JPS59124573A - Abrasive material and preparation thereof - Google Patents

Abrasive material and preparation thereof

Info

Publication number
JPS59124573A
JPS59124573A JP22923182A JP22923182A JPS59124573A JP S59124573 A JPS59124573 A JP S59124573A JP 22923182 A JP22923182 A JP 22923182A JP 22923182 A JP22923182 A JP 22923182A JP S59124573 A JPS59124573 A JP S59124573A
Authority
JP
Japan
Prior art keywords
abrasive material
synthetic resin
resin material
cracks
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22923182A
Other languages
Japanese (ja)
Other versions
JPH0329549B2 (en
Inventor
Takashi Miyatani
孝 宮谷
Junji Nakada
順二 中田
Kisuke Seki
關 喜介
Satonaka Kageyama
蔭山 学央
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Mitsui Toatsu Chemicals Inc
Original Assignee
Toshiba Corp
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Mitsui Toatsu Chemicals Inc filed Critical Toshiba Corp
Priority to JP22923182A priority Critical patent/JPS59124573A/en
Priority to US06/522,736 priority patent/US4548617A/en
Publication of JPS59124573A publication Critical patent/JPS59124573A/en
Publication of JPH0329549B2 publication Critical patent/JPH0329549B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00Selection of abrasive materials or additives for abrasive blasts
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PURPOSE:To obtain an abrasive material which can be used for a long period by using, as abrasive material, a synthetic resin particle which has cracks which can be cleaved by an external force, so that new edges are always formed, because the particle is cleaved by the shock during vapor blasting. CONSTITUTION:An unsaturated polyester resin block is formed by pouring the unsaturated polyester material added with catalyst into a mold. Then, said block is cut to form pellet form, and after pulverized by a crasher, etc., further said pellet is pulveriszed mintely by a ball mill, etc., and an unsaturated polyester resin particle 6 having a number of cutting edges is obtained. Then, said pulverized body 6 is further pulverized minutely by using a compression machine in which the crashed pieces 3... are having a relatively high hardness held onto the opposite surface of the upper and the lower molds 1 and 2 through adhesive layers 4a and 4b, and an abrasive material 8 which has cracks 7 which can be cleaved by an external force is obtained. Said abrasive material 8 is used for removing the burr on a molded article, in a blasting apparatus.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は合成樹脂製の研磨材に関し、特に噴射加工中に
おいて鋭いエツジの新生作用(以下、自生売方作用)を
有する研磨材及びその製造方法に係る。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an abrasive material made of synthetic resin, and in particular to an abrasive material that has the effect of generating sharp edges during jetting processing (hereinafter referred to as self-regeneration effect) and a method for producing the same. Pertains to.

〔発明の技術的背景〕[Technical background of the invention]

軟質金属の表面処理や電子′機器部品のパリ取り除去を
行なうには、研磨材を圧縮空気で加速し、被加工物であ
る軟質金属や電子機器部品に衝突させて噴射加工する方
法が採用されている。
In order to perform surface treatment on soft metals and remove deburrs from electronic equipment parts, a method is adopted in which the abrasive material is accelerated with compressed air and jetted by colliding with the soft metal or electronic equipment parts being processed. ing.

かかる研磨材としては、従来、くるみ穀粉、あんず穀粉
が用いられている。
Conventionally, walnut flour and apricot flour have been used as such abrasives.

〔背景技術の問題点〕[Problems with background technology]

