxide.

40は酸化処理液38のヒーターである。40 is a heater for the oxidation treatment liquid 38;

循環用ポンプ42で、酸化処理液38をシャワ一筒36
に送り、そこからシャワ一状またはスプレー状に噴出さ
せる。44は冷却室である。
The oxidation treatment liquid 38 is pumped into the shower cylinder 36 by the circulation pump 42.
from which it is ejected in the form of a shower or spray. 44 is a cooling chamber.

酸化処理室30との間にシール45を設け、ほぼガスを
しや断する。冷却室44の下部に冷却水そう46を設け
る。その冷却水48を、ポンプ50.冷却器52を通し
て循環させる。銅線12の出口にガスシール54を設け
る。56は不活性ガスの循環用ブロワ一である。
A seal 45 is provided between the chamber 30 and the oxidation treatment chamber 30 to substantially cut off gas. A cooling water tank 46 is provided in the lower part of the cooling chamber 44. The cooling water 48 is pumped to the pump 50. Circulate through cooler 52. A gas seal 54 is provided at the outlet of the copper wire 12. 56 is a blower for circulating inert gas.

不活性ガスの一例として窒素ガスを使う。ガス加熱器5
8を通してたとえば100〜500℃くらいにした高温
窒素ガス60を、加熱室22内に送り込む。高温窒素ガ
ス60の一部は、シール24を通つて予熱室18内に入
る。また別の一部は、すき間34から酸化処理室30内
に入る。高温窒素ガス60により予熱室18、加熱室2
2、酸化処理室30内は高温に保たれる。また、ガス加
熱器58を通さない低温窒素ガス62を、冷却室44内
に送り込む。6,4は窒素ガスの循環用パイプ、66は
凝縮器,68は水分の分離器、70は補給用の窒素ボン
ベである。
Nitrogen gas is used as an example of an inert gas. gas heater 5
High-temperature nitrogen gas 60 heated to about 100 to 500° C., for example, is fed into the heating chamber 22 through the heating chamber 22 . A portion of hot nitrogen gas 60 enters preheat chamber 18 through seal 24 . Another part enters the oxidation treatment chamber 30 through the gap 34. Preheating chamber 18 and heating chamber 2 are heated by high temperature nitrogen gas 60.
2. The inside of the oxidation treatment chamber 30 is maintained at a high temperature. Furthermore, low-temperature nitrogen gas 62 that does not pass through the gas heater 58 is sent into the cooling chamber 44 . 6 and 4 are pipes for circulating nitrogen gas, 66 is a condenser, 68 is a moisture separator, and 70 is a nitrogen cylinder for replenishment.

次に作用を述べる。Next, we will discuss the effect.

(1)銅線12を予熱室18内でたとえば100〜15
0℃くらいに予熱して加熱室22に入れる。
(1) Copper wire 12 is heated in the preheating chamber 18 to
Preheat it to about 0°C and place it in the heating chamber 22.

そこで、高周波誘導加熱装置26により500〜600
℃に加熱する。加熱室22内には高温窒素ガス60が充
満しているので、銅線12は温度がほとんど低下せず、
また表面が酸化されずに、酸化処理室30内に入る。(
2)酸化処理室30内で、シヤワ一筒36から酸化処理
液38を吹きつけ、銅線12の表面に酸化第二銅の皮膜
を形成する。
Therefore, the high frequency induction heating device 26
Heat to ℃. Since the heating chamber 22 is filled with high-temperature nitrogen gas 60, the temperature of the copper wire 12 hardly decreases.
Moreover, the surface enters the oxidation treatment chamber 30 without being oxidized. (
2) In the oxidation treatment chamber 30, the oxidation treatment liquid 38 is sprayed from the shower cylinder 36 to form a film of cupric oxide on the surface of the copper wire 12.

それが素線絶縁の役をする。なお酸化処理室30内には
高温窒素ガス60が充満し、また酸化処理液38をスプ
レー状に吹きつけるので、銅線12の温度は急に下がる
ことがない。相当な時間、高温を保つた状態で酸化が行
なわれるので、反応速度が速くなる。(3)それから銅
線121:冷却室44に入れ、低温)窒素ガス62で冷
却する。
This acts as wire insulation. Note that since the oxidation treatment chamber 30 is filled with high-temperature nitrogen gas 60 and the oxidation treatment liquid 38 is sprayed, the temperature of the copper wire 12 does not drop suddenly. Since oxidation is carried out at high temperatures for a considerable period of time, the reaction rate becomes faster. (3) Then, the copper wire 121 is put into the cooling chamber 44 and cooled with nitrogen gas 62 (low temperature).

なお窒素ガスの代わりに空気で冷却してもよい。さらに
冷却水48により常温まで下げる。それから洗浄し、乾
燥し、巻取りドラム16に巻取る。別の実施例 加熱室22と酸化処理室30とをいつしよにした加熱酸
化処理室72内で、たとえば高周波誘導加熱装置26に
より加熱すると同時に、シヤワ一筒36から酸化処理液
38を吹きつけ、酸化処理を行なう。
Note that air may be used for cooling instead of nitrogen gas. The temperature is further lowered to room temperature using cooling water 48. It is then washed, dried and wound onto a winding drum 16. Another Embodiment In a heating oxidation treatment chamber 72 in which a heating chamber 22 and an oxidation treatment chamber 30 are connected together, heating is performed by, for example, a high frequency induction heating device 26, and at the same time, an oxidation treatment liquid 38 is sprayed from a shower cylinder 36. , perform oxidation treatment.

