JP2002162162A - Drying system - Google Patents
Drying systemInfo
- Publication number
- JP2002162162A JP2002162162A JP2000356470A JP2000356470A JP2002162162A JP 2002162162 A JP2002162162 A JP 2002162162A JP 2000356470 A JP2000356470 A JP 2000356470A JP 2000356470 A JP2000356470 A JP 2000356470A JP 2002162162 A JP2002162162 A JP 2002162162A
- Authority
- JP
- Japan
- Prior art keywords
- drying
- substrate
- drying zone
- infrared heater
- air supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Solid Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は基材上に設けられた
塗膜を乾燥させるための乾燥装置に係り、とりわけ塗膜
の性質を劣化させることなく乾燥させることができる乾
燥装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drying apparatus for drying a coating film provided on a substrate, and more particularly to a drying apparatus capable of drying a coating film without deteriorating its properties.
【０００２】[0002]
【従来の技術】従来、ＰＤＰ背面板にリブを形成する
際、電極等が表面に形成された枚葉のガラス基板上にリ
ブペースト材を２５０〜３００μｍの厚みで均一に塗布
し、その後ペースト中に含まれる溶剤を乾燥装置内で蒸
発させる。この場合、まず乾燥装置内で恒率乾燥期間で
は、およそ１５０〜１８０℃で乾燥させ、減率乾燥期間
では２２０〜２５０℃で乾燥を行っている。いずれの乾
燥期間でも、風速１ｍ／ｓ程度の熱風を塗膜表面に垂直
または平行に給気し、発生する溶剤蒸気を塗工膜表面近
傍から取り除いている。2. Description of the Related Art Conventionally, when ribs are formed on a PDP back plate, a rib paste material is uniformly applied in a thickness of 250 to 300 .mu.m on a single glass substrate having electrodes and the like formed on the surface thereof. Is evaporated in the drying device. In this case, first, drying is performed at about 150 to 180 ° C. in the constant rate drying period in the drying apparatus, and drying is performed at 220 to 250 ° C. in the decreasing rate drying period. During any drying period, hot air having a wind speed of about 1 m / s is supplied perpendicularly or parallel to the surface of the coating film, and the generated solvent vapor is removed from the vicinity of the coating film surface.
【０００３】[0003]
【発明が解決しようとする課題】上記の乾燥方式では、
恒率乾燥期間において塗膜表面で発生した溶剤蒸気は、
給気の流れにより塗膜表面に再度戻されるため、塗膜表
面上で澱みが生じ、これが塗膜表面の乾燥ムラとなって
いた。また、溶剤がいつまでも滞留するため、乾燥効率
も上がらない。これらを防ぐために熱風の給気風速を上
げると、塗膜表面に風紋が生じてしまうという欠点があ
る。In the above-mentioned drying method,
Solvent vapor generated on the coating surface during the constant-rate drying period,
Since the film is returned to the surface of the coating film again by the flow of the air supply, stagnation occurs on the surface of the coating film, and this causes drying unevenness on the surface of the coating film. Further, since the solvent stays forever, the drying efficiency does not increase. If the supply air speed of the hot air is increased to prevent these, there is a disadvantage that a wind ripple is generated on the surface of the coating film.
【０００４】本発明はこのような点を考慮してなされた
ものであり、基材に設けられた塗膜の性質を劣化させる
ことなく塗膜を確実に乾燥させることができる乾燥装置
を提供することを目的とする。The present invention has been made in view of the above points, and provides a drying apparatus that can surely dry a coating film without deteriorating the properties of the coating film provided on the base material. The purpose is to:
【０００５】[0005]
【課題を解決するための手段】本発明は、塗膜が形成さ
れた基材が内部を走行するとともに、この内部が走行す
る基材の上流側から順に第１乾燥ゾーンと、第２乾燥ゾ
ーンとに仕切られた乾燥炉と、乾燥炉の入口側に設けら
れ、基材を載置して加熱するホットプレートを有する予
熱部と、第１乾燥ゾーン内に設けられた第１乾燥機構
と、第２乾燥ゾーン内に設けられた第２乾燥機構とを備
えたことを特徴とする乾燥装置である。According to the present invention, a substrate on which a coating film is formed travels inside, and a first drying zone and a second drying zone are arranged in order from the upstream side of the substrate on which the interior travels. A drying oven, a preheating unit provided on the entrance side of the drying oven, having a hot plate for mounting and heating the substrate, and a first drying mechanism provided in the first drying zone; And a second drying mechanism provided in the second drying zone.
