JPS59166390A - Hydrogen atom working device - Google Patents

Hydrogen atom working device

Info

Publication number
JPS59166390A
JPS59166390A JP58038918A JP3891883A JPS59166390A JP S59166390 A JPS59166390 A JP S59166390A JP 58038918 A JP58038918 A JP 58038918A JP 3891883 A JP3891883 A JP 3891883A JP S59166390 A JPS59166390 A JP S59166390A
Authority
JP
Japan
Prior art keywords
cooling liquid
workpiece
laser
hydrogen atom
worked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58038918A
Other languages
Japanese (ja)
Inventor
Kiyoshi Inoue
潔 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP58038918A priority Critical patent/JPS59166390A/en
Publication of JPS59166390A publication Critical patent/JPS59166390A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/127Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
    • B23K26/127Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an enclosure
    • B23K26/128Laser beam path enclosures

Abstract

PURPOSE:To provide a titled device which improves working efficiency and speed and enables fine working by the constitution in which laser light is focused and irradiated to the surface of a body to be worked by a focusing lens while a cooling liquid is supplied thereto and gaseous hydrogen is supplied and interposed. CONSTITUTION:The laser light emitted from a laser oscillator 1 is focused to the working part of a body 20 to be worked by a reflecting mirror 2 and a focusing lens 5, and gaseous hydrogen to be introduced through a gaseous hydrogen supplying pipe 10 into a casting 7 is ejected through a hole 7a to the working part. The body 20 is efficiently worked by the energy released in the stage of ionizing the gas by the laser light and recombining the same. The body 20 is disposed via a turntable 16 and cross slide tables 14, 15 into a cooling liquid tank 12 controlled by a numerical control device 21. A cooling liquid 13 such as water is run at a specified speed at which the liquid disturbance does not arise to cool the surface of the body 20. Only the very small part or desired point of the body 20 is thus surely worked.

Description

【発明の詳細な説明】 本発明はレーザ光と水素ガスとを併用して加工する水素
原子加工装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a hydrogen atom processing apparatus that processes using a combination of laser light and hydrogen gas.

レーザ光を集束レンズにて集束し被加工体に照射しつつ
加工を行うレーザ加工装置は公知であ′り広く利用され
ている。また、この他の装置としては、レーザ、発振器
とプラズマ発生器等とを併用し、加工効率をより向上さ
せて加工を行うレーザ加工装置も開発され利用されつつ
ある。
2. Description of the Related Art Laser processing apparatuses that perform processing while focusing laser light on a workpiece by focusing it on a focusing lens are well known and widely used. In addition, as another device, a laser processing device that uses a laser, an oscillator, a plasma generator, etc. in combination to perform processing with improved processing efficiency has been developed and is being used.

然しなから、上記のそれぞれのレーザ加工装置は従来一
般のレーザ加工装置に比べれば加工効率及び加工速度は
大幅に向上したが、まだまだその加工効率及び加工速度
は低いものであった。
However, although the processing efficiency and processing speed of each of the above-mentioned laser processing apparatuses has been significantly improved compared to conventional general laser processing apparatuses, the processing efficiency and processing speed are still low.

この問題点を解決するために、水素ガスの水素分子をレ
ーザ光でイオン化し、更に上記イオン化された水素分子
が再結合する際のエネルギを利用して加工する水素原子
加工装置が開発された。この水素原子加工装置は、レー
ザ光とアーク放電、又は上記のレーザ光とプラズマ等を
併用した装置に比べると加工効率及び加工速度が大変に
高いものである。
In order to solve this problem, a hydrogen atom processing device was developed that ionizes hydrogen molecules in hydrogen gas with a laser beam and processes the hydrogen molecules using the energy generated when the ionized hydrogen molecules recombine. This hydrogen atom processing apparatus has much higher processing efficiency and processing speed than the apparatus that uses a combination of laser light and arc discharge, or the above-mentioned laser light and plasma.

然しながら、このレーザ光と水素ガスとを併用した水素
原子加工装置は一1加工効率及び加工速度は高いのであ
るが被加工体の微小部分又は上記被加工体の所望の箇所
のみを確実に加工することが困難であると云う問題点が
あった。
However, this hydrogen atom processing device that uses a combination of laser light and hydrogen gas has high processing efficiency and processing speed, but cannot reliably process only a minute part of the workpiece or a desired location on the workpiece. The problem was that it was difficult to do so.

