JPS59164237U - Vapor deposition equipment - Google Patents

Vapor deposition equipment

Info

Publication number
JPS59164237U
JPS59164237U JP5886283U JP5886283U JPS59164237U JP S59164237 U JPS59164237 U JP S59164237U JP 5886283 U JP5886283 U JP 5886283U JP 5886283 U JP5886283 U JP 5886283U JP S59164237 U JPS59164237 U JP S59164237U
Authority
JP
Japan
Prior art keywords
container
vapor deposition
metal silicide
substrate
deposition equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5886283U
Other languages
Japanese (ja)
Inventor
佳宏 森本
Original Assignee
三洋電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三洋電機株式会社 filed Critical 三洋電機株式会社
Priority to JP5886283U priority Critical patent/JPS59164237U/en
Publication of JPS59164237U publication Critical patent/JPS59164237U/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図は本考案蒸着装置の一実施例を示すブロック図である
。The figure is a block diagram showing an embodiment of the vapor deposition apparatus of the present invention.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 密閉可能な容器と、密閉時にこの容器内を減圧する減圧
機構と、から成り、上記容器内を上記減圧機構で減圧し
、この容器内で容器内に配置された基板上に金属シリサ
イド膜を蒸着形成する蒸着装置において、上記容器内に
、１基板を載置する基板載置部と、金属シリサイドをイ
オン化せしめるイオン化手段と、このイオン化された金
属シリサイドを加速し、上記基板載置部へ導く加速手段
と、を設けたことを特徴とする蒸着装置。It consists of a sealable container and a pressure reduction mechanism that reduces the pressure inside the container when the container is sealed, the pressure reduction mechanism reduces the pressure inside the container, and a metal silicide film is deposited on a substrate placed in the container within the container. In the vapor deposition apparatus for forming, in the container, there is provided a substrate mounting section for placing one substrate, an ionization means for ionizing metal silicide, and an acceleration for accelerating the ionized metal silicide and guiding it to the substrate mounting section. A vapor deposition apparatus comprising means.
JP5886283U 1983-04-19 1983-04-19 Vapor deposition equipment Pending JPS59164237U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5886283U JPS59164237U (en) 1983-04-19 1983-04-19 Vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5886283U JPS59164237U (en) 1983-04-19 1983-04-19 Vapor deposition equipment

Publications (1)

Publication Number Publication Date
JPS59164237U true JPS59164237U (en) 1984-11-02

Family

ID=30189126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5886283U Pending JPS59164237U (en) 1983-04-19 1983-04-19 Vapor deposition equipment

Country Status (1)

Country Link
JP (1) JPS59164237U (en)

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