JPS5916991A - Electrotyping apparatus and preparation of shell therefor - Google Patents

Electrotyping apparatus and preparation of shell therefor

Info

Publication number
JPS5916991A
JPS5916991A JP12510482A JP12510482A JPS5916991A JP S5916991 A JPS5916991 A JP S5916991A JP 12510482 A JP12510482 A JP 12510482A JP 12510482 A JP12510482 A JP 12510482A JP S5916991 A JPS5916991 A JP S5916991A
Authority
JP
Japan
Prior art keywords
electroforming
current
electro
electroformed
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12510482A
Other languages
Japanese (ja)
Other versions
JPS6315996B2 (en
Inventor
Shinichi Omura
大村 進一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JAPAX KASEI KK
Original Assignee
JAPAX KASEI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JAPAX KASEI KK filed Critical JAPAX KASEI KK
Priority to JP12510482A priority Critical patent/JPS5916991A/en
Publication of JPS5916991A publication Critical patent/JPS5916991A/en
Publication of JPS6315996B2 publication Critical patent/JPS6315996B2/ja
Granted legal-status Critical Current

Links

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  • Manufacturing Optical Record Carriers (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To prepare an electrotyping shell reduced in the precipitation of dendrite in good efficiency within a short time, by a method wherein an electro-forming matrix mold is rotated and vibrated in an electro-forming liquid containing a particle having mechanical grinding capacity while repeatedly reciprocated with respect to the current passing orifices of a partition wall and an electro-forming current is flowed. CONSTITUTION:An electro-forming tank 2 is divided into an electro-forming chamber and an electrode chamber by a partition wall 3 having current passing orifices 3a at a desired height in the axial direction thereof. An electro-forming matrix mold 8 is inserted and immersed into the electro-forming chamber while a current passing electrode 4 and an electro-forming metal 5 are inserted into the electrode chamber. A known electro-forming liquid 6 is introduced into said tank 2 and plural semiconductive or non-conductive particles 7 each of which has mechanical grinding capacity are mixed in said liquid 6. In this state, the surface of the matrix mold 8 is subjected to zone plating or scanning by high density current beams flowed out of the orifices 3a generated by the up-and-down motion of said matrix mold 8 passing said orifices 3a. At the same time, the matrix mold 8 is rotated or vibrated and the electro-forming surface is subjected to liquid honing or barrel polishing by particles 7.

Description

【発明の詳細な説明】 本発明は高能率且つ新規な電Lj!殻の製造方法及びそ
の方法の実施に際し使用される電鋳装置に関し、更に具
体的には、例えば+nの5mm厚程度の電鋳殻を数時間
乃至数十時間以内、長くても約24時間以内で鋳造し得
る高速度電鋳装置及び電鋳方法に関するものである。
[Detailed Description of the Invention] The present invention provides a highly efficient and novel electric Lj! Regarding the shell manufacturing method and the electroforming equipment used in carrying out the method, more specifically, for example, an electroforming shell of about 5 mm thickness of +N can be produced within several hours to several tens of hours, and within about 24 hours at most. The present invention relates to a high-speed electroforming device and an electroforming method that can perform casting.

従来公知の電鋳装置で厚さ 0.5〜5mm程度の電鋳
殻を製造しようとすると、電鋳面に電鋳金属の樹枝状晶
又は側状晶等が成長したり、甚だしく先鋭な凹凸が生じ
たりするという問題があった。
When attempting to manufacture an electroformed shell with a thickness of about 0.5 to 5 mm using conventionally known electroforming equipment, dendrites or lateral crystals of the electroformed metal may grow on the electroformed surface, or extremely sharp irregularities may occur. There was a problem that this may occur.

これらの障害を可能な限り防止するためには、電流密度
を非常に低いレベルに限定する必要があり、そのため−
日当りの71t&?厚は0.5〜l mm程度に限定さ
れ、数mm程度のMi鋳を行うためには通算して数日以
上の通電が必要とされていた。
In order to prevent these disturbances as much as possible, the current density must be limited to very low levels, so that −
71t/day? The thickness is limited to about 0.5 to 1 mm, and in order to perform Mi casting of about several mm, it is necessary to apply electricity for several days or more in total.

然も、その様に低電流密度で電鋳してもこれらの障害は
完全に防止されず、従って電鋳作業を屡中断し、電鋳品
を電鋳液(rri鋳槽)外に取り出してそのまま、また
は、電鋳装置がら?l!鋳母型ごと取り外して切削装置
等の所へ移送して取り付け、これらの引状晶や凹凸を切
削又は研削により除去して平滑化し、次いで切削装置等
から取り外して、洗浄、脱脂、表面活性化処理、水洗等
を施した後、電鋳液中或いは電鋳装置に戻して電鋳を再
開すると言う工程を繰り返す必要があった。
However, even if electroforming is performed at such a low current density, these failures cannot be completely prevented, and therefore, the electroforming operation is often stopped and the electroformed product is taken out of the electroforming solution (RRI casting bath). As is or with the electroforming equipment? l! The entire cast mold is removed, transferred to a cutting device, etc., and installed, and these crystals and irregularities are removed and smoothed by cutting or grinding, and then removed from the cutting device, etc., and cleaned, degreased, and surface activated. After processing, washing with water, etc., it was necessary to repeat the process of returning to the electroforming solution or to the electroforming device and restarting electroforming.

このような作業は単に煩雑であるばかりでなく、その予
測が困離であるため熟練者による周期的監視と不時の作
業をa・要とするが、それらにも限度があるので、結局
、長いアイドルタイムの発生が不可避となり不経済であ
る上、深夜の無人連続電鋳等も不可能であった。
This type of work is not only complicated, but also difficult to predict, so periodic monitoring and unscheduled work by skilled personnel is essential, but there are limits to this, so in the end, In addition to unavoidable long idle time, which is uneconomical, continuous unmanned electroforming late at night is also impossible.

又、従来の方法では、電鋳金属及び電力にも無駄が多い
上、薬品費等によるコストアップも深刻な問題であった
が、廃液処理も亦大きな問題であるが、前述切削又は研
削等の機械加工の工程に伴って発生ずる薬品等の廃液の
増加は、より以上深刻な問題となっていた。
In addition, with conventional methods, there is a lot of waste in electroformed metal and electricity, and there is also a serious problem of increased costs due to chemical costs, etc. Waste liquid treatment is also a big problem, but the cutting or grinding methods mentioned above are The increase in waste liquids such as chemicals generated during the machining process has become an even more serious problem.

しかし、上記機械加工面の脱脂、再活性化処理、水洗等
の処理が不完全であると、電鋳殻内に欠陥層を生じ、剥
離が生ずると言う問題もあった。
However, if the above-mentioned treatments such as degreasing, reactivation treatment, washing with water, etc. of the machined surface are incomplete, a defective layer is generated in the electroformed shell, which causes peeling.

