JPS5916333B2 - Kaitenki Rokubaitaino Master - Banno Seizouhouhou - Google Patents
Kaitenki Rokubaitaino Master - Banno SeizouhouhouInfo
- Publication number
- JPS5916333B2 JPS5916333B2 JP15438975A JP15438975A JPS5916333B2 JP S5916333 B2 JPS5916333 B2 JP S5916333B2 JP 15438975 A JP15438975 A JP 15438975A JP 15438975 A JP15438975 A JP 15438975A JP S5916333 B2 JPS5916333 B2 JP S5916333B2
- Authority
- JP
- Japan
- Prior art keywords
- record carrier
- recording
- layer
- plating
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 17
- 238000009713 electroplating Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 238000007772 electroless plating Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
Description
【発明の詳細な説明】
映像信号などの情報信号が円板状の記録媒体に: 例え
ばレーザー光により光学的に記録され、これから光学的
に再生されるようにされたものがある。DETAILED DESCRIPTION OF THE INVENTION Information signals such as video signals are recorded on a disc-shaped recording medium: For example, there are disc-shaped recording media that are optically recorded using laser light and then optically reproduced.
本発明は、このような円板状の記録媒体のマスター板の
製造方法に関する。この種の記録媒体のマスター板は従
来次のよう0 にして作製されていた。The present invention relates to a method for manufacturing a master plate for such a disc-shaped recording medium. The master plate for this type of recording medium has conventionally been manufactured at zero as follows.
即ち、第1図に示すように、まず例えばガラスからなる
円板状の絶縁基板1の表面に記録層となるフォトレジス
ト層2を被着形成し(同図A)、次いでこのフォトレジ
スト層2をレーザー光によ5 り露光し、現像処理する
ことにより、フォトレジスト層2に映像信号などの情報
信号を記録し(同図B)、次いで無電解メッキを施すこ
とによつて表面に導電層4を被着形成して記録担体3を
形成し(同図C)、次にこの記録担体3に電解メッキ0
を施してメッキ層5を形成する(同図D)。That is, as shown in FIG. 1, first, a photoresist layer 2 serving as a recording layer is deposited on the surface of a disc-shaped insulating substrate 1 made of glass, for example (FIG. 1A), and then this photoresist layer 2 is By exposing the photoresist layer 2 to laser light and developing it, information signals such as video signals are recorded on the photoresist layer 2 (see figure B), and then electroless plating is applied to form a conductive layer on the surface. 4 is deposited to form the record carrier 3 (FIG. C), and then this record carrier 3 is electrolytically plated with 0
to form a plating layer 5 (D in the same figure).
そして導電層4及びメッキ層5を絶縁基板1より剥がし
、導電層4に付着するフォトレジストを洗い流してマス
ター板6を作る。ところでこのような製造方法において
は、無電’5 解メッキによる導電層4はピンホールの
発生やメッキ応力によるはがれを防止するためできるだ
け薄いことが望ましい。Then, the conductive layer 4 and the plating layer 5 are peeled off from the insulating substrate 1, and the photoresist adhering to the conductive layer 4 is washed away to form a master plate 6. By the way, in such a manufacturing method, it is desirable that the conductive layer 4 formed by electroless plating is as thin as possible in order to prevent the formation of pinholes and peeling off due to plating stress.
しカルながら導電層4が薄いときには電解メッキをする
場合にこれに電流を流すときの電気抵抗が大きくなり、
導電層4の記j0録層2を覆う部分の各部が等電位にな
らず、電圧降下した部分には電解メッキがされにくくな
り、メッキ層5が形成されずに導電層4が電解メッキ液
によつて溶かされてしまう。また、記録担体3を陽極と
対向させて電解メツ■5 キをする際、第1図D及びE
に示すように記録担体3の外周端部の角の部分への電流
集中のためこの部分にはメッキ層5が他の部分より厚く
盛り上がつて形成されてしまう。However, when the conductive layer 4 is thin, the electrical resistance increases when a current is passed through it during electrolytic plating.
Each part of the conductive layer 4 covering the recording layer 2 does not have an equal potential, and it becomes difficult to electrolytically plate the parts where the voltage has dropped, and the conductive layer 4 is exposed to the electrolytic plating solution without forming the plating layer 5. It will twist and melt. Also, when performing electrolytic cleaning with the record carrier 3 facing the anode,
As shown in FIG. 2, the current is concentrated at the corner portion of the outer peripheral end of the recording carrier 3, so that the plating layer 5 is formed thicker in this portion than in other portions.
