JPS59162283A - Washing device - Google Patents

Washing device

Info

Publication number
JPS59162283A
JPS59162283A JP3618783A JP3618783A JPS59162283A JP S59162283 A JPS59162283 A JP S59162283A JP 3618783 A JP3618783 A JP 3618783A JP 3618783 A JP3618783 A JP 3618783A JP S59162283 A JPS59162283 A JP S59162283A
Authority
JP
Japan
Prior art keywords
tank
water
washing
cleaning tank
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3618783A
Other languages
Japanese (ja)
Other versions
JPS6321756B2 (en
Inventor
Yoshio Yamaguchi
山口 義夫
Yasuo Taki
滝 保夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3618783A priority Critical patent/JPS59162283A/en
Publication of JPS59162283A publication Critical patent/JPS59162283A/en
Publication of JPS6321756B2 publication Critical patent/JPS6321756B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To improve the effect of washing etched products, etc. by connecting organically a liquid feed tank, washing tank, recovering tank and discharging section via valves and segmenting the inside of the washing tank to a plurality thereby making the recovery of treated liquid and the water exchange in the washing tank automatic. CONSTITUTION:An etching liquid, etc. are primarily recovered in a washing tank 7 in the stage of cleaning a material subjected to the formation, removal, etc. of a film. The recovered liquid is detected with a detector 38 and water is fed from a feed tank to the tank 7. Air is discharged through the through-holes 16a provided on an inside wall 16 and the feed speed of the water is increased. The amt. of the water to be fed is so set that the water is maintained at the level lower than a partition wall 21, thereby preventing the contamination of the water from spreading. A stop valve 28 is opened upon the washing to discharge the water to a discharging tank 30. The discharge is detected with the detector 38 and again the water in the feed tank is fed to the tank 7 and the washing is performed again. The washing is thus accomplished always with fresh water by which the effect of washing is improved.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は薬液を使用した膜形成、除去等の後工程の洗浄
装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a cleaning device for post-processes such as film formation and removal using chemical solutions.

従来例の構成とその問題点 従来の洗浄は膜形成、あるいは除去に必要な薬液に浸漬
後、薬液の大部分を回収するだめの水槽に短時間つけ(
これを1次回収と呼ぶ)その後第1図にその具体例を示
すように、水洗槽1に浸漬する。清潔な水(純水と呼ぶ
)2は管3より供給され、供給量は り弁でコントロー
ルし、仕切壁6を適量オーバフローさせる。すなわち、
純水をたえず供給し、水にとけた薬液をオーバフローさ
せることにより、順次うすめ、水洗を行う。又、別の水
洗槽を準備し再び浸漬させて水洗を行う場合もある。
Conventional structure and problems Conventional cleaning involves immersing the film in a chemical solution necessary for film formation or removal, and then immersing it in a water tank for a short time to collect most of the chemical solution (
(This is called primary recovery.) Thereafter, as shown in FIG. 1, the sample is immersed in a washing tank 1. Clean water (referred to as pure water) 2 is supplied from a pipe 3, and the supply amount is controlled by a valve to overflow the partition wall 6 by an appropriate amount. That is,
By constantly supplying pure water and allowing the chemical solution dissolved in the water to overflow, it is sequentially diluted and washed with water. In some cases, a separate water washing tank is prepared and the material is immersed again for washing.

しかし、このような方法では槽が2つ以上必要となり自
動化する場合に設備が大型化し、又オーバフローさせる
ことにより薬液を除去を行うため薬液が水洗槽1の中に
ひろがシ完全に除去することが困難であシ、水洗時間が
長くかがり、水洗効果の点で問題がある。
However, such a method requires two or more tanks, which increases the size of the equipment when automated.Also, since the chemical solution is removed by overflowing, the chemical solution does not spread out into the washing tank 1, making it difficult to completely remove it. It is difficult to clean, takes a long time to wash with water, and there are problems in terms of washing effectiveness.

発明の目的 本発明は、上記従来の欠点を解決するもので、1工程(
1つの洗浄槽)で薬液の1次回収と水洗を自動的に行な
えるようにすると共に、必要な回数だけ槽内の水を交換
し、新しい純水で水洗を行い、水洗効果の向上を図るも
のである。
OBJECT OF THE INVENTION The present invention solves the above-mentioned drawbacks of the conventional technology, and is aimed at solving the above-mentioned conventional drawbacks.
In addition to making it possible to automatically perform the primary collection of chemical solution and washing with water in a single washing tank, the water in the tank is replaced as many times as necessary and washing is performed with new pure water to improve the washing effect. It is something.

