JPS59177101A - Apparatus for supplying sublimable substance - Google Patents

Apparatus for supplying sublimable substance

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Publication number
JPS59177101A
JPS59177101A JP4865683A JP4865683A JPS59177101A JP S59177101 A JPS59177101 A JP S59177101A JP 4865683 A JP4865683 A JP 4865683A JP 4865683 A JP4865683 A JP 4865683A JP S59177101 A JPS59177101 A JP S59177101A
Authority
JP
Japan
Prior art keywords
sublimable substance
heating
sublimable
pressure
flow rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4865683A
Other languages
Japanese (ja)
Other versions
JPH0557004B2 (en
Inventor
Masaru Kondo
勝 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP4865683A priority Critical patent/JPS59177101A/en
Publication of JPS59177101A publication Critical patent/JPS59177101A/en
Publication of JPH0557004B2 publication Critical patent/JPH0557004B2/ja
Granted legal-status Critical Current

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  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

PURPOSE:The titled apparatus capable of rapidly changing the generating amount of a sublimable subsance corresponding to the variation of demand, constituted so as to control the flow control valves arranged to the outlets of a plurality of sublimable substance receiving containers in parallel to each other by detecting the pressure of the supply side of the sublimable substance. CONSTITUTION:In an apparatus wherein sublimable substance receiving containers 3a, 3b are heated in heating tanks 2a, 2b through a heating apparatus consisting of heat exchangers 1a-1, 1b-a and air recirculating fans 1a-2, 1b-2 by a heating medium flowing in a constant amount at a constant temp. and a predetermined sublimable substance is generated to be supplied to a treating process, the flow control valves 12a, 12b arranged to the above mentioned receiving containers 3a, 3b are controlled so as to make the pressure detected by the pressure gauge 8-1 provided on the buffer tank 9-1 connected to a header 10 constant to allow the generating amount of the sublimable substance in the side of the receiving containers 3a, 3b to rapidly change corresponding to the variation of demand on the side of the treating process 11.

Description

【発明の詳細な説明】 本発明は昇華性物質の供給装置の改良に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a sublimable substance supply device.

従来の昇華性物質の供給装置を第1図により説明すると
、(la−1)(lb−i )が加熱用熱交換器、(l
a−z)(lb−2)が空気循環用ファン、(2a)(
2b)が加熱槽、(3a)(3b)が昇華性物質収納容
器、(4aX4b)が熱媒流量調節弁、(5a)(5b
)が圧力計、(6a)(6b)が温度計、(力が昇華性
物質流量調節弁、(8)が圧力計、(9)がバッファタ
ンク、(10)がヘッダ、(11)が処理プロセスで、
昇華性物質を収納した収納容器(3aX3b)を加熱槽
(2a)(2b)内に入れ、加熱用熱交換器(la−1
)(lb−1)及び空気循環用ファン(la−2)(l
b−2)により収納容器(3a)(3b)を加熱して、
その中の昇華性物質をガス化し、これをヘッダ(10)
→昇華性物質流量調節弁(カーバッファ(9)を経て処
理プロセス(11)へ供給するようになっている。また
このとき、ヘッダ(10)内の圧力と設定圧力との圧力
差を圧力計(5a)(5b)により測定し、この圧力差
により設定される設定温度と加熱槽(2a)(2b)内
の温度との温度差を温度計(6a)(6b)により測定
し、この結果に基き熱媒流量調節弁(4a)(4b)を
制御し、加熱槽(2aX2b)内の温度を設定温度にし
て、ヘッダ(10)内を流れる昇華性物質の圧力を一定
に保持するように、またバッファタンク(9)内の圧力
を圧力計(8)により測定し、その結果に基き昇華性物
質流量調節弁(力を制御して、バッファタンク(9)内
の圧力を設定圧力に保持するようになっている。
To explain a conventional sublimable substance supply device with reference to FIG. 1, (la-1) (lb-i) is a heating heat exchanger, (l
a-z) (lb-2) is the air circulation fan, (2a) (
2b) is a heating tank, (3a) (3b) is a sublimable substance storage container, (4aX4b) is a heat medium flow control valve, (5a) (5b)
) is the pressure gauge, (6a) and (6b) are the thermometers, (force is the sublimable substance flow rate control valve, (8) is the pressure gauge, (9) is the buffer tank, (10) is the header, and (11) is the processing In the process
The storage container (3aX3b) containing the sublimable substance is placed in the heating tank (2a) (2b), and the heating heat exchanger (la-1
) (lb-1) and air circulation fan (la-2) (l
b-2) by heating the storage containers (3a) and (3b),
The sublimable substance in it is gasified and this is used as a header (10).
→The sublimable substance is supplied to the treatment process (11) via a flow control valve (car buffer (9)).At this time, the pressure difference between the pressure in the header (10) and the set pressure is measured by a pressure meter. (5a) (5b), and the temperature difference between the set temperature set by this pressure difference and the temperature in the heating tank (2a) (2b) is measured with thermometers (6a) (6b), and the result is The heat medium flow control valves (4a) and (4b) are controlled based on the temperature in the heating tank (2aX2b) to the set temperature, and the pressure of the sublimable substance flowing in the header (10) is maintained constant. In addition, the pressure inside the buffer tank (9) is measured with a pressure gauge (8), and based on the result, the pressure inside the buffer tank (9) is maintained at the set pressure by controlling the force of the sublimable substance flow rate control valve. It is supposed to be done.