なおこの場合は、銅線12の加熱手段に、通電加熱装置
を使えない。絶縁性の酸化皮膜ができると、通電が困難
になるからである。高周波誘導加熱装置26はさしつか
えない。なお、焼鈍とは別個に、本発明を行なうことも
できる。
Note that in this case, an electrical heating device cannot be used as a heating means for the copper wire 12. This is because the formation of an insulating oxide film makes it difficult to conduct electricity. A high frequency induction heating device 26 may be used. Note that the present invention can also be carried out separately from annealing.

その場合は、加熱温度を100〜300℃ぐらいにする
。また単線だけでなく、より線の場合も、同様にできる
In that case, the heating temperature is set to about 100 to 300°C. This can be done not only for solid wires but also for stranded wires.

「第3図」に、銅線12の温度の、時間的変化を示した
"Figure 3" shows the change in temperature of the copper wire 12 over time.

Aはこの発明の場合、Bは酸化処理液38内に浸せきす
る場合である。この発明の場合、高温を保つた状態で酸
化反応が行なわれることがよくわかる。発明の効果 (1)酸化処理液38をスプレーにして吹きつけるので
、浸せきする場合に比べ銅S!12の温度が急に下がる
ことがない。
A is the case of this invention, and B is the case of immersion in the oxidation treatment liquid 38. In the case of this invention, it is clearly seen that the oxidation reaction is carried out while maintaining a high temperature. Effects of the invention (1) Since the oxidation treatment liquid 38 is sprayed, the copper S is reduced compared to the case of dipping. 12 temperature does not drop suddenly.

しかも高温の不活性ガスの中で、加熱した酸化処理液3
8を吹きつけるので、なおさら銅内線12の温度の下が
り方が少ない。そのために反応速度がたいへん速くなり
、銅内線12の線速を増大させることができ、結局コス
トダウンができるようになる。(2)上記のように酸化
皮膜のできたとき納線12はまだ相当な高温であるが、
それをいつたん低温のガスで予冷してから冷却水48に
通すようにしたので、急冷によるヒートシヨツクを起こ
して酸化皮膜がはがれるという心配がない。
Furthermore, the oxidation treatment liquid 3 was heated in a high-temperature inert gas.
8, the temperature of the copper internal wire 12 decreases even more. As a result, the reaction speed becomes very high, and the wire speed of the copper internal wire 12 can be increased, resulting in cost reduction. (2) As mentioned above, when the oxide film is formed, the wire 12 is still at a fairly high temperature;
Since it is pre-cooled with low-temperature gas and then passed through the cooling water 48, there is no fear that the oxide film will peel off due to heat shock caused by rapid cooling.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施に使う装置の説明図、第2図は
別の実施例に使う装置の主要部分の説明図、第3図は銅
線12の温度の時間的変化図である。 18・・・予熱室、22・・・加熱室、26・・・高周
波誘導加熱装置、30・・・酸化処理室、36・・・シ
ヤワ一8・・・酸化処理液。
FIG. 1 is an explanatory diagram of an apparatus used to carry out the present invention, FIG. 2 is an explanatory diagram of the main parts of an apparatus used in another embodiment, and FIG. 3 is a diagram of the change in temperature of the copper wire 12 over time. 18... Preheating chamber, 22... Heating chamber, 26... High frequency induction heating device, 30... Oxidation treatment chamber, 36... Shower 18... Oxidation treatment liquid.

Claims (1)

【特許請求の範囲】[Claims] 1 連続走行する銅内線12を、高温の不活性ガスの中
で加熱する工程と、高温の不活性ガスの中で前記の加熱
した銅内線12に、高温の酸化処理液38をスプレー状
にして、銅内線12の表面に酸化第二銅の皮膜を形成す
る工程と、前記の酸化皮膜を形成した銅内線12を低温
ガスで予冷した後、冷却水48のなかに通すこと、を特
徴とする酸化銅皮膜素線絶縁導体の製造方法。
1. A process of heating the continuously running copper internal wire 12 in a high-temperature inert gas, and spraying a high-temperature oxidation treatment liquid 38 onto the heated copper internal wire 12 in the high-temperature inert gas. , is characterized by forming a film of cupric oxide on the surface of the copper internal wire 12, and precooling the copper internal wire 12 with the oxide film formed thereon with low-temperature gas, and then passing it through cooling water 48. A method for producing a copper oxide film stranded insulated conductor.
JP8534879A 1979-07-05 1979-07-05 Manufacturing method of copper oxide film wire insulated conductor Expired JPS5919401B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8534879A JPS5919401B2 (en) 1979-07-05 1979-07-05 Manufacturing method of copper oxide film wire insulated conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8534879A JPS5919401B2 (en) 1979-07-05 1979-07-05 Manufacturing method of copper oxide film wire insulated conductor

Publications (2)

Publication Number Publication Date
JPS569912A JPS569912A (en) 1981-01-31
JPS5919401B2 true JPS5919401B2 (en) 1984-05-07

Family

ID=13856160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8534879A Expired JPS5919401B2 (en) 1979-07-05 1979-07-05 Manufacturing method of copper oxide film wire insulated conductor

Country Status (1)

Country Link
JP (1) JPS5919401B2 (en)

Also Published As

Publication number Publication date
JPS569912A (en) 1981-01-31

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