JP4350298B2 - Drying equipment - Google Patents

Drying equipment Download PDF

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Publication number
JP4350298B2
JP4350298B2 JP2000356470A JP2000356470A JP4350298B2 JP 4350298 B2 JP4350298 B2 JP 4350298B2 JP 2000356470 A JP2000356470 A JP 2000356470A JP 2000356470 A JP2000356470 A JP 2000356470A JP 4350298 B2 JP4350298 B2 JP 4350298B2
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JP
Japan
Prior art keywords
drying
base material
drying zone
substrate
infrared heater
Prior art date
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Expired - Fee Related
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JP2000356470A
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Japanese (ja)
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JP2002162162A (en
Inventor
羽 洋 吉
田 武 明 津
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2000356470A priority Critical patent/JP4350298B2/en
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  • Application Of Or Painting With Fluid Materials (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は基材上に設けられた塗膜を乾燥させるための乾燥装置に係り、とりわけ塗膜の性質を劣化させることなく乾燥させることができる乾燥装置に関する。
【0002】
【従来の技術】
従来、PDP背面板にリブを形成する際、電極等が表面に形成された枚葉のガラス基板上にリブペースト材を250〜300μmの厚みで均一に塗布し、その後ペースト中に含まれる溶剤を乾燥装置内で蒸発させる。この場合、まず乾燥装置内で恒率乾燥期間では、およそ150〜180℃で乾燥させ、減率乾燥期間では220〜250℃で乾燥を行っている。いずれの乾燥期間でも、風速1m/s程度の熱風を塗膜表面に垂直または平行に給気し、発生する溶剤蒸気を塗工膜表面近傍から取り除いている。
【0003】
【発明が解決しようとする課題】
上記の乾燥方式では、恒率乾燥期間において塗膜表面で発生した溶剤蒸気は、給気の流れにより塗膜表面に再度戻されるため、塗膜表面上で澱みが生じ、これが塗膜表面の乾燥ムラとなっていた。また、溶剤がいつまでも滞留するため、乾燥効率も上がらない。これらを防ぐために熱風の給気風速を上げると、塗膜表面に風紋が生じてしまうという欠点がある。
【0004】
本発明はこのような点を考慮してなされたものであり、基材に設けられた塗膜の性質を劣化させることなく塗膜を確実に乾燥させることができる乾燥装置を提供することを目的とする。
【0005】
【課題を解決するための手段】
本発明は、塗膜が形成された基材が内部を走行するとともに、この内部が走行する基材の上流側から順に第1乾燥ゾーンと、第2乾燥ゾーンとに仕切られた乾燥炉と、乾燥炉の入口側に設けられ、基材を載置して加熱するホットプレートを有する予熱部と、第1乾燥ゾーン内に設けられた第1乾燥機構と、第2乾燥ゾーン内に設けられた第2乾燥機構とを備えたことを特徴とする乾燥装置である。
【0006】
本発明によれば、塗膜が形成された基材が予熱部のホットプレート上に載置され、直接的に加熱される。次に第1乾燥ゾーンにおいて、第1乾燥機構により、基材上のヒータ上方において形成された塗膜の恒率乾燥が行われる。その後基材は第2乾燥ゾーンへ送られ、第2乾燥機構により表面の塗膜が更に乾燥されて減率乾燥が行われる。このように基材はホットプレートにより予め直接的に加熱された後、第1乾燥ゾーンに入るので、第1乾燥ゾーン内における恒率乾燥を迅速に行なうことができる。
【0007】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態について説明する。図1は本発明による乾燥装置の一実施の形態を示す図である。
【0008】
