JPS59187340A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS59187340A JPS59187340A JP14090783A JP14090783A JPS59187340A JP S59187340 A JPS59187340 A JP S59187340A JP 14090783 A JP14090783 A JP 14090783A JP 14090783 A JP14090783 A JP 14090783A JP S59187340 A JPS59187340 A JP S59187340A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- polyvinyl
- photosensitive
- film
- diazide compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ポリビニルブチラール、ポリビニルホルマー
ル又はポリ酢酸ビニルと、オルソキノンジアジド系化合
物とを含有する感光性組成物に関するものであり、さら
に詳細には感光皮膜が強靭で水系現像液で現像可能な感
光性組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive composition containing polyvinyl butyral, polyvinyl formal, or polyvinyl acetate and an orthoquinone diazide compound, and more particularly, the present invention relates to a photosensitive composition that has a strong photosensitive film and is suitable for aqueous development. The present invention relates to a photosensitive composition that can be developed with a liquid.
従来より高分子化合物とオルソキノンジアジド系化合物
とを含有する感光性組成物が知られており、例えばフェ
ノール樹脂と１，２−ナフト・キノン−ジアジド（２）
−４−スルホン酸のノボラックエステルの組合せがある
。これらはフォトレジスト、フ第１〜レリーフなどの用
途に利用されている。Photosensitive compositions containing a polymer compound and an orthoquinone diazide compound have been known for a long time, such as a phenol resin and 1,2-naphthoquinone diazide (2).
There is a combination of novolac esters of -4-sulfonic acid. These are used for applications such as photoresists and reliefs.
しかしながら、これらの組合せでは、アルカリ水溶液で
現像可能であるが、感光皮膜が脆く、きすがつきやすい
など機械的強度が不充分である。However, although these combinations can be developed with an alkaline aqueous solution, the photosensitive film is brittle and easily scratches, resulting in insufficient mechanical strength.
本発明の目的は、これらの問題点を解決し、感光皮膜が
強靭でしかも木系現液で現像可能な感光性組成物を提供
することにある。An object of the present invention is to solve these problems and provide a photosensitive composition which has a tough photosensitive film and can be developed with a wood-based developer.
本発明者は、前記の問題点を解決すべく鋭意研究を進め
た結果、ポリビニルブチラール、ポリビニルホルマール
、又はポリ酢酸ビニルと、オルソキノンジアジド系化合
物とを含有する感光性組成物を使用するときは前記目的
を達成し得ることを発見した。本発明はかかる知見に基
づいてなされたものである。As a result of intensive research in order to solve the above problems, the present inventors have discovered that when using a photosensitive composition containing polyvinyl butyral, polyvinyl formal, or polyvinyl acetate and an orthoquinone diazide compound, the I discovered that I could achieve my goal. The present invention has been made based on this knowledge.
本発明において使用する高分子化合物は、ポリビニルブ
チラール、ポリビニルホルマール、又はポリ酢酸ビニル
よりなる群から選ばれた１種以上が用いられている。こ
れら高分子化合物は有機溶剤に可溶であれば使用可能で
あるが、その分子量が少なすぎると、皮膜強度が低下し
、又１分子量が大きすぎると、感光液が高粘度になり、
その調整が困難になるため好ましくない。ブチラール化
度及びホルマール化度については低すぎると耐水性が悪
くなり、高すぎると水系現像液での現像性が低下する。The polymer compound used in the present invention is one or more selected from the group consisting of polyvinyl butyral, polyvinyl formal, and polyvinyl acetate. These polymer compounds can be used if they are soluble in organic solvents, but if their molecular weight is too small, the film strength will decrease, and if their molecular weight is too large, the photosensitive liquid will become highly viscous.
This is not preferable because the adjustment becomes difficult. If the degree of butyralization and the degree of formalization are too low, water resistance will deteriorate, and if it is too high, developability with an aqueous developer will decrease.