しかしながら、植物性であるくるみ穀粉、あんず穀粉は
乾燥状態での弾性力が大きく、粘り気があるため、これ
らを研磨材として用いて被、加工物の噴射加工を行なう
と、該研磨材のエツジだけが丸くなって短時間で研磨力
が低下するという欠点があった。特に、かかる研磨材を
半導体モールド成形品の樹脂パリの除去に適用すると、
該成形品のリードフレーム上およびリード間に存在する
樹脂パリを十分除去できない0〔発明の目的〕 本発明は被加工物への噴射加工に際して良好な研磨力を
長期間に亘って発揮し得る研磨材及びその製造方法を提
供しようとするものである0〔発明の概要〕 本発明の研磨材は外力にエリイ開可゛能なりラックをも
つ合成樹脂粒体からなるものである0上記粒体にはクシ
ツクが不規則的に形成されており、噴射加工時の衝撃に
より前記クシツクに沿って割れ、脱落し、新しい鋭いエ
ツジが形成されるものである0このことから、該粒体は
硬度が高く、延性の低い合成樹脂から構成することが望
゛ましい。かかる合成樹脂としては、例えばエポキシ樹
脂、尿素樹脂、ポリエステル樹脂等の熱硬化性樹脂のほ
かアクリル樹脂等比較的硬質の熱硬化性樹脂を挙げるこ
とができる0上記合成樹脂粒体は圧縮空気による噴射加
工により被加工物の研削や樹脂パリ除去を行なう目的か
ら、多数の切れ刃用エツジを有する構造にすることが望
ましい。また、合成樹脂粒体の形状は扁平形9粒状、針
状等任意であり、かつこれらの形状の異なる合成樹脂粒
体全混合して研磨材を構成してもよい0 上記合成樹脂粒体の大きさは研磨材の用途により自由に
選定し得るが、例えばモールド成形品の樹脂パリ除去に
用いる場合には平均径(1つの粒体の最大径と最小径の
和の%)で0.05〜20.−の範囲内においてピーク
を持つ分布のものが望ましい。
However, since walnut flour and apricot flour, which are vegetable-based flours, have high elasticity and stickiness when dry, when these are used as abrasives to blast the workpiece or workpiece, only the edges of the abrasives are removed. The disadvantage was that the polishing force became rounded and the polishing power decreased in a short period of time. In particular, when such an abrasive is applied to remove resin particles from semiconductor molded products,
The resin particles existing on the lead frame and between the leads of the molded product cannot be sufficiently removed. [Object of the Invention] The present invention provides a polishing method that can exert good polishing power over a long period of time when spraying a workpiece. [Summary of the Invention] The abrasive material of the present invention is made of synthetic resin granules having a rack that can be opened by external force. The granules have irregularly formed ridges, and the impact during the blasting process causes them to crack and fall off along the ridges, forming new sharp edges.For this reason, the granules have high hardness. It is preferable to use a synthetic resin with low ductility. Examples of such synthetic resins include thermosetting resins such as epoxy resins, urea resins, and polyester resins, as well as relatively hard thermosetting resins such as acrylic resins.The synthetic resin particles may be sprayed with compressed air. For the purpose of grinding the workpiece and removing resin particles during machining, it is desirable to have a structure with a large number of cutting edges. Further, the shape of the synthetic resin granules may be arbitrary, such as flat, acicular, etc., and all of these synthetic resin granules with different shapes may be mixed to form the abrasive material. The size can be freely selected depending on the purpose of the abrasive, but for example, when used for removing resin debris from molded products, the average diameter (% of the sum of the maximum diameter and minimum diameter of one particle) is 0.05. ~20. A distribution with a peak within the range of - is desirable.

上述した本発明の研磨材の製造方、法は、合成樹脂素材
を成形する方法と、この合成樹脂素材を粒状化する方法
とからなり、上記合成樹脂素材を成形及び又は粒状化す
るときにクラックを発生させることを特徴としている。
The method for manufacturing the abrasive material of the present invention described above consists of a method of molding a synthetic resin material and a method of granulating the synthetic resin material, and when molding and/or granulating the synthetic resin material, cracks are removed. It is characterized by generating.