図1に示すように、乾燥装置、例えば赤外線乾燥装置10は、基材15が内部を走行するとともに、この内部が走行するガラス基材15の上流側から順に第1乾燥ゾーン10aと、第2乾燥ゾーン10bとに仕切壁10cにより仕切られた乾燥炉11と、乾燥炉11の第1乾燥ゾーン10a内であって基材15上方に基材15に平行に配置された赤外線ヒータ16と、第1乾燥ゾーン10a内であって赤外線ヒータ16上方に配置された給気装置18および排気装置19と、を備えている。この場合、基材15は乾燥炉11内において搬送ローラ12上を走行する。
【0009】
図1において基材15としては、電極を有する枚葉ガラス基材に、予めリブペースト材が塗布されて表面に塗膜が形成されたPDP背面板用のガラス基材が考えられる。
【0010】
給気装置18は基材15の走行方向Lの下流側に設けられ、予め適温に加熱された空気を供給するものである。排気装置19は基材15の走行方向Lの上流側に設けられ、給気装置18と排気装置19とによって赤外線ヒータ16上方に赤外線ヒータ16と平行な空気流を形成するようになっている。
【0011】
なお、給気装置18を基材15の走行方向Lの上流側に設け、排気装置19を基材15の走行方向Lの下流側に設けてもよい。
【0012】
また第1乾燥ゾーン11a内の搬送ローラ12に支持された基材15下方に、追加給気装置20と追加排気装置21とが各々設けられている。追加給気装置20は基材15の走行方向Lの下流側に設けられ、追加排気装置21は基材15の走行方向Lの上流側に設けられ、これら追加給気装置20と追加排気装置21とによって基材15下方に基材15と平行な空気流を形成している。
【0013】
また図1に示すように、乾燥炉11にはその入口側に基材入口11aを介して予熱部30が設置され、その出口側に基材出口11bを介してアンローダ部25が設置されている。さらに乾燥炉11の第1乾燥ゾーン10a、および第2乾燥ゾーン10b内には、上述のように基材15を搬送する多数の搬送ローラ12が設けられている。
また図11において、予熱部30は囲体30aと、囲体30a内に収納され基材11を載置して直接的に加熱するホットプレート31とを有している。さらに囲体30aの上部には、排気機構32が設けられている。
【0014】
さらにまた、図1に示すように、乾燥炉11の第2乾燥ゾーン10b内には、基材15の上方に熱風吹付装置26が設けられ、基材15の下方に排気装置27が設けられている。
【0015】
図1において、第1乾燥ゾーン10a内に設置された赤外線ヒータ16、給気装置18、排気装置19、追加給気装置20および追加排気装置21により第1乾燥機構が構成されている。また第2乾燥ゾーン10b内に設置された熱風吹付装置26および排気装置27により第2乾燥機構が構成されている。
【0016】
次にこのような構成からなる本実施の形態の作用について説明する。まず電極を有するガラス基材15に対して印刷またはコーティングによりリブペースト材が塗布され、表面に塗膜(250〜300μm)が形成された基材15が作製される。次に塗膜が形成された基材15は、予熱部30のホットプレート31上に載置され、直接的に一定時間(1〜5分間)、60〜100℃程度で加熱される。その後、基材15はウォーキングビーム等の搬送手段により、基材入口11aを介して乾燥炉11に進入し、搬入ローラ12により一定速度で乾燥炉11の第1乾燥ゾーン10a内を走行する。その後基材15は、乾燥炉11の第2乾燥ゾーン10b内へ送られ、その後第2乾燥ゾーン10b内から基材出口11bを経て外方へ排出される。
【0017】
この間、予熱部30内において基材15が加熱されると、基材15上に設けられた塗膜表面から溶剤が蒸発し、蒸発した溶剤は排気機構32から除去される。このように溶剤を排気機構32から排出することにより、塗膜の乾燥効率を上昇させることができる。その後、基材15は第1乾燥ゾーン10a内において赤外線ヒータ16からの輻射熱により加熱され、基材15上に設けられた塗膜表面から更に溶剤が蒸発して除去される。基材15から除去された溶剤は上昇して、赤外線ヒータ16の上方へ達する。
【0018】
このとき、赤外線ヒータ16の上方には、給気装置18と排気装置19とにより赤外線ヒータ16と平行な空気流が形成されているので、赤外線ヒータ16の上方へ達した蒸発溶剤は赤外線ヒータ16と平行な空気流により排気装置19まで運ばれ、この排気装置19から外方へ排出される。
【0019】
また基材15下方にも、追加給気装置20と追加排気装置21とにより、基材15の下方に基材15に平行な空気流が形成されている。このため乾燥炉11の第1乾燥ゾーン10a内の空気流が安定し、赤外線ヒータ16上方の空気流が赤外線ヒータ16の側方または基材15の側方を通過して基材15の下方へ流れることはない。
【0020】
上述のように、第1乾燥ゾーン10a内では、基材15表面に空気流が直接当たることはないので、基材15の塗膜表面が荒れたり塗膜表面からの乾燥によって塗膜表面に皮ばりを生じさせることはなく、第1乾燥ゾーン10a内において基材15の塗膜の恒率乾燥を精度良く行うことができる。また第1乾燥ゾーン10a内に入る前に、予め基材15は予熱部30で予熱されるので、第1乾燥ゾーン10a内における基材15の塗膜の恒率乾燥を迅速に行なうことができる。
【0021】