以上の理由により、ポリビニルブチラールにおいては平
均分子量１００００から２３００００で、ブチラール化
度が２０から８０ｍｏ１％、ポリビニルホルマールにお
いては、平均分子量９０００から１５００００でホルマ
ール化度が２０から８０ｍｏ１％、ポリ酢酸ビニルにお
いては平均分子量１５０００から２７００００である高
分子化合物が好ましい。For the above reasons, polyvinyl butyral has an average molecular weight of 10,000 to 230,000 and a degree of butyralization of 20 to 80 mo1%, polyvinyl formal has an average molecular weight of 9,000 to 150,000 and a degree of formalization of 20 to 80 mo1%, and polyvinyl acetate has an average molecular weight of 9,000 to 150,000 and a degree of formalization of 20 to 80 mo1%. A polymer compound having an average molecular weight of 15,000 to 270,000 is preferred.
又、本発明において使用するオルソキノンジアジド系化
合物としては、２−ジアゾ−１−ナフトール−５（４′
−メチルフェニルスルホネー１〜）、２−ジアゾ−１−
ナフトール−５−フェノキシスルホネート、１．２−ナ
フトキノン−シアシード（２）−４−スルホン酸のノボ
ラックエステ２．２′−ジヒドロキシ−ジフェニル−ビ
ス−（ナフトキノン−１，２−ジアジド−５−スルホン
酸エステル）、２．３．４−１−リオキシベンゾフェノ
ンービスー（デフ１〜キノン−１，２−ジアジド−５−
スルホン酸エステル）等をあげることができる。Further, as the orthoquinonediazide compound used in the present invention, 2-diazo-1-naphthol-5(4'
-methylphenylsulfone 1-), 2-diazo-1-
Naphthol-5-phenoxysulfonate, novolac ester of 1,2-naphthoquinone-siacid (2)-4-sulfonic acid 2,2'-dihydroxy-diphenyl-bis-(naphthoquinone-1,2-diazide-5-sulfonic acid ester) ), 2.3.4-1-lioxybenzophenone-bis(def1-quinone-1,2-diazide-5-
sulfonic acid esters), etc.
これら、オルソキノンジアジド系化合物の、高分子化合
物に対する添加量は、重量で、通常５がら５０％、好適
な添加量は１０がら３０％である。The amount of these orthoquinonediazide compounds to be added to the polymer compound is usually 5 to 50% by weight, and a preferable addition amount is 10 to 30%.
さらに、必要に応じ、染料、顔料等を添加しても差支え
ない。又、使用目的に応じ、現像性、耐蝕性等の改善の
必要が有れば、ポリビニルブチラール、ポリビニルホル
マール、又はポリ酢酸ビニルと相溶性のあるフェノール
樹脂、スチレン−マレイン酸共重合樹脂、アルキッド樹
脂、エポキシ樹脂等をポリビニルブチラール、ポリビニ
ルホルマール、又はポリ酢酸ビニルに対して等量まで添
加しても良い。Furthermore, if necessary, dyes, pigments, etc. may be added. Depending on the purpose of use, if it is necessary to improve developability, corrosion resistance, etc., phenol resins, styrene-maleic acid copolymer resins, alkyd resins that are compatible with polyvinyl butyral, polyvinyl formal, or polyvinyl acetate may be used. , epoxy resin, etc. may be added in an amount equal to that of polyvinyl butyral, polyvinyl formal, or polyvinyl acetate.
本発明の感光性組成物は、一般的には有機溶剤に溶解し
、基材に塗布して使用する。有機溶剤の具体例としては
、アセ１〜ン、メチルエチルケトン、シクロヘキサノン
、メチルアルコール、エチルアルコール、プロピルアル
コール、トルエン、キシレン、酢酸エチル、酢酸ブチル
、エチレングリコールモノメチルエーテル、エチレンイ
ブリコールモノエチルエーテル、ジメチルポル１１アミ
ド等、又はこれら有機溶剤の混合物をあげることができ
る。The photosensitive composition of the present invention is generally used by dissolving it in an organic solvent and applying it to a substrate. Specific examples of organic solvents include acetin, methyl ethyl ketone, cyclohexanone, methyl alcohol, ethyl alcohol, propyl alcohol, toluene, xylene, ethyl acetate, butyl acetate, ethylene glycol monomethyl ether, ethylene isbricol monoethyl ether, and dimethylpol 11. Examples include amides, etc., or mixtures of these organic solvents.