本発明は叙上の観点に立ってなされたものであって、そ
の目的とするところは、レーザ光と水素ガスとを併用し
て加工を行う水素原子加工装置の加工効率及び加工速度
をより向上させると共に、被加工体の微小部分又は上記
濃加工体の所望の箇所のみを確実に加工すことができる
水素原子加工装置を提供しようとするものである。
The present invention has been made based on the above-mentioned viewpoints, and its purpose is to further improve the processing efficiency and processing speed of a hydrogen atom processing device that performs processing using a combination of laser light and hydrogen gas. In addition, it is an object of the present invention to provide a hydrogen atom processing apparatus that can reliably process only a minute portion of a workpiece or a desired location of the heavily processed workpiece.

而して、その要旨とするところは、レーザ発振器からQ
IMされたレーザ光を集束レンズによって集束し、被加
工体に照射させると共に、水素ガスを上記被加工体面に
供給介在させて加工を行う7に素原子加工装置に於て、
上記被加工体表面に冷却液を供給する装置を設けること
にある。
The gist of this is that the Q from the laser oscillator
7. In the elementary atom processing apparatus, the IM laser beam is focused by a focusing lens and irradiated onto the workpiece, and hydrogen gas is supplied to the surface of the workpiece for processing.
The object of the present invention is to provide a device for supplying a cooling liquid to the surface of the workpiece.

以下、図面により本発明の詳細を具体的に説明する。Hereinafter, the details of the present invention will be specifically explained with reference to the drawings.

図面は、本発明にかかる水素原子加工装置の一実施例を
示す説明図である。
The drawing is an explanatory diagram showing an embodiment of the hydrogen atom processing apparatus according to the present invention.

第1図中、1はレーザ発振器、2はレーザ光の反射鏡、
3は上記反射鏡2を固定する反射鏡固定部材、4は反射
絞2及び反射鏡固定部材3のケーシング、5は集束レン
ズ、6は上記集束レンズ5を固定する集束レンズ固定部
材、7は集束レンズ5及びレンズ固定部材6のケーシン
グ、1aは上記ケーシング7に形成されている孔、8は
モータ、8aは上記モータ8のシャフト、9は一端が上
記ケーシング7に固定されている固定板、10は水素ガ
ス供給管、11は冷却液供給バイブ、12は冷却液槽、
13冷却液、14及び15は上記冷却液槽12をそれぞ
れX軸及びY軸方向へ移動させるクロススライドテーブ
ル、16は冷却液[12に回転運動を与えるためクロス
スライドテーブル14上に設けられたターンテーブル、
17.18及び19はそれぞれクロススライドテーブル
14.15及びターンテーブル16を駆動するモータ、
20は被加工体、21はモータ8、クロススライドテー
ブル14.15及びターンテーブル16のそれぞれのモ
ータ17.18及び19を予め定められたプログラムに
従って一括制御する数値制御装置、22は濾過器、23
はポンプ、24は冷却液供給タンクである。
In Figure 1, 1 is a laser oscillator, 2 is a laser beam reflecting mirror,
3 is a reflecting mirror fixing member for fixing the reflecting mirror 2, 4 is a casing for the reflecting diaphragm 2 and the reflecting mirror fixing member 3, 5 is a focusing lens, 6 is a focusing lens fixing member for fixing the focusing lens 5, and 7 is a focusing lens. A casing for the lens 5 and the lens fixing member 6, 1a is a hole formed in the casing 7, 8 is a motor, 8a is a shaft of the motor 8, 9 is a fixing plate whose one end is fixed to the casing 7, 10 is a hydrogen gas supply pipe, 11 is a coolant supply vibe, 12 is a coolant tank,
13 is a coolant; 14 and 15 are cross-slide tables that move the coolant tank 12 in the X-axis and Y-axis directions, respectively; 16 is a turn provided on the cross-slide table 14 to give rotational motion to the coolant [12]; table,
17.18 and 19 are motors that drive the cross slide table 14.15 and turntable 16, respectively;
20 is a workpiece; 21 is a numerical control device that collectively controls the motor 8, motors 17, 18 and 19 of the cross slide table 14, 15, and turntable 16 according to a predetermined program; 22 is a filter; 23
is a pump, and 24 is a cooling liquid supply tank.

