JPS59146950A - Manufacture of quartz glass - Google Patents

Manufacture of quartz glass

Info

Publication number
JPS59146950A
JPS59146950A JP2038683A JP2038683A JPS59146950A JP S59146950 A JPS59146950 A JP S59146950A JP 2038683 A JP2038683 A JP 2038683A JP 2038683 A JP2038683 A JP 2038683A JP S59146950 A JPS59146950 A JP S59146950A
Authority
JP
Japan
Prior art keywords
silica
quartz glass
soln
ultrasonic waves
sol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2038683A
Other languages
Japanese (ja)
Other versions
JPS643814B2 (en
Inventor
Tetsuhiko Takeuchi
哲彦 竹内
Sadao Kanbe
貞男 神戸
Motoyuki Toki
元幸 土岐
Satoru Miyashita
悟 宮下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP2038683A priority Critical patent/JPS59146950A/en
Publication of JPS59146950A publication Critical patent/JPS59146950A/en
Publication of JPS643814B2 publication Critical patent/JPS643814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Abstract

PURPOSE:To manufacture quartz glass of high quality free from defects such as bubbles by a sol-gel method by adding finely powdered silica to an alkyl silicate soln. while applying ultrasonic waves to the soln. and by mixing them. CONSTITUTION:Water or alcohol and hydrochloric acid are added to ethyl silicate, and they are mixed by stirring to carry out hydrolysis. Finely powdered silica is gradually added to the resulting soln. while applying ultrasonic waves to the soln. At this time, the finely powdered silica is easily dispersed by stirring the soln. Ultrasonic waves are applied for a while after adding the silica so as to increase the uniformity of formed silica sol. The silica sol is separated by filtration and converted into gel. The pH of the separated silica sol may be increased by dropping an aqueous ammonia soln. so as to shorten the gelling time. The dry gel is put in a furnace and sintered to obtain quartz glass.

Description

【発明の詳細な説明】 本発明は、石英ガラスの製造法に係り、さらに詳しくは
、アルキルシリケートおよび微粉末シリカを主原料とす
るゾル−ゲル法による低温での石英ガラスの製造法にお
い−C,アルキルシリヶー ト水9塩酸等の混合溶液へ
の微粉末シリカの添加全超音波をかけながら行ないゾル
状態とし、ゲル化式ゼる透明で均質な石英ガラスの製造
伝に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing quartz glass, and more particularly, a method for producing quartz glass at a low temperature by a sol-gel method using an alkyl silicate and finely powdered silica as main raw materials. , alkyl silicate, water, 9 hydrochloric acid, etc. The process is carried out while applying ultrasonic waves to form a sol, which is then gelled into a transparent and homogeneous silica glass.

1ず、石英ガラスの有用性について触れると、近年、石
英ガラス(lよ、銅、ホウ素等の不純物濃度が0. I
 PPM  以下の高純度のものが作られるようになっ
タタめ、ゲルマニウム、シリコンその他の半導体の製造
においてルツボやボード、拡散炉などに用いられるよう
になり、′!!た、理化学用ビーカー、光学測定用のセ
ルと〔−でもよく使用され、さらに水酸基の少ないもの
、および光学的均一性のよいものが開発δれ、各1の光
学的用途に使用され、特に光通信用の石英ガラスファイ
バー鴫、最近注目されている。しかし、以上の例のより
に必要性の冒い石英ガラスも、現在の製造方法では原料
費が1%価なことゴ?よび高温での処理が撃求されるな
どのために、たいへん高パ曲なものしでなっている。
First, to talk about the usefulness of quartz glass, in recent years quartz glass (with impurity concentrations such as copper and boron of 0.1
PPM or higher purity products began to be produced and used in crucibles, boards, diffusion furnaces, etc. in the production of germanium, silicon, and other semiconductors. ! In addition, beakers for physics and chemistry, cells for optical measurements, and cells for optical measurements have also been developed, and those with fewer hydroxyl groups and those with good optical uniformity have been developed, and are used for each optical purpose, especially for optical measurements. Silica glass fiber for communications has recently been attracting attention. However, as shown in the above example, the raw material cost of quartz glass, which is no longer necessary, is only 1% higher with the current manufacturing method. Due to the increased demand for processing at higher temperatures and higher temperatures, it has become extremely difficult to process.