本発明の感光性組成物の現像液としては、芳香族カルボ
ン酸、芳香族スルホン酸、フェノール類、又はアルキル
硫酸のアルカリ金属塩化合物と、アルカリ金属の水酸化
物及びあるいは炭酸塩との水溶液を使用することがきる
。こＡしらの化合物の具体例を示せば、芳香族カルボン
酸としてはＰ−クロル安息香酸、サリチル酸、アン１−
ラニル酸等、芳香族スルホン酸としては１−ナフトール
−４−スルホン酸等、フェノール類としてはＰ−ヒドロ
キシ安息香酸エチル、ペンタクロルフェノール等、アル
キル硫酸としてはラウリル硫酸等のナトリウム、カリウ
ム等のアルカリ金属塩化合物をあげることができる。ま
た、これらのアルカリ金属の水酸化物あるいは炭酸塩の
具体例を示せば、前者としては、水酸化ナトリウム、水
酸化カリウム、後者としては炭酸すＩ・リウム、炭酸カ
リウムがある。As the developer for the photosensitive composition of the present invention, an aqueous solution of an alkali metal salt compound of an aromatic carboxylic acid, an aromatic sulfonic acid, a phenol, or an alkyl sulfuric acid, and an alkali metal hydroxide and/or carbonate is used. can be used. Specific examples of these compounds include aromatic carboxylic acids such as P-chlorobenzoic acid, salicylic acid, and an-1-
Ranilic acid, etc., aromatic sulfonic acids such as 1-naphthol-4-sulfonic acid, phenols such as ethyl P-hydroxybenzoate, pentachlorophenol, etc., alkyl sulfates such as sodium, potassium, etc., lauryl sulfate, etc. Examples include metal salt compounds. Specific examples of hydroxides or carbonates of these alkali metals include sodium hydroxide and potassium hydroxide, and examples of the latter include lithium carbonate and potassium carbonate.
現像液の現像性、安定性等からみて、最も好ましい現像
液としては、Ｐ−クロル安息香酸ナトリウム、サリチル
酸ナトリウムの単独または混合物と、水酸化す１ヘリウ
ム、水酸化カリウムの単独または混合物との水溶液をあ
げることができる。現像液の濃度としては通常４から４
０重量％の水溶液として使用することができるが、現像
性を改善する目的で、メチルアルコール
ル等の有機溶剤をこれら現像液に対し重量で１から４０
％添加することもできる。In view of the developability, stability, etc. of the developer, the most preferred developer is an aqueous solution of sodium P-chlorobenzoate, sodium salicylate, alone or in a mixture, and helium hydroxide, potassium hydroxide, alone or in a mixture. can be given. The concentration of the developer is usually 4 to 4.
It can be used as a 0% by weight aqueous solution, but for the purpose of improving developability, an organic solvent such as methyl alcohol is added to these developing solutions in an amount of 1 to 40% by weight.
% can also be added.
本発明の感光性組成物によれば、皮膜が強靭でレリーフ
がシャープな良好な画像が得られ、又有機溶剤を使用し
ないので作業性も良い。According to the photosensitive composition of the present invention, good images with strong films and sharp relief can be obtained, and workability is also good because no organic solvent is used.
次に本発明を実施例によって更に詳細に説明する。Next, the present invention will be explained in more detail with reference to Examples.
実施例 １
厚さ１００μのポリエチレンテレフタレートフィルム上
に下記の組成の皮膜形成液を乾燥後の膜厚が１０μにな
るように塗布、乾燥し，アルコール可溶性ポリアミド層
を形成した。Example 1 A film forming solution having the following composition was applied onto a polyethylene terephthalate film having a thickness of 100 μm so that the film thickness after drying was 10 μm and dried to form an alcohol-soluble polyamide layer.
皮膜形成液
次に上記ポリアミド層の上に下記組成の感光液を乾燥後
の塗膜が３μになるように塗布、乾燥して感光性フィル
ムを得た。Film-forming solution Next, a photosensitive solution having the following composition was applied onto the above polyamide layer so that the coating film after drying had a thickness of 3 μm, and dried to obtain a photosensitive film.
