JPS59125832U - 熱処理装置 - Google Patents

熱処理装置

Info

Publication number
JPS59125832U
JPS59125832U JP1962183U JP1962183U JPS59125832U JP S59125832 U JPS59125832 U JP S59125832U JP 1962183 U JP1962183 U JP 1962183U JP 1962183 U JP1962183 U JP 1962183U JP S59125832 U JPS59125832 U JP S59125832U
Authority
JP
Japan
Prior art keywords
heat treatment
treatment equipment
core tube
furnace
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1962183U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0319222Y2 (enrdf_load_stackoverflow
Inventor
大越　隆之
小松　靖秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1962183U priority Critical patent/JPS59125832U/ja
Publication of JPS59125832U publication Critical patent/JPS59125832U/ja
Application granted granted Critical
Publication of JPH0319222Y2 publication Critical patent/JPH0319222Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP1962183U 1983-02-14 1983-02-14 熱処理装置 Granted JPS59125832U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1962183U JPS59125832U (ja) 1983-02-14 1983-02-14 熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1962183U JPS59125832U (ja) 1983-02-14 1983-02-14 熱処理装置

Publications (2)

Publication Number Publication Date
JPS59125832U true JPS59125832U (ja) 1984-08-24
JPH0319222Y2 JPH0319222Y2 (enrdf_load_stackoverflow) 1991-04-23

Family

ID=30150761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1962183U Granted JPS59125832U (ja) 1983-02-14 1983-02-14 熱処理装置

Country Status (1)

Country Link
JP (1) JPS59125832U (enrdf_load_stackoverflow)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56153728A (en) * 1980-04-30 1981-11-27 Kokusai Electric Co Ltd Electric furnace having uniform temperature distribution region
JPS57112011A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Heat treatment equipment for semiconductor wafer
JPS5835428A (ja) * 1981-08-27 1983-03-02 Mitsubishi Electric Corp 温度記憶素子
JPS5934627A (ja) * 1982-08-23 1984-02-25 Hitachi Ltd 半導体熱処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56153728A (en) * 1980-04-30 1981-11-27 Kokusai Electric Co Ltd Electric furnace having uniform temperature distribution region
JPS57112011A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Heat treatment equipment for semiconductor wafer
JPS5835428A (ja) * 1981-08-27 1983-03-02 Mitsubishi Electric Corp 温度記憶素子
JPS5934627A (ja) * 1982-08-23 1984-02-25 Hitachi Ltd 半導体熱処理装置

Also Published As

Publication number Publication date
JPH0319222Y2 (enrdf_load_stackoverflow) 1991-04-23

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