JPS59154918U - vapor deposition mask - Google Patents
vapor deposition maskInfo
- Publication number
- JPS59154918U JPS59154918U JP4869583U JP4869583U JPS59154918U JP S59154918 U JPS59154918 U JP S59154918U JP 4869583 U JP4869583 U JP 4869583U JP 4869583 U JP4869583 U JP 4869583U JP S59154918 U JPS59154918 U JP S59154918U
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- deposition mask
- central member
- wall
- main electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の周波数調整工程を示す斜視図、第2図は
本考案の一実施例を示す斜視図である。
1・・・・・・水晶素片、la、 lb、 lc・
・・・・・電極、2・・・・・・金属ベース、3a、
3b、 3C・・・・・・リード端子、4a、
4b、 4c・・・・・・保持板、6・・・・・・蒸
着マスク、6a・・・・・・中央部材、5b、 6c
・・・・・・外側部材、7a。
7b、 7c・・・・・・蒸着用窓。FIG. 1 is a perspective view showing a conventional frequency adjustment process, and FIG. 2 is a perspective view showing an embodiment of the present invention. 1... Crystal piece, LA, LB, LC.
...Electrode, 2...Metal base, 3a,
3b, 3C...Lead terminal, 4a,
4b, 4c... Holding plate, 6... Vapor deposition mask, 6a... Central member, 5b, 6c
...Outer member, 7a. 7b, 7c... Windows for vapor deposition.
Claims (1)
上に調整用電極を蒸着して供振周波数の調整を行なうも
のにおいて、主電極を形成した水晶素板を挿入時にこの
水晶素板の外周縁を内壁に当接させて位置決めする切欠
を形成した中央部材の両側に調整用電極を蒸着すべき位
置に対応して蒸着用窓を形成した外側部材を設けるとと
もに上記中央部材の切欠および上記外側部材で囲まれる
空所の内壁に絶縁膜を形成したことを特徴とする蒸着マ
スク。In a device that adjusts the resonance frequency by depositing an adjustment electrode on the main electrode formed on the plate surface of a piezoelectric crystal cut at a predetermined angle, this crystal blank is inserted when the crystal blank with the main electrode formed is inserted. A central member is provided with a notch for positioning the outer peripheral edge of the central member in contact with an inner wall, and an outer member is provided with a deposition window corresponding to the position where the adjustment electrode is to be deposited on both sides of the central member. A vapor deposition mask characterized in that an insulating film is formed on an inner wall of a space surrounded by the outer member.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4869583U JPS59154918U (en) | 1983-04-01 | 1983-04-01 | vapor deposition mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4869583U JPS59154918U (en) | 1983-04-01 | 1983-04-01 | vapor deposition mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59154918U true JPS59154918U (en) | 1984-10-17 |
JPH0233389Y2 JPH0233389Y2 (en) | 1990-09-07 |
Family
ID=30179216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4869583U Granted JPS59154918U (en) | 1983-04-01 | 1983-04-01 | vapor deposition mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59154918U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04126416U (en) * | 1991-05-08 | 1992-11-18 | セイコーエプソン株式会社 | Frequency adjustment mask |
-
1983
- 1983-04-01 JP JP4869583U patent/JPS59154918U/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04126416U (en) * | 1991-05-08 | 1992-11-18 | セイコーエプソン株式会社 | Frequency adjustment mask |
Also Published As
Publication number | Publication date |
---|---|
JPH0233389Y2 (en) | 1990-09-07 |
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