従つて記録担体3の半径方向に均一な厚みのマスター板
を得るためには第1図Fに示すように外周部分を切り取
らなければならず、基板1の大きさに対し、これよりか
なり小さい半径のマスター板しか得られないことになり
効率が非常に悪い。本発明は、上述の点に鑑みて、特に
導電層4が薄い状態でも上述のような欠点を生ぜず、し
かも絶縁基板1とほぼ同じ大きさのマスター板が得られ
るようにしたマスター板の製造方法を提供するものであ
る。Therefore, in order to obtain a master plate having a uniform thickness in the radial direction of the record carrier 3, it is necessary to cut out the outer peripheral portion as shown in FIG. This means that only the master board can be obtained, which is extremely inefficient. In view of the above-mentioned points, the present invention provides a method for manufacturing a master board that does not cause the above-mentioned drawbacks even when the conductive layer 4 is thin, and that also allows a master board of approximately the same size as the insulating substrate 1 to be obtained. The present invention provides a method.
以下、本発明方法を第2図について説明しよう。The method of the invention will now be explained with reference to FIG.
本発明は、記録担体3を形成するまでの工程は従来と全
く同様で、電解メツキによつてメツキ層5を形成すると
きの工程に特徴がある。即ち、本発明においては、第2
図に示すように、例えば金属よりなり、環状突部7aが
円板の一面側に形成された形状の補正台7を用意し、こ
の補正台7内に記録担体3を収納する。In the present invention, the steps up to the formation of the recording carrier 3 are completely the same as those of the conventional method, and the present invention is characterized by the step of forming the plating layer 5 by electrolytic plating. That is, in the present invention, the second
As shown in the figure, a correction stand 7 made of, for example, metal and having a shape in which an annular protrusion 7a is formed on one side of a disk is prepared, and the record carrier 3 is housed in this correction stand 7.
そして、記録担体3の中心部には貫通孔8を形成し、一
方補正台7の中心位置には母螺9を形成し、記録担体3
の貫通孔8を通して導電性の螺子10を補正台7の母螺
9に螺合させることにより、記録担体3を補正台7に対
して固定するとともに、記録担体3の記録層2側の面と
は反対側の面を補正台7に対して密着させる。なお、1
2は導電性のスペーサである。この場合、補正台7の環
状突部7aは、その上面と、記録担体3の記録層2側の
表面とが同一の高さになるように、その高さHを選ぶ。A through hole 8 is formed in the center of the record carrier 3, and a thread 9 is formed in the center of the correction base 7.
By screwing the conductive screw 10 into the main screw 9 of the correction table 7 through the through hole 8, the record carrier 3 is fixed to the correction table 7, and the surface of the record carrier 3 on the recording layer 2 side is fixed. The opposite surface is brought into close contact with the correction table 7. In addition, 1
2 is a conductive spacer. In this case, the height H of the annular protrusion 7a of the correction table 7 is selected so that its upper surface and the surface of the recording layer 2 side of the record carrier 3 are at the same height.
また補正台7の中心位置から環状突部7aの内側の壁ま
での長さLは基板1の半径と導電層4の厚みとの和Rよ
りわずかに大きくし、従つて、補正台7の環状突部7a
の内側の壁と記録担体3の外周との間に空隙11が形成
されるようにする。そして、このように記録担体3を補
正台7に収納したものを、電解メツキ液中に浸してこれ
を陰極とし、記録担体3の記録層2側の面を陽極と対向
させて補正台7を回転させながら電解メツキを行なう。Further, the length L from the center position of the correction table 7 to the inner wall of the annular protrusion 7a is made slightly larger than the sum R of the radius of the substrate 1 and the thickness of the conductive layer 4. Projection 7a
A gap 11 is formed between the inner wall of the record carrier 3 and the outer periphery of the record carrier 3. Then, the record carrier 3 stored in the correction table 7 is immersed in an electrolytic plating solution, which is used as a cathode, and the correction table 7 is placed with the surface of the record carrier 3 facing the recording layer 2 facing the anode. Perform electrolytic plating while rotating.