発明の構成 本発明は洗浄物が浸漬するに必要な体積を有する洗浄槽
上、洗浄槽の底部に設けられた2つの排出口と、この排
出口の開閉を行うストップ弁と、前記洗浄槽の内壁を介
して設けられた少々くとも3つの部屋とからなり、前記
3つの部屋の内筒1の部屋は前記洗浄槽と接する内壁に
、所定の高さの貫通部を設け、第2及び第3の部屋は、
前記洗浄槽と接する内壁の下部に液体が通過する入口と
洗浄槽液面より上に小さな貫通穴を設け、前記内壁と部
屋を形成する外壁との間に洗浄槽の液面高さ以上の高さ
の隔壁を設けた2つの液供給口と2つの供給口の外壁と
@壁の間の底部に設けた液の供給用口金を有しており洗
浄工程の自動化設備の小型化を可能にし、更に洗浄水の
換水を短時間で行い、水洗効果の向上がはかられる。
Structure of the Invention The present invention provides a cleaning tank having a volume necessary for immersion of the cleaning items, two discharge ports provided at the bottom of the cleaning tank, a stop valve for opening and closing the discharge ports, and a stop valve for opening and closing the discharge ports. It consists of at least three chambers provided through the inner wall, and the chamber of the inner cylinder 1 of the three chambers is provided with a penetration part of a predetermined height on the inner wall in contact with the cleaning tank, and Room 3 is
An inlet through which the liquid passes and a small through hole above the liquid level of the cleaning tank are provided at the lower part of the inner wall in contact with the cleaning tank, and a height greater than the liquid level of the cleaning tank is provided between the inner wall and the outer wall forming the chamber. It has two liquid supply ports with a partition wall and a liquid supply mouthpiece located at the bottom between the outer wall of the two supply ports and the @ wall, making it possible to downsize the automation equipment for the cleaning process. Furthermore, the washing water can be changed in a short time, improving the washing effect.

実施例の説明 以下本発明の一実施例を第2〜第6図にもとづいて説明
する。なお本実施例の液は水である。第2図は供給槽6
を図示したもので、第3図の洗浄槽7に供給するに必要
な水量を貯蔵する内容積をもち、供給槽6底部にバルブ
8、パイプ9を経て洗浄槽7につながっている。10は
バルブであり、このバルブ10にょ゛り供給槽6への水
供給を行なう。又供給槽6の側壁に水面を検知する浮子
式の検知器11を備えている。12は浮子であり、この
浮子12が供給槽6内の水面高さにょシ上下するのを光
′電管13..14で検知する。パイプ9は液供給口1
5の底面の供給用口金15aに連結されている。第1液
供給口15は洗浄槽7と内塗6で仕切られ内壁16の上
部、洗浄槽の液面より上の位置に貫通穴16aが設けて
あり、仕切壁17゜18、天井板19で1つの部屋を構
成している。
DESCRIPTION OF THE EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. 2 to 6. Note that the liquid in this example is water. Figure 2 shows the supply tank 6.
It has an internal volume to store the amount of water necessary to supply to the cleaning tank 7 shown in FIG. 3, and is connected to the cleaning tank 7 via a valve 8 and a pipe 9 at the bottom of the supply tank 6. Reference numeral 10 denotes a valve, and water is supplied to the supply tank 6 through this valve 10. Further, a float-type detector 11 for detecting the water surface is provided on the side wall of the supply tank 6. Reference numeral 12 denotes a float, and a photoelectric tube 13. .. Detected at 14. Pipe 9 is liquid supply port 1
It is connected to the supply mouthpiece 15a on the bottom surface of 5. The first liquid supply port 15 is partitioned by the cleaning tank 7 and the inner coating 6, and a through hole 16a is provided at the upper part of the inner wall 16 at a position above the liquid level of the cleaning tank. It makes up one room.