クラックの発生方法としては、熱硬化性樹脂の成形時の
発熱反応全利用して肉厚成形により内部歪を保持するよ
う合成樹脂素材を成形する方法、熱硬化性樹脂を予め粒
体化しておき(粒径0.05〜5 turt )その粒
体を核として合成樹脂中に分散し成形し、この成形の際
発生する収縮にエリ核体の周囲にクラックを発生させ、
さらに粉体化する方法、合成樹脂素材を加熱又は触媒添
加によりゲル化させ、硬化のすすまない段階で歪をかけ
たのち粗粉砕し、この粗粉砕の際、硬化のすすまない段
階の成形物のもろい特性に↓り無数のクラックが発生す
ること全利用する方法、合成樹脂素材を高温下(50〜
150℃)にて成形することにより成形反応を急激にお
こない内部ひずみを急激に発生さ騒クジツク全無数に入
れる方法、合成樹脂素材を成形後アセトン、メタノール
等の薬液に浸漬するか又は煮沸水中に浸潰し軟化させ成
形物中に微細り2ツクを発生させさらに粉砕化時にり2
ツクを発生させる方法へ多数の切刃をもった加工具によ
り加圧して粗粒体化したものを微細粒体化させ強制的に
クラックを発生させる方法、合成樹脂素材を成形後粗粒
体化したものを10℃以下望ましくは一20℃以下の温
度に冷却し、もろくした段階で微細粒体化させることに
よる方法、合成樹脂素材を成形後粗粒体化後、高温下1
50℃以上の温度に加熱し強度低下状態にして微細粒体
化させクラックを発生させる方法、及び上期方法を少な
くとも2つ以上組み合せて粉体化した研磨材にクラック
を発生させる方法等適当な方法を選択し得しかして、本
発明の研磨材は外力により臂開可能なりラックを有する
合成樹脂粒体からなるため、これを圧縮空気で加速し、
被加工物に衝突させて噴射加工した場合、該研磨材の衝
突力によって被加工物の研削或いはパリ除去を行なうこ
とができると共に、該噴射加f中での衝撃力によって前
記クラックに沿って容易に割れ、脱落を生じて新しい鋭
いエツジが形成され、長期間の使用においても被加工物
の研削或いはパリ除去性能を維持できる。
Cracks can be generated by molding a synthetic resin material by making full use of the exothermic reaction during molding of the thermosetting resin to maintain internal strain through thick molding, or by forming the thermosetting resin into granules in advance. (Particle size: 0.05 to 5 turt) The particles are dispersed as cores in a synthetic resin and molded, and the shrinkage that occurs during molding causes cracks to occur around the core bodies.
Furthermore, there is a method of pulverizing the synthetic resin material by heating or adding a catalyst to gel it, applying strain at a stage where hardening has not progressed, and then coarsely pulverizing it. Due to its brittle characteristics, countless cracks may occur.The synthetic resin material is heated at high temperatures (50~
A method in which the molding reaction occurs rapidly by molding at 150°C) and internal strain is rapidly generated. After molding, the synthetic resin material is immersed in a chemical solution such as acetone or methanol, or in boiling water. It is soaked and softened to generate fine particles in the molded product, and further crushed when crushed.
A method for generating cracks, a method in which a processing tool with a large number of cutting edges is used to apply pressure to make coarse particles into fine particles and forcibly generate cracks, and a synthetic resin material is made into coarse particles after molding. A method in which the synthetic resin material is cooled to a temperature of 10°C or less, preferably -20°C or less, and then turned into fine granules at the stage of brittleness.
Appropriate methods include heating the material to a temperature of 50°C or higher to reduce its strength, turning it into fine particles and generating cracks, and combining at least two of the above methods to generate cracks in the powdered abrasive material. However, since the abrasive material of the present invention is composed of synthetic resin granules having a rack that can be opened by external force, this is accelerated with compressed air,
When the workpiece is jetted by colliding with the workpiece, the impact force of the abrasive material can grind or remove debris from the workpiece, and the impact force during the jetting process can easily be applied along the cracks. The new sharp edges are formed by cracking and falling off, and the grinding or deburring performance of the workpiece can be maintained even during long-term use.

なお、上記合成樹脂粒体に界面活性剤を保持せしめて研
磨材を構成すれば、この研磨材を用いて被加工物を特に
乾式ブラスト処理した場合、被加工物への帯電発生全阻
止でき、ブラスト処理後の被加工物の洗浄処理を簡格に
できる等の効果を有する。
In addition, if an abrasive material is formed by retaining a surfactant in the synthetic resin granules, when a workpiece is subjected to dry blasting using this abrasive material, it is possible to completely prevent the generation of electrical charges on the workpiece. This has the effect of simplifying the cleaning process of the workpiece after blasting.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明を実施例に基づいて詳細に説明する。 Hereinafter, the present invention will be explained in detail based on examples.