【０００６】本発明によれば、塗膜が形成された基材が
予熱部のホットプレート上に載置され、直接的に加熱さ
れる。次に第１乾燥ゾーンにおいて、第１乾燥機構によ
り、基材上のヒータ上方において形成された塗膜の恒率
乾燥が行われる。その後基材は第２乾燥ゾーンへ送ら
れ、第２乾燥機構により表面の塗膜が更に乾燥されて減
率乾燥が行われる。このように基材はホットプレートに
より予め直接的に加熱された後、第１乾燥ゾーンに入る
ので、第１乾燥ゾーン内における恒率乾燥を迅速に行な
うことができる。According to the present invention, the substrate on which the coating film is formed is placed on the hot plate of the preheating section and is directly heated. Next, in the first drying zone, the coating film formed above the heater on the substrate is dried at a constant rate by the first drying mechanism. Thereafter, the base material is sent to the second drying zone, and the coating film on the surface is further dried by the second drying mechanism, and the reduced-rate drying is performed. As described above, since the base material is directly heated in advance by the hot plate and then enters the first drying zone, constant-rate drying in the first drying zone can be rapidly performed.
【０００７】[0007]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態について説明する。図１は本発明による乾燥装
置の一実施の形態を示す図である。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing an embodiment of a drying apparatus according to the present invention.
【０００８】図１に示すように、乾燥装置、例えば赤外
線乾燥装置１０は、基材１５が内部を走行するととも
に、この内部が走行するガラス基材１５の上流側から順
に第１乾燥ゾーン１０ａと、第２乾燥ゾーン１０ｂとに
仕切壁１０ｃにより仕切られた乾燥炉１１と、乾燥炉１
１の第１乾燥ゾーン１０ａ内であって基材１５上方に基
材１５に平行に配置された赤外線ヒータ１６と、第１乾
燥ゾーン１０ａ内であって赤外線ヒータ１６上方に配置
された給気装置１８および排気装置１９と、を備えてい
る。この場合、基材１５は乾燥炉１１内において搬送ロ
ーラ１２上を走行する。As shown in FIG. 1, in a drying apparatus, for example, an infrared drying apparatus 10, a substrate 15 travels inside, and a first drying zone 10a is sequentially arranged from an upstream side of the glass substrate 15 in which the substrate travels. , A drying oven 11 divided by a partition wall 10c into a second drying zone 10b, and a drying oven 1
An infrared heater 16 disposed in the first drying zone 10a and above the substrate 15 in parallel with the substrate 15, and an air supply device disposed in the first drying zone 10a and above the infrared heater 16 18 and an exhaust device 19. In this case, the base material 15 runs on the transport roller 12 in the drying furnace 11.
【０００９】図１において基材１５としては、電極を有
する枚葉ガラス基材に、予めリブペースト材が塗布され
て表面に塗膜が形成されたＰＤＰ背面板用のガラス基材
が考えられる。In FIG. 1, as the substrate 15, a glass substrate for a PDP back plate in which a rib paste material is previously applied to a sheet glass substrate having electrodes and a coating film is formed on the surface is conceivable.
【００１０】給気装置１８は基材１５の走行方向Ｌの下
流側に設けられ、予め適温に加熱された空気を供給する
ものである。排気装置１９は基材１５の走行方向Ｌの上
流側に設けられ、給気装置１８と排気装置１９とによっ
て赤外線ヒータ１６上方に赤外線ヒータ１６と平行な空
気流を形成するようになっている。The air supply device 18 is provided downstream of the base material 15 in the running direction L, and supplies air heated to an appropriate temperature in advance. The exhaust device 19 is provided on the upstream side in the traveling direction L of the base material 15, and forms an air flow parallel to the infrared heater 16 above the infrared heater 16 by the air supply device 18 and the exhaust device 19.
【００１１】なお、給気装置１８を基材１５の走行方向
Ｌの上流側に設け、排気装置１９を基材１５の走行方向
Ｌの下流側に設けてもよい。Note that the air supply device 18 may be provided on the upstream side in the traveling direction L of the substrate 15, and the exhaust device 19 may be provided on the downstream side in the traveling direction L of the substrate 15.