第1液供給口15の中間に洗浄槽7の底面2oから隔壁
21が洗浄槽内の水面より高く立上り、天井板19との
間に水が通過できるすき間を形成している。又仕切’4
17118を介して洗浄槽の水のオーバフロー分を回収
するオーバフロ一部22と第1tL供給口15と同じ構
造の第2液供給口23が併設されている。オーバフロ一
部22は内壁24で洗浄槽7と仕切られ、内壁24の高
さを洗浄槽7の槽壁25より低く設けられており、洗浄
槽7の水面高さを二定にする。又洗浄槽7の底面2oに
、水の排出口26.27が2ケ所設けられている。水は
この排出口26.27を通りストップ弁28,29を経
由して洗浄槽7の下に設置した排出槽30と回収槽31
に流れ落る。
In the middle of the first liquid supply port 15, a partition wall 21 rises from the bottom surface 2o of the cleaning tank 7 higher than the water surface in the cleaning tank, and forms a gap with the ceiling plate 19 through which water can pass. Matashikiri '4
An overflow portion 22 for collecting overflow water from the cleaning tank via 17118 and a second liquid supply port 23 having the same structure as the first tL supply port 15 are provided. The overflow part 22 is partitioned from the cleaning tank 7 by an inner wall 24, and the height of the inner wall 24 is set lower than the tank wall 25 of the cleaning tank 7, so that the water surface height of the cleaning tank 7 is kept constant. Further, two water outlets 26 and 27 are provided on the bottom surface 2o of the cleaning tank 7. The water passes through these discharge ports 26 and 27 and passes through stop valves 28 and 29 to a discharge tank 30 and a recovery tank 31 installed below the cleaning tank 7.
flowing down.

オーバフロ一部22はパイプ32を経て回収槽31に通
じ、回収槽31の底部には排出口が設けられ、一方はバ
ルブ33を経て外部の処理槽へパイプ34で連結され、
他方はポンプ35を通って液供給口23の供給用口金3
6に配管されてバる。
The overflow part 22 communicates with a recovery tank 31 through a pipe 32, and a discharge port is provided at the bottom of the recovery tank 31, and one side is connected to an external processing tank through a valve 33 with a pipe 34.
The other side passes through the pump 35 to the supply mouthpiece 3 of the liquid supply port 23.
It is piped to 6.

排出槽30はパイプ37を通して外部の再生装置37a
につながり、再生された水が供給槽6に供給される。洗
浄槽7、回収槽31には槽内の水面高さを検知する浮子
式の検知器3..8.39が設けである。
The discharge tank 30 is connected to an external regenerator 37a through a pipe 37.
The recycled water is supplied to the supply tank 6. The cleaning tank 7 and the recovery tank 31 are equipped with a float-type detector 3 for detecting the water surface height in the tank. .. 8.39 is set.

上記構成の洗浄槽では、最初に洗浄槽7にだくわえられ
た水でエツチング液などの1次回収を行い、その後スト
ップ弁21を開く。水は第4図に示すように回収槽31
に回収される。洗浄槽7の1次回収水が回収されたこと
は洗浄槽7の検知器38で検知する。検知後、直に供給
槽6のバルブ8を開き貯蔵されていた水を洗浄槽7に供
給する。
In the cleaning tank configured as described above, the water stored in the cleaning tank 7 is used to first recover the etching solution, and then the stop valve 21 is opened. The water is collected in a collection tank 31 as shown in Figure 4.
will be collected. A detector 38 in the cleaning tank 7 detects that the primary recovered water in the cleaning tank 7 has been collected. After the detection, the valve 8 of the supply tank 6 is immediately opened to supply the stored water to the cleaning tank 7.

水はバルブ8、パイプ9を通り、液供給口15を経て洗
浄槽7に短時間の内に注がれる。その時内壁16に設け
られた貫通穴16aがら空気が排出され水の供給速度ア
ップを図る。水の供給は供給槽6の浮子12が光電管1
4を遮光することにより供給バルブ8を閉じてストップ
される。この状態を第6図のLa)、 (b)に示す。
Water passes through the valve 8, the pipe 9, and the liquid supply port 15 and is poured into the cleaning tank 7 within a short time. At this time, air is discharged through the through hole 16a provided in the inner wall 16, thereby increasing the water supply speed. For water supply, the float 12 of the supply tank 6 is connected to the photocell 1.
The supply valve 8 is closed and stopped by shielding the supply valve 4 from light. This state is shown in La) and (b) of FIG.

第5図山)に示すように洗浄槽7に供給される水の量を
隔壁21より低位になるよう設定することにより、第1
供給口15では洗浄槽7の水と供給槽の水が隔壁21で
遮断されることになり、水の汚染のひろがりを防止でき
る。この状態の洗浄槽7内の水で一定時間水洗を行う。
By setting the amount of water supplied to the cleaning tank 7 to be lower than the partition wall 21 as shown in Fig. 5, the first
At the supply port 15, the water in the cleaning tank 7 and the water in the supply tank are separated by the partition wall 21, thereby preventing the spread of contamination of the water. Washing is performed for a certain period of time with the water in the washing tank 7 in this state.