前記昇華性物質の供給装置では、加熱槽(2a、)(2
b)から発生する昇華性物質の発生量を熱媒の供給量(
熱媒流量調節弁(4a−X4b)の制御)により変化さ
せているため、処理プロセスでの需要量が変化しでも、
それに迅速に対応できなくて、加熱槽(2a)(2b)
での発生量を処理プロセス(11)の需要量に対応させ
るのに時間遅れを生じる。また加熱槽(2a)(2b)
内の温度に上限値が設定されている場合、収納容器(3
a)内の昇華性物質の量が減少すると、一定の発生量を
確保できフ工<なり、昇華性物質の量が充分にある加熱
槽(2b)側の収納容器(3b)で加熱によるガス化、
供給を行なうことになるが、その時点で処理プロセス(
11)の需要量が急激に減少して、加熱槽(2a)側の
収納容器(3a)だけでも充分に対応できるようになっ
た場合、2つの加熱槽(2a)(2b)が別々に制御さ
れているため、加熱槽(2b)側の収納容器(3b)で
も加熱によるガス化、供給を続けるという問題があった
In the sublimable substance supply device, the heating tank (2a,) (2
The amount of sublimable substances generated from b) is expressed as the amount of heat medium supplied (
Since the heat medium flow rate is controlled by the heat medium flow control valve (4a-X4b), even if the demand in the treatment process changes,
Unable to respond quickly, heating tanks (2a) (2b)
A time delay occurs in making the amount generated in correspond to the amount demanded by the treatment process (11). Also heating tanks (2a) (2b)
If an upper limit is set for the temperature inside the storage container (3
When the amount of sublimable substances in a) decreases, a constant amount of generation can be ensured, and the gas generated by heating is stored in the storage container (3b) on the side of the heating tank (2b) where there is a sufficient amount of sublimable substances. transformation,
At that point, the processing process (
If the demand for 11) suddenly decreases and the storage container (3a) on the heating tank (2a) side is sufficient to handle the demand, the two heating tanks (2a) and (2b) can be controlled separately. Therefore, there was a problem in that gasification and supply by heating continued even in the storage container (3b) on the side of the heating tank (2b).