そこで石英ガラスの安価な製造の可能性全期待され、最
近、特に注目′にめびているのが、ゾル−ゲル法による
低温での石英ガラスの製造法である。
Therefore, the possibility of producing quartz glass at low cost is highly anticipated, and recently, the method of producing quartz glass at low temperatures using the sol-gel method has been attracting particular attention.

このゾル−ゲル法による石英ガラスの製造法について簡
単に説明すると次のと卦ジである。
A brief explanation of the silica glass manufacturing method using the sol-gel method is as follows.

i薗当なアルキルシリケート5i(OR)4(Rは炭素
数が1〜10のアルギル基)、通等なアルコール溶液(
含水)および微粉末シリカ全混合し、シリカゾルとし、
溶媒濃縮めるいは加熱愈どの処理によってシリカゲルと
する。ここで得られり塊状のシリカゲルを炉に入れ所定
のプログラムにより、焼結を行ない石英ガラスとする。
i A common alkyl silicate 5i (OR)4 (R is an argyl group having 1 to 10 carbon atoms), a common alcohol solution (
water) and finely powdered silica to form a silica sol.
The solvent is concentrated into silica gel by heating or other treatment. The bulk silica gel obtained here is placed in a furnace and sintered according to a predetermined program to form quartz glass.

以上が、ゾル−ゲル法による石英ガラスの製造法であり
、この製造法の長所としては 1)水晶を原料として高温溶融法で作る場合に比べ、低
温で製造できるため省エネルギー的である 2)原料が精製容易なため、高純度のガラスが得られる 3)粘性の低い溶液を原料として用いるために均一性の
高いガラスが得られる などが必げられ、このような大変優れた特徴上Mするた
め、この方法を利用しての石英ガラスの製造に関しては
、さ1ざ1な所で幅広く研究されている。
The above is the method for manufacturing quartz glass using the sol-gel method.The advantages of this manufacturing method are 1) It can be manufactured at a lower temperature than the high-temperature melting method using quartz as a raw material, which saves energy.2) Raw materials Because it is easy to purify, high-purity glass can be obtained.3) Since a low-viscosity solution is used as a raw material, highly uniform glass can be obtained. The production of quartz glass using this method has been extensively researched.

しかしながら、これ1でに発表されている資料などによ
ると、種々の問題点があり、笑用化lでは至っていない
のが現状である。
However, according to the materials published in 1, there are various problems, and the current situation is that it has not been put into commercial use.

それらの問題点の一つは、原料溶液に微粉末シリカを添
加する際、ろる程度の麓全越えると溶液の粘度が急激に
高くな9機械的な攪拌ではかなり無理があるということ
でるる。その結果、均一なシリカゾルとすることは、非
常に困難であり、長時間を要することになる。したがっ
てこのゾルをゲル化し、得られた乾燥ゲル全焼結し、石
英ガラスとするとそのガラス中に気泡が生じたり、不適
切VC′fX、りやすいとい9久点を有する。この対策
として微粉末シリカ添加後の攪拌時間全元号にとる。
One of these problems is that when adding finely powdered silica to a raw material solution, the viscosity of the solution increases rapidly if it exceeds the viscous level.9 Mechanical stirring is quite difficult. . As a result, it is very difficult to obtain a uniform silica sol and it takes a long time. Therefore, when this sol is gelatinized and the resulting dry gel is completely sintered to form quartz glass, it has the disadvantage that bubbles are generated in the glass, and it is easy to cause inappropriate VC'fX and scratches. As a countermeasure for this, the stirring time after addition of fine powdered silica is set at the entire time.

超音波、濾過等の処理金加えるなど全行なったもののま
た不光分であり、微粉末シリカの添加の困難でを解消で
きない。
Despite all treatments such as ultrasonic waves and filtration, including the addition of gold, the problem was still opaque, and the problem could not be resolved due to the difficulty of adding fine powder silica.

そこで、本発明の目的は、原料溶液への微粉末シリカの
添加全容8にし、しかもプ句−注の高いシリカゾルとし
、ゲル化、焼結する透明で均質な石英ガラスの製造法を
提供することである。
Therefore, an object of the present invention is to provide a method for producing transparent and homogeneous quartz glass by adding finely powdered silica to a raw material solution to a silica sol with a high level of efficiency, gelling and sintering. It is.