実施例1 まず、不飽和ポリエステル素材ニスターR235A−1
(商品名;三井東圧化学株式会社製)に触媒55%ME
KPO(メチル・エテル−ケトン・バー・オキサイド)
を2%添加し1縦×横×高さ300鵡×300期×20
間の型に注型する。このようにして得られた不飽和ポリ
エステル樹脂ブロックを切断してペレット状とし、これ
をクラッシャー、ノ・ンマー等にエリ粗粉砕した後、ボ
ールミル、゛ロールミル又は衝撃粉砕機等を用いて粗粒
体を微粉砕して平均径m” 0.7 hi前後の多数の
切れ刃用エツジを有する不飽和ポリエステル樹脂粒体を
造った0つづいて、第1図に示す如く上下型1.2の対
向面に合成樹脂より格段に硬い材料(例えばダイヤモン
ド)の破砕片3・・・全固着剤層4a、4bk介して保
持した構造の圧縮機全用意し、この上下型1,2間に前
記方法で造った多数のエツジ5・・・全装するポリエス
テル樹脂粒体6・・・全装填し、上下型1.2にエリ圧
縮することによって前H己破砕片3・・・と当接する粒
体6をさらに微細粒体イヒして、外力により臂開可能な
りラック7・・・を有する平均粒径0,3間前後の研磨
材8金得た0次に、前記研磨材による第2図図示の半導
体モールド成形品の樹脂パリ除去を第3図図示の湿式ブ
ラスト装置を用いて説明す、る0予め、半導体素子がマ
ウントされたリードフレール全成形金型内に収納した後
、該金型内にエポキシ樹脂全注入して第2図(示す如く
リードフレーム9上の半導体素子(図示せず)が樹脂層
10″c刊止された半導体モールド成形品1−1ヲ成形
した。この成形品ノー1にはモールド成形時において樹
脂層10付近のリードフレーム9上及びリードフレーム
9のリード間に樹脂パリI2・・・が発生した。
Example 1 First, unsaturated polyester material Nister R235A-1
(Product name: Mitsui Toatsu Chemical Co., Ltd.) with catalyst 55% ME
KPO (methyl ether-ketone bar oxide)
Add 2% of
Pour into the mold in between. The unsaturated polyester resin block obtained in this way is cut into pellets, which are coarsely ground using a crusher, a crusher, etc., and then coarsely pulverized using a ball mill, roll mill, impact grinder, etc. Then, as shown in Fig. 1, the facing surfaces of the upper and lower molds 1.2 were prepared by finely pulverizing the unsaturated polyester resin particles having a large number of cutting edges with an average diameter of about m" 0.7 hi. A compressor with a structure in which crushed pieces 3 of a material much harder than synthetic resin (for example, diamond) are held through adhesive layers 4a and 4bk is prepared, and between the upper and lower molds 1 and 2, a compressor made by the above method is prepared. A large number of edges 5... fully loaded polyester resin granules 6... are fully loaded and compressed into the upper and lower molds 1.2, thereby making the granules 6 in contact with the front H self-crushed pieces 3... Furthermore, fine grains were further developed, and an abrasive material having an average grain size of about 0.3 and having a rack 7 which could be opened by an external force was obtained.Next, the semiconductor shown in FIG. The removal of resin debris from a molded product will be explained using the wet blasting device shown in Figure 3.After the entire lead flail on which the semiconductor element is mounted is placed in the mold, epoxy is poured into the mold. The entire resin was injected to form a semiconductor molded product 1-1 in which a semiconductor element (not shown) on a lead frame 9 was fixed in a resin layer 10''c as shown in FIG. During molding, resin particles I2 were generated on the lead frame 9 near the resin layer 10 and between the leads of the lead frame 9.