感光液
この感光性フィルムをネガのくくり線ｉ稿と密着させ、
超高圧水銀灯２ ｋ ｗで１ｍの距離より、４０秒露光
を行った後，以下の現像液で処理することにより、感光
層の現像及びポリアミド層のエツチングを一液で行うこ
とができ、良好なネガフィルムが得られた。Photosensitive liquid: Bring this photosensitive film into close contact with the negative border line,
After exposure for 40 seconds from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp, the photosensitive layer can be developed and the polyamide layer etched with one solution by processing with the following developer. A negative film was obtained.
現像液
比較例 １
実施例１の感光液のバ身ンダー用高分子化合物・・・・
ポリビニルブチラール樹脂に変えて、フェノール樹脂（
郡栄化学工業（株）社製商品名ＭＰ１２０ＨＨ）を使用
し、実施例１に従って感光性フィルムを作り、現像処理
したネガフィルムを得た。Comparative Example of Developer Solution 1 Polymer compound for binder of photosensitive solution of Example 1...
Instead of polyvinyl butyral resin, phenolic resin (
A photosensitive film was prepared according to Example 1 using Gunei Chemical Industry Co., Ltd. (trade name: MP120HH), and a developed negative film was obtained.
処理済のネガフィルムは、実施例１とほとんど同じであ
ったが、現像処理前に、感光フィルムを折り曲げたり，
強く筒状に丸めたりすると、比較例１の感光フィルムは
、クラックが入り、現像処理により、可溶性ポリアミド
層にも同型の溝が入ったが、実施例１の感光フィルムは
、全く異状が認められなかった。The processed negative film was almost the same as in Example 1, except that the photosensitive film was not folded or
When the photosensitive film of Comparative Example 1 was strongly rolled into a cylindrical shape, cracks appeared, and grooves of the same type were formed in the soluble polyamide layer during the development process, but no abnormality was observed in the photosensitive film of Example 1. There wasn't.
実施例 ２
１００μのポリエチレンテレフタレートフィルムの片面
に真空蒸着により０．１μのアルミニウム膜を設け、そ
の上に下記組成感光液を乾燥後の塗膜が３μになる様に
塗布し、乾燥した。Example 2 A 0.1 μm aluminum film was provided on one side of a 100 μm polyethylene terephthalate film by vacuum evaporation, and a photosensitive solution having the following composition was applied thereon so that the dried coating had a thickness of 3 μm, and then dried.
感光液
このフィルムにポジ原稿を密着させ、２ｋｗの超高圧水
銀灯で１ｍの距離より２分間露光を行った後、次に示す
現像液で、現像を行った。次いで５０重量％リン酸水溶
液で、アルミニウムのエツチングを行った。露光部の感
光層は十分にレジストとしての機能を果たし、画像遮光
性の高い鮮明なアルミニウムのポジ画像が得られた。Photosensitive solution A positive original was brought into close contact with this film and exposed for 2 minutes from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp, and then developed using the following developer. Next, aluminum was etched with a 50% by weight aqueous phosphoric acid solution. The photosensitive layer in the exposed area sufficiently functioned as a resist, and a clear aluminum positive image with high image light-shielding properties was obtained.
現像液
比較例 ２
実施例２の感光液で使用されているポリ酢酸ビニルに替
えて、フェノール樹脂（郡学化学工業（株）社製部品名
ＭＰ１２０ＨＨ）を使って実施例２に従って感光フィル
ムを作った。Developer Comparative Example 2 A photosensitive film was made according to Example 2 using a phenol resin (part name: MP120HH, manufactured by Gungaku Kagaku Kogyo Co., Ltd.) in place of the polyvinyl acetate used in the photosensitive solution of Example 2. Ta.
実施例２及び比較例２の両フィルムを現像前に折り曲げ
、強く丸めたところ、比較例２のフィルムはクラックが
入り現像及びエツチング処理により、クラックの部分の
アルミニウムが溶解して良好な画像を得られなかった。When both the films of Example 2 and Comparative Example 2 were bent and rolled tightly before development, the film of Comparative Example 2 showed cracks, and during the development and etching process, the aluminum in the cracked areas was dissolved and a good image was obtained. I couldn't.