而して、レーザ発振器1には、CO□レーザやHe−N
eレーザ等の気体レーザ、ルビーレーザやYAGレーザ
等の固体レーザその他を用い、また必要に応じてはQス
イッチ法等によってより出力を高めることができるよう
に構成されている。
Therefore, the laser oscillator 1 is equipped with a CO□ laser or a He-N laser.
It is configured to use a gas laser such as an e-laser, a solid laser such as a ruby laser or a YAG laser, and to further increase the output by a Q-switch method or the like if necessary.

反射鏡2は反射鏡固定部材3に取付けられ、レーザ発振
器1から発振されたレーザ光を反射してこれを光路変更
せしめる。な2お、上記反射鏡固定部材3はケーシング
4に固定され、図示されない冷却水供給装置から供給さ
れる冷却水によって常に冷却されるように構成されてい
る。
The reflecting mirror 2 is attached to a reflecting mirror fixing member 3, and reflects the laser light emitted from the laser oscillator 1 to change its optical path. 2. The reflecting mirror fixing member 3 is fixed to the casing 4 and is configured to be constantly cooled by cooling water supplied from a cooling water supply device (not shown).

また、レーザ発振器1に対して、反射鏡2、反射鏡固定
部材3、ケーシング4の位置は固定されている。
Furthermore, the positions of the reflecting mirror 2, the reflecting mirror fixing member 3, and the casing 4 are fixed with respect to the laser oscillator 1.

集束レンズ5は集束レンズ固定部材6によってケーシン
グ7の内壁に固定されており、反射鏡2によって反射さ
れたレーザ光を被加工体20の加工部分に集束させる。
The focusing lens 5 is fixed to the inner wall of the casing 7 by a focusing lens fixing member 6, and focuses the laser beam reflected by the reflecting mirror 2 onto the processing portion of the workpiece 20.

ケーシング7とケーシング4の接合部において、ケーシ
ング7の外径はケーシング4の内径と略等しく設定され
、ケーシング7はケーシング4に摺動自在に取付けられ
ている。また、上記ケーシング4の外周壁面の一端には
モータ8が取り付けられ、そのシャフト8aにはネジが
切られ、ケーシング7に固定された固定板9のめねじと
噛み合っている。従って、上記ケーシング7はモータ8
の回転に応じて図中Z−Z方向に移動することができる
のである。
At the joint between the casing 7 and the casing 4, the outer diameter of the casing 7 is set to be approximately equal to the inner diameter of the casing 4, and the casing 7 is slidably attached to the casing 4. Further, a motor 8 is attached to one end of the outer peripheral wall surface of the casing 4, and its shaft 8a is threaded and meshes with a female thread of a fixing plate 9 fixed to the casing 7. Therefore, the casing 7 is attached to the motor 8.
It is possible to move in the Z-Z direction in the figure according to the rotation of .

水素ガス供給管10はケーシング7の被加工体20と相
対向する部分の近傍に接続され、ここから加工用の水素
ガスがケーシング7内の空所に供給され、ケーシング7
の先端に形成された孔7aから被加工体20の加工部分
に向かって吹き付けられる。
The hydrogen gas supply pipe 10 is connected near the part of the casing 7 that faces the workpiece 20, from which hydrogen gas for processing is supplied to the space inside the casing 7, and
It is sprayed toward the processing portion of the workpiece 20 from the hole 7a formed at the tip.

なお、上記ケーシング7をz−Z方向に移動させるモー
タ8及びクロススライドテーブル14.15、ターンテ
ーブル16をそれぞれ駆動させるモータ17.18及び
19は予め定められたブロダラムに従って数値制御装置
21によって一括制御されるように構成されている。
The motor 8 that moves the casing 7 in the Z-Z direction and the motors 17, 18 and 19 that drive the cross slide table 14, 15 and turntable 16, respectively, are collectively controlled by the numerical controller 21 according to a predetermined brodalum. is configured to be