然しなから、従来の電鋳装置に於て電流密度を上げ電鋳
の高速化を計ると、析出電鋳金属中の先鋭な凹凸や樹枝
状晶の析出が爪間的に増大し、上記機械加工をより頻繁
に繰返して行わなければならなくなり、結局、製作に余
分な日時と人手、資材と電力を要する様になる丈でなく
、製品の品位も111なわれるものであった。
However, when increasing the current density and increasing the speed of electroforming in conventional electroforming equipment, sharp irregularities and dendrite precipitation in the deposited electroformed metal increase in size, and the above-mentioned machines The process had to be repeated more frequently, and in the end, the length required more time, manpower, materials, and electricity to manufacture, and the quality of the product was also lowered.

本発明は斜上の観点に立っζなされたものであって、そ
の目的とするところは、高電流密度で高速電鋳を行っ°
ζも、樹枝状晶の析出や凹凸の発生が極めて少な(、従
って、短時間で効率よく電鋳殻を製造し得る新規な方法
及び装置を提v目−ることにある。
The present invention has been developed from the perspective of upward slope, and its purpose is to perform high-speed electroforming at high current density.
ζ Also, the precipitation of dendrites and the occurrence of unevenness are extremely small (therefore, the object is to propose a new method and apparatus that can efficiently produce electroformed shells in a short time).

而し゛C1本発明の要旨とするところは、電鋳槽内で電
鋳面に液体ホーニング若しくはバレル研摩に類似した加
工を施しっ一1且フゾーンプレーテイング法ともいうべ
き手法で局部的に高電流密度で繰返し通電することによ
り、電鋳品に於ける樹枝状晶の析出や凹凸の発生を抑制
しっ\、高速度で電鋳を行うことにある。
C1 The gist of the present invention is to apply a process similar to liquid honing or barrel polishing to the electroformed surface in an electroforming bath, and to locally increase the height of the surface by a method called fuzone plating. By repeatedly applying electricity at a current density, the precipitation of dendrites and the occurrence of unevenness in electroformed products can be suppressed, and electroforming can be performed at high speed.

以下、図面により本発明の!lY:相を具体的に説明す
る。
Hereinafter, the details of the present invention will be explained with reference to the drawings. lY: Phase will be specifically explained.

図面は本発明に係る電鋳装置の一実施例を示ず断面図で
あり、■は装置を支承している機台、2は電鋳槽、3は
略中央部に全周にわたっ゛C通電孔3a、3aを設けた
円筒状の非導電性隔壁、4は通1′cim極、5は隔壁
3と通電電極40間に充填される塊状の電鋳金属、6は
公知の電&I液、7.7は、研削能のある粒子で、例え
ば酸化アルミナ等のデツプ又は粒子、8は通常所定軸方
向に先細テーバ状で、打ましくは電鋳殻が剥離可能なよ
うに、予め鏡面に仕上げられ、かつ必要に応じ薄い酸化
被膜を有する公知の?’li#母型、9は電鋳母型8の
上に析出しつ\ある電&Ia、10は補助陰極、11は
補助陰極10を支承し、これに適宜の運動をなさしめる
油圧シリンダ、12はエンコーダ、13は電鋳用電源、
14はスイッチ、15は電鋳母型8に該tU型を先細軸
方向へ往復運動を付与し、さらに前記軸の廻りに回転及
び、もしくは前記往復運動方向に微小振幅の振動を付与
するように支承する支承装置である。
The drawing is a sectional view, not showing an embodiment of the electroforming device according to the present invention, where ■ is a machine base supporting the device, 2 is an electroforming tank, and 3 is an electroforming tank located approximately in the center and extending all around the entire circumference. A cylindrical non-conductive partition wall provided with current-carrying holes 3a, 3a, 4 a through 1'cim pole, 5 a block of electroformed metal filled between the partition wall 3 and the current-carrying electrode 40, and 6 a known electrical & I liquid. , 7.7 are particles with grinding ability, for example, depths or particles of alumina oxide, etc. 8 is usually tapered in a predetermined axial direction, and preferably has a mirror finish in advance so that the electroformed shell can be peeled off. Is there a known material that has a thin oxide film if necessary? 'li# mother mold, 9 is the electrode which is being deposited on the electroforming mother mold 8, 10 is an auxiliary cathode, 11 is a hydraulic cylinder that supports the auxiliary cathode 10 and allows it to move appropriately; is an encoder, 13 is a power supply for electroforming,
14 is a switch; 15 is a switch for imparting reciprocating motion of the tU shape to the electroforming mother mold 8 in the direction of the tapered axis, and further imparting rotation around the axis and/or vibration of minute amplitude in the direction of the reciprocating motion; It is a supporting device that supports.

而して、この支承装置15は、油圧シリンダ16、ピス
トン四ノド17、エンコータ18、アーノ、19、ヘッ
ド20、スピンドル21、モータ22、スライダプルカ
ップリング23、スプリング24及び25、ばね調整ネ
ジ26、起振コイル27及び起振用鉄心28とから成る
This support device 15 includes a hydraulic cylinder 16, piston four throats 17, an encoder 18, an encoder 19, a head 20, a spindle 21, a motor 22, a slider pull coupling 23, springs 24 and 25, and a spring adjustment screw 26. , an excitation coil 27, and an excitation iron core 28.

尚、29及び30はそれぞれ油圧シリンダ11及び16
を制御する四方切換弁、31は油圧ユニット、32は制
御装置、33は起振用電源回路である。
Note that 29 and 30 are hydraulic cylinders 11 and 16, respectively.
31 is a hydraulic unit, 32 is a control device, and 33 is an excitation power supply circuit.

又、電Ui j費2に於ては、電鋳液6にり1する金属
イオンが、電&i金属5の電気化学的溶解により供給さ
れるもので、濃度制御やさらには液温制御が必要な場合
があり、さらに粒子7の破砕屑や電鋳殻の研削等の排出
等もa・要となろうから、金属5や粒子7に対するスト
レーナを介して電鋳液6及び上l!8微細屑を槽2より
常時又は■■歇的等排出させる機種を設け、濾過後、前
記濃度及び温度調整の後ノズル等により)τ12に上部
から注入する等の構成が採られるが、それ等についての
構成図示は省略しである。また、例えば、粒子7は、電
鋳殻9係造の戒る電鋳工程に於ては、除去乃至排除した
り、従って逆に途中で供給充填すること等もあるから、
そのような給排装置等も3m宜付設されるものである。
In addition, in the case of the electroforming liquid 6, the metal ions contained in the electroforming liquid 6 are supplied by electrochemical dissolution of the electroforming liquid 5, and concentration control and further liquid temperature control are required. In some cases, it may be necessary to discharge the crushed waste of the particles 7 and the grinding of the electroformed shell, so the electroforming liquid 6 and the top l! A configuration is adopted in which a model is provided that discharges fine debris from tank 2 constantly or intermittently, and after filtration and after adjusting the concentration and temperature, it is injected from the top into τ12 (via a nozzle, etc.). The illustration of the configuration is omitted. In addition, for example, in the electroforming process where the electroformed shell 9 is prohibited, the particles 7 may be removed or excluded, or conversely, they may be supplied and filled during the process.
Such a supply/discharge device etc. shall also be provided for a distance of 3 m.

