JPS59163890A - Method of partially plating board wiring - Google Patents

Method of partially plating board wiring

Info

Publication number
JPS59163890A
JPS59163890A JP3766683A JP3766683A JPS59163890A JP S59163890 A JPS59163890 A JP S59163890A JP 3766683 A JP3766683 A JP 3766683A JP 3766683 A JP3766683 A JP 3766683A JP S59163890 A JPS59163890 A JP S59163890A
Authority
JP
Japan
Prior art keywords
wiring
plating
layer
substrate
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3766683A
Other languages
Japanese (ja)
Inventor
綱島 「えい」一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3766683A priority Critical patent/JPS59163890A/en
Publication of JPS59163890A publication Critical patent/JPS59163890A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は基板」−に形成された配線に局部的なめっき層
を電解めっき法で形成する方法、すなわち、基板配線へ
の部分めっき方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for forming a local plating layer on wiring formed on a substrate by electrolytic plating, that is, a method for partial plating on wiring on a substrate.

従来例の構成とその問題点 絶縁基板」二に配線層を設け、この配線層の一部にめっ
き層を選択的に形成する方法は、従来から、コネクタへ
の接続端子部あるいはスルーホール孔壁部へのめっき層
形成過程で広く利用されている。
Conventional structure and its problems A method of providing a wiring layer on an insulated substrate and selectively forming a plating layer on a part of this wiring layer has traditionally been applied to the connection terminal part to the connector or the through-hole hole wall. It is widely used in the process of forming plating layers on parts.

寸だ、めっきの方法も、製造管理面からみて安定性のよ
い電解めっき法がしばしば用いられる。
As for the plating method, electrolytic plating is often used because of its good stability from the viewpoint of manufacturing control.

電解めっき法で基板上配線に部分めっき層を形成すると
きの課題は、選択形成のマスクと配線への電極接続技術
とである。すなわち、基板上の配線の一部を露出させ、
他部を適当な被覆材によっておおい、その一部のみを電
解めっき浴に接触させるには、その被覆材を確実、安定
に付着させるとともに、その着脱工程も簡単であること
が空寸れる。一方、配線層は、通常、基板上で互いに分
離されているから、各配線に確実に電気接続され、かつ
、その接続方式の簡素なものが要求される。
The challenges when forming a partial plating layer on wiring on a substrate using electrolytic plating are the selective formation mask and electrode connection technology to the wiring. In other words, part of the wiring on the board is exposed,
In order to cover the other parts with a suitable coating material and to make only a part of the coating come into contact with the electrolytic plating bath, it is essential that the coating material be adhered reliably and stably and that the process of attaching and removing it be simple. On the other hand, since the wiring layers are usually separated from each other on the substrate, a reliable electrical connection to each wiring and a simple connection method are required.

発明の目的 本発明は上述の電解めっき法における課題をことごとく
解決し得るとともに、簡便で、耐久性の3ベーー゛ よい基板配線への部分めっき方法を提供するものである
OBJECTS OF THE INVENTION The present invention provides a partial plating method for substrate wiring that can solve all of the problems in the electrolytic plating method described above, is simple, and has three bases of durability.

発明の構成 本発明に12、要約するに、基板上の配線の一部を露出
させ、他部を導電性ゴムで圧着被覆し、かつ、前記導電
+1ゴムの露出表面部を可撓性絶縁層で被覆して、前記
配線の一部に電解めっき層を被設する工程をそなえた基
板配線への部分めっき方法であり、これに」:す、基板
配線への選択的めっき層形成が簡単、容易に実施できる
12. In summary, a part of the wiring on the board is exposed, the other part is covered with conductive rubber, and the exposed surface part of the conductive +1 rubber is covered with a flexible insulating layer. This is a partial plating method for board wiring, which includes a step of covering a part of the wiring with an electrolytic plating layer. Easy to implement.