次に基材15は、第2乾燥ゾーン10b内において熱風吹付装置26から吹付けられる熱風により、基材15の塗膜の減率乾燥が行われ、減率乾燥を行った熱風は、その後排気装置27から排気される。基材15の塗膜は第1乾燥ゾーン10a内で予めある程度乾燥して固化されているので、第2乾燥ゾーン10b内において熱風を基材15の型膜に吹付けても塗膜表面が荒れることはなく、熱風吹付装置26により吹付けられた熱風により、迅速に基材15の塗膜の減率乾燥を行うことができる。
【0022】
なお第1乾燥ゾーン10a内における恒率乾燥は150℃〜180℃の温度で行われ、一方第2乾燥ゾーン10b内における減率乾燥は220℃〜250℃にて行われる。
【0023】
以上のように本実施の形態によれば、予め予熱部30内で基材15を加熱した後、基材15に対して第1乾燥ゾーン10a内で塗膜の恒率乾燥を行なうので、第1乾燥ゾーン10a内での塗膜の恒率乾燥を迅速に行なうことができる。また第1乾燥ゾーン10a内において給気装置18と排気装置19とにより赤外線ヒータ16上方に空気流が形成されるので、このように形成された空気流が直接基材15表面に当たることはない。このため基材15に設けられた塗膜表面が荒れたり、塗膜表面からの乾燥によって塗膜表面に皮ばりを生じさせこれによって塗膜の密着性が悪化したりすることはない。このように基材15に設けられた塗膜の性質を劣化させることを防止することができる。また赤外線ヒータ16上方の空気流は、赤外線ヒータ16と平行に流れるので、赤外線ヒータ16に空気流が当たることもなく、赤外線ヒータ16の温度低下を引き起こすことはない。さらに追加給気装置20と追加排気装置21とにより、基材15の下方に基材15と平行な空気流を形成することができるので、乾燥炉11内の空気流のバランスを安定化させることができ、より確実に基材15へ直接当たる空気流をなくすことができる。第1乾燥ゾーン10a内で塗膜に対して恒率乾燥が行われた基材15は、その後第2乾燥ゾーン10b内において、熱風吹付装置26から吹付けられる熱風により減率乾燥が行われる。
【0024】
なお上記実施の形態において、第2乾燥ゾーン10b内に熱風吹付装置26を設置した例を示したが、これに限らず第2乾燥ゾーン10b内に第1乾燥ゾーン10a内と同様赤外線ヒータを設置してもよい。
【0025】
【発明の効果】
以上のように本発明によれば、基材は予熱部のホットプレートにより予め直接的に加熱された後、第1乾燥ゾーンに入るので、第1乾燥ゾーン内における第1乾燥機構による恒率乾燥を迅速に行なうことができる。その後基材は第2乾燥ゾーン内において、すでに恒率乾燥され固化された塗膜に対して第2乾燥機構により迅速に減率乾燥を行うことができる。
【図面の簡単な説明】
【図1】本発明による乾燥装置の一実施の形態を示す図。
【符号の説明】
10 赤外線乾燥装置
10a 第1乾燥ゾーン
10b 第2乾燥ゾーン
11 乾燥炉
12 搬送ローラ
15 基材
16 赤外線ヒータ
18 給気装置
19 排気装置
20 追加給気装置
21 追加排気装置
26 熱風吹付装置
27 排気装置
30 予熱部
30a 囲体
31 ホットプレート
32 排気機構
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a drying apparatus for drying a coating film provided on a substrate, and more particularly to a drying apparatus capable of drying without deteriorating the properties of the coating film.
[0002]
[Prior art]
Conventionally, when ribs are formed on a PDP back plate, a rib paste material is uniformly applied to a thickness of 250 to 300 μm on a glass substrate having a surface on which electrodes and the like are formed, and then a solvent contained in the paste is removed. Evaporate in the dryer. In this case, first, drying is performed at about 150 to 180 ° C. during the constant rate drying period in the drying apparatus, and drying is performed at 220 to 250 ° C. during the reduction rate drying period. In any drying period, hot air having a wind speed of about 1 m / s is supplied perpendicularly or parallel to the surface of the coating film, and the generated solvent vapor is removed from the vicinity of the coating film surface.
