JPS59143044U - Resist coating equipment - Google Patents

Resist coating equipment

Info

Publication number
JPS59143044U
JPS59143044U JP3583183U JP3583183U JPS59143044U JP S59143044 U JPS59143044 U JP S59143044U JP 3583183 U JP3583183 U JP 3583183U JP 3583183 U JP3583183 U JP 3583183U JP S59143044 U JPS59143044 U JP S59143044U
Authority
JP
Japan
Prior art keywords
resist coating
coating equipment
coating device
resist
resist solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3583183U
Other languages
Japanese (ja)
Other versions
JPS6342527Y2 (en
Inventor
栄一 河村
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP3583183U priority Critical patent/JPS59143044U/en
Publication of JPS59143044U publication Critical patent/JPS59143044U/en
Application granted granted Critical
Publication of JPS6342527Y2 publication Critical patent/JPS6342527Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来のレジスト塗布装置の概略構成断面図、第
２図は本考案の一実施例の要部斜視図、第３図は受溝先
端部の断面図である。 図において、３は噴射用ノズル、４はレジスト液、１１
は受溝、１２は支持枠、１３は切片を示す。FIG. 1 is a schematic sectional view of a conventional resist coating apparatus, FIG. 2 is a perspective view of a main part of an embodiment of the present invention, and FIG. 3 is a sectional view of the tip of a receiving groove. In the figure, 3 is a spray nozzle, 4 is a resist liquid, and 11 is a spray nozzle.
12 indicates a receiving groove, 12 indicates a support frame, and 13 indicates a section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 噴射ノズルより加圧してレジスト液を噴射するレジスト
塗布装置において、レジスト液の噴射を停止した後、ノ
ズル先端に残存した液滴に接触してこれを受ける受溝を
設けたことを特徴とするレジスト塗布装置。A resist coating device that sprays a resist solution under pressure from a spray nozzle, characterized in that a receiving groove is provided to contact and receive droplets remaining at the tip of the nozzle after the spraying of the resist solution is stopped. Coating device.
JP3583183U 1983-03-11 1983-03-11 Resist coating equipment Granted JPS59143044U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3583183U JPS59143044U (en) 1983-03-11 1983-03-11 Resist coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3583183U JPS59143044U (en) 1983-03-11 1983-03-11 Resist coating equipment

Publications (2)

Publication Number Publication Date
JPS59143044U true JPS59143044U (en) 1984-09-25
JPS6342527Y2 JPS6342527Y2 (en) 1988-11-08

Family

ID=30166518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3583183U Granted JPS59143044U (en) 1983-03-11 1983-03-11 Resist coating equipment

Country Status (1)

Country Link
JP (1) JPS59143044U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632724A (en) * 1979-08-24 1981-04-02 Hitachi Ltd Photoresist applying apparatus
JPS57135057A (en) * 1981-02-16 1982-08-20 Tokyo Denshi Kagaku Kabushiki Nozzle for dripping liquid

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632724A (en) * 1979-08-24 1981-04-02 Hitachi Ltd Photoresist applying apparatus
JPS57135057A (en) * 1981-02-16 1982-08-20 Tokyo Denshi Kagaku Kabushiki Nozzle for dripping liquid

Also Published As

Publication number Publication date
JPS6342527Y2 (en) 1988-11-08

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