而して、本発明にかかる水素原子加工装置によって加工
が行われる場合には、冷却液13が冷却液供給タンク2
4からポンプ23により、濾過器22及び冷却液供給管
11を介してゆっくりと、好ましくは液擾乱が起らない
ように冷却液槽12に送り込まれ、送り込まれた上記冷
却液13は冷却液槽12内を静に流動し、上記冷却液槽
12内に納められた被加工体20の表面全体を充分に冷
却する。
When processing is performed by the hydrogen atom processing apparatus according to the present invention, the coolant 13 is supplied to the coolant supply tank 2.
4, the coolant 13 is slowly fed into the coolant tank 12 by the pump 23 via the filter 22 and the coolant supply pipe 11, preferably without causing any liquid disturbance. The cooling liquid flows quietly in the cooling liquid tank 12 and sufficiently cools the entire surface of the workpiece 20 housed in the cooling liquid tank 12.

然る後、レーザ発振器1からレーザ光が発射され、この
発射されたレーザ光は集束レンズ5によって充分に集束
されて被加工体20の加工すべき部分に照射される。こ
れと同時に、上記被加工体20の加工部分に水素ガス供
給管10からケーシング7を介してケーシング7の孔7
aから水素ガスが供給され、加工部分は、前記水素ガス
喰射やレーザ光照射点の被加工体部分の高温等により、
小さい半径の円形部分が、冷却液13が周りに除去され
た被加工体20の表面露出部となり、該露出部に於て加
工が行われる。該円形露出部分は周りから冷却液13に
よって冷却されるため、周りに対する過剰加工が防止さ
れる。
Thereafter, a laser beam is emitted from the laser oscillator 1, and the emitted laser beam is sufficiently focused by the focusing lens 5 and irradiated onto the part of the workpiece 20 to be processed. At the same time, the hydrogen gas supply pipe 10 is passed through the casing 7 to the hole 7 of the casing 7 to the processing part of the workpiece 20.
Hydrogen gas is supplied from a, and the processed part is heated due to the hydrogen gas ingestion and the high temperature of the part of the workpiece at the laser beam irradiation point.
The circular portion with a small radius becomes an exposed surface portion of the workpiece 20 from which the cooling liquid 13 has been removed, and processing is performed in this exposed portion. Since the circular exposed portion is cooled by the cooling liquid 13 from the surrounding area, excessive machining of the surrounding area is prevented.

而して、ゲージング7の孔7aから供給さた水素ガスの
分子は集束されたレーザ光によって加熱され、これによ
り上記水素ガスの分子はイオン化されることになる。然
しなから、このイオン化された状態は不安定な状態であ
る為、このイオン化された水素ガスの分子は瞬時に元の
分子の状態に戻ろうとして再結合するのであるが、この
イオン化された水素ガスが再結合する際には高いエネル
ギを放出するので、この放出エネルギの熱によって被加
工体20の加工すべき部分に加工を施すことができるの
である。
The molecules of the hydrogen gas supplied from the hole 7a of the gauging 7 are heated by the focused laser beam, whereby the molecules of the hydrogen gas are ionized. However, since this ionized state is unstable, the molecules of this ionized hydrogen gas instantly try to return to their original molecular state and recombine. Since high energy is released when the gases are recombined, the portion of the workpiece 20 to be processed can be processed using the heat of this released energy.

本発明にかかる水素原子加工装置においては、上記被加
工体20′は冷却液槽12内に収容され、冷却液13に
よって充分に冷却されているので、被加工体20のレー
ザ光によって照射された部分のみの水素ガスが加熱され
て、上記再結合時の熱エネルギが被加工体20の加工部
分に供給されて被加工体20の所望の部分のみを短時間
に、且つ確実に加工することができるのである。
In the hydrogen atom processing apparatus according to the present invention, the workpiece 20' is housed in the cooling liquid tank 12 and is sufficiently cooled by the cooling liquid 13, so that the workpiece 20' is irradiated with the laser beam. The hydrogen gas in only the part is heated, and the thermal energy at the time of recombination is supplied to the processing part of the workpiece 20, so that only the desired part of the workpiece 20 can be processed reliably in a short time. It can be done.