実施例の説明 第1図は本発明実施例に用いる基板配線の要部平面図で
あり、樹脂絶縁層の被着されたアルミニウム板を基板1
とし、この樹脂絶縁層上に厚さ約3571mの銅箔から
所定パターンに加工された配線層2を設け/ζものであ
る。そして、各配線層の幅広端部3,4が集中する領域
6を露出させて、この幅広端部3,4にのみ部分めっき
層を形成する方法について詳しくのべると、第2図に電
解めっき浴の系を断面図状で示した」:うに、前記基板
1の−γτ(i領域6の面を露出させ、他の面には導電
性ゴノ、シート6を正着させて、こtlをめっき液7内
で対向陽極8と並置する。前記導電性ゴムシー1−6 
if:前記基板1の一部領域5にあプζる部分に開口9
を設けると共に、この開口壁面および対向電極8と向き
合う表面全域を可撓性絶縁層10でおおっている。そこ
で、この導電性ゴムシート6を陰極として電解めっき過
程を遂行すると、配線層の露出部にめっき層11が形成
される。なお、系中の容器12はめっき浴槽である。
DESCRIPTION OF THE EMBODIMENTS FIG. 1 is a plan view of the main parts of the board wiring used in the embodiments of the present invention.
On this resin insulating layer, a wiring layer 2 made of copper foil with a thickness of about 3571 m and processed into a predetermined pattern is provided. In detail, the method of exposing the region 6 where the wide end portions 3 and 4 of each wiring layer are concentrated and forming a partial plating layer only on the wide end portions 3 and 4 is shown in Fig. 2. The system is shown in a cross-sectional diagram.The surface of the -γτ (i-region 6) of the substrate 1 is exposed, and the conductive gongs and sheet 6 are properly attached to the other surface. juxtaposed with the opposing anode 8 in the plating solution 7.The conductive rubber sheath 1-6
if: An opening 9 is formed in a portion of the substrate 1 that is located in a portion 5 of the substrate 1.
The opening wall surface and the entire surface facing the counter electrode 8 are covered with a flexible insulating layer 10. Therefore, when an electrolytic plating process is performed using the conductive rubber sheet 6 as a cathode, a plating layer 11 is formed on the exposed portion of the wiring layer. Note that the container 12 in the system is a plating bath.

電解めっき過程に関して概括的に言えば、めっき層金属
は、金、銀、ロジウム、白金などの貴金属、ニッケル、
亜鉛、錫あるいは錫・鉛合金が利用され、めっき浴は前
記金属のシアン系、硫酸系溶液が用いられ、さらに、条
件として、70℃以下、電流密度2〜10A/d771
″であれば、概ね、良好なめっき層が得られる。めっき
層の厚さは、用途によっても異なるが、半導体基板接着
用あるいはコネクタ端子用で、金;0.25〜2.6μ
m。
Generally speaking regarding the electrolytic plating process, the plating layer metals include precious metals such as gold, silver, rhodium, and platinum, nickel,
Zinc, tin, or a tin-lead alloy is used, and the plating bath is a cyanide-based or sulfuric acid-based solution of the metal, and the conditions are: 70°C or less, and a current density of 2 to 10 A/d771.
'', generally a good plating layer can be obtained. The thickness of the plating layer varies depending on the application, but it is for adhesion of semiconductor substrates or connector terminals, and gold: 0.25 to 2.6 μm.
m.

銀:2.5〜5μm、ニッケル:3〜1011mが5べ
−2・ 適尚である。
Silver: 2.5 to 5 μm, nickel: 3 to 1011 m is suitable for 5 b-2.

導電性ゴノ、シート6は、例えば厚さ5陥の市販品を用
いることができ、一般的には、シリコーンゴム中に金属
粉、金属繊維を混合して、電気抵抗10Ω/[1〜0.
1Ω/口になした製品から自在に成形して用いる。また
、この導電性ゴ、ムシ−トロの表面をおおう可撓性絶縁
層10には、芳香族アミン系硬化剤添加のエポキシ系樹
脂を用いることができる。この樹脂系は、たとえば、樹
脂主剤に対して硬化剤の添加量をts is Phr 
(ただし、phr−100/200・アミン当量)にな
すと、150℃。
As the conductive gonograph and sheet 6, for example, a commercially available product having a thickness of 5 recesses can be used.Generally, silicone rubber is mixed with metal powder and metal fibers to give an electrical resistance of 10Ω/[1 to 0 ..
1Ω/Mold the product into any shape you like and use it. Furthermore, for the flexible insulating layer 10 covering the surface of the conductive rubber, an epoxy resin containing an aromatic amine curing agent can be used. For this resin system, for example, the amount of curing agent added to the resin base resin is ts is Phr.
(However, phr-100/200・amine equivalent) is 150°C.

30分の硬化条件で導電性ゴムシート6との接着性、可
撓性が適合し、めっき液に対しても十分な耐液性がある
。なお、耐液性の一例ではpH12〜13.70℃のシ
アン化金(または銀)めっき浴に対して、1000時間
以上の耐久性が見られた。
Adhesion and flexibility with the conductive rubber sheet 6 are suitable under curing conditions of 30 minutes, and there is sufficient liquid resistance against plating solution. In addition, as an example of liquid resistance, durability for 1000 hours or more was observed in a cyanide gold (or silver) plating bath having a pH of 12 to 13.70°C.

さらに、被覆樹脂としては、ポリ塩化ビニール系、紫外
線照射硬化アクリル樹脂、脂肪族アミン硬化剤系エポキ
シ樹脂、酸無水物硬化剤系メラミン樹脂、あるいは酸無
水物硬化剤系エポキシ樹脂々どが、!1−1″定条件下
で使用できることもある。
Furthermore, as the coating resin, polyvinyl chloride type, ultraviolet radiation curing acrylic resin, aliphatic amine curing agent type epoxy resin, acid anhydride curing agent type melamine resin, acid anhydride curing agent type epoxy resin, etc.! 1-1'' may be used under constant conditions.