[0003]
[Problems to be solved by the invention]
In the above drying method, the solvent vapor generated on the coating film surface during the constant rate drying period is returned to the coating film surface again by the flow of the supply air, so that stagnation occurs on the coating film surface. It was uneven. Moreover, since the solvent stays forever, the drying efficiency does not increase. If the air supply speed of hot air is increased in order to prevent these problems, there is a drawback that a wind pattern is generated on the surface of the coating film.
[0004]
The present invention has been made in consideration of such points, and an object thereof is to provide a drying apparatus that can reliably dry a coating film without deteriorating the properties of the coating film provided on the substrate. And
[0005]
[Means for Solving the Problems]
The present invention is a drying furnace partitioned into a first drying zone and a second drying zone in order from the upstream side of the substrate on which the substrate on which the coating film is formed travels inside. A preheating unit provided on the inlet side of the drying furnace and having a hot plate for placing and heating the substrate, a first drying mechanism provided in the first drying zone, and provided in the second drying zone A drying apparatus including a second drying mechanism.
[0006]
According to this invention, the base material in which the coating film was formed is mounted on the hot plate of a preheating part, and is heated directly. Next, in the first drying zone, constant rate drying of the coating film formed above the heater on the substrate is performed by the first drying mechanism. Thereafter, the base material is sent to the second drying zone, and the coating film on the surface is further dried by the second drying mechanism, and reduction drying is performed. Thus, since the base material is directly heated by the hot plate in advance and then enters the first drying zone, constant rate drying in the first drying zone can be performed quickly.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing an embodiment of a drying apparatus according to the present invention.
[0008]
As shown in FIG. 1, a drying apparatus, for example, an infrared drying apparatus 10 includes a first drying zone 10 a and a second drying order in order from the upstream side of the glass substrate 15 in which the substrate 15 travels. A drying furnace 11 partitioned into a drying zone 10b by a partition wall 10c; an infrared heater 16 disposed in parallel with the base material 15 above the base material 15 in the first drying zone 10a of the drying furnace 11; An air supply device 18 and an exhaust device 19 disposed in the drying zone 10 a and above the infrared heater 16 are provided. In this case, the base material 15 travels on the transport roller 12 in the drying furnace 11.
[0009]
In FIG. 1, as the base material 15, a glass base material for a PDP back plate in which a rib paste material is previously applied to a single wafer glass base material having electrodes and a coating film is formed on the surface is conceivable.
[0010]
The air supply device 18 is provided on the downstream side of the base material 15 in the traveling direction L, and supplies air heated to an appropriate temperature in advance. The exhaust device 19 is provided on the upstream side in the running direction L of the base material 15, and an air flow parallel to the infrared heater 16 is formed above the infrared heater 16 by the air supply device 18 and the exhaust device 19.
[0011]
The air supply device 18 may be provided on the upstream side in the traveling direction L of the base material 15, and the exhaust device 19 may be provided on the downstream side in the traveling direction L of the base material 15.
[0012]
Further, an additional air supply device 20 and an additional exhaust device 21 are respectively provided below the base material 15 supported by the transport roller 12 in the first drying zone 11a. The additional air supply device 20 is provided on the downstream side in the running direction L of the base material 15, and the additional exhaust device 21 is provided on the upstream side in the running direction L of the base material 15, and the additional air supply device 20 and the additional exhaust device 21 are provided. Thus, an air flow parallel to the base material 15 is formed below the base material 15.
[0013]
Further, as shown in FIG. 1, the drying furnace 11 is provided with a preheating part 30 on the inlet side via a base material inlet 11a and on the outlet side thereof with an unloader part 25 via a base material outlet 11b. . Furthermore, in the 1st drying zone 10a and the 2nd drying zone 10b of the drying furnace 11, many conveyance rollers 12 which convey the base material 15 as mentioned above are provided.
In FIG. 11, the preheating unit 30 includes an enclosure 30 a and a hot plate 31 that is stored in the enclosure 30 a and directly heats the substrate 11. Further, an exhaust mechanism 32 is provided on the upper portion of the enclosure 30a.
[0014]
Furthermore, as shown in FIG. 1, in the second drying zone 10 b of the drying furnace 11, a hot air blowing device 26 is provided above the base material 15, and an exhaust device 27 is provided below the base material 15. Yes.
[0015]
In FIG. 1, a first drying mechanism is configured by the infrared heater 16, the air supply device 18, the exhaust device 19, the additional air supply device 20, and the additional exhaust device 21 installed in the first drying zone 10 a. Moreover, the 2nd drying mechanism is comprised by the hot air spraying apparatus 26 and the exhaust apparatus 27 which were installed in the 2nd drying zone 10b.