機台1、電鋳槽2及び隔壁3は例えば非導電性の強化プ
ラスチックやセラミック、或いは表面を削正ITh I
t材で被覆した金に@等で作られている。
The machine base 1, the electroforming tank 2, and the partition wall 3 are made of, for example, non-conductive reinforced plastic or ceramic, or the surface is ground ITh I
It is made of gold coated with T material and @ etc.

隔壁3には一所望の高さ、望ましくはその全高の略2の
位置に全周にわたって多数のj11電孔38.38を環
状に設ける。この孔は電鋳液の流通と電鋳電流のf(i
路を形成するものであるが、電鋳金属5が隔壁3内に入
ったり、研削粒7が隔壁3外に出たりしないようにする
ことが好ましい。そのためには、金属5は絶縁性又は電
極4を一部兼用する耐蝕金網に入れて充填配置すれば良
く、また孔3、lの、母型8移動軸方向の開口幅は数鍋
−曲後程度でそれ程人きいものでないから、粒子7とし
てそれ以上の大きさの径のものを使用している限りに於
ては問題なく、また粒子7として小さいものを用いる場
合には、孔3aに粒子7に対する好ましくは耐圧性スト
レーナを設ければ良い。
A large number of J11 holes 38, 38 are annularly provided in the partition wall 3 at a desired height, preferably at approximately 2 positions of its total height, all around its circumference. This hole allows the flow of electroforming liquid and the electroforming current f(i
However, it is preferable to prevent the electroformed metal 5 from entering the partition wall 3 and the grinding particles 7 from coming out of the partition wall 3. To do this, the metal 5 may be placed in an insulating or corrosion-resistant wire mesh that also serves as a part of the electrode 4, and the opening width of the holes 3 and 1 in the direction of the axis of movement of the matrix 8 should be set after several pots and bends. Since it is not that inconsiderate in size, there is no problem as long as particles 7 with a diameter larger than that are used, and if particles 7 with a smaller diameter are used, the particles may not fit into the holes 3a. Preferably, a pressure-resistant strainer may be provided for 7.

而して、この隔壁3と通電電極4とは、製造する電鋳殻
の形状に合せて適宜に交換しく)るJv141 e。
The partition wall 3 and current-carrying electrode 4 are replaced as appropriate according to the shape of the electroformed shell to be manufactured.

することが望ましい。It is desirable to do so.

この隔壁3により、電鋳槽2の内部は中心部の電鋳室と
その外側の電極室の二層に区分されるが、電鋳液はこの
隔M3に設けられた通電孔3aを自由に通過、流通せし
められるものであり、また循環される電鋳液6を隔壁3
から溢流する状態にノズル等から供給しても良い。
This partition wall 3 divides the inside of the electroforming tank 2 into two layers: an electroforming chamber in the center and an electrode chamber on the outside. The electroforming liquid 6 that is allowed to pass through and circulate and is circulated is connected to the partition wall 3.
It may also be supplied from a nozzle or the like so that it overflows.

jffi?t!電極4は電鋳金属又は望ましくはカーボ
ン等の非腐食性の材料で製造され、VAAs2通′Ki
電極4の間には旧等の塊状又は粒状の電鋳金属5が直接
充填されるか、又は図示されていない金網籠等に入れら
れた状態で通電電極4に接して置かれている。
jffi? T! The electrode 4 is made of a non-corrosive material such as electroformed metal or preferably carbon, and has two VAAs'Ki
Between the electrodes 4, electroformed metal 5 in the form of old lumps or particles is directly filled, or placed in contact with the current-carrying electrodes 4 in a wire cage (not shown) or the like.

一方、隔壁3で創成された電鋳室内の電th液6には、
打ましくは半導電性又は絶縁性の機械的研削能のある粒
子7.7を混入するが、この粒子7.7は、例えば#6
0〜1000程度のアランダム、けい石等の液体ホーニ
ング剤又は粒度0.1〜10mm前後程度等必要な1法
のバレルデツプ等を単独で又は適宜に混合して使用する
On the other hand, in the electrolytic liquid 6 in the electroforming chamber created by the partition wall 3,
Preferably semi-conductive or insulating mechanically abrasive particles 7.7 are mixed, for example #6 particles 7.7.
A liquid honing agent such as alundum or silica having a grain size of about 0 to 1000, or a barrel depth of one method as required, such as a particle size of about 0.1 to 10 mm, is used alone or in an appropriate mixture.

スライダプルカップリング23は、スプライン軸23a
とソケット23bとから成るスプラインRt1手であり
、スプライン軸23aはモータ22の出力軸に、ソケッ
)23bは鉄心28と共にスピンドル21に取り付けら
れており、後者の組立体はスプリング24及び25を介
して軸方向に振動自在に支承されている。
The slider pull coupling 23 has a spline shaft 23a.
The spline shaft 23a is attached to the output shaft of the motor 22, the socket 23b is attached to the spindle 21 together with the iron core 28, and the latter assembly is connected to the spindle 21 through springs 24 and 25. It is supported so that it can freely vibrate in the axial direction.

従って、起振コイル27に振動電流が流れると、鉄心2
8及びスピンドル21が電鋳母型8と共に軸方向に振動
するが、それらの組立体が振動しているときでも、モー
タ22の回転はスピンドル21に伝達されるものである
Therefore, when an oscillating current flows through the oscillating coil 27, the iron core 2
8 and the spindle 21 vibrate in the axial direction together with the electroforming master mold 8, and even when the assembly is vibrating, the rotation of the motor 22 is transmitted to the spindle 21.

而して、アーム19に支承されたヘッド20は、油圧シ
リンダ17により昇降せしめられるので、これによりW
i電鋳母型の@脱、電&!殻9の剥&1【作業等を行・
)外、電鋳のための通電期間中、電鋳母型8が通電孔3
8の前面を反復して往復通過せしめられる様に、電鋳殻
9の高さより大きなストロークを以てヘッド20を反浚
打降・uしめるものである。
Since the head 20 supported by the arm 19 is raised and lowered by the hydraulic cylinder 17, the W.
iElectroforming mother mold @de, electric &! Peeling the shell 9 & 1 [Perform work etc.
) Outside, during the energizing period for electroforming, the electroforming mother mold 8 is connected to the energizing hole 3.
The head 20 is lowered and lowered with a stroke larger than the height of the electroformed shell 9 so that the head 20 can repeatedly pass back and forth over the front surface of the electroformed shell 9.