【００１２】また第１乾燥ゾーン１１ａ内の搬送ローラ
１２に支持された基材１５下方に、追加給気装置２０と
追加排気装置２１とが各々設けられている。追加給気装
置２０は基材１５の走行方向Ｌの下流側に設けられ、追
加排気装置２１は基材１５の走行方向Ｌの上流側に設け
られ、これら追加給気装置２０と追加排気装置２１とに
よって基材１５下方に基材１５と平行な空気流を形成し
ている。An additional air supply device 20 and an additional exhaust device 21 are provided below the substrate 15 supported by the transport roller 12 in the first drying zone 11a. The additional air supply device 20 is provided downstream of the substrate 15 in the traveling direction L, and the additional exhaust device 21 is provided upstream of the substrate 15 in the traveling direction L. Thus, an air flow parallel to the base material 15 is formed below the base material 15.
【００１３】また図１に示すように、乾燥炉１１にはそ
の入口側に基材入口１１ａを介して予熱部３０が設置さ
れ、その出口側に基材出口１１ｂを介してアンローダ部
２５が設置されている。さらに乾燥炉１１の第１乾燥ゾ
ーン１０ａ、および第２乾燥ゾーン１０ｂ内には、上述
のように基材１５を搬送する多数の搬送ローラ１２が設
けられている。また図１１において、予熱部３０は囲体
３０ａと、囲体３０ａ内に収納され基材１１を載置して
直接的に加熱するホットプレート３１とを有している。
さらに囲体３０ａの上部には、排気機構３２が設けられ
ている。As shown in FIG. 1, the drying furnace 11 is provided with a preheating section 30 at the inlet side via a base material inlet 11a and an unloader section 25 at the outlet side via a base material outlet 11b. Have been. Further, in the first drying zone 10a and the second drying zone 10b of the drying furnace 11, a large number of transport rollers 12 for transporting the base material 15 are provided as described above. In FIG. 11, the preheating unit 30 has an enclosure 30a and a hot plate 31 that is housed in the enclosure 30a and directly heats the substrate 11 placed thereon.
Further, an exhaust mechanism 32 is provided above the enclosure 30a.
【００１４】さらにまた、図１に示すように、乾燥炉１
１の第２乾燥ゾーン１０ｂ内には、基材１５の上方に熱
風吹付装置２６が設けられ、基材１５の下方に排気装置
２７が設けられている。Further, as shown in FIG.
In the first second drying zone 10 b, a hot air blowing device 26 is provided above the substrate 15, and an exhaust device 27 is provided below the substrate 15.
【００１５】図１において、第１乾燥ゾーン１０ａ内に
設置された赤外線ヒータ１６、給気装置１８、排気装置
１９、追加給気装置２０および追加排気装置２１により
第１乾燥機構が構成されている。また第２乾燥ゾーン１
０ｂ内に設置された熱風吹付装置２６および排気装置２
７により第２乾燥機構が構成されている。In FIG. 1, a first drying mechanism is constituted by an infrared heater 16, an air supply device 18, an exhaust device 19, an additional air supply device 20, and an additional exhaust device 21 installed in a first drying zone 10a. . Second drying zone 1
Hot air blowing device 26 and exhaust device 2 installed in
7 constitutes a second drying mechanism.
【００１６】次にこのような構成からなる本実施の形態
の作用について説明する。まず電極を有するガラス基材
１５に対して印刷またはコーティングによりリブペース
ト材が塗布され、表面に塗膜（２５０〜３００μｍ）が
形成された基材１５が作製される。次に塗膜が形成され
た基材１５は、予熱部３０のホットプレート３１上に載
置され、直接的に一定時間（１〜５分間）、６０〜１０
０℃程度で加熱される。その後、基材１５はウォーキン
グビーム等の搬送手段により、基材入口１１ａを介して
乾燥炉１１に進入し、搬入ローラ１２により一定速度で
乾燥炉１１の第１乾燥ゾーン１０ａ内を走行する。その
後基材１５は、乾燥炉１１の第２乾燥ゾーン１０ｂ内へ
送られ、その後第２乾燥ゾーン１０ｂ内から基材出口１
１ｂを経て外方へ排出される。Next, the operation of the embodiment having the above-described configuration will be described. First, a rib paste material is applied to the glass substrate 15 having electrodes by printing or coating, and the substrate 15 having a coating film (250 to 300 μm) formed on the surface is produced. Next, the base material 15 on which the coating film is formed is placed on the hot plate 31 of the preheating unit 30 and is directly heated for a predetermined time (1 to 5 minutes) for 60 to 10 minutes.