このようにすれば、メツキ電流1は、記録担体3の導電
層4の記録層2を覆う部分一導電層4の基板1の外周面
を覆う部分一導電層4の記録層2を覆う部分とは反対側
の部分一補正台7と流れ(経路0))、しかも、このと
き螺子10が導電体であるのでメツキ電流は記録担体3
の導電層4の記録層2を覆う部分一螺子10一補正台7
と流れて(経路杉))、メツキ電流は広い面積に拡散す
るので、導電層4の電位はいたるところで等しくなり、
記録担体3の記録層2側の面上にメツキ層5が均一に形
成される。In this way, the plating current 1 is applied to the part of the conductive layer 4 of the recording carrier 3 that covers the recording layer 2; the part of the conductive layer 4 that covers the outer peripheral surface of the substrate 1; flows with the correction table 7 on the opposite side (path 0), and since the screw 10 is a conductor at this time, the plating current flows into the recording carrier 3.
A part covering the recording layer 2 of the conductive layer 4, a screw 10, and a correction table 7.
The plating current spreads over a wide area, so the potential of the conductive layer 4 becomes equal everywhere,
A plating layer 5 is uniformly formed on the surface of the recording carrier 3 on the recording layer 2 side.
上述の本発明方法によれば、導電性の金属からなる補正
台7に記録担体3を収納し、一面を補正台7に密着させ
ることにより、導電層4の電解メツキをすべき部分の電
位を等電位にすることができるので、導電層4は薄くて
も、これが電解メツキ液により溶け出すことはなく、記
録層2全体を完全に被覆することができ、記録層2を正
確に転写したマスター板を得ることができる。According to the above-described method of the present invention, the recording carrier 3 is housed in the correction table 7 made of conductive metal, and one side is brought into close contact with the correction table 7, so that the potential of the portion of the conductive layer 4 to be electrolytically plated is adjusted. Since the electrical potential can be made equal, even if the conductive layer 4 is thin, it will not be dissolved by the electrolytic plating solution, and the entire recording layer 2 can be completely covered, making it possible to create a master with the recording layer 2 accurately transferred. You can get a board.
このとき記録担体3の半径が小さい場合には、メツキ電
流1を経路0)に流すだけで十分に導電層4を等電位に
することができるが、記録担体3の半径が大きい場合で
も図の例のようにメツキ電流Iを経路(4))にも流す
ようにすることによつて同様に十分に等電位にすること
ができる。At this time, if the radius of the record carrier 3 is small, it is sufficient to make the conductive layer 4 equipotential by flowing the plating current 1 through the path 0), but even if the radius of the record carrier 3 is large, By causing the plating current I to also flow through the path (4) as in the example, it is possible to sufficiently equalize the potential in the same way.
また本発明方法によれば導電層4は薄くてよいので、ピ
ンホールが生じることはなく、メツキ応力によりこれが
剥れるようなことはない。Furthermore, according to the method of the present invention, the conductive layer 4 may be thin, so pinholes will not occur and it will not peel off due to plating stress.
また、補正台7に記録担体3の周囲をとりまくような環
状突部7aを設けたことにより、この環状突部7aの外
周端部の角の部分に主として電流集中が生じ、従つて記
録担体3の記録層2側の面に形成されるメツキ層5はほ
ぼ均一の厚さとなるので、絶縁基板1から剥したものを
そのままマスター板として使用することができ、基板1
と同じ半径のマスター板を得ることができる。Furthermore, by providing the annular protrusion 7a that surrounds the record carrier 3 on the correction table 7, current concentration mainly occurs at the corner portion of the outer peripheral end of the annular protrusion 7a, and therefore the record carrier 3 Since the plating layer 5 formed on the side of the recording layer 2 has a substantially uniform thickness, the plated layer 5 that is peeled off from the insulating substrate 1 can be used as a master plate as it is, and
You can get a master plate with the same radius as .
第3図は、マスター板6の中心から半径方向の各位置に
おける厚さを示す特性曲線図で、図中破線は従来のよう
に補正台7を使用しないで、電解メツキを施した場合の
特性、図中実線は、本発明方法により電解メツキを施し
た場合の特性である。FIG. 3 is a characteristic curve diagram showing the thickness at each position in the radial direction from the center of the master plate 6, and the broken line in the figure shows the characteristics when electrolytic plating is applied without using the correction table 7 as in the conventional case. The solid line in the figure shows the characteristics when electrolytically plated by the method of the present invention.
この場合補正台7としては厚さ2(V7!の銅板を用い
、記録担体3の半径は14GTrL、厚さは5mm、空
隙11の幅は2mmである。なお、補正台7としては、
円板の一面側に環状突部を形成したものの代わりに、環
状板の一面側に環状突部を形成したものを使用すること
もでき、また補正台7は、例えばプラスチツクの成形品
の表面を金属で覆つたようなものでもよい。In this case, a copper plate with a thickness of 2 (V7!) is used as the correction table 7, the radius of the record carrier 3 is 14GTrL, the thickness is 5 mm, and the width of the gap 11 is 2 mm.