その後、ストップ弁28を開くと洗浄槽7の水は排出槽
30に数秒間で排出される。
Thereafter, when the stop valve 28 is opened, the water in the cleaning tank 7 is discharged into the discharge tank 30 in a few seconds.

この状態を第6図(c)に示す。バルブ8、ストップ弁
28.29は大口径のものを用い、水の供給、排出時間
の短縮をはかる。洗浄槽7からの排出終了は検知器38
で検出され、ストップ弁28は閉じる。同時に、再びバ
ルブ8が開き再び供給槽6の水が数秒間で供給され、そ
して再び水洗を行う。
This state is shown in FIG. 6(c). The valve 8 and stop valves 28 and 29 are of large diameter to shorten the water supply and discharge time. The detector 38 indicates the completion of discharge from the cleaning tank 7.
is detected, and the stop valve 28 is closed. At the same time, the valve 8 opens again and water from the supply tank 6 is supplied again in a few seconds, and the washing is performed again.

この動作を必要なだけ繰り返すことにより、常に新しい
水で水洗を行うことができる。水洗が完了すると第6図
(C)のようにストップ弁28を開き汚れた水を排出槽
30に排出しストップ弁28が閉じる。その後回収槽3
1の1次回収水がポンプ36により第2供給口23を通
り洗浄槽7に供給される。供給量は洗浄槽7の検知器3
Bで制御される。以上により再び洗浄工程が開始できる
。なお供給槽6への供給は供給バルブ8が閉じている間
にバルブ1oを開いて供給される。
By repeating this operation as many times as necessary, you can always wash with fresh water. When the water washing is completed, the stop valve 28 is opened as shown in FIG. 6(C), the dirty water is discharged into the discharge tank 30, and the stop valve 28 is closed. Then collection tank 3
The first recovered water is supplied to the cleaning tank 7 through the second supply port 23 by the pump 36. The supply amount is determined by the detector 3 in the cleaning tank 7.
Controlled by B. With the above steps, the cleaning process can be started again. The supply tank 6 is supplied by opening the valve 1o while the supply valve 8 is closed.

前記に記載したように、エツチング後の製品のエツチン
グ液の回収のための1次回収、そして水洗を自動的に連
続動作させることができる。又洗浄槽7内の水の交換を
必要なだけしかも短時間で行うことができ、水洗の効果
をより高いものにすることができる。
As described above, the primary recovery for recovering the etching solution of the product after etching and the water washing can be automatically and continuously operated. Further, the water in the washing tank 7 can be replaced as much as necessary and in a short time, making the washing effect even higher.

発明の効果 前記のようにして、液供給槽、洗浄槽2回収槽。Effect of the invention As described above, a liquid supply tank, a cleaning tank 2 and a recovery tank.

排出槽を設けこの間をバルブとポンプで有機的に連結さ
せることによシ、1工程で前工程の処理液の1次回収と
洗浄槽内の水の完全換水を自動的に行い、新しい純水に
よる水洗を必要な回数行うことができ、水洗効果を向上
させる。
By providing a discharge tank and organically connecting the two with valves and pumps, the primary recovery of the treated liquid from the previous process and complete water exchange of the water in the cleaning tank are automatically performed in one process, producing new pure water. You can perform washing with water as many times as necessary, improving the washing effect.

又回収槽と排出槽の2槽に分離することにより、回収槽
の水は繰り返し使用し汚れ程度により廃棄する。排出槽
の水は前工程の液による汚れが1次回収で殆んど除去さ
れるため汚れが少なく、純水再生装置を経て供給槽へ循
環されるため処理コストが安くなる。
Also, by separating the tank into two tanks, a collection tank and a discharge tank, the water in the collection tank is used repeatedly and discarded depending on the degree of contamination. The water in the discharge tank has less dirt because most of the dirt from the liquid from the previous process is removed in the primary recovery, and the water is circulated to the supply tank via the pure water regenerating device, which reduces the processing cost.

洗浄槽自身水供給口に隔壁を備えた液供給口を設けるこ
とにより、洗浄槽内の水と供給水を分離し水の汚れのひ
ろがりを防止する効果がある。
Providing a liquid supply port with a partition wall in the water supply port of the cleaning tank itself has the effect of separating the water in the cleaning tank from the supplied water and preventing the spread of dirt in the water.

