JPS59182422A - Production of liquid crystal cell - Google Patents
Production of liquid crystal cellInfo
- Publication number
- JPS59182422A JPS59182422A JP5733783A JP5733783A JPS59182422A JP S59182422 A JPS59182422 A JP S59182422A JP 5733783 A JP5733783 A JP 5733783A JP 5733783 A JP5733783 A JP 5733783A JP S59182422 A JPS59182422 A JP S59182422A
- Authority
- JP
- Japan
- Prior art keywords
- film
- liquid crystal
- dust
- dryer
- polymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
Abstract
Description
【発明の詳細な説明】
本発明は液晶セルの製造方法、特に液晶セルの配向膜と
して用いられるボリイミ゛ド系高分子膜塗布による製造
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a liquid crystal cell, and particularly to a method of manufacturing a liquid crystal cell by coating a polyimide polymer film used as an alignment film of a liquid crystal cell.
電界効果型液晶セルは一般に、上、下ガラス基板上に各
々透明電極パターンを形成し、その上面に配向膜を塗布
、配向処理を行った後−上下ガラス基板をある一定間隔
をなして対向配置し、上下ガラス基板の周辺部を接着剤
で封止し一上下ガラス基板間に液晶を注入し、孔を封孔
処理して形成される、
この配向膜は一般に有機高分子膜が用いられており、特
に信頼性、配向安定性、品質等から、ポリイミド系高分
子膜が多く用いられている。Field-effect liquid crystal cells generally have transparent electrode patterns formed on top and bottom glass substrates, and after applying an alignment film on the top surface and performing alignment treatment, the top and bottom glass substrates are placed facing each other at a certain distance. Then, the peripheral parts of the upper and lower glass substrates are sealed with adhesive, liquid crystal is injected between the upper and lower glass substrates, and the holes are sealed.This alignment film is generally made of an organic polymer film. In particular, polyimide-based polymer films are often used because of their reliability, alignment stability, quality, etc.
この高分子膜を塗布するにはスピンナー法、印刷法、デ
ィッピング法等が用いられている。A spinner method, a printing method, a dipping method, etc. are used to apply this polymer film.
しかしながら、塗布した後の乾燥工程を行なう時に、一
定の条件の下に行なわないと、膜厚の均一性、ピンホー
ルの発生、ゴミの付着、膜質変化等、最終的な膜品質に
大きく影響を及ぼす。However, if the drying process after coating is not carried out under certain conditions, the final film quality may be significantly affected, such as uniformity of film thickness, occurrence of pinholes, adhesion of dust, and changes in film quality. affect
又、この溶媒にはＮ−メチル−２−ピロリドンを用いて
いるため、乾燥時の散出ガスの処理も問題となる。Furthermore, since N-methyl-2-pyrrolidone is used as the solvent, treatment of gas emitted during drying also poses a problem.
従来、乾燥工程としては一般的にノ（ソチ炉あるいは連
続炉等が用いられているが）くソチ炉では、ガラス基板
を入れたカセットの出し入れをする際、炉内に入ってい
る別のカセットの乾燥に影響を及ぼし同一条件下での乾
燥がやりにくく、散出ガスの処理が困難である。Traditionally, the drying process has generally been carried out using a Sochi furnace or a continuous furnace. It is difficult to dry under the same conditions, and it is difficult to treat the emitted gas.
又、連続炉であるとクリーンな雰囲気を保ちながら乾燥
する事が困難であり、設備的にも膨大な費用を要する。Moreover, if a continuous furnace is used, it is difficult to dry while maintaining a clean atmosphere, and an enormous amount of equipment is required.
本発明は以上の様な事情に鑑みなされたもので、ポリイ
ミド系高分子膜の溶媒を蒸発させるとともに、膜厚の均
一性を保ち、ピンホール、ゴミ付着等の発生のない配向
膜の乾燥工程及び、散出ガスの安全排気処理を得ようと
するものである。The present invention has been made in view of the above circumstances, and is a drying process for an alignment film that evaporates the solvent of a polyimide polymer film, maintains uniform film thickness, and does not cause pinholes, dust adhesion, etc. It also aims to provide safe exhaust treatment for emitted gas.
以下本発明の詳細について図１を用いて説明する。The details of the present invention will be explained below using FIG. 1.
第１図は本発明の一実施例によるポリイミド系高分子膜
の乾燥装置の概略を示す断面図であり、第１図において
、ポリイミド系高分子膜を塗布されたガラス基板２が複
数枚入ったカセット１がローラー６上に載せられて乾燥
装置に運搬されて来る、
乾燥装置の構成としては空気（他の不活性ガスでも可）
を送風するためのブロアー４、熱源５、フィルター６、
カバー７、及び排気ダクト８より成っており、ゴミの発
生のない機な工夫がほどこされている。FIG. 1 is a cross-sectional view schematically showing a drying apparatus for a polyimide polymer film according to an embodiment of the present invention. In FIG. The cassette 1 is placed on a roller 6 and transported to a drying device.The drying device consists of air (other inert gas is also possible).
A blower 4 for blowing air, a heat source 5, a filter 6,
It consists of a cover 7 and an exhaust duct 8, and is designed to prevent the generation of dust.
が十分な条件のもとに行なわれろ様に送風量熱風温度、
ローラー送り速度が可変選択できる様になっている。The amount of air blown should be carried out under sufficient conditions, the temperature of the hot air,
The roller feed speed can be variably selected.