Heated at about 0 ° C. Thereafter, the base material 15 enters the drying furnace 11 through the base material inlet 11a by a conveying means such as a walking beam, and travels in the first drying zone 10a of the drying furnace 11 at a constant speed by the carry-in roller 12. Thereafter, the base material 15 is sent into the second drying zone 10b of the drying furnace 11, and thereafter, the base material outlet 1 from the second drying zone 10b.
It is discharged outside through 1b.
【００１７】この間、予熱部３０内において基材１５が
加熱されると、基材１５上に設けられた塗膜表面から溶
剤が蒸発し、蒸発した溶剤は排気機構３２から除去され
る。このように溶剤を排気機構３２から排出することに
より、塗膜の乾燥効率を上昇させることができる。その
後、基材１５は第１乾燥ゾーン１０ａ内において赤外線
ヒータ１６からの輻射熱により加熱され、基材１５上に
設けられた塗膜表面から更に溶剤が蒸発して除去され
る。基材１５から除去された溶剤は上昇して、赤外線ヒ
ータ１６の上方へ達する。During this time, when the substrate 15 is heated in the preheating section 30, the solvent evaporates from the surface of the coating film provided on the substrate 15, and the evaporated solvent is removed from the exhaust mechanism 32. By discharging the solvent from the exhaust mechanism 32 as described above, the drying efficiency of the coating film can be increased. Thereafter, the substrate 15 is heated by the radiant heat from the infrared heater 16 in the first drying zone 10a, and the solvent is further evaporated and removed from the surface of the coating film provided on the substrate 15. The solvent removed from the substrate 15 rises and reaches above the infrared heater 16.
【００１８】このとき、赤外線ヒータ１６の上方には、
給気装置１８と排気装置１９とにより赤外線ヒータ１６
と平行な空気流が形成されているので、赤外線ヒータ１
６の上方へ達した蒸発溶剤は赤外線ヒータ１６と平行な
空気流により排気装置１９まで運ばれ、この排気装置１
９から外方へ排出される。At this time, above the infrared heater 16,
An infrared heater 16 is provided by an air supply device 18 and an exhaust device 19.
Since an air flow parallel to the infrared heater 1 is formed, the infrared heater 1
The evaporating solvent reaching the upper part of the exhaust device 6 is carried to the exhaust device 19 by an air flow parallel to the infrared heater 16, and the exhaust device 1
It is discharged from 9 outside.
【００１９】また基材１５下方にも、追加給気装置２０
と追加排気装置２１とにより、基材１５の下方に基材１
５に平行な空気流が形成されている。このため乾燥炉１
１の第１乾燥ゾーン１０ａ内の空気流が安定し、赤外線
ヒータ１６上方の空気流が赤外線ヒータ１６の側方また
は基材１５の側方を通過して基材１５の下方へ流れるこ
とはない。The additional air supply device 20 is also provided below the base material 15.
And the additional exhaust device 21, the base material 1 is provided below the base material 15.
An air flow parallel to 5 is formed. Therefore, drying oven 1
The air flow in the first drying zone 10a is stabilized, and the air flow above the infrared heater 16 does not flow below the base material 15 by passing the side of the infrared heater 16 or the side surface of the base material 15. .
【００２０】上述のように、第１乾燥ゾーン１０ａ内で
は、基材１５表面に空気流が直接当たることはないの
で、基材１５の塗膜表面が荒れたり塗膜表面からの乾燥
によって塗膜表面に皮ばりを生じさせることはなく、第
１乾燥ゾーン１０ａ内において基材１５の塗膜の恒率乾
燥を精度良く行うことができる。また第１乾燥ゾーン１
０ａ内に入る前に、予め基材１５は予熱部３０で予熱さ
れるので、第１乾燥ゾーン１０ａ内における基材１５の
塗膜の恒率乾燥を迅速に行なうことができる。As described above, in the first drying zone 10a, the air flow does not directly hit the surface of the substrate 15, so that the surface of the substrate 15 is roughened or dried by drying from the surface. The surface of the coating film of the base material 15 can be accurately dried in the first drying zone 10a without causing burrs on the surface. Also the first drying zone 1
Before entering into 0a, the base material 15 is preheated by the preheating unit 30 in advance, so that the coating of the base material 15 in the first drying zone 10a can be quickly dried at a constant rate.