実施例２のフィルムには全く異状が認められなかった。No abnormalities were observed in the film of Example 2.
実施例３
厚さ１００μのポリエチレンテレフタレートフィルム上
に下記の組成の感光液を塗布乾燥し、３μの着色した感
光層をもつ感光性フィルムを得た。Example 3 A photosensitive solution having the following composition was applied onto a 100 μm thick polyethylene terephthalate film and dried to obtain a photosensitive film having a 3 μm thick colored photosensitive layer.
この感光性フィルムをポジ原稿と密着させ、超高圧水銀
灯２ｋｗで１ｍの距離より、６０秒露光した後、実施例
１の現像液で処理することにより、青色の鮮明なポジ画
像を得た。This photosensitive film was brought into close contact with a positive original, exposed for 60 seconds from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp, and then treated with the developer of Example 1 to obtain a clear blue positive image.
代理人 弁理士 守 谷 −雄 手続補正帯動式） ％式％ １、事件の表示 特願昭５８−１４０９０７号 ２、発明の名称 感光性組成物 ３、補正をする者 事件との関係 特許出願人 株式会社きもと ４、代理人〒１．０３ 東京都中央区日本橋本町３−９−５ ５、補正指令の日付 昭和５９年４月２４日 −２１（Agent: Patent Attorney Moritani - Yu Procedure correction band type) %formula% 1.Display of the incident Patent Application No. 140907/1982 2. Name of the invention photosensitive composition 3. Person who makes corrections Relationship to the case Patent applicant Kimoto Co., Ltd. 4. Agent〒1.03 3-9-5 Nihonbashi Honmachi, Chuo-ku, Tokyo 5. Date of amendment order April 24, 1982 -21(
Claims (1)
ビニルホルマール、又はポリ酢酸ビニルよりなる群から
選ばれた１種以上と、オルソキノンジアジド系化合物と
を含有することを特徴とする感光性組成物。 ２、 ポリビニルブチラールが平均分子量１００００か
ら２３００００で、ブチラール化度が２０から８０ｍｏ
１％である特許請求の範囲第１項に記載の感光性組成物
。 ３、 ポリビニルホルマールが平均分子１９０００から
１５００００で、ホルマール化度が２０から８０ ｍ
ｏ １％である特許請求の範囲第１項に記載の感光性組
成物。 ４、 ポリ酢酸ビニルが平均分子１１５０００から２７
００００である特許請求の範囲第１項に記載の感光性組
成物。 ５、 オルソキノンジアジド系化合物の高分子化金物に
対する添加量が５から５０重景％である特許請求の範囲
第１項、第２項、第３項又は第４項いずれかに記載の感
光性組成物。 ６、 高分子化合物としてポリビニルブチラール、ポリ
ビニルホルマール、又はポリ酢酸ビニルよりなる群から
選ばれた１種以上と、オルソキノンジアジド系化合物と
を含有する感光性組成物を露光し、次いで水系現像液で
現像することを特徴とする感光性組成物の現像方法。 ７ｏ 水系現像液が芳香族カルボン酸、芳香族スルホン
酸、フェノール類、又はアルキル硫酸のアルカリ金属塩
化合物と、アルカリ金属の水酸化物及びあるいは炭酸塩
との水溶液である特許請求の範囲第６項に記載の現像方
法。[Scope of Claims] 1. A photosensitive composition characterized by containing one or more polymeric compounds selected from the group consisting of polyvinyl butyral, polyvinyl formal, or polyvinyl acetate, and an orthoquinone diazide compound. thing. 2. Polyvinyl butyral has an average molecular weight of 10,000 to 230,000 and a degree of butyralization of 20 to 80 mo.
1% of the photosensitive composition according to claim 1. 3. Polyvinyl formal has an average molecular weight of 19,000 to 150,000 and a degree of formalization of 20 to 80 m.
