JPS59130053A - Electron microscope - Google Patents
Electron microscopeInfo
- Publication number
- JPS59130053A JPS59130053A JP58005688A JP568883A JPS59130053A JP S59130053 A JPS59130053 A JP S59130053A JP 58005688 A JP58005688 A JP 58005688A JP 568883 A JP568883 A JP 568883A JP S59130053 A JPS59130053 A JP S59130053A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- sample holder
- temperature
- heat
- grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
Abstract
Description
【発明の詳細な説明】
本発明は電子顕微鏡に関し、特に試料を高温加熱しなが
ら観察することのできる電子顕微鏡に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron microscope, and more particularly to an electron microscope capable of observing a sample while heating it to a high temperature.
従来、高温での物質の挙動の研究、あるいは熱処理によ
る物質の変化状態の研究等に試料を加熱しながら観察す
る形式の電子顕微鏡が用いられている。試料の加熱装置
として現在二つ装置が作られている。その一つは、試料
保持部に抵抗線を巻いた作った電気炉を使用するもので
必り、他の一つは試料を保持している細線グリッドに電
流を通して加熱するものである。BACKGROUND OF THE INVENTION Conventionally, an electron microscope that observes a sample while it is heated has been used to study the behavior of substances at high temperatures or to study the state of change of substances due to heat treatment. Currently, two devices are being manufactured as sample heating devices. One method uses an electric furnace made by wrapping a resistance wire around the sample holder, and the other method heats the sample by passing an electric current through a thin wire grid.
第１図は従来の電子顕微鏡用試料加熱装置の一例の断面
図である。FIG. 1 is a sectional view of an example of a conventional sample heating device for an electron microscope.
第１図において、１は試料ホルダー、２は試料回転支持
軸、３は試料加熱部、４は抵抗線、５は試料押えねじ、
６は熱電対である。この加熱装置に試料８を装着し、電
子ビーム９をあてて観察するので必る。In Fig. 1, 1 is a sample holder, 2 is a sample rotation support shaft, 3 is a sample heating section, 4 is a resistance wire, 5 is a sample holding screw,
6 is a thermocouple. This is necessary because the sample 8 is mounted on this heating device and the electron beam 9 is applied to it for observation.
上述の加熱装置は熱容量が小さい為に、温度を安定に制
御することが極めて困離でめった。また、発熱体が金属
である為、その金属自身による試料あるいは試料室の汚
染が不可避であった。この金属汚染は、観察結果そのも
の及び装置の保守に対して重大な悪影響を及ばすという
欠点がある。Since the heating device described above has a small heat capacity, it is extremely difficult to control the temperature stably. Furthermore, since the heating element is a metal, contamination of the sample or the sample chamber by the metal itself is unavoidable. This metal contamination has the disadvantage that it has a serious negative effect on the observation results themselves and on the maintenance of the apparatus.
本発明の目的は上記欠点を除去し、試料を安定に高温加
熱し、かつ、清浄条件下で観察することのできる電子顕
微鏡を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide an electron microscope capable of eliminating the above drawbacks, stably heating a sample to a high temperature, and observing the sample under clean conditions.
本発明によれば、二酸化珪素で作られた試料ホルダーと
、核試料ホルダーを照射して加熱するレーザー装置と、
前記試料ホルダー内に温度センサ部が設けられている温
度測定装置とを含むことを特徴とする電子顕微鏡が得ら
れる。According to the present invention, a sample holder made of silicon dioxide, a laser device for irradiating and heating the nuclear sample holder,
There is obtained an electron microscope characterized in that it includes a temperature measuring device in which a temperature sensor section is provided in the sample holder.
次に、本発明の実施例について図面を用いて説明する。Next, embodiments of the present invention will be described using the drawings.
第２図は本発明の一実施例の一部断面側面図である。こ
の実施例は、二酸化珪素で作られた試料ホルダー１１と
、該試料ホルダー１１を照射して加熱するレーザー装置
（図示していない）と、試料ホルダー１１内に温度セン
サ部１６が設けられている温度測定装置とを含んで構成
される。FIG. 2 is a partially sectional side view of one embodiment of the present invention. This embodiment includes a sample holder 11 made of silicon dioxide, a laser device (not shown) that irradiates and heats the sample holder 11, and a temperature sensor section 16 inside the sample holder 11. and a temperature measuring device.
第３図は第２図に示す試料ホルダーの平面図である。FIG. 3 is a plan view of the sample holder shown in FIG. 2.
この試料ホルダー１１は試料回転支持軸１２を有し、ま
た試料８を載せる部分には試料保持グリッド１３を有す
。この試料保持グリッド１３が高純度二酸化珪素（Ｓｉ
Ｃ）ｚ）で作られる。This sample holder 11 has a sample rotation support shaft 12, and also has a sample holding grid 13 on the part on which the sample 8 is placed. This sample holding grid 13 is made of high purity silicon dioxide (Si).
C) Made by z).
第４図は第１図に示す試料押えねじの平面図及び断面図
である。FIG. 4 is a plan view and a sectional view of the sample holding screw shown in FIG. 1.
試料押えねじ１５は試料ホルダー１１に試料８を載せた
後、試料ホルダー１１に螺合させて試料を固定するもの
である。After the sample 8 is placed on the sample holder 11, the sample holding screw 15 is screwed into the sample holder 11 to fix the sample.