即ち、電鋳を行うときは、スイッチ14を藺じ、電源1
3により通電孔3a、38及び電鋳液6を介して電鋳電
流を通電電極4から電鋳母型8の上記通電孔38.38
対応部分に通電して、電鋳殻8上に電鋳殻9を形成する
ものであるが、その際、予め製造すべき電鋳殻の形状、
厚さ等に応じて予め°定めたプログラムにより、四方切
換弁30を制御しピストンロッド17に所望の速度変化
を与え反復竹降・uしめると同時に、モータ22を回動
さ−U、更に必要ならば起振コイル27に振動電流を流
して電鋳母型8に1[!1転)!l!勅と共に軸方向の
振動j!I動をなさしめるものである。
That is, when performing electroforming, turn on the switch 14 and turn on the power supply 1.
3, the electroforming current is passed through the current-carrying holes 3a, 38 and the electroforming liquid 6 from the current-carrying electrode 4 to the current-carrying holes 38, 38 of the electroforming mother mold 8.
The electroformed shell 9 is formed on the electroformed shell 8 by energizing the corresponding parts, but at this time, the shape of the electroformed shell to be manufactured in advance,
According to a predetermined program according to the thickness, etc., the four-way switching valve 30 is controlled to give the piston rod 17 a desired speed change and the piston rod 17 is repeatedly tightened.At the same time, the motor 22 is rotated. If so, an oscillating current is applied to the oscillating coil 27 and 1 [! 1 roll)! l! Axial vibration with the force! It is something that makes you move.

モータ21の回転数は電鋳母型8の大きさに応じて20
0〜2.00Orpmの範囲から適宜選定するが、常用
の電鋳殻では大約1.00Orpm前後の回転数とする
ことが11奨される。尚、通常20Orpm以下では樹
枝状晶の成長を阻止し雌くなるが、2.00Orpm以
上で1m転さ・Uる必yはない。又振動運動に就いCm
えば、その振動数を2〜10サイクル/秒、望ましくは
3〜5サイクル/秒、振中品を2〜10mm、、望まし
くは5mm曲後とすることが推奨される。
The number of revolutions of the motor 21 is 20 depending on the size of the electroforming mother mold 8.
The rotation speed is appropriately selected from the range of 0 to 2.00 Orpm, but it is recommended that the rotation speed be approximately 1.00 Orpm for a commonly used electroformed shell. Normally, if the speed is 20 Orpm or less, the growth of dendrites will be inhibited and the grain will become female, but if the speed is 2.00 Orpm or more, it is not necessary to roll over 1 m. Also in vibrational motion Cm
For example, it is recommended that the vibration frequency is 2 to 10 cycles/second, preferably 3 to 5 cycles/second, and the vibration frequency is 2 to 10 mm, preferably 5 mm after bending.

また、前記ロッド17の昇降によりヘッド2oに付与さ
れる、テーパ状電鋳母型8の軸方向の往復運動の周波数
は前記振動よりも遅い5〜0.1サイクル/秒、望まし
くは3〜0.5”)イクル/秒前後程度で、その往復運
動のストロークは、母型8が液6外に出ない限度に於て
、母型8の軸方向の長さ前後以上とすれば良(、また図
示実施例の電鋳母型8の場合、全体的に均一な厚さの電
鋳殻を得るものとすると、先端側に対してI!l端側の
同−幅環状部の面積が大であるから、該面積にほぼ比例
させて、往復運動の速度を制御変更すれば良い。
Further, the frequency of the reciprocating motion in the axial direction of the tapered electroforming mold 8 applied to the head 2o by raising and lowering the rod 17 is slower than the vibration, preferably 5 to 0.1 cycles/sec, preferably 3 to 0 cycles/sec. The stroke of the reciprocating movement should be approximately equal to or more than the axial length of the mother mold 8 as long as the mother mold 8 does not come out of the liquid 6. In addition, in the case of the electroformed mother mold 8 of the illustrated embodiment, if an electroformed shell having a uniform thickness is obtained throughout, the area of the same-width annular portion on the I!l end side is larger than that on the tip side. Therefore, the speed of the reciprocating motion can be controlled and changed approximately in proportion to the area.

而して、電鋳操11テは次の如くして行われる。Electroforming operation 11 is performed as follows.

先ず、?!!鋳母聖母型8えばステンレススヂールの如
き合金でも良いが、例えばNi電鋳の場合にはNl金属
ブロックか、旧メッキ等の被覆体を用いることが好まし
い。
First of all? ! ! The mold 8 may be made of an alloy such as stainless steel, but in the case of Ni electroforming, it is preferable to use a Nl metal block or a covering such as old plating.

そして〜所定の形状、寸法に切削、研削、そして充分研
摩して鏡面仕上げする。これは電鋳#!9を製作後剥離
可能とするもので、昌剥部性とするために上記鏡面部分
を例えば空気中に所定時間的して極く薄い酸化物被膜を
形成させるが、又す上記鏡面仕上げの電#I母型8を本
発明電#jl装置のへノドに取り付け、粒子7.7が未
だ充填されていない電鋳槽2中の電鋳液6中に挿入浸漬
し、電鋳金属の薄い鏡面メッキを行い、これを一旦、電
鋳液6かも引き上げて空気中に晒すことによりメッキ膜
の一部打ましくは全部を酸化さ・Uる。こうしておいて
、未だ粒子7.7を入れることなく、電鋳母型8を回転
さ・Uると共に、肩降往復運動させ、或いは振動さセな
がら、従来の通席速度程度の電鋳条件で電鋳を行い、上
記酸化vJ、v74面に略0.2〜0.3mm前後の電
&Pi層ができ、樹枝状晶等も戒程度生成し始める位の
所で粒子7.7を供給充填し、電流を増大さ・Uて本発
明の?li鋳殻の製造工程へ移行さけるのである。これ
は、製作された電鋳殻9のQ11舗離脱が比較的容易に
行われるようにするためと、電鋳母型8の表面に剥離の
際や上記19面及び下地メッキの際に粒子7により傷を
付けることなく、反復使用できるようにするためであっ
て、上記鏡面及びOi!護川下用メッキの際には、隔壁
3は格別V要ではないから、その際は隔壁3は設けられ
ていなくても良く、そうすれば電鋳母型8を格別昇降往
復運動させながら上記鏡面メッキ等をする必要はない。
Then, it is cut to the desired shape and dimensions, ground, and polished to a mirror finish. This is electroforming #! 9 can be peeled off after manufacturing, and in order to make the mirror surface part removable, a very thin oxide film is formed by exposing the mirror surface part to the air for a predetermined period of time. The #I matrix 8 is attached to the hem of the electroforming device of the present invention, and inserted into the electroforming solution 6 in the electroforming tank 2 which has not yet been filled with the particles 7. Plating is performed, and the electroforming solution 6 is once removed and exposed to air to oxidize or oxidize part or all of the plating film. In this way, without introducing the particles 7.7, the electroforming mother mold 8 is rotated and rolled, and is subjected to shoulder-down reciprocating motion, or while being vibrated, under electroforming conditions at about the conventional passing speed. Electroforming is performed, and particles 7.7 are supplied and filled at a point where an approximately 0.2 to 0.3 mm thick electro&Pi layer is formed on the oxidized vJ and v74 surfaces, and dendrites and the like begin to form to a certain extent. , the current can be increased by using the present invention? This avoids moving to the manufacturing process of Li cast shells. This is so that the produced electroformed shell 9 can be detached relatively easily, and particles 7 are placed on the surface of the electroformed mold 8 during peeling and during the above-mentioned surface 19 and base plating. This is to enable repeated use without causing damage to the mirror surface and Oi! When plating the lower part of the shield, the partition wall 3 is not particularly necessary, so the partition wall 3 may not be provided in that case, and the electroforming mother mold 8 can be moved up and down in a reciprocating manner to achieve the above-mentioned mirror surface. There is no need for plating etc.

