JPS59187133U - Vapor deposition equipment - Google Patents

Vapor deposition equipment

Info

Publication number
JPS59187133U
JPS59187133U JP8223483U JP8223483U JPS59187133U JP S59187133 U JPS59187133 U JP S59187133U JP 8223483 U JP8223483 U JP 8223483U JP 8223483 U JP8223483 U JP 8223483U JP S59187133 U JPS59187133 U JP S59187133U
Authority
JP
Japan
Prior art keywords
vapor deposition
deposition equipment
abstract
deposition apparatus
susceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8223483U
Other languages
Japanese (ja)
Inventor
今井　利郎
林　善夫
Original Assignee
ロ−ム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ロ−ム株式会社 filed Critical ロ−ム株式会社
Priority to JP8223483U priority Critical patent/JPS59187133U/en
Publication of JPS59187133U publication Critical patent/JPS59187133U/en
Pending legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来あ蒸着装置を示す説明図、第２図はこの考
案の蒸着装置の実施例を示す分解斜視図、第３図はこの
考案の蒸着装置の実施例を示す説明図である。 ８・・・回転軸、１０・・・ガイド板、１４・・・サセ
プタ、１６・・・半導体基板、２２・・・スペーサ。FIG. 1 is an explanatory view showing a conventional vapor deposition apparatus, FIG. 2 is an exploded perspective view showing an embodiment of the vapor deposition apparatus of this invention, and FIG. 3 is an explanatory view showing an embodiment of the vapor deposition apparatus of this invention. 8... Rotating shaft, 10... Guide plate, 14... Susceptor, 16... Semiconductor substrate, 22... Spacer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 回転軸の上端部に形成されたガイド体と半導体基板を載
置するサセプタとの間にスペーサをｉ置し、載置板の高
さを調節可能にしたことを特徴とする蒸着装置。A vapor deposition apparatus characterized in that a spacer is placed between a guide body formed at the upper end of a rotating shaft and a susceptor on which a semiconductor substrate is placed, so that the height of the mounting plate can be adjusted.
JP8223483U 1983-05-30 1983-05-30 Vapor deposition equipment Pending JPS59187133U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8223483U JPS59187133U (en) 1983-05-30 1983-05-30 Vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8223483U JPS59187133U (en) 1983-05-30 1983-05-30 Vapor deposition equipment

Publications (1)

Publication Number Publication Date
JPS59187133U true JPS59187133U (en) 1984-12-12

Family

ID=30212186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8223483U Pending JPS59187133U (en) 1983-05-30 1983-05-30 Vapor deposition equipment

Country Status (1)

Country Link
JP (1) JPS59187133U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5010567A (en) * 1973-05-25 1975-02-03
JPS51140888A (en) * 1975-05-30 1976-12-04 Hitachi Ltd A vapor phase growth apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5010567A (en) * 1973-05-25 1975-02-03
JPS51140888A (en) * 1975-05-30 1976-12-04 Hitachi Ltd A vapor phase growth apparatus

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