再び第２図に戻って説明する。レーザー装置、例えば炭
酸ガスレーザーから発せられるレーザー光線２１を導波
管２０で試料ホルダー１１の下まで導き、前述のグリッ
ド１３にレーザー光線２１を照射して試料８を加熱する
。加熱温度は熱電対の温度センサ部１６で測定する。The explanation will be given by returning to FIG. 2 again. A laser beam 21 emitted from a laser device, such as a carbon dioxide laser, is guided through a waveguide 20 to below the sample holder 11, and the aforementioned grid 13 is irradiated with the laser beam 21 to heat the sample 8. The heating temperature is measured by a thermocouple temperature sensor section 16.
この発明は、５ＩＯ２が波長９．２μｍの赤外線に対し
て鋭い吸収ピークを有していることを利用している。グ
ＩＪ ノド１３はレーザー光２１のエネルギーを吸収し
て昇温し、試料８を加熱する。従って、グリッドを効率
良く加熱するためには波長９．２μｍに近い波長のレー
ザー光を用いるのが有利である。波長９．２μｍに近い
波長を発するレーザーとして炭酸ガスレーザーがある。This invention utilizes the fact that 5IO2 has a sharp absorption peak for infrared rays at a wavelength of 9.2 μm. The IJ throat 13 absorbs the energy of the laser beam 21 and raises its temperature, thereby heating the sample 8. Therefore, in order to efficiently heat the grid, it is advantageous to use laser light with a wavelength close to 9.2 μm. A carbon dioxide laser is a laser that emits a wavelength close to 9.2 μm.
炭酸ガスレーザーは９．５６９１〜９．６７６２μｍ及
び１０．５１３５〜１０．７８８０μｍに発振線を有し
ている。また、試料ホルダーの昇温部分（グリッド１３
）には金属を使用していないので、金属の蒸発による汚
染も起らない。The carbon dioxide laser has oscillation lines at 9.5691-9.6762 μm and 10.5135-10.7880 μm. In addition, the heated part of the sample holder (grid 13
) does not contain metals, so there is no contamination caused by metal evaporation.
以上詳細に説明したように、本発明によれば、試料を安
定に高温加熱し、かつ金属汚染を起さない試料加熱装置
を有する電子顕微鏡が得られるのでその効果は大きい。As described in detail above, according to the present invention, it is possible to obtain an electron microscope having a sample heating device that stably heats a sample at a high temperature and does not cause metal contamination, which is highly effective.
第１図は従来の電子顕微鏡の試料加熱装置の一例の一部
断面側面図、第２図は本発明の一実施例の一部断面側面
図、第３図は第２図に示す試料ホルダーの平面図、第４
図は第２図に示す試料押えねじの平面図及び断面図であ
る。
１・・・・・・試料ホルダー、２・・・・・・試料回転
支持軸、３・・・・・・試料加熱部、４・・・・・・抵
抗線、５・・・・・・試料押えねじ、６・・・・・・熱
電対、８・・・・・・試料、９・・・・・・電子ビーム
、１１・・・・・・試料ホルダー、１２・・・・・・試
料回転支持軸、１３・・・・・・グリッド、１５・・・
・・・試料押えね舅１６・・・・・・温度セベ２Ｃ１−
・・−導波管、２１・・・・・・レーサー光。
阜（閏
茅３０
（０−〕
（レノ
半４７Fig. 1 is a partially sectional side view of an example of a conventional sample heating device for an electron microscope, Fig. 2 is a partially sectional side view of an embodiment of the present invention, and Fig. 3 is a side view of a sample holder shown in Fig. 2. Floor plan, 4th
The figures are a plan view and a sectional view of the sample holding screw shown in FIG. 2. 1...Sample holder, 2...Sample rotation support shaft, 3...Sample heating section, 4...Resistance wire, 5... Sample holding screw, 6...Thermocouple, 8...Sample, 9...Electron beam, 11...Sample holder, 12... Sample rotation support shaft, 13...Grid, 15...
...Sample holding part 16...Temperature control 2C1-
...-Waveguide, 21...Racer light.阜(阜茅30 (0-)) (Reno Han 47
Claims (1)
を照射して加熱するレーザー装置と、前記試料ホルダー
内に温度センサ部が設けられている温度測定装置とを含
むことを特徴とする電子顕微鏡。An electron microscope characterized in that it includes a sample holder made of silicon dioxide, a laser device that irradiates and heats the sample holder, and a temperature measuring device in which a temperature sensor section is provided in the sample holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58005688A JPS59130053A (en) | 1983-01-17 | 1983-01-17 | Electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58005688A JPS59130053A (en) | 1983-01-17 | 1983-01-17 | Electron microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59130053A true JPS59130053A (en) | 1984-07-26 |
Family
ID=11618035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58005688A Pending JPS59130053A (en) | 1983-01-17 | 1983-01-17 | Electron microscope |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59130053A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012114087A (en) * | 2010-11-24 | 2012-06-14 | Fei Co | Method of measuring temperature of sample carrier in charged particle-optical apparatus |
| JP2016054120A (en) * | 2014-09-04 | 2016-04-14 | 新日鐵住金株式会社 | Crystal observation system and crystal observation method |
-
1983
- 1983-01-17 JP JP58005688A patent/JPS59130053A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012114087A (en) * | 2010-11-24 | 2012-06-14 | Fei Co | Method of measuring temperature of sample carrier in charged particle-optical apparatus |
| JP2016054120A (en) * | 2014-09-04 | 2016-04-14 | 新日鐵住金株式会社 | Crystal observation system and crystal observation method |
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