JPS59138044A - 集束イオンビ−ム装置 - Google Patents
集束イオンビ−ム装置Info
- Publication number
- JPS59138044A JPS59138044A JP58011753A JP1175383A JPS59138044A JP S59138044 A JPS59138044 A JP S59138044A JP 58011753 A JP58011753 A JP 58011753A JP 1175383 A JP1175383 A JP 1175383A JP S59138044 A JPS59138044 A JP S59138044A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- ion
- sample
- generating part
- field generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 21
- 238000012937 correction Methods 0.000 claims abstract description 7
- 230000005389 magnetism Effects 0.000 abstract description 6
- 230000001133 acceleration Effects 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 description 48
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 150000001793 charged compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000000155 isotopic effect Effects 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58011753A JPS59138044A (ja) | 1983-01-27 | 1983-01-27 | 集束イオンビ−ム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58011753A JPS59138044A (ja) | 1983-01-27 | 1983-01-27 | 集束イオンビ−ム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59138044A true JPS59138044A (ja) | 1984-08-08 |
| JPS647457B2 JPS647457B2 (enrdf_load_stackoverflow) | 1989-02-08 |
Family
ID=11786755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58011753A Granted JPS59138044A (ja) | 1983-01-27 | 1983-01-27 | 集束イオンビ−ム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59138044A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7411192B2 (en) | 2004-07-29 | 2008-08-12 | Hitachi High-Technologies Corporation | Focused ion beam apparatus and focused ion beam irradiation method |
| JP2014006265A (ja) * | 2003-08-25 | 2014-01-16 | Ion-Tof Technologies Gmbh | 質量分析器およびこの質量分析器のための液体金属イオン源 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03171838A (ja) * | 1989-11-29 | 1991-07-25 | Alpine Electron Inc | 自動車電話装置のパワーセーブ方法 |
-
1983
- 1983-01-27 JP JP58011753A patent/JPS59138044A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014006265A (ja) * | 2003-08-25 | 2014-01-16 | Ion-Tof Technologies Gmbh | 質量分析器およびこの質量分析器のための液体金属イオン源 |
| US7411192B2 (en) | 2004-07-29 | 2008-08-12 | Hitachi High-Technologies Corporation | Focused ion beam apparatus and focused ion beam irradiation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS647457B2 (enrdf_load_stackoverflow) | 1989-02-08 |
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