【００２１】次に基材１５は、第２乾燥ゾーン１０ｂ内
において熱風吹付装置２６から吹付けられる熱風によ
り、基材１５の塗膜の減率乾燥が行われ、減率乾燥を行
った熱風は、その後排気装置２７から排気される。基材
１５の塗膜は第１乾燥ゾーン１０ａ内で予めある程度乾
燥して固化されているので、第２乾燥ゾーン１０ｂ内に
おいて熱風を基材１５の型膜に吹付けても塗膜表面が荒
れることはなく、熱風吹付装置２６により吹付けられた
熱風により、迅速に基材１５の塗膜の減率乾燥を行うこ
とができる。Next, the base material 15 is subjected to the reduced-rate drying of the coating film on the base material 15 by the hot air blown from the hot-air blowing device 26 in the second drying zone 10b. After that, the air is exhausted from the exhaust device 27. Since the coating film of the base material 15 is previously dried and solidified to some extent in the first drying zone 10a, the surface of the coating film becomes rough even when hot air is blown on the mold film of the base material 15 in the second drying zone 10b. The hot air blown by the hot air blowing device 26 can quickly dry the coating film of the base material 15 at a reduced rate.
【００２２】なお第１乾燥ゾーン１０ａ内における恒率
乾燥は１５０℃〜１８０℃の温度で行われ、一方第２乾
燥ゾーン１０ｂ内における減率乾燥は２２０℃〜２５０
℃にて行われる。The constant rate drying in the first drying zone 10a is performed at a temperature of 150 ° C. to 180 ° C., while the reduced rate drying in the second drying zone 10b is performed at a temperature of 220 ° C. to 250 ° C.
Performed at ° C.
【００２３】以上のように本実施の形態によれば、予め
予熱部３０内で基材１５を加熱した後、基材１５に対し
て第１乾燥ゾーン１０ａ内で塗膜の恒率乾燥を行なうの
で、第１乾燥ゾーン１０ａ内での塗膜の恒率乾燥を迅速
に行なうことができる。また第１乾燥ゾーン１０ａ内に
おいて給気装置１８と排気装置１９とにより赤外線ヒー
タ１６上方に空気流が形成されるので、このように形成
された空気流が直接基材１５表面に当たることはない。
このため基材１５に設けられた塗膜表面が荒れたり、塗
膜表面からの乾燥によって塗膜表面に皮ばりを生じさせ
これによって塗膜の密着性が悪化したりすることはな
い。このように基材１５に設けられた塗膜の性質を劣化
させることを防止することができる。また赤外線ヒータ
１６上方の空気流は、赤外線ヒータ１６と平行に流れる
ので、赤外線ヒータ１６に空気流が当たることもなく、
赤外線ヒータ１６の温度低下を引き起こすことはない。
さらに追加給気装置２０と追加排気装置２１とにより、
基材１５の下方に基材１５と平行な空気流を形成するこ
とができるので、乾燥炉１１内の空気流のバランスを安
定化させることができ、より確実に基材１５へ直接当た
る空気流をなくすことができる。第１乾燥ゾーン１０ａ
内で塗膜に対して恒率乾燥が行われた基材１５は、その
後第２乾燥ゾーン１０ｂ内において、熱風吹付装置２６
から吹付けられる熱風により減率乾燥が行われる。As described above, according to the present embodiment, after preliminarily heating the base material 15 in the preheating unit 30, the coating film is dried on the base material 15 in the first drying zone 10a. Therefore, constant-rate drying of the coating film in the first drying zone 10a can be quickly performed. Further, since the air flow is formed above the infrared heater 16 by the air supply device 18 and the exhaust device 19 in the first drying zone 10a, the air flow thus formed does not directly hit the surface of the base material 15.
For this reason, the surface of the coating film provided on the base material 15 does not become rough, and the coating film surface does not swell due to drying from the coating film surface, thereby deteriorating the adhesion of the coating film. Thus, it is possible to prevent the properties of the coating film provided on the base material 15 from being deteriorated. Further, since the air flow above the infrared heater 16 flows in parallel with the infrared heater 16, the air flow does not hit the infrared heater 16,
The temperature of the infrared heater 16 does not decrease.
Further, by the additional air supply device 20 and the additional exhaust device 21,
Since the air flow parallel to the base material 15 can be formed below the base material 15, the balance of the air flow in the drying furnace 11 can be stabilized, and the air flow that directly hits the base material 15 can be more reliably. Can be eliminated. First drying zone 10a
The base material 15 on which the coating film has been dried at a constant rate is then heated in a second drying zone 10b by a hot air blowing device 26.