Instead of a disk with an annular projection formed on one side, an annular plate with an annular projection formed on one side can also be used, and the correction table 7 can be made by, for example, forming the surface of a plastic molded product. It may be something covered with metal.
また環状突部7aの高さHが記録担体3の厚みよりも低
くても上述の場合とほぼ同様の効果が得られる。Further, even if the height H of the annular protrusion 7a is lower than the thickness of the recording carrier 3, substantially the same effect as in the above case can be obtained.
第1図は従来の回転記録媒体のマスター板の製造方法の
一例の工程を示す図、第2図は本発明による回転記録媒
体のマスター板の製造方法の要部の工程を示す図、第3
図はその効果の説明のための図である。
1は絶縁基板、2はフオトレジスト層、3は記録担体、
4は導電層、5は電解メツキ層、6はマスター板、7は
補正台、7aはその環状突部である。FIG. 1 is a diagram showing steps of an example of a conventional method for manufacturing a master plate for a rotating recording medium, FIG. 2 is a diagram showing main steps of a method for manufacturing a master plate for a rotating recording medium according to the present invention, and FIG.
The figure is a diagram for explaining the effect. 1 is an insulating substrate, 2 is a photoresist layer, 3 is a record carrier,
4 is a conductive layer, 5 is an electrolytic plating layer, 6 is a master plate, 7 is a correction table, and 7a is an annular protrusion thereof.
Claims (1)
わたつて無電解メッキによる導電層が形成された記録担
体と、表面が導電性の金属よりなり、一面側に環状突部
を有し、この環状突部の内側の半径が上記記録担体の半
径よりやや大きく、かつこの環状突部の高さが上記記録
担体の高さと等しいかこれ以下に選定された補正台を用
意し、上記記録担体を、この補正台内に、上記環状突部
が上記記録担体に近接してこれを囲み、かつ上記記録担
体の上記記録層側の面とは反対側の面を上記補正台に密
着させた状態で収納し、この状態で上記記録担体の上記
記録層側の面に電解メッキによつてメッキ層を形成し、
その際メッキ電流は記録担体の側面を介して上記反対側
の面に導き、その後、上記メッキ層及び導電層を上記絶
縁基板よりはがしてマスター板を得るようにした回転記
録媒体のマスター板の製造方法。1 A recording carrier having a conductive layer formed by electroless plating over the entire surface of a disc-shaped insulating substrate having a recording layer on one side, and a recording carrier having a surface made of conductive metal and having an annular protrusion on one side. Then, a correction table is prepared in which the inner radius of the annular protrusion is slightly larger than the radius of the record carrier, and the height of the annular protrusion is selected to be equal to or less than the height of the record carrier. A record carrier is placed in the correction table, the annular protrusion proximately surrounds the record carrier, and the surface of the record carrier opposite to the surface on the recording layer side is brought into close contact with the correction table. and in this state, forming a plating layer on the surface of the recording layer side of the recording carrier by electrolytic plating,
In this case, the plating current is guided to the opposite surface through the side surface of the record carrier, and then the plating layer and the conductive layer are peeled off from the insulating substrate to obtain a master plate for a rotating recording medium. Method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15438975A JPS5916333B2 (en) | 1975-12-23 | 1975-12-23 | Kaitenki Rokubaitaino Master - Banno Seizouhouhou |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15438975A JPS5916333B2 (en) | 1975-12-23 | 1975-12-23 | Kaitenki Rokubaitaino Master - Banno Seizouhouhou |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5276901A JPS5276901A (en) | 1977-06-28 |
JPS5916333B2 true JPS5916333B2 (en) | 1984-04-14 |
Family
ID=15583057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15438975A Expired JPS5916333B2 (en) | 1975-12-23 | 1975-12-23 | Kaitenki Rokubaitaino Master - Banno Seizouhouhou |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5916333B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5814343A (en) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | Method and device for photoresist wet development |
JPS589242A (en) * | 1981-07-08 | 1983-01-19 | Pioneer Electronic Corp | Method and device for photoresist wet development |
-
1975
- 1975-12-23 JP JP15438975A patent/JPS5916333B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5276901A (en) | 1977-06-28 |
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