乾燥装置にカセットが来ると、ブロアーから吹き出され
た空気は熱源を通過する事により３０゜〜２３０℃の範
囲で選択された温度に上昇し、ゴミを持ち込まない様に
０，３μ以上のゴミを除去するフィルタ一部を通過する
事によりクリーンエアーとなる。When the cassettes arrive at the dryer, the air blown out from the blower passes through a heat source and is raised to a selected temperature in the range of 30° to 230°C. It becomes clean air by passing through a part of the filter to be removed.
この加熱されたクリーンエアーがガラス基板を加熱する
と同時に配向膜を乾燥させろ。蒸発したガスはクリーン
エアーに運ばれて上方の排気ダクトから排出され、しか
るべき処理がなされる。This heated clean air heats the glass substrate and simultaneously dries the alignment film. The evaporated gases are carried in clean air and discharged through the upper exhaust duct for appropriate treatment.
本発明の装置による乾燥処理を行ったポリイミド系高分
子膜の塗布されたガラス基板な観察してみたところ、通
常の乾燥を行ったガラス基板と比べ膜の均一性もすぐれ
、ピンホールも少なく、ゴミ付着もない配向膜を得る事
が出来た。When we observed a glass substrate coated with a polyimide polymer film that had been dried using the apparatus of the present invention, we found that the film was more uniform and had fewer pinholes than a glass substrate that had been dried normally. It was possible to obtain an alignment film with no dust attached.
又、装置としても犬がかりなものでな〈従来の炉の様に
散出ガスが炉内に充満する事なく排気出来るため安全性
に富むと同時にセル品質にも好結果をもたらした。In addition, the equipment is not complicated, and the emitted gas can be exhausted without filling the furnace like in conventional furnaces, making it safer and at the same time yielding good results in terms of cell quality.
第１図は本発明の一実施例によるポリイミド系高分子膜
の乾燥装置の概略を示す断面図である。
１・・・・・・ガラス基板を運搬するためのカセット、
２・・・・・・ガラス基板、
６・・・・・・カセットを運ぶためのローラー、４・・
・・・・ブロアー、５・・・・・・熱源、６・・・・・
・フィルター、７・・・・・・カッく−、８・・・・・
・排気ダクト。
第１図FIG. 1 is a sectional view schematically showing a drying apparatus for a polyimide polymer film according to an embodiment of the present invention. 1...Cassette for transporting glass substrates,
2...Glass substrate, 6...Roller for carrying the cassette, 4...
...Blower, 5...Heat source, 6...
・Filter, 7...Cuckoo, 8...
·Exhaust duct. Figure 1
Claims (1)
着剤でシールし、その間に液晶を封入してなる液晶セル
において、前記ガラス基板にポリイミド系高分子膜を塗
布後、３０°Ｃ〜２３０°Ｃの熱風で乾燥する事を特徴
とする液晶セルの製造方法。In a liquid crystal cell in which a pair of glass substrates having electrodes are sealed with an adhesive at a predetermined distance and a liquid crystal is sealed between them, after coating a polyimide polymer film on the glass substrates, the glass substrates are heated at 30°C to 230°C. A method for manufacturing a liquid crystal cell characterized by drying with hot air at °C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5733783A JPS59182422A (en) | 1983-04-01 | 1983-04-01 | Production of liquid crystal cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5733783A JPS59182422A (en) | 1983-04-01 | 1983-04-01 | Production of liquid crystal cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59182422A true JPS59182422A (en) | 1984-10-17 |
Family
ID=13052752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5733783A Pending JPS59182422A (en) | 1983-04-01 | 1983-04-01 | Production of liquid crystal cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59182422A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6947113B2 (en) * | 2001-06-20 | 2005-09-20 | Nec Lcd Technologies, Ltd. | Method of fabricating liquid crystal display device |
-
1983
- 1983-04-01 JP JP5733783A patent/JPS59182422A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6947113B2 (en) * | 2001-06-20 | 2005-09-20 | Nec Lcd Technologies, Ltd. | Method of fabricating liquid crystal display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR910003777B1 (en) | Method and apparatus for coating photoresist | |
| KR970077123A (en) | Coating film forming method and coating film forming apparatus | |
| JP4939850B2 (en) | Substrate processing method | |
| CN1322969A (en) | Method for coating and developing and its system | |
| JP2003145563A (en) | Cellulose acylate film and polarizing plate using the film | |
| JPS59182422A (en) | Production of liquid crystal cell | |
| JPS5953530B2 (en) | Photosensitive material manufacturing equipment | |
| JPH1195219A (en) | Formation of oriented film of liquid crystal cell | |
| KR20020096997A (en) | Method of fabricating liquid crystal display device | |
| CN112859451A (en) | Alignment film drying device, alignment film preparation equipment and alignment film preparation method | |
| US20040048201A1 (en) | Resist application method and device | |
| JPH0412201B2 (en) | ||
| JP2004319117A (en) | Electrode coating method | |
| JPH1163828A (en) | Hot-blast drying furnace | |
| JPH11223462A (en) | Drying furnace | |
| JP3026305B2 (en) | Heat treatment method | |
| JP2019028285A (en) | Production apparatus and production method of optical film | |
| JP3978533B2 (en) | Film manufacturing method | |
| JPS62193248A (en) | Resist coating and baking device | |
| JP2010186929A (en) | Substrate processing apparatus and substrate processing method | |
| JP3067177B2 (en) | Rotary coating device | |
| JPH0431393A (en) | Metallizing device with molecular beam | |
| KR950007081Y1 (en) | Drying apparatus of coating films | |
| JPH02288289A (en) | Manufacture of flexible printed substrate | |
| US664982A (en) | Manufacture of photographic sensitized materials. |