本発明は前記の問題点に対処するもので、並設した複数
の昇華性物質収納容器から所定の昇華性物質を供給する
昇華性物質の供給装置において、前記各昇華性物質収納
容器のそれぞれを一定流量、一定温度の熱媒により加熱
する加熱装置と、同各昇華性物質収納容器の出口に配設
した流量調節弁と、同流量調節弁を制御する供給側の圧
力検出装置とを具えていることな特徴としだ昇華性物質
の供給装置に係り、その目的とする処は、収納容器側で
の昇華性物質の発生量な処理プロセス側の需要量の変動
に応じて迅速に変化させることができる改良された昇華
性物質の供給装置を供する点にある。
The present invention addresses the above-mentioned problems, and includes a sublimable substance supply device that supplies a predetermined sublimable substance from a plurality of sublimable substance storage containers arranged in parallel. It is equipped with a heating device that heats with a heat medium at a constant flow rate and a constant temperature, a flow rate control valve disposed at the outlet of each sublimable substance storage container, and a pressure detection device on the supply side that controls the flow rate control valve. The unique feature of the sublimable substance supply device is to quickly change the amount of sublimable substance generated in the storage container in response to fluctuations in the amount demanded by the treatment process. An object of the present invention is to provide an improved sublimable substance supplying device that is capable of providing a sublimable substance.

次に本発明の昇華性物質の供給装置を第2図に示す一実
施例により説明すると、(la 1)(la−2)(1
b−1) (1b−2) (2a)(2b)(3a)(
3b)(7) (11)が前記と同一の部分で、加熱用
熱交換器(Ia−t)(lb−t)には熱媒用流量調節
弁(第1図の(4aX4b) )がなく、同熱交換器(
Ia−1)(Ib−1)は、加熱槽(2a)(2b)内
の昇華性物質収納容器(3a)(3b)を一定温度、一
定流量の熱媒で加熱することになる。また(12a)(
]、2b)が昇華性物質収納容器(3a)(3b)の出
口側に設けた昇華性物質流量調節弁、(8−1)が同流
量調節弁(12a)(12b)を制御する供給側の圧力
計である。
Next, the sublimable substance supplying apparatus of the present invention will be explained using an embodiment shown in FIG. 2. (la 1) (la-2) (1
b-1) (1b-2) (2a) (2b) (3a) (
3b) (7) (11) are the same parts as above, and the heating heat exchanger (Ia-t) (lb-t) does not have a heat medium flow control valve ((4aX4b) in Figure 1). , isothermal heat exchanger (
Ia-1) (Ib-1) heats the sublimable substance storage containers (3a) (3b) in the heating tanks (2a) (2b) with a constant temperature and a constant flow rate of the heating medium. Also (12a) (
], 2b) is a sublimable substance flow rate control valve provided on the outlet side of the sublimable substance storage container (3a) (3b), and (8-1) is a supply side that controls the same flow rate control valve (12a) (12b). This is a pressure gauge.

なお(9−1)(9〜2)はバッファタンク、(8−2
)は同バッファタンク(9−2)側の圧力汀1、(13
a)(13b)+よM置針である。
(9-1) (9-2) are buffer tanks, (8-2
) are pressure levels 1 and (13) on the same buffer tank (9-2) side.
a) (13b) + yo M position needle.

次に前記昇華性物質の供給装置の作用を説明する。熱交
換器(la−1)(lb−1,)と空気循環用ファン(
la−2)(xb−2)とを具えた加熱h! (2a)
+zb)は収納容器(3a)(3b)内の昇華性物質を
加熱して、ガス化する。第6図に定常発生時の状態(A
)及び非定常発生時の状態の)を示した。なお第6図中
のTIは加熱槽内温度、T2は昇華性物質の昇華温度、
Pは昇華温度T2のときの昇華性!物質の圧力、Gは発
生量、Wは昇華性物質の7A量(添え字a、bは加熱槽
(2aX2b)に対応している)、Goは処理システム
への流量、Voは処理プロセスの条件により決まる圧力
計(8−1)の設定圧力、Δtは定常発生期間である。
Next, the operation of the sublimable substance supply device will be explained. Heat exchanger (LA-1) (LB-1,) and air circulation fan (
la-2) (xb-2) and heating h! (2a)
+zb) heats the sublimable substance in the storage containers (3a) and (3b) to gasify it. Figure 6 shows the state during steady occurrence (A
) and the state at the time of unsteady occurrence. In addition, TI in Fig. 6 is the temperature inside the heating tank, T2 is the sublimation temperature of the sublimable substance,
P is sublimation property at sublimation temperature T2! The pressure of the substance, G is the amount generated, W is the 7A amount of the sublimable substance (subscripts a and b correspond to the heating tank (2aX2b)), Go is the flow rate to the treatment system, and Vo is the conditions of the treatment process. The set pressure of the pressure gauge (8-1) determined by Δt is the steady generation period.