前述の条件を満たすような石英ガラスの製造法としで、
次に示す方法全考案した。
As a method of manufacturing quartz glass that satisfies the above conditions,
The following method was devised.

すなわチ、エチルシリケート、水、アルコール(有無ど
ちらでも可)、及び塩酸を攪拌混合し、加水分解反応を
行かった後、この溶液に超音波をかけながら、微粉末シ
リカ(例えば(商品名)Aeresll(Diguss
a社)、(Franeil(Franeol半土、Ca
b−o−8il(Cabot社3.DO8ilica(
Dow Oorning社)およびArc 5ilic
a(PP0社)e、t、c) f徐々に添加する。この
時攪拌を加えるとより微粉末シリカ溶液への分散が容易
となる。そしてこのシリカゾルの均一性を、さらに高め
る7Cめに、しばらく(1〜s )l r )超音波を
かける。この後、濾過、場合によっては、アンモニア水
全滴下しpH値を高くし、ゲル化時間全短縮させるなど
の操作を加え、ゲル化させ、続いて得られた乾燥ゲルを
炉に入れ焼結し1石英ガラスとするものである。この発
明の方法を用いると、超音波撮動により微粉末シリカの
溶液への分散が非常に容易にしかも短時間ですみ、攪拌
による添加に比べ均一性も高いゾルが得られ、焼結後の
石英ガラスも気泡などの欠点がなく高品質な石英ガラス
の製造が可能となる。
In other words, after stirring and mixing ethyl silicate, water, alcohol (with or without), and hydrochloric acid and performing a hydrolysis reaction, while applying ultrasonic waves to this solution, fine powder silica (for example, (trade name) )Aeresll(Diguss
Company a), (Franeil (Franeol Hanto, Ca
b-o-8il (Cabot 3. DO8ilica (
Dow Oorning Co.) and Arc 5ilic
a (PP0 company) e, t, c) f Gradually add. If stirring is added at this time, dispersion into the fine powder silica solution becomes easier. Then, in order to further increase the uniformity of this silica sol, ultrasonic waves are applied for a while (1 to s)lr). After this, filtration is performed, and in some cases, operations such as adding all the drops of ammonia water to increase the pH value and shortening the gelation time are added to gelatinize, and the resulting dry gel is then placed in a furnace and sintered. 1 is made of quartz glass. Using the method of this invention, ultrasonic imaging makes it very easy to disperse fine silica powder into a solution, and it takes only a short time, and a sol with higher uniformity can be obtained compared to adding by stirring. Silica glass also has no defects such as bubbles and can be manufactured with high quality.

以下、実施例に従い、本発明の同各をさらに詳細に説明
する。
Hereinafter, each aspect of the present invention will be explained in more detail according to Examples.

実施例1 精製した市販のエチルシリケート(lEi(Offlt
)4 )44mt エタノール5.4献 (加えなくと
も町、0、 I N (−またはo、oiN)塩酸溶液
66□t 、訃よび水56 m、t  を混会し、加水
分解反応を行なった。この溶液に超音波をかけなから微
粉末シリカ((曲品名) Cab−o−8i、1(Ca
bar、社))1!M”’i徐々に添加し、添加後、溶
dkの均−注ff1iKめるために、2時間超音波をか
けた。なお微粉末シリカ全添加する時、攪拌は行なわな
かった。次にこれ全グラスフィルターで濾過した。ここ
で、この濾液にアンモニア水を滴下しpH値f 5.5
−5.0程度に調整するとゲル化時間がかなり短縮され
ることがわかっているが、本芙験の目的には、直接影響
企及ぼでないと考えられる。(災際に行なった結果、焼
結後の石英ガラスに相異点は見られなかツタ。)この溶
液’t[径10釧のテフロン(デュポン社の登、碌商標
)夷シャーレに50y測υ入れゲル化後、蒸発速度の調
節可能な穴あきのふたをしで、恒温槽に入れ、60℃で
4日間、80℃で2日間の合耐8日間の乾燥を行ない、
直径6.2 crn。
Example 1 Purified commercially available ethyl silicate (lEi (Offlt
) 4) 44 mt 5.4 mt of ethanol (without adding, 66 m, t of hydrochloric acid solution and 56 m, t of water were mixed to perform a hydrolysis reaction. After applying ultrasonic waves to this solution, finely powdered silica ((product name) Cab-o-8i, 1(Ca
bar, company))1! M"'i was added gradually, and after the addition, ultrasonic waves were applied for 2 hours to uniformly distribute the molten silica. Stirring was not performed when all the fine powder silica was added. Next, this It was filtered through a whole glass filter.Here, aqueous ammonia was added dropwise to this filtrate, and the pH value was adjusted to f5.5.
Although it is known that the gelation time can be considerably shortened by adjusting it to about -5.0, it is considered that this is not a direct influence for the purpose of this experiment. (As a result of conducting this test in the event of a disaster, no differences were observed in the quartz glass after sintering.) This solution't [50y measurement υ After gelatinization, place in a constant temperature bath with a lid with a hole that allows the evaporation rate to be adjusted, and dry for 8 days at 60°C for 4 days and 80°C for 2 days.
Diameter 6.2 crn.