而して、本発明に於ては、従来の電流密度の5〜10倍
に相当する15〜40Δ/dm2前後、又はそれ以上、
場合によっては80〜10〇八/dm2稈度の高電流密
度で通電し電鋳を行うのであるが、本発明に於ては、こ
の電鋳電流は通電孔3aを通じて電鋳面に供給されるの
で、電鋳面のうち通電孔3aを通過しつ\ある部分に集
中的に電着析出が行われる。
Therefore, in the present invention, the current density is around 15 to 40 Δ/dm2, which is 5 to 10 times the conventional current density, or more.
In some cases, electroforming is carried out by applying current at a high current density of 80 to 1008/dm2 culm, but in the present invention, this electroforming current is supplied to the electroforming surface through the current carrying hole 3a. Therefore, electrodeposition is concentrated on a portion of the electroformed surface that passes through the current-carrying hole 3a.

これが、所謂、ゾーンブレーティングである。This is so-called zone brating.

尚、電鋳母型8の形状、寸法によっては、この様に環状
又は帯状にではなく、ビーム状電流により点状等に集中
電着するよう構成すると共に、このビーム状電流でm鋳
面をスキャニングする場合もある。
Depending on the shape and dimensions of the electroforming mother mold 8, the electrodeposition may be concentrated in dots or the like using a beam-like current, rather than in a ring or band shape as described above, and the beam-like current may be used to cover m casting surfaces. Sometimes scanning is also done.

而して、電鋳母型8は、通電孔3aの前を所定のプログ
ラムに従って所望の速度で往復通過しつへ強い電流2受
ける上、上記の回転運動と必要に応じて付与される振動
運動により樹枝状晶、針状、品の成、長が抑制されるの
で、短時間内に所望の厚さ分布を有する電鋳殻9が形成
される。
Thus, the electroforming mother mold 8 passes back and forth in front of the current-carrying hole 3a at a desired speed according to a predetermined program, receives a strong current 2, and is also subjected to the above-mentioned rotational movement and vibrational movement applied as necessary. Since the growth and length of dendrites, needles, and crystals are suppressed, an electroformed shell 9 having a desired thickness distribution is formed within a short time.

そし′C1電鋳途中に於て樹枝状晶や針状晶等が仮りに
形成され始めたとしても、上記電鋳母型8の昇降往復運
動と回転、さらには付与振動により、粒子7とfti突
さらには摩擦し、バレル研摩作用を受けて減寸消失させ
られる丈でなく、形成電鋳殻9をその析出の都度、一種
の粒子7による軽打作用により母型8表面に押圧圧縮す
る作用を行なっているものであって、密度の高い電鋳殻
9形成を可能とするものである。
Even if dendrites, needles, etc. start to form during C1 electroforming, particles 7 and fti The length is not such that the length is reduced and disappears due to friction and barrel polishing action, but the action of pressing and compressing the formed electroformed shell 9 against the surface of the matrix 8 by the light hitting action of a kind of particles 7 each time it is deposited. This makes it possible to form an electroformed shell 9 with high density.

而して、M&原流密度0Δ/dm2では略0.5mm/
 Ilrの速度で、又80A / dm2では略1 m
m/ Ilrの速度で電鋳殻が形成されるが、本発明に
よるときは通常の形状の電鋳殻では作業中樹枝状晶、針
状晶の成長が殆ど見られず又、多少凹凸等が生ずること
があっても電鋳を中断し機械加工をしなければならなく
なるようなことは稀である。
Therefore, at M & original density 0Δ/dm2, approximately 0.5 mm/
At a speed of Ilr and at 80A/dm2 approximately 1 m
An electroformed shell is formed at a speed of m/Ilr, but in the case of the present invention, the growth of dendrites and acicular crystals is hardly observed during the work in the electroformed shell of a normal shape, and there are some irregularities etc. Even if it does occur, it is rare that electroforming must be interrupted and machining performed.

また、電鋳の途中に於て、様子を視るために電鋳を一旦
中断し、電鋳液6を落ずか電鋳母型8を引き上げて電鋳
殻9表面を空気中に晒らしたような場合にも、電鋳の再
開に当って、電鋳電流を流さないで又は少し絞った状態
で往復運動と回転、さらには振動を付与することにより
、電&?l殻9表面の酸化膜等をバレル研摩除去して、
目的電鋳殻に移行さ七ることにより電vtM、9中に欠
陥層を造ることがなく、そしてこのようなことは電鋳の
途中で、樹枝状晶等を機械加工によって除去した後の?
a鋳再開の場合にも適用して同9)ノであり、従来のよ
うに廃液処理の問題やその手間等を要しないから極めて
有用である。
In addition, during electroforming, the electroforming is temporarily stopped to check the progress, and the electroforming liquid 6 is dropped or the electroforming mother mold 8 is pulled up and the surface of the electroformed shell 9 is exposed to the air. Even in such a case, when restarting electroforming, by applying reciprocating motion, rotation, and even vibration without applying electroforming current or with a slightly reduced current, it is possible to restart electroforming. Remove the oxide film etc. on the surface of l shell 9 by barrel polishing,
Purpose: By transferring to the electroformed shell, no defect layer is created in the electroformed shell, and this does not occur during electroforming, after dendrites, etc. are removed by machining.
9) also applies to the case of re-casting, and is extremely useful since it does not require the problem of waste liquid treatment or the time and effort required in the past.