(I)  まず定常発生時の状態(A)について説明す
る。昇華性物質が収納容器(3a)に充分に残っていて
、加熱槽(2a)のみで一定流量G(→a)の定常発生
可能なときには、加熱槽(2a)の諸量の変化は第6図
の(A)のようになる。昇華性物質の残留Waは発生と
ともに減ってゆき、昇華性物質と収納容器(3a)との
接触面積(伝熱面積)が小さくなる。そのため加熱槽内
温度T1と昇華性物質の昇華温度T2との温度差が大き
くなって、昇華温度T2が下がる。またそれに伴いPa
も低下する。
(I) First, the state (A) at the time of steady occurrence will be explained. When a sufficient amount of the sublimable substance remains in the storage container (3a) and a constant flow rate G (→a) can be generated steadily using only the heating tank (2a), the changes in various quantities in the heating tank (2a) will be as follows. It will look like (A) in the figure. The residual Wa of the sublimable substance decreases as it is generated, and the contact area (heat transfer area) between the sublimable substance and the storage container (3a) becomes smaller. Therefore, the temperature difference between the heating tank internal temperature T1 and the sublimation temperature T2 of the sublimable substance increases, and the sublimation temperature T2 decreases. Also, along with this, Pa
also decreases.

このとき、流量調節弁(12a)は、バッファタンク(
9−1)内の圧力を設定圧力POに保持するために。
At this time, the flow rate control valve (12a) is connected to the buffer tank (
9-1) to maintain the pressure inside at the set pressure PO.