【図面の簡単な説明】 第1図は従来の水洗槽の断面図、第2図は本発明の一実
施例にkける液供給槽の斜視図、第3図は同一部破断の
洗浄槽および下槽の宗1視図、第4図は回収槽への水の
排出を示す洗浄槽の概略説明図、第5図(a)、 (b
) 、 Is’)は洗浄槽への水の供給と換水の状態を
示す説明図である。 6・・・・・・供給槽、7・・・・・・洗浄槽、8・・
・・・・供給バルブ、15・・・・・・第1供給口、2
2・・・・・・オーバフロ一部、23・・・・・・第2
供給口、28゜29・・拳・・・ストップバルブ、31
・・0・・・回収槽、32・・・・・・排出槽。
[Brief Description of the Drawings] Fig. 1 is a sectional view of a conventional washing tank, Fig. 2 is a perspective view of a liquid supply tank according to an embodiment of the present invention, and Fig. 3 is a partially broken part of the same washing tank and Figure 4 is a schematic diagram of the cleaning tank showing the discharge of water to the recovery tank, Figures 5 (a) and (b)
), Is') are explanatory diagrams showing the state of water supply and water exchange to the cleaning tank. 6... Supply tank, 7... Cleaning tank, 8...
...Supply valve, 15...First supply port, 2
2... Overflow part, 23... Second
Supply port, 28° 29...fist...stop valve, 31
...0...Recovery tank, 32...Discharge tank.

Claims (2)

【特許請求の範囲】[Claims] (1)洗浄物が浸漬するに必要な体積を有する洗浄槽と
、洗浄槽の底部に設けられた2つの排出口と、この排出
口の開閉を行うストップ弁と、前記洗浄槽の内壁を介し
て設けられた少なくとも3つの部屋とからなり、前記3
つの部屋の内相1の部屋は前記洗浄槽と接する内壁に所
定の高さの貫通部を設け、第2及び第3の部屋は、前記
洗浄槽と接する内壁の下部に液体が通過する入口と洗浄
槽液面よシ上に小さな貫通穴を設け、前記内壁と部屋を
形成する外壁との間に洗浄槽の液面高さ以上の高さの隔
壁を設けた2つの液供給口と2つの供給口の外壁と隔壁
の間の底部に設けた液の供給用口金を有した洗浄装置。
(1) A cleaning tank with a volume necessary for immersion of the cleaning items, two discharge ports provided at the bottom of the cleaning tank, a stop valve for opening and closing these discharge ports, and a It consists of at least three rooms provided with
The interior phase 1 of the two rooms has a penetration part of a predetermined height on the inner wall in contact with the cleaning tank, and the second and third rooms have an inlet through which liquid passes through the lower part of the inner wall in contact with the cleaning tank. A small through hole is provided above the liquid level of the cleaning tank, and a partition wall with a height equal to or higher than the liquid level of the cleaning tank is provided between the inner wall and the outer wall forming the chamber. A cleaning device having a liquid supply mouthpiece provided at the bottom between the outer wall of the supply port and the partition wall.
(2)一方が前記洗浄槽の第1の排出口と連結し、他方
が前記第2の部屋の液供給口と連結した回収槽を設け、
かつ一方が前記洗浄槽の第2の排出口と連結し、他方が
液を再生する再生装置と連結した排出槽を備えた特許請
求の範囲第1項記載の洗浄装置。
(2) providing a recovery tank with one side connected to the first discharge port of the cleaning tank and the other side connected to the liquid supply port of the second chamber;
The cleaning device according to claim 1, further comprising a discharge tank, one of which is connected to the second discharge port of the cleaning tank, and the other of which is connected to a regenerating device for regenerating the liquid.
JP3618783A 1983-03-04 1983-03-04 Washing device Granted JPS59162283A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3618783A JPS59162283A (en) 1983-03-04 1983-03-04 Washing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3618783A JPS59162283A (en) 1983-03-04 1983-03-04 Washing device

Publications (2)

Publication Number Publication Date
JPS59162283A true JPS59162283A (en) 1984-09-13
JPS6321756B2 JPS6321756B2 (en) 1988-05-09

Family

ID=12462720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3618783A Granted JPS59162283A (en) 1983-03-04 1983-03-04 Washing device

Country Status (1)

Country Link
JP (1) JPS59162283A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110408916A (en) * 2019-08-26 2019-11-05 惠州市安泰普表面处理科技有限公司 Chemical nickel plating method

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