次いで、第3図に示す加圧室13内に設置したホッパI
4内に前記研磨羽8・・・と水15とを1:3の比率で
収容した。つづいて、第1のポンプ16を作動して研磨
羽8・・・を水15と共に吸い込み、これをホッパ14
底部へ強制的に送給することにより攪拌し、研磨材8・
・・を均一に分散させてスラリーを調製したO 次いで、第2のポンプ17f作動させて、スラリーを吸
上げてガンI8に導入し、これを空気導入管I9からの
圧縮空気により分散加速して水、研磨材及び空気の三相
高速噴射流20として加工室13内に搬送された前述の
半導体モ−ルド成形品(図示せず)に向って噴射させた
0このように噴射流がモールド成形品に噴射されると、
第4図に示す如く多数のエツジ5・・・を有する研磨材
8がモールド成形品11のリードフレーム9上及びリー
ドフレーム9のリード間に付着した樹脂パリ12に衝突
する。樹脂パリI2は熱硬化性のエポキシ樹脂からなり
、比較的脆い研磨材8のエツジ5による集中的(局所的
)な衝撃力及び該衝撃力に伴なう振動により樹脂バリ1
2にクラック21が発生する。しかも、樹脂パリ12に
発生したクラック21に水が浸入してリードフレーム9
と樹脂バリ12の界面に入り、樹脂パリ12′をリード
フレーム9に対して浮かすように作用する。更に、多数
のエツジ5・・・を有する研磨材8が樹脂バリ12のク
ラック21に伺度も衝突するため、前記浸入した水によ
る樹脂バ。す12の浮上げ作用と相俟って樹脂バリ12
が完全に除去される0また、研磨材8は表面から内部に
向って不規則的なりラック2・・・を有するため、前記
半導体モールド成形品1−1への衝突にエリ、研磨材8
のクラック7に沿って割れ、丸くなったエツジが脱落し
て新しい鋭いエツジが形成される。その結果、長期間の
使用においても半導体モールド成形品IIの樹脂パリI
2の除去性能を維持できる。
Next, the hopper I installed in the pressurizing chamber 13 shown in FIG.
The polishing blades 8 and water 15 were housed in the container 4 at a ratio of 1:3. Next, the first pump 16 is operated to suck in the polishing blades 8 along with the water 15, and these are transferred to the hopper 14.
The abrasive material 8 is agitated by being forcibly fed to the bottom.
A slurry was prepared by uniformly dispersing O. Next, the second pump 17f was operated to suck up the slurry and introduce it into the gun I8, where it was dispersed and accelerated by compressed air from the air introduction pipe I9. A three-phase high-speed jet stream 20 of water, abrasive material, and air is injected toward the semiconductor molded product (not shown) that is transported into the processing chamber 13. When sprayed on the product,
As shown in FIG. 4, the abrasive material 8 having a large number of edges 5 collides with the resin particles 12 attached on the lead frame 9 of the molded product 11 and between the leads of the lead frame 9. As shown in FIG. The resin burr I2 is made of a thermosetting epoxy resin, and the resin burr 1 is made of a thermosetting epoxy resin due to the concentrated (local) impact force caused by the edge 5 of the relatively brittle abrasive material 8 and the vibration accompanying the impact force.
2, a crack 21 occurs. Furthermore, water may enter the cracks 21 that have occurred in the resin pad 12, causing the lead frame 9
and enters the interface between the resin burr 12 and acts to float the resin burr 12' relative to the lead frame 9. Furthermore, since the abrasive material 8 having a large number of edges 5 collides with the cracks 21 of the resin burr 12, the resin burr is damaged by the infiltrated water. Coupled with the lifting action of the resin burr 12
Furthermore, since the abrasive material 8 has irregular racks 2 from the surface toward the inside, the abrasive material 8 is prone to colliding with the semiconductor molded product 1-1.
It splits along the crack 7, and the rounded edges fall off to form new sharp edges. As a result, even after long-term use, the resin Paris I of semiconductor molded product II
2 removal performance can be maintained.

したがって、本発明の研磨材8を用いて例えば半導体モ
ールド成形品1−1ヲ噴射加工することによって、該成
形品1−1の樹脂バ、°す12を効果的に除去できると
共に、該研磨材8のクラック7・・・に沿っての割れ、
脱落により生じた新しい鋭いエツジによって成形品1−
1の微細箇所(例えばリードフレーム9のリード間等)
に付着した樹脂パリ12をも除去残りを生じることなく
完全に除去できる。
Therefore, by spraying, for example, the semiconductor molded product 1-1 using the abrasive material 8 of the present invention, the resin bar and the glass 12 of the molded product 1-1 can be effectively removed, and the abrasive material Cracks in 8, cracks along 7...
The new sharp edges created by the falling off caused molded product 1-
1 minute location (for example, between the leads of lead frame 9, etc.)
The resin particles 12 attached to the surface can be completely removed without leaving any residue.

事実、以下に示す試験により本実施例1の研磨材が優れ
たパリ取り性能を有することが確認された0なお、この
試験では比較例を併記して説明する。
In fact, the test shown below confirmed that the abrasive material of Example 1 had excellent deburring performance.In addition, in this test, a comparative example will also be described.

比較例 不飽和ポリエステル素材ニスターR235A−1(商品
名:三井東圧化学株式会社製作触媒55チMEKPO(
メチル・エチル・ケトン・オキサイド)を2%添加し、
縦×横×高さ 300朋x30QrIgLX20駄の型に注型する0こ
のようにして得られた合成樹脂ブロックをクラッシャー
、ノ・ンマーで粗粉砕した後、ホールミル。
Comparative Example: Unsaturated polyester material Nister R235A-1 (Product name: Mitsui Toatsu Chemical Co., Ltd. Catalyst 55CH MEKPO (
Add 2% of methyl ethyl ketone oxide),
Cast into a mold of length x width x height 300 mm x 30 QrIgL x 20 mm.The synthetic resin block thus obtained was coarsely crushed using a crusher and a non-marine, and then milled.