Drying is performed by hot air blown from the bottom.
【００２４】なお上記実施の形態において、第２乾燥ゾ
ーン１０ｂ内に熱風吹付装置２６を設置した例を示した
が、これに限らず第２乾燥ゾーン１０ｂ内に第１乾燥ゾ
ーン１０ａ内と同様赤外線ヒータを設置してもよい。In the above embodiment, an example is shown in which the hot air blowing device 26 is installed in the second drying zone 10b. However, the present invention is not limited to this. A heater may be provided.
【００２５】[0025]
【発明の効果】以上のように本発明によれば、基材は予
熱部のホットプレートにより予め直接的に加熱された
後、第１乾燥ゾーンに入るので、第１乾燥ゾーン内にお
ける第１乾燥機構による恒率乾燥を迅速に行なうことが
できる。その後基材は第２乾燥ゾーン内において、すで
に恒率乾燥され固化された塗膜に対して第２乾燥機構に
より迅速に減率乾燥を行うことができる。As described above, according to the present invention, since the base material is directly heated in advance by the hot plate of the preheating unit and then enters the first drying zone, the first drying in the first drying zone is performed. Constant-rate drying by a mechanism can be performed quickly. Thereafter, in the second drying zone, the coating film that has been dried at a constant rate and has been solidified can be rapidly dried at a reduced rate by the second drying mechanism.
【図１】本発明による乾燥装置の一実施の形態を示す
図。FIG. 1 is a diagram showing an embodiment of a drying device according to the present invention.
１０ 赤外線乾燥装置 １０ａ 第１乾燥ゾーン １０ｂ 第２乾燥ゾーン １１ 乾燥炉 １２ 搬送ローラ １５ 基材 １６ 赤外線ヒータ １８ 給気装置 １９ 排気装置 ２０ 追加給気装置 ２１ 追加排気装置 ２６ 熱風吹付装置 ２７ 排気装置 ３０ 予熱部 ３０ａ 囲体 ３１ ホットプレート ３２ 排気機構 DESCRIPTION OF SYMBOLS 10 Infrared drying device 10a 1st drying zone 10b 2nd drying zone 11 Drying furnace 12 Conveying roller 15 Base material 16 Infrared heater 18 Air supply device 19 Exhaust device 20 Additional air supply device 21 Additional exhaust device 26 Hot air blowing device 27 Exhaust device 30 Preheating section 30a Enclosure 31 Hot plate 32 Exhaust mechanism
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｆ２６Ｂ 21/00 Ｆ２６Ｂ 21/00 Ｂ Ｆターム(参考） 3L113 AA02 AA03 AB02 AB05 AB06 AC08 AC10 AC31 AC45 AC46 AC48 AC67 BA34 CB05 CB06 CB21 DA10 DA24 4D075 BB24Y BB37Y DB13 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) F26B 21/00 F26B 21/00 BF Term (Reference) 3L113 AA02 AA03 AB02 AB05 AB06 AC08 AC10 AC31 AC45 AC46 AC48 AC67 BA34 CB05 CB06 CB21 DA10 DA24 4D075 BB24Y BB37Y DB13
Claims (7)
ともに、この内部が走行する基材の上流側から順に第１
乾燥ゾーンと、第２乾燥ゾーンとに仕切られた乾燥炉
と、 乾燥炉の入口側に設けられ、基材を載置して加熱するホ
ットプレートを有する予熱部と、 第１乾燥ゾーン内に設けられた第１乾燥機構と、 第２乾燥ゾーン内に設けられた第２乾燥機構とを備えた
ことを特徴とする乾燥装置。1. A substrate on which a coating film is formed travels inside, and a first substrate is sequentially arranged from an upstream side of the substrate on which the interior travels.
A drying oven partitioned into a drying zone and a second drying zone; a preheating unit provided on the entrance side of the drying oven, having a hot plate on which the base material is placed and heated; and a preheating unit provided in the first drying zone. A drying device provided with a first drying mechanism provided therein and a second drying mechanism provided in a second drying zone.
有し、囲体の上部に排気機構を設けたことを特徴とする
請求項１記載の乾燥装置。2. The drying apparatus according to claim 1, wherein the preheating section has an enclosure for accommodating the hot plate, and an exhaust mechanism is provided above the enclosure.