厚さ0.3画の乾燥ゲルを得た。この乾燥ゲルを拡牧炉
に入れ昇温速度180℃/hrで加熱焼結としたところ
1150℃で透明な直径!5.0 cmの石英ガラスを
得た。この石英ガラスの諸物性の分析結果は、ビッカー
ス硬度800Kg/−比重2.2でるり、赤外吸収スペ
クトル、近赤外吸収スペクトルおよび屈折率など、それ
ぞれ溶融石英ガラスと全< 一致し、兄盆な石英ガラス
であることが判明した。
A dried gel with a thickness of 0.3 strokes was obtained. When this dried gel was placed in a spreading furnace and heated and sintered at a heating rate of 180°C/hr, it became transparent in diameter at 1150°C! A 5.0 cm piece of quartz glass was obtained. The analysis results of various physical properties of this quartz glass, including Vickers hardness of 800 kg/- specific gravity of 2.2, infrared absorption spectrum, near-infrared absorption spectrum, and refractive index, all agree with those of fused silica glass, which is superior to its older brother. It turned out to be made of quartz glass.

フた、以前ゾル−ゲル法により得られた石英ガラス中V
こ観測された50μm程度の大きな気泡は全くなく、1
0μm以下のとぐ小さな気泡もほとんどなかった。
Lid, V in quartz glass previously obtained by the sol-gel method
There were no large bubbles of about 50 μm observed, and 1
There were also almost no small bubbles of 0 μm or less.

実施例2 実施例1と同量の原料を用い加水分解反応を行なった。Example 2 A hydrolysis reaction was carried out using the same amount of raw materials as in Example 1.

反応後、溶液を攪拌しながら超音波をかけ、微粉末シリ
カ((商品名) Cab−o−8il(cabot社)
)15 ff徐々に添加し、励加後、均−性を高めるた
め、1.5時間、攪拌および超音波を続けた。次にこれ
をグラスフィルターで濾過し、濾液’(i−[径10o
nのデフロン(デュポン社の登録開襟)製シャーレに5
02測υ入れ、ゲル化後、蒸発速度の調節可能な穴めさ
のふたをして恒温槽に入れ、実施例1と同様の乾燥を行
ない、直径6、2 cm 、厚さ0.3 crtrの乾
燥ゲルを得た。この乾燥ゲルを実施例1と同様に加熱g
8結し、透明な直径5、0 (:rnの石英ガラスを侍
り。この石英ガラスの諸物性も溶融石英ガラスと全く一
致し完全な石英ガラスであることがわかった。lた、均
一性も非常に良く気泡はほとんζ観測されなかった。
After the reaction, ultrasonic waves are applied to the solution while stirring, and fine powder silica ((trade name) Cab-o-8il (Cabot)
) 15 ff was gradually added, and after excitation, stirring and ultrasonication were continued for 1.5 hours to improve uniformity. Next, this was filtered with a glass filter, and the filtrate'(i-[diameter 10o
5 in a petri dish made of DEFRON (DuPont's registered open collar).
02 measurement, after gelation, put in a thermostatic bath with a lid with a hole that allows the evaporation rate to be adjusted, and dry in the same manner as in Example 1 to form a 6.2 cm diameter, 0.3 crtr. A dry gel was obtained. This dry gel was heated in the same manner as in Example 1.
8, and a transparent quartz glass with a diameter of 5.0 (:rn).The physical properties of this quartz glass were exactly the same as those of fused silica glass, and it was found to be a perfect silica glass. Very well, almost no bubbles were observed.

