JPS59138044A - 集束イオンビ−ム装置 - Google Patents

集束イオンビ−ム装置

Info

Publication number
JPS59138044A
JPS59138044A JP58011753A JP1175383A JPS59138044A JP S59138044 A JPS59138044 A JP S59138044A JP 58011753 A JP58011753 A JP 58011753A JP 1175383 A JP1175383 A JP 1175383A JP S59138044 A JPS59138044 A JP S59138044A
Authority
JP
Japan
Prior art keywords
magnetic field
ion
sample
generating part
field generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58011753A
Other languages
English (en)
Japanese (ja)
Other versions
JPS647457B2 (enExample
Inventor
Masanori Komuro
昌徳 古室
Hiroshi Hiroshima
洋 廣島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58011753A priority Critical patent/JPS59138044A/ja
Publication of JPS59138044A publication Critical patent/JPS59138044A/ja
Publication of JPS647457B2 publication Critical patent/JPS647457B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP58011753A 1983-01-27 1983-01-27 集束イオンビ−ム装置 Granted JPS59138044A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58011753A JPS59138044A (ja) 1983-01-27 1983-01-27 集束イオンビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58011753A JPS59138044A (ja) 1983-01-27 1983-01-27 集束イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS59138044A true JPS59138044A (ja) 1984-08-08
JPS647457B2 JPS647457B2 (enExample) 1989-02-08

Family

ID=11786755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58011753A Granted JPS59138044A (ja) 1983-01-27 1983-01-27 集束イオンビ−ム装置

Country Status (1)

Country Link
JP (1) JPS59138044A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7411192B2 (en) 2004-07-29 2008-08-12 Hitachi High-Technologies Corporation Focused ion beam apparatus and focused ion beam irradiation method
JP2014006265A (ja) * 2003-08-25 2014-01-16 Ion-Tof Technologies Gmbh 質量分析器およびこの質量分析器のための液体金属イオン源

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03171838A (ja) * 1989-11-29 1991-07-25 Alpine Electron Inc 自動車電話装置のパワーセーブ方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014006265A (ja) * 2003-08-25 2014-01-16 Ion-Tof Technologies Gmbh 質量分析器およびこの質量分析器のための液体金属イオン源
US7411192B2 (en) 2004-07-29 2008-08-12 Hitachi High-Technologies Corporation Focused ion beam apparatus and focused ion beam irradiation method

Also Published As

Publication number Publication date
JPS647457B2 (enExample) 1989-02-08

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