JPS59192458A - Cleaning/polishing method and device - Google Patents

Abstract

PURPOSE:To recover and reuse volatile liquid by employing cleaning/polishing liquid mixed with highly volatile liquid and polishing material while distilling used liquid and separating into peeled matter, polishing material and volatile liquid. CONSTITUTION:Solid state material 15 to be processed is mounted on a metal mesh 16 in a cleaning/polishing tank 1. Mixture of polishing material and liquid having higher volatility than water such as Freon 113R is mixed by an agitator 12 then ejected through a slurry pump 4, liquid piping 13 and nozzle 2 onto the surface of material 15 to be processed to clean and polish it. Thereafter it is dried by wind fed from a fan 10. Said mixture liquid is fed through the slurry pump 4 to a still 7 and heated while Freon 113R is fed in vapor to a condenser 5. While cooling is performed in the condenser 5 to liquidize only Freon 113R which is collected in a solvent tank 6.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning and polishing method and apparatus, and more particularly to a method and apparatus for cleaning and polishing a solid surface with a cleaning and polishing liquid.

Conventionally, a mixture of an abrasive and water has been used as a cleaning polishing liquid for polishing and cleaning solid surfaces. When a solid surface is cleaned and polished with such a cleaning and polishing liquid, powder separated from the solid surface is mixed into the cleaning and polishing liquid. Gravity separation and centrifugation are used to separate water from powder and abrasive materials.

There are methods such as filtration and evaporation separation. However, it is difficult to completely separate the powder and abrasive from water using 1 gravity, centrifugation, and filtration, whereas evaporative separation completely separates the powder and abrasive from water. However, because the specific heat and latent heat of water are large.

The heat energy required to evaporate water is large, making it difficult in terms of cost. In the methods of gravity separation, centrifugation, and filtration, dissolved components on solid surfaces may also be included in the separated water.
When separated water is recycled and reused.

There is also the problem of poor cleaning efficiency.

The purpose of the present invention is to solve the problems of the prior art described above,
It is an object of the present invention to provide a cleaning and polishing method and apparatus capable of easily and efficiently separating and recovering powder particles and abrasive material peeled from a solid surface from a working liquid, and using the recovered liquid permanently.

The present invention uses a cleaning and polishing liquid that is a mixture of a highly volatile liquid, that is, a liquid that evaporates easily even at low temperatures, and an abrasive material instead of water, which has been used in the past, and removes debris from solid surfaces after use. By filling the cleaning and polishing liquid containing the cleaning and polishing liquid, the exfoliated material and the polishing material are separated from the volatile liquid, and the volatile liquid is recovered and can be used again.

Hereinafter, the present invention will be described in detail based on the accompanying drawings.

FIG. 1 shows an example of the apparatus of the present invention, which includes a cleaning and polishing tank 1, a condenser 5, and a solvent tank 6.

It mainly consists of a distillation tank 7, a filter 8, and a steam trap 9. A nozzle 2 and an agitator 12 are installed in the cleaning and polishing tank 1.

In such a cleaning and polishing apparatus, a solid workpiece 15 is placed on the gold side 6 in the cleaning and polishing tank.

On the other hand, the mixture of abrasive material and Freon 113R liquid was mixed with the stirrer 1.
After being thoroughly mixed in Step 2, the liquid is jetted from the nozzle 2 onto the surface of the object 15 via the slurry IJ, +O pump 4 and liquid pipe 13. The processed object 15 that has been cleaned and polished is sent to the fan 1.
Dry by air sent from 0. Freon 113R
The liquid mixture of the liquid and the abrasive material is sent to the distiller 7 via the slurry pump 4.

Here, the Freon 113R is heated to 47.6° C. or higher and reaches the condenser 5 as vapor. There is also a cleaning and polishing tank.
The partially evaporated steam and the air that has dried the object 15 are also sent from the steam air plumber 4 to the condenser 5.

In condenser 5, it is cooled to below 47.6°C, where Freonco. Only Co-3R becomes liquid, and this liquid is collected in the solvent tank 6.

The solvent is returned to the cleaning and polishing tank 1 via the solvent transfer pump 11.

Note that cooling air is introduced into the condenser 5 via a filter 8.

The liquid used for such cleaning and polishing is more volatile than water, especially with a specific heat of 0.998 or less and a latent heat of 538 K.
Solvents with cal/f/ or less are desirable. Such solvents include hexane, hexane, petroleum ether, petroleum chloride, methylene chloride, chloroform, carbon tetrachloride, trichlorethylene, trichlorethane, methanol, ethanol, isobrohanol, phthanol, ethyl ether, and phlopylene oxide. , acetone, methyl ethyl ketone, methyl acetate, ethyl acetate, carbon disulfide, fluorotrichloromethane, trichlorotrifluoroethane, tetrachlorodifluoroethane, noξ-chloroethylene, methylene chloride, and the like.

Note that it is also possible to share a distillation column by combining a device that cleans and polishes solid objects to be treated with a highly volatile liquid containing an abrasive and a device that uses only a highly volatile liquid. .

As described above, according to the present invention, a mixed slurry of a highly volatile liquid and an abrasive material is used for the water cleaning.

By distillation, exfoliated materials from the solid surface and polished F@
Since the paulownia and the liquid can be easily and efficiently separated, and what is dissolved in the liquid can be separated from the liquid, the separated liquid can be used permanently.

[Brief explanation of the drawing]

FIG. 1 is a configuration diagram showing an example of the apparatus of the present invention. 1...Cleaning and polishing device 2...Nozzle 5...Condenser 6...Solvent tank 7...Distiller
8... Filter 9... Steam trap.

Claims (1)

[Scope of Claims] (1) Cleaning and polishing is performed by jetting and colliding a cleaning and polishing liquid that is a mixture of an abrasive and a liquid that is more volatile than water, and the highly volatile liquid is distilled. A cleaning and polishing method characterized in that the highly volatile liquid is separated from the peeled matter from the surface of the object to be treated and the polishing material, and the recovered highly volatile liquid is used again. (2. In claim 1, the cleaning and polishing method is characterized in that the highly volatile liquid is a solvent with a specific heat of 0998 or less and a latent heat of 538 Kcat/I or less. (3) From the abrasive and water. A nozzle that jets and collides a cleaning and polishing liquid mixed with a highly volatile liquid onto a solid object;
A mixture of the peeled material from the surface of the object to be treated, the abrasive material, and the highly volatile liquid is stored. A cleaning and polishing device comprising a distillation device for distilling the highly volatile liquid, a condenser for condensing the vapor from the distillation device, and a line for mixing the liquid collected in the condenser with an abrasive and supplying it to the nozzle. .