圧力計(8=1)により制御される。このとき、Paは
下がっているので、流量調節弁(12a)の開度は徐々
に大きくなり、定常発生の状態(A)から非定常発生の
状態(B)に移るときに全開になる。次に非定常発生の
状態(B)Kついて説明する。PaがPoと一致すると
、それ以後はPa、T2aが一定となり、第6図の但)
のようにGaが低下する。そこで不足分の(G−Ga)
だけ加熱槽(2b)から補給しなければならない。この
とき、流量調節弁(12a)は全開になっており、流量
調節弁(12b)は(G−Ga)を補給して、バッファ
タンク(,9−1)内の圧力を一定に保持するように圧
力計(8−1)により制御される(第6図のGb参照)
。次に流量調節弁(12a)(12b)の選択方式につ
いて説明する。同各流量調節弁の選択は、重量計(13
a)(13b)により加熱槽(2a)(2b)の重量を
測定し、昇華性物質の保有量の多い収納容器、それが(
3b)であれば、その出口側にある流量調節弁(12b
)を制御する。一方、非定常発生中に、処理プロセス(
11)での需要量が減少したときには、圧力計(8−1
’)の信号により重量の大きい方の加熱槽(2b)の出
口側の流量調節弁(12b)を閉じていって、加熱槽(
2b)からの供給量を減少させる。またこの流量調節弁
(12b)が全開になったときに、それでも供給量が多
いときには、流量調節弁(12a)を全開から徐々に閉
じていって、処理プロセス(11)での需要量に対応さ
せる。このとき、収納容器(3)内の圧力が高くなり、
それにつれてT2も高くなるので、収納容器(3)内で
の昇華性物質の発生量が小さくなる。なお収納容器(3
a)内が空になると、他の収納容器(3b)が非定常発
生の状態になるまでに、昇華性物質の充分に入っている
新たな収納容器(3a)を加熱槽(2a)内へ挿入して
、その後の供給を続行する。またバッファタンク(9−
2)内の圧力は、圧力計(8−2>とそれにより制御さ
れる流量調整弁(力とにより一定に保持される。
Controlled by a pressure gauge (8=1). At this time, since Pa is decreasing, the opening degree of the flow rate control valve (12a) gradually increases and becomes fully open when moving from the steady state (A) to the unsteady state (B). Next, the state (B)K of unsteady occurrence will be explained. When Pa matches Po, Pa and T2a become constant from then on, and as shown in Fig. 6)
Ga decreases as follows. Therefore, the shortfall (G-Ga)
must be replenished from the heating tank (2b). At this time, the flow rate control valve (12a) is fully open, and the flow rate control valve (12b) replenishes (G-Ga) to keep the pressure in the buffer tank (,9-1) constant. is controlled by the pressure gauge (8-1) (see Gb in Figure 6).
. Next, the selection method of the flow rate control valves (12a) (12b) will be explained. The selection of each flow control valve is made using a weighing scale (13
a) Measure the weight of the heating tanks (2a) and (2b) according to (13b), and determine whether the storage container that holds a large amount of sublimable substance is (
3b), the flow control valve (12b) on the outlet side
). On the other hand, during unsteady occurrence, the processing process (
When the demand at 11) decreases, the pressure gauge (8-1)
'), the flow control valve (12b) on the outlet side of the heavier heating tank (2b) is closed, and the heating tank (2b) is closed.
2b) Decrease the amount of supply from. Furthermore, when the flow rate control valve (12b) is fully open, if the supply amount is still large, the flow rate control valve (12a) is gradually closed from the fully open position to meet the demand in the treatment process (11). let At this time, the pressure inside the storage container (3) increases,
Since T2 also increases accordingly, the amount of sublimable substances generated within the storage container (3) decreases. In addition, the storage container (3
a) When the container is empty, place a new storage container (3a) containing enough sublimable substance into the heating tank (2a) before the other storage container (3b) reaches a state of unsteady generation. Insert and then continue feeding. Also, the buffer tank (9-
2) The pressure inside is kept constant by the pressure gauge (8-2>) and the flow rate regulating valve (force) controlled by it.

が、バッファタンク(9−1)内の圧力が安定している
場合には、上記の機器(力(8−2) (9−2)を省
略しても差支えない。またヘッダ(10)内の流量、圧
力が安定している場合には、バッファタンク(9−1)
を省略して、ヘッダ(10)内の圧力を圧力計(8−1
)により検出するようにしてもよい。
However, if the pressure inside the buffer tank (9-1) is stable, the above equipment (power (8-2) (9-2) can be omitted. If the flow rate and pressure of the buffer tank (9-1) are stable,
is omitted, and the pressure inside the header (10) is measured using a pressure gauge (8-1).
) may be used for detection.

本発明の昇華性物質の供給装置は前記のように構成され
ており、各加熱装置(加熱槽(2a)(2b)及び加熱
用熱交換器(la−1)(lb−1))の加熱用熱媒を
コントロールせずに常に一定流量、一定温度にする一方
、各加熱装置の出口側の流量調節弁(12a)(12b
)を供給側の圧力検出装置(圧力計(8−1))により
制御して、ガス化した昇華性物質を処理プロセス(11
)へ供給するので、収納容器(3a)(3b)側での昇
華性物質の発生量を処理プロセス側の需要量の変動に応
じて迅速に変化させることができる効果がある。
The sublimable substance supply device of the present invention is configured as described above, and each heating device (heating tank (2a) (2b) and heating heat exchanger (la-1) (lb-1)) is heated. The flow rate control valve (12a) (12b) on the outlet side of each heating device is used to maintain a constant flow rate and constant temperature of the heating medium without controlling it.
) is controlled by a pressure detection device (pressure gauge (8-1)) on the supply side, and the gasified sublimable substance is transferred to the treatment process (11).
), it is possible to quickly change the amount of the sublimable substance generated in the storage containers (3a) and (3b) in accordance with changes in demand on the treatment process side.