1% of the photosensitive composition according to claim 1. 4. Polyvinyl acetate has an average molecular weight of 115,000 to 27
0000. The photosensitive composition according to claim 1. 5. The photosensitive composition according to any one of claims 1, 2, 3, or 4, wherein the amount of the orthoquinone diazide compound added to the polymerized metal is 5 to 50 weight percent. thing. 6. A photosensitive composition containing one or more polymeric compounds selected from the group consisting of polyvinyl butyral, polyvinyl formal, or polyvinyl acetate and an orthoquinone diazide compound is exposed, and then developed with an aqueous developer. A method for developing a photosensitive composition, characterized by: 7o Claim 6, wherein the aqueous developer is an aqueous solution of an alkali metal salt compound of aromatic carboxylic acid, aromatic sulfonic acid, phenols, or alkyl sulfuric acid, and an alkali metal hydroxide and/or carbonate. The development method described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14090783A JPS59187340A (en) | 1983-08-01 | 1983-08-01 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14090783A JPS59187340A (en) | 1983-08-01 | 1983-08-01 | Photosensitive composition |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56156961A Division JPS5858546A (en) | 1981-10-02 | 1981-10-02 | Photosensitive mask material for photoengraving |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1060496A Division JPH0680462B2 (en) | 1989-03-13 | 1989-03-13 | Photosensitive film and developing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59187340A true JPS59187340A (en) | 1984-10-24 |
| JPH0253778B2 JPH0253778B2 (en) | 1990-11-19 |
Family
ID=15279579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14090783A Granted JPS59187340A (en) | 1983-08-01 | 1983-08-01 | Photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59187340A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0320741A (en) * | 1989-06-17 | 1991-01-29 | Konica Corp | Dampening waterless photosensitive planographic plate |
| JPH0373953A (en) * | 1989-08-15 | 1991-03-28 | Konica Corp | Photosensitive composition and image forming method |
| JPH0373952A (en) * | 1989-08-15 | 1991-03-28 | Konica Corp | Photosensitive composition and image forming method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011022A (en) * | 1973-05-29 | 1975-02-04 | ||
| JPS5096304A (en) * | 1973-12-27 | 1975-07-31 | ||
| JPS5463818A (en) * | 1977-09-22 | 1979-05-23 | Hoechst Ag | Photosensitive copying composition |
| JPS556397A (en) * | 1978-06-26 | 1980-01-17 | Hoechst Ag | Photosensitive mixture |
| JPS55129341A (en) * | 1979-03-29 | 1980-10-07 | Daicel Chem Ind Ltd | Photosensitive covering composition |
| JPS56126836A (en) * | 1980-03-11 | 1981-10-05 | Ricoh Co Ltd | Photosensitive lithographic original plate |
| JPS5858546A (en) * | 1981-10-02 | 1983-04-07 | Kimoto & Co Ltd | Photosensitive mask material for photoengraving |
-
1983
- 1983-08-01 JP JP14090783A patent/JPS59187340A/en active Granted
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011022A (en) * | 1973-05-29 | 1975-02-04 | ||
| JPS5096304A (en) * | 1973-12-27 | 1975-07-31 | ||
| JPS5463818A (en) * | 1977-09-22 | 1979-05-23 | Hoechst Ag | Photosensitive copying composition |
| JPS556397A (en) * | 1978-06-26 | 1980-01-17 | Hoechst Ag | Photosensitive mixture |
| JPS55129341A (en) * | 1979-03-29 | 1980-10-07 | Daicel Chem Ind Ltd | Photosensitive covering composition |
| JPS56126836A (en) * | 1980-03-11 | 1981-10-05 | Ricoh Co Ltd | Photosensitive lithographic original plate |
| JPS5858546A (en) * | 1981-10-02 | 1983-04-07 | Kimoto & Co Ltd | Photosensitive mask material for photoengraving |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0320741A (en) * | 1989-06-17 | 1991-01-29 | Konica Corp | Dampening waterless photosensitive planographic plate |
| JPH0373953A (en) * | 1989-08-15 | 1991-03-28 | Konica Corp | Photosensitive composition and image forming method |
| JPH0373952A (en) * | 1989-08-15 | 1991-03-28 | Konica Corp | Photosensitive composition and image forming method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0253778B2 (en) | 1990-11-19 |
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