[0016]
Next, the operation of the present embodiment having such a configuration will be described. First, a rib paste material is applied to the glass substrate 15 having electrodes by printing or coating, and the substrate 15 having a coating film (250 to 300 μm) formed on the surface is produced. Next, the base material 15 on which the coating film is formed is placed on the hot plate 31 of the preheating unit 30 and directly heated at a temperature of about 60 to 100 ° C. for a certain time (1 to 5 minutes). Thereafter, the base material 15 enters the drying furnace 11 through the base material inlet 11a by a conveying means such as a walking beam, and travels in the first drying zone 10a of the drying furnace 11 at a constant speed by the carry-in roller 12. Thereafter, the base material 15 is fed into the second drying zone 10b of the drying furnace 11, and then discharged outward from the second drying zone 10b through the base material outlet 11b.
[0017]
During this time, when the substrate 15 is heated in the preheating unit 30, the solvent evaporates from the surface of the coating film provided on the substrate 15, and the evaporated solvent is removed from the exhaust mechanism 32. By discharging the solvent from the exhaust mechanism 32 in this way, the drying efficiency of the coating film can be increased. Thereafter, the substrate 15 is heated by radiant heat from the infrared heater 16 in the first drying zone 10a, and the solvent is further evaporated and removed from the surface of the coating film provided on the substrate 15. The solvent removed from the base material 15 rises and reaches above the infrared heater 16.
[0018]
At this time, since an air flow parallel to the infrared heater 16 is formed by the air supply device 18 and the exhaust device 19 above the infrared heater 16, the evaporated solvent that has reached the upper side of the infrared heater 16 is the infrared heater 16. Is carried to the exhaust device 19 by an air flow parallel to the exhaust gas, and discharged from the exhaust device 19 to the outside.
[0019]
Further, an air flow parallel to the base material 15 is formed below the base material 15 by the additional air supply device 20 and the additional exhaust device 21 also below the base material 15. For this reason, the air flow in the first drying zone 10 a of the drying furnace 11 is stabilized, and the air flow above the infrared heater 16 passes through the side of the infrared heater 16 or the side of the base material 15 and below the base material 15. There is no flow.
[0020]
As described above, in the first drying zone 10a, the air flow does not directly hit the surface of the base material 15, so that the coating surface of the base material 15 is roughened or dried from the coating surface. There is no flash, and constant rate drying of the coating film of the base material 15 can be performed with high accuracy in the first drying zone 10a. Moreover, since the base material 15 is preheated in advance by the preheating unit 30 before entering the first drying zone 10a, constant rate drying of the coating film of the base material 15 in the first drying zone 10a can be performed quickly. .
[0021]
Next, the base material 15 is subjected to the reduction rate drying of the coating film of the base material 15 by the hot air blown from the hot air blowing device 26 in the second drying zone 10b, and the hot air subjected to the reduction rate drying is then exhausted. The air is exhausted from the device 27. Since the coating film of the base material 15 is previously dried and solidified to some extent in the first drying zone 10a, the coating film surface is roughened even if hot air is blown onto the mold film of the base material 15 in the second drying zone 10b. However, the coating film of the base material 15 can be quickly dried by the hot air blown by the hot air blowing device 26.
[0022]
The constant rate drying in the first drying zone 10a is performed at a temperature of 150 ° C. to 180 ° C., while the decreasing rate drying in the second drying zone 10b is performed at 220 ° C. to 250 ° C.
[0023]
As described above, according to the present embodiment, since the base material 15 is heated in the preheating unit 30 in advance, the constant rate drying of the coating film is performed on the base material 15 in the first drying zone 10a. The constant rate drying of the coating film in the 1 drying zone 10a can be performed rapidly. Further, since an air flow is formed above the infrared heater 16 by the air supply device 18 and the exhaust device 19 in the first drying zone 10a, the air flow thus formed does not directly hit the surface of the base material 15. For this reason, the coating film surface provided in the base material 15 is not roughened, and the coating film surface is not peeled by drying from the coating film surface, thereby preventing the adhesion of the coating film from being deteriorated. In this way, it is possible to prevent the properties of the coating film provided on the base material 15 from being deteriorated. Further, since the air flow over the infrared heater 16 flows in parallel with the infrared heater 16, the air flow does not hit the infrared heater 16, and the temperature of the infrared heater 16 does not decrease. Furthermore, since the additional air supply device 20 and the additional exhaust device 21 can form an air flow parallel to the base material 15 below the base material 15, the balance of the air flow in the drying furnace 11 can be stabilized. Therefore, the air flow that directly hits the base material 15 can be eliminated more reliably. The base material 15 that has been subjected to constant rate drying on the coating film in the first drying zone 10a is then subjected to reduced rate drying with hot air blown from the hot air blowing device 26 in the second drying zone 10b.