上方に基材に略平行に配置された赤外線ヒータと、 第１乾燥ゾーン内の赤外線ヒータ上方に配置された、空
気を給気する給気装置および空気を排気する排気装置と
を有し、 給気装置と排気装置とによって赤外線ヒータ上方に赤外
線ヒータと平行な空気流を形成することを特徴とする請
求項１記載の乾燥装置。3. A first drying mechanism comprising: an infrared heater disposed above the substrate in the first drying zone substantially parallel to the substrate; and an air heater disposed above the infrared heater in the first drying zone. The air supply device according to claim 1, further comprising an air supply device for supplying air and an exhaust device for exhausting air, wherein the air supply device and the exhaust device form an air flow parallel to the infrared heater above the infrared heater. Drying equipment.
下流側のうち一方に配置し、排気装置を他方に配置した
ことを特徴とする請求項３記載の乾燥装置。4. The drying device according to claim 3, wherein the air supply device is arranged on one of the upstream side and the downstream side in the traveling direction of the base material, and the exhaust device is arranged on the other side.
排気装置を基材の走行方向上流側に設けたことを特徴と
する請求項４記載の赤外線乾燥装置。5. An air supply device is provided on the downstream side in the traveling direction of the substrate,
The infrared drying device according to claim 4, wherein the exhaust device is provided on the upstream side in the traveling direction of the substrate.
装置と追加排気装置を設け、これら追加給気装置と追加
排気装置とによって基材下方に基材と平行な空気流を形
成することを特徴とする請求項３記載の乾燥装置。6. An additional air supply device and an additional exhaust device are provided below the substrate in the first drying zone, and an air flow parallel to the substrate is provided below the substrate by the additional air supply device and the additional exhaust device. The drying device according to claim 3, wherein the drying device is formed.
ける熱風吹付装置からなることを特徴とする請求項３記
載の乾燥装置。7. The drying device according to claim 3, wherein the second drying mechanism comprises a hot air blowing device for blowing hot air to the substrate.
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| JP2000356470A JP4350298B2 (en) | 2000-11-22 | 2000-11-22 | Drying equipment |
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|---|---|---|---|
| JP2000356470A JP4350298B2 (en) | 2000-11-22 | 2000-11-22 | Drying equipment |
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| JP4350298B2 JP4350298B2 (en) | 2009-10-21 |
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| JP2000356470A Expired - Fee Related JP4350298B2 (en) | 2000-11-22 | 2000-11-22 | Drying equipment |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002162163A (en) * | 2000-11-24 | 2002-06-07 | Nec Kagoshima Ltd | Solvent drying system |
| CN103168209A (en) * | 2011-02-24 | 2013-06-19 | 大日本网屏制造株式会社 | Drying machine and thermal processing system |
| CN105605899A (en) * | 2016-03-10 | 2016-05-25 | 武汉华星光电技术有限公司 | Drying device and drying method |
| CN105026863B (en) * | 2013-02-26 | 2016-12-28 | 日本碍子株式会社 | Drying device |
| CN112815684A (en) * | 2021-02-02 | 2021-05-18 | 江西春兴新能源有限公司 | Continuous microwave drying process method for solidified polar plate of storage battery |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002162163A (en) * | 2000-11-24 | 2002-06-07 | Nec Kagoshima Ltd | Solvent drying system |
| CN103168209A (en) * | 2011-02-24 | 2013-06-19 | 大日本网屏制造株式会社 | Drying machine and thermal processing system |
| CN105026863B (en) * | 2013-02-26 | 2016-12-28 | 日本碍子株式会社 | Drying device |
| CN105605899A (en) * | 2016-03-10 | 2016-05-25 | 武汉华星光电技术有限公司 | Drying device and drying method |
| RU2761154C1 (en) * | 2020-08-28 | 2021-12-06 | Сергей Владимирович Воронцов | Roller-based modular veneer dryer |
| CN112815684A (en) * | 2021-02-02 | 2021-05-18 | 江西春兴新能源有限公司 | Continuous microwave drying process method for solidified polar plate of storage battery |
| CN112815684B (en) * | 2021-02-02 | 2022-12-09 | 江西春兴新能源有限公司 | Continuous microwave drying process method for solidified polar plate of storage battery |
| CN113028801A (en) * | 2021-03-22 | 2021-06-25 | 珠海格力绿色再生资源有限公司 | Apparatus and method for removing lubricating oil on heat exchanger |
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