以上本発明を実施例について説明したが、勿論本発明は
このような実施例にだけ局限されるものではなく、本発
明の精神を逸脱しない範囲内で種々の設計の改変を施し
うるものである。
Although the present invention has been described above with reference to embodiments, it goes without saying that the present invention is not limited to such embodiments, and that various design modifications can be made without departing from the spirit of the present invention. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の昇華性物質の供給装置を示す系統図、第
2図は本発明に係る昇華性物質の供給装置の一実施例を
示す系統図、第6図はその作用説明図である。 (Ia−1)(2a、)及び(Ib−1)(2b)・−
・加熱装置、(3a、)(3b)・・・昇華性物質収納
容器、(8−1)・・・圧力検出装置、 (1,2a)(12b)−・・流量調節弁。 復代理人 弁理士開本重文 外2名
Fig. 1 is a system diagram showing a conventional sublimable substance supply device, Fig. 2 is a system diagram showing an embodiment of the sublimation substance supply device according to the present invention, and Fig. 6 is an explanatory diagram of its operation. . (Ia-1) (2a, ) and (Ib-1) (2b)・-
- Heating device, (3a,) (3b)...Sublimable substance storage container, (8-1)...Pressure detection device, (1,2a) (12b)...Flow control valve. Sub-agents: 2 patent attorneys and non-Kaimoto important literary figures

Claims (1)

【特許請求の範囲】[Claims] 並設した複数の昇華性物質収納容器から所定の昇華性物
質を供給する昇華性物質の供給装置において、前記各昇
華性物質収納容器のそれぞれを一定流量、一定温度の熱
媒により加熱する加熱装置と、同各昇華性物質収納容器
の出口に配設した流量調節弁と、同流量調節弁を制御す
る供給側の圧力検出装置とを具えていることを特徴とし
た昇華性物質の供給装置。
In a sublimable substance supply device that supplies a predetermined sublimable substance from a plurality of sublimable substance storage containers arranged in parallel, a heating device that heats each of the sublimable substance storage containers with a heating medium at a constant flow rate and a constant temperature. A sublimable substance supply device comprising: a flow rate control valve disposed at the outlet of each sublimable substance storage container; and a pressure detection device on the supply side that controls the flow rate control valve.
JP4865683A 1983-03-25 1983-03-25 Apparatus for supplying sublimable substance Granted JPS59177101A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4865683A JPS59177101A (en) 1983-03-25 1983-03-25 Apparatus for supplying sublimable substance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4865683A JPS59177101A (en) 1983-03-25 1983-03-25 Apparatus for supplying sublimable substance

Publications (2)

Publication Number Publication Date
JPS59177101A true JPS59177101A (en) 1984-10-06
JPH0557004B2 JPH0557004B2 (en) 1993-08-23

Family

ID=12809388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4865683A Granted JPS59177101A (en) 1983-03-25 1983-03-25 Apparatus for supplying sublimable substance

Country Status (1)

Country Link
JP (1) JPS59177101A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5653843U (en) * 1979-09-29 1981-05-12
JPS5743045A (en) * 1980-06-28 1982-03-10 Fichtel & Sachs Ag Chain replacing type outer mounted speed changing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5653843U (en) * 1979-09-29 1981-05-12
JPS5743045A (en) * 1980-06-28 1982-03-10 Fichtel & Sachs Ag Chain replacing type outer mounted speed changing device

Also Published As

Publication number Publication date
JPH0557004B2 (en) 1993-08-23

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