尚、禎助陰極lOは電#殻9の下端面の角隅部に過剰の
電着が生ずるのを防止するため使用するものであり、主
として電防の初期に電鋳母型8の近傍に接近させ、これ
と共に即ちこれと同期さ七て上下させることにより電v
t電流の一部を誘引して電鋳母型8の下端側外周縁部に
過剰の電着が生じるのを阻止するものである。
The auxiliary cathode 1O is used to prevent excessive electrodeposition from occurring at the corners of the lower end surface of the electrode shell 9, and is mainly used near the electroforming matrix 8 in the early stage of electroprotection. By bringing them close together and raising and lowering them in synchronization with this, the voltage
This is to prevent excessive electrodeposition from occurring on the outer peripheral edge of the lower end of the electroforming mold 8 by inducing a part of the t current.

尤も、陰極10は電鋳母型8に充分近接さU′るように
ずれば母型8と実質」1同電位として作用するから、電
源13へは必ずしも接続のり・要はな(、また、該陰極
10は母型8の形状効果を消失さ・υるためのものであ
るから、形状効果の軽減可能な絶縁物であっても良いこ
とがある。
However, if the cathode 10 is moved sufficiently close to the electroforming matrix 8, it will act at substantially the same potential as the matrix 8, so it is not necessarily necessary to connect it to the power source 13. Since the cathode 10 is intended to eliminate the shape effect of the matrix 8, it may be an insulator that can reduce the shape effect.

本発明は紅玉の如く構成されるから、電鋳母型80表面
は通電孔3aを通過する上下運動により通電孔3aから
流出する高密度電流ビームによりゾーンプレイティング
又はスキャニングされ、同時にその電鋳面は昇降往復運
動と回転運動、或いはさらに付−りされる振動運動によ
り粒子7との間で液体ホーニング又はバレル研摩される
ので、樹枝状晶、今1状晶の成長が抑制され、且つ71
1鋳面が常時活性化されるので、従来の数十倍のiAi
電流密度でWi&tJを行うことが可能となるものであ
る。
Since the present invention is configured like a red ball, the surface of the electroforming mold 80 is zone-plated or scanned by the high-density current beam flowing out from the current-carrying hole 3a by vertical movement passing through the current-carrying hole 3a, and at the same time, the electroforming surface is is subjected to liquid honing or barrel polishing between the particles 7 through the vertical and reciprocating movement and rotational movement, or the added vibration movement, so that the growth of dendrites and monomorphic crystals is suppressed, and 71
Since one casting surface is constantly activated, iAi is several tens of times higher than conventional
This makes it possible to perform Wi&tJ at a current density.

従って、本発明によるときは、電鋳のコストを大幅に引
き下げ得るばかりでなく、危険で公害発生の恐れのある
薬品等も使用する必要がなく、夜間等を利用して長時間
無人で自動的Gこ1榮業できるのでその利益は計り知る
ことができなり1゜又、特に紅玉の如く電鋳殻中心軸を
中上・と−1−る回転運動下で電鋳を行うと、粒子7介
在番こよる才止子7の軽打作用等と相俟って電鋳結晶力
く電vI殻の半径直角方向に成長するのでその方向の圧
縮及び引張り強度が増し、金型用として打遠な電鋳殻9
表面られるという利点もある。
Therefore, according to the present invention, not only can the cost of electroforming be significantly reduced, but there is also no need to use chemicals that are dangerous and may cause pollution, and automatic forming can be carried out unattended for long periods of time, such as at night. The benefits are immeasurable, and especially when electroforming is carried out under rotational motion with the center axis of the electroformed shell in the middle and up, as in the case of Kogyoku, the particles 7 Combined with the light tapping action of the intervening stopper 7, the electroformed crystal force grows in the direction perpendicular to the radius of the electroformed shell, increasing compressive and tensile strength in that direction, making it suitable for use in molds. electroformed shell 9
It also has the advantage of being visible.

尚、本発明の構成は紅玉の実施例に限定さJするもので
なく、本発明は要するに、電鋳番こ際して、電鋳面に液
体ホーニング又はノイレル研摩と同様な研削加工を施し
つ−、ゾーンブレーティング又l:1スキヤニングブレ
ーテイング手法により部分n!Nこ高密度で通電し電鋳
を行うことを要旨とするものであるから、装置の形状、
特に隔壁、通電電極等の形状、通電孔の配置等々は、電
鋳の目的、電鋳殻の形状等に合せて自由に設δ1変更し
得るものである。
Note that the structure of the present invention is not limited to the embodiment of Kodama; in short, the present invention is applicable to electroforming, in which the electroformed surface is subjected to a grinding process similar to liquid honing or Neurel polishing. -, zone brating or l:1 scanning brating technique for part n! Since the purpose is to perform electroforming by applying current at a high density, the shape of the equipment,
In particular, the shapes of the partition walls, current-carrying electrodes, etc., arrangement of current-carrying holes, etc. can be freely changed by δ1 according to the purpose of electroforming, the shape of the electroformed shell, etc.