ロールミル又は衝撃粉砕機を用い−て平均粒径〃工0.
3B前後の合成樹脂粒体を得た0 しかして、本実施例1のクラックが形成された研磨材及
び前記比較例のクラックの数の少ない研磨#を用いて半
導体装置の樹脂/(すの除去を行なってパリ取り性能を
調べたところ、第5図に示すグラフを得た。ここセ、試
験条件番ま連続24時間湿式プラスト装置にエリ半導体
装置をパリ取り加工した後、更に10000個の)(v
取りしたものであって、これら10000個の被加工物
のうちから任意に1000個サンプリングした被加工物
のうち、完全にノーv取りされた被加工物の割合をパリ
取り性として100分率で表示したものである0この第
5図から明らかな如く、本実施例1の研磨材はパリ取り
性がほぼ100%であるのに対し、比較例の研磨材はパ
リ取り性がほぼ80q6と低く、本発明の研磨材は優れ
たパリ取り性を有することがわかる。
Using a roll mill or impact mill, the average particle size is reduced to 0.
Synthetic resin granules of around 3B were obtained.0 However, using the abrasive material with cracks of Example 1 and the abrasive material with a small number of cracks of the Comparative Example, it was possible to remove the resin/(stain) of semiconductor devices. When the deburring performance was investigated, the graph shown in Figure 5 was obtained.The test conditions were as follows: After deburring the semiconductor devices in a continuous 24-hour wet blasting machine, an additional 10,000 pieces were processed. (v
Out of the 1000 workpieces randomly sampled from these 10000 workpieces, the percentage of workpieces that have been completely removed without v-removal is defined as the deburring property, expressed as a 100% percentage. As is clear from FIG. 5, the abrasive material of Example 1 has a deburrability of almost 100%, whereas the abrasive material of the comparative example has a deburrability as low as approximately 80q6. , it can be seen that the abrasive material of the present invention has excellent deburring properties.

なお、本実施例の研磨材に=る噴射加工は上記の如く半
導体モールド成形品の樹脂パリ除去を目的どする場合に
限らず、一般のモールド成形品の樹脂パリ除去や軟−負
金属の表面処理等にも同様に適用できる。
Note that the injection processing using the abrasive material of this example is not limited to the purpose of removing resin debris from semiconductor molded products as described above, but also for removing resin debris from general molded products and the surface of soft negative metals. It can be similarly applied to processing, etc.

実施例2 前記ニスターR235A−1に前記5 s %MzKp
Example 2 The 5 s % MzKp was added to the Nistar R235A-1.
.

を2襲添加し、 縦×横×高さ300朋×300朗×200LLの型に注
型し硬化させブロックを得る。このとき、ブロック内部
中央の温度は、250℃以上となって内部歪が入り無数
のクラックが発生する0このようにしてり2ツクが形成
されたブロック全クラッシャー、ハンマーで粗粉砕した
後、ボールミル、ロールミル、又は衝撃粉砕機音用いて
平均粒径が0.3M前後の多数のり2ツクが入った研磨
材を得た。この実施例における研磨材も、実施例1と同
様にパリ取り性が顕著に向上する。
was added twice, and poured into a mold with length x width x height of 300 mm x 300 mm x 200 LL and hardened to obtain a block. At this time, the temperature at the center of the block reaches 250°C or higher, causing internal strain and innumerable cracks.The entire block with two blocks formed in this way is coarsely crushed using a crusher, a hammer, and then a ball mill. , a roll mill, or an impact crusher was used to obtain an abrasive material containing a large number of glue particles with an average particle size of around 0.3M. Similar to Example 1, the abrasive material in this Example also has significantly improved deburrability.