第3図は、めっき浴系内において、導電性ゴトシート6
が配線層2に対して、好1〜い密着性を持つように、樹
脂硬板13を保持具のボルト14およびナツト15で基
板1に締着させたものの断面図である。導電性ゴムシー
ト6は、このような締め付は圧着によって、接触抵抗が
1/2〜1/100のオーダで減少し、接触性が著しく
向」ニする。これにより、めっき層の形成条件の管理が
一段と容易になり、品質の向上がみられた。
Figure 3 shows a conductive goto sheet 6 in the plating bath system.
2 is a sectional view of a resin hard plate 13 fastened to a substrate 1 with bolts 14 and nuts 15 of a holder so that the resin hard plate 13 has good adhesion to the wiring layer 2. FIG. The contact resistance of the conductive rubber sheet 6 is reduced by 1/2 to 1/100 on the order of 1/2 to 1/100 by such tightening and crimping, and the contact properties are significantly improved. This made it easier to manage the conditions for forming the plating layer, and the quality improved.

発明の効果 本発明によれば、導電性ゴムを配線層に圧着することに
よって、配線層への局部的めっき層形成が可能であり、
製造性が顕著に向上した。捷た、本発明の方法は、簡便
、耐久性の面からも工業性にすぐれ、実用性の高いもの
である。
Effects of the Invention According to the present invention, by pressing conductive rubber onto the wiring layer, it is possible to form a plating layer locally on the wiring layer.
Manufacturability has been significantly improved. The method of the present invention is excellent in industrial efficiency in terms of simplicity and durability, and is highly practical.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明実施例に用いた基板配線の要部平面図、
第2図は本発明実施例のめっき浴系断面図、第3図は他
の実施例のめっき浴系断面図であ了ベーS′ る1、 1・・・・・・基鈑、2・・・・・配線層、3,4・・
・・・・配線層幅広端部、6・・・・・・露出面領域、
6・・・・・・導電性ゴムシート、了・・・・・めっき
液、8・・・・・・陽極、9・・・・・・開口、10・
・・・・可撓性絶縁層、11・・・・・めっき層、12
・・・・・・めっき浴槽。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 第2図
FIG. 1 is a plan view of the main parts of the board wiring used in the embodiment of the present invention,
FIG. 2 is a sectional view of the plating bath system of an embodiment of the present invention, and FIG. 3 is a sectional view of the plating bath system of another embodiment. ...Wiring layer, 3, 4...
. . . Wiring layer wide end portion, 6 . . . Exposed surface area,
6... Conductive rubber sheet, Finish... Plating solution, 8... Anode, 9... Opening, 10.
... Flexible insulating layer, 11 ... Plating layer, 12
・・・・・・Plated bathtub. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2

Claims (3)

【特許請求の範囲】[Claims] (1)基板上の配線の一部を露出させ、他部を導電(’
lゴムで圧着被覆し、かつ、前記槽重(’lゴムの露出
表面部を可撓性絶縁層で被覆して、前記配線の一部に電
解めっき層を被設する工程をそなえた基板配線への部分
めっき方法。
(1) Part of the wiring on the board is exposed and the other part is conductive ('
A substrate wiring comprising a step of crimping and covering the wiring with rubber, covering the exposed surface of the rubber with a flexible insulating layer, and covering a part of the wiring with an electrolytic plating layer. partial plating method to.
(2)可撓性絶縁層に芳香族アミン系硬化剤添加のエボ
ギシ系樹脂を用いる特許請求の範囲第1項に記載の基板
配線への部分めっき方法。
(2) The partial plating method for substrate wiring according to claim 1, in which the flexible insulating layer is made of an epoxy resin containing an aromatic amine curing agent.
(3)導電性ゴムにシリコン系ゴムを用いる特許請求の
範囲第1項に記載の基板配線への部分めっき方法。
(3) The partial plating method for substrate wiring according to claim 1, in which silicone rubber is used as the conductive rubber.
JP3766683A 1983-03-08 1983-03-08 Method of partially plating board wiring Pending JPS59163890A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3766683A JPS59163890A (en) 1983-03-08 1983-03-08 Method of partially plating board wiring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3766683A JPS59163890A (en) 1983-03-08 1983-03-08 Method of partially plating board wiring

Publications (1)

Publication Number Publication Date
JPS59163890A true JPS59163890A (en) 1984-09-14

Family

ID=12503950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3766683A Pending JPS59163890A (en) 1983-03-08 1983-03-08 Method of partially plating board wiring

Country Status (1)

Country Link
JP (1) JPS59163890A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6181016U (en) * 1984-11-02 1986-05-29

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6181016U (en) * 1984-11-02 1986-05-29
JPH0356686Y2 (en) * 1984-11-02 1991-12-20

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