即ち、本発明に於ては、電鋳面を通電孔の前面を通過せ
しめつ\高密度で電鋳面に電流を通じると共に、電鋳液
中に機械的研削又は研摩能力のある硬質の微粒子または
デツプ等の粒子を混入しておき、電鋳のための通電中に
、電鋳u、、!:電鋳液の間に強い相対運動を与えて上
記粒子を電鋳面に強(衝突、接触せしめ、樹枝状晶、釧
状晶の成長を附1止して平滑且つ均一に電鋳殻を生成・
υ−しめるものであるから、部分的W1鋳のための通電
孔の配置や、電鋳面を通電孔の前面を通過させるための
往復運動の様式は?Ii鋳母型の形に応じて自由に変更
しくグるものであり、例えば、電1?母型8でな(通電
孔3a又は電鋳槽2を移動等運動さ−Uることもあり、
又場合に応じて隔壁3の内側を電極室としその外側を電
鋳室としたり、隔壁3を水平な仕切板としてf′!!鋳
槽内全上下二車に区分し上室を電鋳室に下室を電極室に
したりすることもあり、更には隔壁を組立式とし通電孔
の位置や幅等のN法を調節可能としたり、各種複合型の
電極室とすることもあり、又、電鋳室に挿入する電鋳母
型も常に一+tnに限定されるものでなく複数の?!!
鋳母型を受入れ得るよう構成することもでき、又更に、
研摩作業のため電鋳殻又は電鋳母型に与える運動の様式
も上E’A降往復運動と回転運動、成いはさらに付与さ
れる振動の組合せの外、例えば遊星運動や間欠反転運動
としてもよく、又W1鋳殻でなく電鋳液の方を噴流又は
循環流等さ・lることも当然考えられるものであり、又
又更に上記の如き粒子のみでなく研摩のためには剛毛を
有する回転ブラシやベルト式研摩具等を併用することも
あり、又、電v!槽や電鋳母型の支持装置、駆動装置の
様式、構成は本発明の目的の範囲内で広く公知のものを
利用して自由に設δ1変更し得るものであり、本発明は
それらの総てを包摂するものである。
That is, in the present invention, a current is passed through the front surface of the current-carrying hole on the electroformed surface at a high density, and hard fine particles capable of mechanical grinding or abrasion are added to the electroforming solution. Alternatively, particles such as a dip may be mixed in and the electroforming u...! : Strong relative motion is applied between the electroforming liquid to force the particles to collide and contact with the electroformed surface, thereby stopping the growth of dendrites and chimes to form a smooth and uniform electroformed shell. Generate·
Since it is a material that tightens υ-, what is the arrangement of the current carrying holes for partial W1 casting and the mode of reciprocating movement to allow the electroformed surface to pass in front of the current passing hole? You can freely change it depending on the shape of the Ii casting mold, for example, Den 1? The mother die 8 may move or move the current carrying hole 3a or the electroforming tank 2.
Depending on the situation, the inside of the partition wall 3 may be used as an electrode chamber and the outside thereof may be used as an electroforming chamber, or the partition wall 3 may be used as a horizontal partition plate f'! ! Sometimes the entire casting tank is divided into two upper and lower chambers, with the upper chamber used as the electroforming chamber and the lower chamber used as the electrode chamber.Furthermore, the partition wall is made prefabricated so that the N method such as the position and width of the energizing hole can be adjusted. In addition, the number of electroforming molds inserted into the electroforming chamber is not always limited to one + tn, but may be multiple. ! !
It can also be configured to accept a casting mold, and further,
The mode of motion given to the electroformed shell or electroformed mother mold for polishing work is not only the upper E'A reciprocating motion and rotational motion, but also the combination of vibrations, such as planetary motion or intermittent reversal motion. Naturally, it is also possible to use the electroforming liquid instead of the W1 cast shell in a jet or circulating flow, and furthermore, it is possible to use not only the particles mentioned above but also bristles for polishing. Rotating brushes and belt-type polishing tools, etc., may be used in conjunction with electric v! The style and structure of the tank, the support device for the electroforming mother mold, and the drive device can be freely changed by using widely known devices within the scope of the purpose of the present invention, and the present invention covers all of them. It encompasses everything.

本発明は炊上の如く構成されるので、本発明によるとき
は、極めて効率的な電鋳装置と電鋳方法を提供し得るも
のである。
Since the present invention is structured like a cooking method, it is possible to provide an extremely efficient electroforming device and electroforming method.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明に係る電鋳装置の一実施例を示す断面図で
ある。 1−−−−−−−−−−−−−一機台 2−−−−−−−−一−−−−−−−−−一電鋳槽3−
−−−−−・−−−一一−−−−−−隔壁4−一−−−
−−−−−−・−通電電極5−−−−−−−−−−−一
電鋳金属塊6−−−−−−−−−〜−電電鋳 7−〜−−〜−−−−−−−−−−・微粒子8−−−−
  −−・−’iuv母型 9 −−−−−−−−−−−一電鋳殻 +3−−−−−−−−−−−一電鋳用電源14−−−−
−−−−−−  スイノヂ15−−−−−−−−−一支
承装置 +6−− −−−−−−−一浦圧シリンダ17−− −
−一〜−−〜−−−−−−−ピストンロッド18〜−−
一一−−−−−−−−−エンコーダ19−−−−−〜〜
−−−−−−−−−−アーム20−−−〜−−−−−−
−−−−ヘッド21−−−−−−−−−−−−−スピン
ドル22−−−−−−−・−・−・−−−−−モータ2
3−−−−−−−−−−−−−−−スライダプルカップ
リング24.25−−−−−−−−スプリング26−−
 −−−・・・−−−−一一一−−・−ばね調整ねじ2
7’−−−−−−−−−−−−一起振コイル28−−−
−−−−−−−一−−−−−−・−鉄心29.30−−
−−−−−・−・−−−−四方切換ブr3 ]−−−−
一−−−−−−−−−−−一油圧ユニット32−−−−
−−−−−−−−−−−一制御装置特許出願人  ジャ
パックス化成株式会社代理人(7524)最上正太部 手続補正書 昭和57年09月28日 特許庁長 官 若 杉 和 夫 殿 1、 事件の表示 昭和57年特許願第125104す 2、 発明の名称 電鋳装置及び電鋳殻の製造方法 3、  ?ill正をする者 事件との関係 特許出願人 住所 神奈川県用崎市高津区板戸100番地名称 ジャ
パックス化成株式会社 代表者 上 1)隆 三 4、代理人の107  Th 583−0306住 所
 東京都港区赤坂1丁目8番1号6、補正により増加す
る発明の数 0 7、 補正の対象 明細書の発明のaY:相な説明の欄、図面の簡単な説明
の欄及び図面 8、 補正の内容 別紙の通り 8.7!1正の内容 1)明細書第8頁第11行目に「研削粒7」とあるのを
「粒子7」と補正する。 2)明細書第10頁ff114行目から15行目にかけ
て「油圧シリンダ17」とあるのを「油圧シリンダ16
」と補正する。 3)明細書第11頁第4行目に「電鋳殻8」とあるのを
「電鋳母型8」と補正する。 4)明細書第21頁第3行目に「電鋳金属塊」とあるの
を「電鋳金属」と補正する。 5)明細書第21頁第5行目に[微粒子Jとあるのを「
粒子」と補正する。 6)明細書第22頁第2行目に「鉄心」とあるのを「起
振用鉄心」と補正する。 7)明細書に添付した図面を本手続補正書に添付した図
面と差換える。
The drawing is a sectional view showing an embodiment of an electroforming apparatus according to the present invention. 1----------1 machine 2--1--
--------・----11---- Partition wall 4-1---
−−−−−・−Electrifying electrode 5−−−−−−−−−−Electroformed metal block 6−−−−−−−−−−−Electroforming 7−−−−−−−− ---------・Fine particles 8----
---・-'iuv matrix 9 ------------ One electroforming shell + 3 ---------- One electroforming power source 14 ---
---
-1~---~------Piston rod 18~---
11--------Encoder 19--
−−−−−−−−−−Arm 20−−−−−−−−−
---Head 21-------------Spindle 22--------・--・---Motor 2
3---------------Slider pull coupling 24.25------Spring 26---
−−−・・・−−−−111−−・−Spring adjustment screw 2
7'--------- Single excitation coil 28--
−−−−−−−−−−−−−・−Iron core 29.30−−
-------・------Four-way switching brake r3 ]----
1 ---------- 1 Hydraulic unit 32 ----
−−−−−−−−−−−1 Controller Patent Applicant Agent for Japax Kasei Co., Ltd. (7524) Mogami Shota Section Procedural Amendment September 28, 1980 Commissioner of the Japan Patent Office Kazuo Wakasugi 1 , Indication of the case 1982 Patent Application No. 125104-2, Name of the invention Electroforming device and method for manufacturing electroformed shell 3, ? Relationship with the ill-correcting case Patent applicant address: 100 Itado, Takatsu-ku, Yozaki City, Kanagawa Prefecture Name: Japax Kasei Co., Ltd. Representative 1) Takashi Mizo 4, Agent 107 Th 583-0306 Address: Tokyo, Japan 1-8-1-6 Akasaka, Minato-ku, number of inventions increased by amendment 0 7, aY of the invention in the specification subject to amendment: Column for relative explanation, column for brief explanation of drawings, and drawing 8, Amendment Contents As per attached sheet, 8.7!1 Correct contents 1) "Grind grain 7" on page 8, line 11 of the specification is corrected to "particle 7." 2) From the 114th line to the 15th line of page 10 of the specification, "hydraulic cylinder 17" is replaced with "hydraulic cylinder 16".
” he corrected. 3) In the fourth line of page 11 of the specification, "electroformed shell 8" is corrected to "electroformed mother mold 8." 4) The phrase "electroformed metal ingot" in the third line of page 21 of the specification is amended to read "electroformed metal." 5) In the 5th line of page 21 of the specification, [fine particles J] has been changed to ``
Correct as "particles". 6) The phrase "iron core" in the second line of page 22 of the specification is amended to read "excitation iron core." 7) Replace the drawings attached to the specification with the drawings attached to the written amendment of this procedure.