実施列6 実施列1および2においては、代表的な例をめげたが、
これはほんの一部であり、その他、原料に関しては、微
粉末シリカ((商品名)Cab−o−8il(Oabo
t社))の童k 2〜50 ?とした場ば、それぞれに
ついて超音波のみで添加した場合、攪拌および超音波全
併用した場合7行なった。攪拌卦工び超音波全併用する
とシリカゾルの均一性を高める効果は一層増した。そし
て焼結して得られた石英ガラス、は、大変均質で諸物性
は、もちろん溶融石英ガラスと一致した。
Example row 6 In example rows 1 and 2, representative examples were failed, but
This is only a small part; other raw materials include fine powder silica ((trade name) Cab-o-8il (Oabo
Company T)) Children k 2-50? In this case, seven tests were carried out, for each case, when addition was carried out using only ultrasonic waves, and when both stirring and ultrasonic waves were used in combination. The effect of increasing the uniformity of the silica sol was further increased when both stirring and ultrasonic waves were used together. The sintered silica glass was extremely homogeneous and its physical properties matched those of fused silica glass.

以上、実施fllをめげて示したように、?、扮末シリ
カ會65加する際に、超音波をかけることにより振#J
を与えると、/8液の均−注が非常に向上し、したがっ
てこれ全ゲル1ヒ、焼結して得られる石英ガラスも人′
(均Aなものとなることが明らかになつン1ヒニ。
As shown above, the full implementation failed? , when adding powdered silica, shake #J by applying ultrasonic waves.
The uniform pouring of the /8 liquid is greatly improved, and therefore the quartz glass obtained by sintering this gel is also very easy to use.
(It's obvious that it will be an A-grade one.)

このよりしてして本発明によジ得られる石英ガラ′スは
、従来の方法(溶融法)による石英ガラスよりかなり低
コストでできるなどの利点シてよジ、これ丘で、石英ガ
ラス全使用してい几分野(列えば理化学用機5.ION
造工程中のフォトマスク、炉心台のボードなど)ではも
ちろんのこと、品質的にも艮好なため、さらに広範囲に
その応用が広がるものと考えられる。
As a result, the quartz glass obtained by the present invention has the advantage that it can be produced at a considerably lower cost than the quartz glass produced by the conventional method (melting method). I am using it in the field of science and chemistry (5. ION)
Not only can it be used in photomasks during the fabrication process, boards for reactor core stands, etc., but it is also of good quality, so it is thought that its applications will expand to a wider range of areas.

以上 −2シthat's all -2shi

Claims (1)

【特許請求の範囲】[Claims] アルキルシリケートオよび微粉末シリカを主原料とする
ゾル−ゲル法に卦いて、原料全混合する祇微粉末ミリカ
の添加を超音波をかけながら行なうことHq4徴とする
石英ガラスの製造法。
A method for producing quartz glass using a sol-gel method using alkyl silicate and finely powdered silica as main raw materials, and adding finely powdered millica to all the raw materials while applying ultrasonic waves.
JP2038683A 1983-02-09 1983-02-09 Manufacture of quartz glass Granted JPS59146950A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2038683A JPS59146950A (en) 1983-02-09 1983-02-09 Manufacture of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2038683A JPS59146950A (en) 1983-02-09 1983-02-09 Manufacture of quartz glass

Publications (2)

Publication Number Publication Date
JPS59146950A true JPS59146950A (en) 1984-08-23
JPS643814B2 JPS643814B2 (en) 1989-01-23

Family

ID=12025585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2038683A Granted JPS59146950A (en) 1983-02-09 1983-02-09 Manufacture of quartz glass

Country Status (1)

Country Link
JP (1) JPS59146950A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02119217U (en) * 1989-02-16 1990-09-26
JPH0552812U (en) * 1991-12-16 1993-07-13 コパル電子株式会社 Rotating polygon mirror of optical deflector

Also Published As

Publication number Publication date
JPS643814B2 (en) 1989-01-23

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