実施例3 実施2で得た粒径111g以下の粉砕物20部を前記ニ
スターR235A−1100部に核として混合したのら
前記551MEKPOを2部追加し、縦×横×高さ30
 QIIulX 300wnX 2 Qmの型に注、型
し硬化させブロックを得る。それから、急激に加熱する
などして熱衝撃を与えることによりブロック内部歪が誘
起されるとともに無数のクランクを発生させたのち、実
施例2と同一方法で、平均粒径が0.3期前後の多数の
クラックが入った研磨材を得た。この実施例における研
磨材も、実施例1と同様にパリ取り性が顕著に向上する
Example 3 20 parts of the pulverized material with a particle size of 111 g or less obtained in Example 2 was mixed with 1100 parts of Nister R235A-1 as a core, and then 2 parts of the 551MEKPO was added, and the length x width x height was 30.
The mixture was poured into a QIIulX 300wnX 2 Qm mold, molded and cured to obtain a block. Then, after applying a thermal shock such as rapid heating to induce internal strain in the block and generate countless cranks, the block was prepared using the same method as in Example 2, with an average grain size of around 0.3 An abrasive material containing many cracks was obtained. Similar to Example 1, the abrasive material in this Example also has significantly improved deburrability.

実施例4 前記ニスターR235A−1に前記55%MEKPOを
0.3%添加し、実施例1と同一寸法の型に注型し、5
℃近くで反応させゲル化した後、直ちに衝撃歪を付加し
て、ブロック中にクラックを発生させる。それから充分
硬化したブロックを実施例2と同一方法で、平均粒径が
0.3M前後の多数のクラックが入った研磨@を得た。
Example 4 0.3% of the 55% MEKPO was added to the Nistar R235A-1 and cast into a mold with the same dimensions as in Example 1.
After the block is reacted and gelled at a temperature near ℃, impact strain is immediately applied to generate cracks in the block. Then, the sufficiently hardened block was polished in the same manner as in Example 2, with a large number of cracks having an average grain size of around 0.3M.

この実施例における研磨材も、実施例1と同様にパリ取
り性が顕著に向上する。
Similar to Example 1, the abrasive material in this Example also has significantly improved deburrability.

実施例5 実施例4と同一の成形をする際に、合成樹脂の温度を1
00〜150℃にして硬化させ、ブロック中に内部歪、
’(i= 誘起させてクランク全発生させたのち、実施
例2と同一方法で、平均粒径が0、39前後の多数のク
ラックが入った研磨材全書た。この実施例における研磨
材も、実施例1と同様にパリ取り性が顕著に向上する。
Example 5 When performing the same molding as in Example 4, the temperature of the synthetic resin was lowered to 1
Cured at 00 to 150℃ to create internal strain in the block.
'(i= After inducing all the cranks, the entire abrasive material with many cracks with an average particle size of around 0.39 was prepared using the same method as in Example 2. The abrasive material in this example also had As in Example 1, the deburrability is significantly improved.

実施例6 実施例1と同一樹脂、同一触媒条件で同一寸法の型に注
型して成形硬化させたブロックを150−200℃に加
熱したのち一10℃以下に急冷するか、又は−10℃以
下Q温度から100〜 。
Example 6 A block was cast into a mold of the same size using the same resin and the same catalyst conditions as in Example 1, and then molded and cured.The block was heated to 150-200°C and then rapidly cooled to below -10°C, or the block was molded and cured at -10°C. 100~ below from Q temperature.

200℃の温度にまで急速加熱することにより上記ブロ
ックにり2ツクを発生させたのち、実施例2と同一方法
で、平均粒径が0部朋前後の多数のクラックが入った研
磨材を得た。この実施例における研磨材も、実施例と同
様にパリ取り性が顕著に向上する。
After generating two cracks in the block by rapidly heating it to a temperature of 200°C, the same method as in Example 2 was used to obtain an abrasive material containing many cracks with an average particle size of around 0 parts. Ta. The abrasive material in this example also has significantly improved deburrability as in the example.

実施例7 実施例1と同一樹脂、同一触媒条件で同一寸法の型に注
型して硬化させたブロックを、実施例2と同一方法にて
粗粉砕し、粗粉砕した合成樹脂粒子全アセトン溶液、メ
タノール溶液等の薬液に1週間浸漬した後、薬液を除去
して微粉砕し、平均粒径が0.3部前後の多数のクラッ
クが入った研磨材を得た。この実施例における研磨材も
、実施例1と同様にパリ取り性が顕著に向上する。
Example 7 A block cast and cured using the same resin and the same catalyst conditions as in Example 1 into a mold of the same size was coarsely ground in the same manner as in Example 2, and a total acetone solution of the coarsely ground synthetic resin particles was obtained. After being immersed in a chemical solution such as a methanol solution for one week, the chemical solution was removed and the material was finely pulverized to obtain an abrasive material with a large number of cracks and an average particle size of about 0.3 parts. Similar to Example 1, the abrasive material in this Example also has significantly improved deburrability.