Claims (1)

【特許請求の範囲】 1)電鋳液が導入される電鋳槽と、電鋳槽内に電鋳母型
を挿入、支承する装置と、電鋳槽内に設けられる通電電
極及び電鋳金属と、電鋳母型と通電電極との間に電鋳電
流を供給し得る電源とからなる電鋳装置に於て、所望の
軸方向高さに通電孔を有する非導電性の隔壁を設けて電
鋳槽内部を電鋳母型が挿入される電鋳室と通電電極及び
電極金属が挿入される電極室との二層に区分し、電鋳母
型の支承装置には、電鋳母型を上記通電孔の前面で反復
往復運動なさしめると共に、所望の回転運動及び/又は
振動運動をなさしめ得る移動装置を設けたことを特徴と
する上記の電&I装置。 2)通電孔を有する非導電性の隔壁により、Wi電鋳母
型挿入される電鋳室と通電電極及び電鋳金属とが挿入さ
れる電極室とに区分された電鋳槽を用い、その電鋳槽内
に公知の電鋳液を導入し、電鋳室内の電鋳液には、好ま
しくは半導電性又は非導電性の機械的研削能のある粒子
を多数混合すると共に、電鋳室内に挿入する電鋳母型に
は上記通電孔の前面で電鋳母型の軸方向全長以上のス)
 l:l −りで通電孔に対し相対的に反復往復運動を
なさしめつ一1所望の回転運動及び/又は振動運動を与
えると共に、通電電極との間に上記通電孔を通じて電鋳
電流を流し電鋳母型上に電鋳殻を形成することを特徴と
するtU電鋳殻製造方法。 3)電鋳母型に与えられる各運動が、前記往復運動にあ
っては、往復数5〜0.1サイクル/秒またその運動が
回転運動にあっては、その軸を中心とする200〜2,
000rpmの回転運動であり、またその運動が、振動
運動にあっては、振動数2〜10サイクル/秒、振幅2
〜10mmの軸方向の振動運動である特1’I−請求の
範囲第2項記載の電鋳殻の製造方法。
[Claims] 1) An electroforming tank into which an electroforming solution is introduced, a device for inserting and supporting an electroforming mold into the electroforming tank, and a current-carrying electrode and electroformed metal provided in the electroforming tank. and a power supply capable of supplying an electroforming current between the electroforming mother mold and the current-carrying electrode, in which a non-conductive partition wall having a current-carrying hole is provided at a desired axial height. The inside of the electroforming tank is divided into two layers: the electroforming chamber where the electroforming mother mold is inserted and the electrode chamber where the current-carrying electrode and electrode metal are inserted. The electric & I device described above is further provided with a moving device capable of repeatedly making reciprocating movements in front of the electricity supply holes and also making desired rotational movements and/or vibrational movements. 2) Using an electroforming tank that is divided into an electroforming chamber into which the Wi electroforming mother mold is inserted and an electrode chamber into which the current-carrying electrode and electroformed metal are inserted by a non-conductive partition wall having current-carrying holes, A known electroforming solution is introduced into the electroforming tank, and a large number of preferably semi-conductive or non-conductive particles having mechanical grinding ability are mixed into the electroforming solution in the electroforming chamber. The electroforming mother mold to be inserted into the mold has a space that is longer than the total axial length of the electroforming mother mold in front of the above-mentioned current carrying hole).
1: Repeated reciprocating motion relative to the current-carrying hole with the 11 l-r to give a desired rotational movement and/or vibrational movement, and flowing an electroforming current through the current-carrying hole between the current-carrying electrode and the current-carrying electrode. A method for producing a tU electroformed shell, which comprises forming an electroformed shell on an electroformed mother mold. 3) If each motion given to the electroforming mother mold is the reciprocating motion, the number of reciprocations is 5 to 0.1 cycles/sec, and if the motion is rotational motion, the number of reciprocations is 200 to 0.1 cycles/second around the axis. 2,
000 rpm, and if the motion is a vibrational motion, the frequency is 2 to 10 cycles/sec, the amplitude is 2.
1. The method for producing an electroformed shell according to claim 2, wherein the axial vibration motion is 10 mm.
JP12510482A 1982-07-20 1982-07-20 Electrotyping apparatus and preparation of shell therefor Granted JPS5916991A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12510482A JPS5916991A (en) 1982-07-20 1982-07-20 Electrotyping apparatus and preparation of shell therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12510482A JPS5916991A (en) 1982-07-20 1982-07-20 Electrotyping apparatus and preparation of shell therefor

Publications (2)

Publication Number Publication Date
JPS5916991A true JPS5916991A (en) 1984-01-28
JPS6315996B2 JPS6315996B2 (en) 1988-04-07

Family

ID=14901943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12510482A Granted JPS5916991A (en) 1982-07-20 1982-07-20 Electrotyping apparatus and preparation of shell therefor

Country Status (1)

Country Link
JP (1) JPS5916991A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103243374A (en) * 2012-02-06 2013-08-14 昆山允升吉光电科技有限公司 Method capable of effectively increasing quality of electroforming plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103243374A (en) * 2012-02-06 2013-08-14 昆山允升吉光电科技有限公司 Method capable of effectively increasing quality of electroforming plate
CN103243374B (en) * 2012-02-06 2016-08-10 昆山允升吉光电科技有限公司 A kind of method being effectively improved electrotyping plate quality

Also Published As

Publication number Publication date
JPS6315996B2 (en) 1988-04-07

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