特に、200騙のC02レーザを使用し、1Qcc /
 minの水素ガスを供給して加工を行った場合には、
被加工体面の加工面荒さを1oμRmax %加工速度
を0.23g / minとすることができた。なお、
従来一般のレーザ加工装置を用いて加工を行った場合に
は、被加工体面の加工面荒さは12μRmaに、加工速
度は0.06g / minであった。
In particular, using a C02 laser of 200 degrees, 1Qcc/
When processing is performed by supplying min. of hydrogen gas,
The machined surface roughness of the workpiece surface could be set to 1oμRmax% and the processing speed to 0.23 g/min. In addition,
When machining was performed using conventional laser machining equipment, the roughness of the surface of the workpiece was 12 μRma, and the machining speed was 0.06 g/min.

本発明は叙上の如(構成されるので、本発明にかかる水
素原子加工装置によるときには、被加工体の加工すべき
部分又は被加工体の所望の部分のみを確実に且つ短時間
に加工することができるのである。
Since the present invention is configured as described above, when using the hydrogen atom processing apparatus according to the present invention, only the part of the workpiece to be processed or the desired part of the workpiece can be processed reliably and in a short time. It is possible.

−なお、本発明は叙上の実施例に限定されるものではな
い。即ち、例えば、本実施例においてはケーシングの孔
から水素ガスを吹き出すように構成したが、ケーシング
の側壁面に水素ガス供給装置を取り付けるようにしても
よい。その他レーザ光の集束方法、冷却液の供給方法及
び各部の制御の仕方等は本発明の目的の範囲内で自由に
設計変更できるものであって、本発明それらの総てを包
摂するものである。
-It should be noted that the present invention is not limited to the embodiments described above. That is, for example, in this embodiment, hydrogen gas is blown out from the hole in the casing, but a hydrogen gas supply device may be attached to the side wall surface of the casing. Other aspects such as the method of focusing the laser beam, the method of supplying the cooling liquid, and the method of controlling each part can be freely changed within the scope of the purpose of the present invention, and the present invention encompasses all of them. .

【図面の簡単な説明】[Brief explanation of the drawing]

図面、は本発明にかかる水素原子加工装置の一実施例を
示す説明図である。 1−=−−−−−−−−−−−−−−−・−レーザ発振
器2−−−−−−−−−・−−一一−−−−−−レーザ
光の反射鏡3−−−−−−−−−−−−−−−−−−−
一反射鏡固定部材4〜−−−−−−−・−〜−−−−−
−−−−−反射鏡2及び反射鏡固定部材3のケーシング 5−−−−−−−−−、−−−−−−−−一集束レンズ
6−一−−−−−−−−−−−−−−−−−−・集束レ
ンズ固定部材7−−−−−−−−−−−−−−−一一−
−−−−レンズ5及びレンズ固定部材6のケーシング 8−−−−−−−−−−・−・−−−−一一−モータ8
 a −−−−−−−−−−−−−−−−−−−シャフ
ト9−−−−−−−−−−−−−−、−−−−一固定板
i o −−−−−−−−−−−−−−−−−−−−水
素ガス供給管i 1−−−−−−−−−−−−一冷却液
供給バイブ12−−−−−−−−−−−−−−〜−−−
冷却液槽i 3−−−−−一−−冷却液 14.15−−−−−−−−−−クロススラ・fトチ−
プルIG−−−−−・−ターンテーブル 20−−−一〜=−−−−−−−−−−−−−被加工体
21−− −−一数値制御装置 22−−−・−一一一−−−−−−−・フィルタ23−
−−−−−・−−一−−−−ポンプ24−−−−−一−
−−−−−一冷却液供給タンク特d′F出願人 株式会
社 井上ジャパックス研究所代理人(7524)最上正
太部
The drawings are explanatory diagrams showing one embodiment of a hydrogen atom processing apparatus according to the present invention. 1−=−−−−−−−−−−−−−−−−・−Laser oscillator 2−−−−−−−−−・−−11−−−−−−Laser light reflecting mirror 3− −−−−−−−−−−−−−−−−−−
1.Reflector fixing member 4~----------・---------
--------Casing 5 of the reflecting mirror 2 and the reflecting mirror fixing member 3-----------One focusing lens 6-------- −−−−−−−−−・Focusing lens fixing member 7−−−−−−−−−−−−−−−1−
--- Casing 8 of lens 5 and lens fixing member 6 -----------------11-Motor 8
a -------------------Shaft 9---------------, ----- One fixed plate i o ----- -------------------Hydrogen gas supply pipe i 1--------------- Cooling liquid supply vibe 12----- −−−−〜−−−
Cooling liquid tank i 3-----1--Cooling liquid 14.15--------Cross slurry/f tochie
Pull IG--------Turntable 20-----1~=---------------Workpiece 21-----1 Numerical controller 22-----1 11------- Filter 23-
-------・--1-----Pump 24--
------1 Coolant Supply Tank Special d'F Applicant Inoue Japax Research Institute Agent (7524) Shotabe Mogami