[0024]
In the above embodiment, an example in which the hot air blowing device 26 is installed in the second drying zone 10b has been shown. However, the present invention is not limited to this, and an infrared heater is installed in the second drying zone 10b as in the first drying zone 10a. May be.
[0025]
【The invention's effect】
As described above, according to the present invention, the base material is directly heated in advance by the hot plate of the preheating unit and then enters the first drying zone. Therefore, constant rate drying by the first drying mechanism in the first drying zone. Can be performed quickly. Thereafter, the base material can be rapidly dried at a reduced rate by the second drying mechanism with respect to the coating film which has been dried at a constant rate and solidified in the second drying zone.
[Brief description of the drawings]
FIG. 1 is a diagram showing an embodiment of a drying apparatus according to the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Infrared dryer 10a 1st drying zone 10b 2nd drying zone 11 Drying furnace 12 Conveyance roller 15 Base material 16 Infrared heater 18 Air supply device 19 Exhaust device 20 Additional air supply device 21 Additional exhaust device 26 Hot air spraying device 27 Exhaust device 30 Preheating part 30a Enclosure 31 Hot plate 32 Exhaust mechanism

Claims (2)

塗膜が形成された基材が内部を走行するとともに、この内部が走行する基材の上流側から順に第1乾燥ゾーンと、第2乾燥ゾーンとに仕切られた乾燥炉と、
乾燥炉の入口側に設けられ、基材を載置して加熱するホットプレートを有する予熱部と、
第1乾燥ゾーン内に設けられた第1乾燥機構と、
第2乾燥ゾーン内に設けられた第2乾燥機構とを備え
予熱部は乾燥炉の入口側に乾燥炉と別体に設けられ、ホットプレートを収納する囲体を有し、囲体の上部に排気機構を設け、
第1乾燥機構は第1乾燥ゾーン内の基材の上方に基材に略平行に配置された赤外線ヒータと、
第1乾燥ゾーン内の赤外線ヒータ上方に配置された、空気を給気する給気装置および空気を排気する排気装置とを有し、
給気装置と排気装置とによって赤外線ヒータ上方に赤外線ヒータと平行な空気流を形成し、
給気装置を基材の走行方向下流側に設け、排気装置を基材の走行方向上流側に設け、
第2乾燥機構は、基材に対して熱風を吹付ける熱風吹付装置からなることを特徴とする乾燥装置。
The substrate on which the coating film is formed travels inside, and a drying furnace partitioned into a first drying zone and a second drying zone in order from the upstream side of the substrate on which the interior travels,
A preheating unit provided on the inlet side of the drying furnace, having a hot plate for placing and heating the substrate;
A first drying mechanism provided in the first drying zone;
A second drying mechanism provided in the second drying zone ,
The preheating part is provided separately from the drying furnace on the inlet side of the drying furnace, has an enclosure for storing the hot plate, and an exhaust mechanism is provided on the upper part of the enclosure.
The first drying mechanism includes an infrared heater disposed substantially parallel to the substrate above the substrate in the first drying zone;
An air supply device for supplying air and an exhaust device for exhausting air disposed above the infrared heater in the first drying zone;
An air flow parallel to the infrared heater is formed above the infrared heater by the air supply device and the exhaust device,
An air supply device is provided on the downstream side in the running direction of the base material, and an exhaust device is provided on the upstream side in the running direction of the base material.
The second drying mechanism comprises a hot air blowing device that blows hot air against the substrate .
第1乾燥ゾーン内の基材下方に、追加給気装置と追加排気装置を設け、これら追加給気装置と追加排気装置とによって基材下方に基材と平行な空気流を形成することを特徴とする請求項記載の乾燥装置。An additional air supply device and an additional exhaust device are provided below the base material in the first drying zone, and an air flow parallel to the base material is formed below the base material by the additional air supply device and the additional exhaust device. The drying apparatus according to claim 1 .
JP2000356470A 2000-11-22 2000-11-22 Drying equipment Expired - Fee Related JP4350298B2 (en)

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