Claims (1)

【特許請求の範囲】 1)レーザ発振器から発振されたレーザ光を集束レンズ
によって集束し、被加工体に照射させると共に、水素ガ
スを上記被加工体面に供給゛介在させて加工を行う水素
原子加工装置に於て、上記波加工体表面に冷却液を供給
する装置を設けたことをe徴とする上記の水素原子加工
装置。 2)上記冷却液が上記被加工体面を一定速度で流動する
特許請求の範囲f81項記載の水素原子加工装置。 3)上記冷却液が水である特許請求の範囲第1項又は第
2項記載の水素原子加工装置。
[Claims] 1) Hydrogen atom processing in which a laser beam oscillated from a laser oscillator is focused by a focusing lens and irradiated onto a workpiece, and hydrogen gas is supplied to the surface of the workpiece to perform processing. The hydrogen atom processing apparatus described above, characterized in that the apparatus is provided with a device for supplying a cooling liquid to the surface of the corrugated body. 2) The hydrogen atom processing apparatus according to claim f81, wherein the cooling liquid flows at a constant speed on the surface of the workpiece. 3) The hydrogen atom processing apparatus according to claim 1 or 2, wherein the cooling liquid is water.
JP58038918A 1983-03-11 1983-03-11 Hydrogen atom working device Pending JPS59166390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58038918A JPS59166390A (en) 1983-03-11 1983-03-11 Hydrogen atom working device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58038918A JPS59166390A (en) 1983-03-11 1983-03-11 Hydrogen atom working device

Publications (1)

Publication Number Publication Date
JPS59166390A true JPS59166390A (en) 1984-09-19

Family

ID=12538589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58038918A Pending JPS59166390A (en) 1983-03-11 1983-03-11 Hydrogen atom working device

Country Status (1)

Country Link
JP (1) JPS59166390A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206587A (en) * 1985-03-08 1986-09-12 Toshiba Corp Laser beam processing method
CN102248294A (en) * 2011-07-08 2011-11-23 厦门大学 Array type water waveguide laser processing device
CN102248293A (en) * 2011-07-08 2011-11-23 厦门大学 Rotary adjustable water waveguide laser processing device
CN106271060A (en) * 2016-08-31 2017-01-04 西安优耐特容器制造有限公司 A kind of thin-walled tantalum pipe and the method for laser welding of thin-walled iron-nickel alloy pipe
CN116329769A (en) * 2023-05-29 2023-06-27 上海凯来仪器有限公司 Laser ablation laser ionization device, method and mass spectrometer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206587A (en) * 1985-03-08 1986-09-12 Toshiba Corp Laser beam processing method
CN102248294A (en) * 2011-07-08 2011-11-23 厦门大学 Array type water waveguide laser processing device
CN102248293A (en) * 2011-07-08 2011-11-23 厦门大学 Rotary adjustable water waveguide laser processing device
CN106271060A (en) * 2016-08-31 2017-01-04 西安优耐特容器制造有限公司 A kind of thin-walled tantalum pipe and the method for laser welding of thin-walled iron-nickel alloy pipe
CN106271060B (en) * 2016-08-31 2018-04-20 西安优耐特容器制造有限公司 A kind of method for laser welding of thin-walled tantalum pipe and thin-walled iron-nickel alloy pipe
CN116329769A (en) * 2023-05-29 2023-06-27 上海凯来仪器有限公司 Laser ablation laser ionization device, method and mass spectrometer
CN116329769B (en) * 2023-05-29 2023-08-04 上海凯来仪器有限公司 Laser ablation laser ionization device, method and mass spectrometer

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