実施例8 実施例1と同一樹脂、同一触媒条件で同一寸法の証に注
型して硬化させたブロックを、実施例2と同一方法にて
粗粉砕し、粗粉砕した合成樹脂粒子全一20℃まで冷却
し、実施例2と同一方法にて微粉砕し、平均粒径が0.
3部前後の多数のクラックが入った研磨材を得た0この
実施例における研磨材も、実施例1と同様にパリ取り性
が顕著に向上する。
Example 8 A block cast and cured using the same resin and the same catalyst conditions as in Example 1 into a mold of the same size was coarsely pulverized in the same manner as in Example 2, and a total of 20 coarsely pulverized synthetic resin particles were obtained. ℃ and finely pulverized in the same manner as in Example 2 to obtain an average particle size of 0.
An abrasive material with many cracks of about 3 parts was obtained. Similarly to Example 1, the abrasive material in this example also has significantly improved deburrability.

実施例9 実施例2と同一方法にて粗粉砕し、粗粉砕した合成樹脂
粒子音170℃まで加熱し、ごの温度下で、実施例2と
同一方法にて微粉砕し、平均粒径が0.3−前後の多数
のクラックが入った研    ゛磨材を得た。この実施
例における研磨材も、実施例1と同様にパリ取り性が顕
著に向上する。
Example 9 Coarsely pulverized synthetic resin particles were coarsely pulverized in the same manner as in Example 2, heated to 170°C, and finely pulverized in the same manner as in Example 2 at an oven temperature. An abrasive material with many cracks of around 0.3 was obtained. Similar to Example 1, the abrasive material in this Example also has significantly improved deburrability.

なお、本発明の研磨材は、上記実施例1から実施例8ま
での特定の製造方法によって得られたものに限定するこ
となく、上記8個の製造方法のうち少なくとも2個以上
組合わせて得られた研磨材を用いてもよい。
The abrasive material of the present invention is not limited to those obtained by the specific manufacturing methods from Example 1 to Example 8, but can be obtained by combining at least two or more of the eight manufacturing methods described above. A polished abrasive may also be used.

〔発明の効果〕〔Effect of the invention〕

以上詳述した如く、本発明によれば成形時に樹脂パリが
発生した半導体モールド成形品或いはその他の成形品や
軟質金属等の被加工物への噴射加工に際して、長期間の
使用においても被加工物の樹脂パリ除去又は研削性能を
維持できる良好な研騒力を有する研磨材及びその製造方
法全提供できるものである。
As described in detail above, according to the present invention, when injection processing is performed on workpieces such as semiconductor molded products or other molded products or soft metals in which resin flakes are generated during molding, the workpieces can be sprayed even after long-term use. The present invention provides an abrasive material having good abrasive force capable of removing resin particles or maintaining grinding performance, and a method for manufacturing the same.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図:]・、ノは本発明の一実施例である研磨材の製
造に用いられる圧縮機の概略断面図、第2図は半導体モ
ールド成形品の平面図、第3図は第1図(−lンの研■
材による半導体モールド成形品の樹脂パリ除去に用いる
湿式ブラスト装置の一形態を示す説明図、第4図は研磨
材による樹脂パリ除去を説明するための断面図、第5図
は本発明の一実施例と比較例とのパリ取り性を示すグラ
フである。 1.2・・・型、3・・・超硬材料からなる破砕片、5
・・・エツジ、7・・・クラック、8・・・研磨材、9
・・・リードフレーム、1−1半導体モールド成形品、
12・°・樹脂パリ、13・・・加工室、14・・・ホ
ッパ、15・・・水、16.11’・・ポンプ、18・
・・ガン、2)・・・クラック0 牙1図 牙2図 牙3図 才4図゛ 第5図
Figure 1:], , is a schematic sectional view of a compressor used for manufacturing an abrasive material according to an embodiment of the present invention, Figure 2 is a plan view of a semiconductor molded product, and Figure 3 is the same as Figure 1. (-l's research ■
FIG. 4 is a cross-sectional view illustrating the removal of resin debris using an abrasive material, and FIG. 5 is an illustration of an embodiment of the present invention. It is a graph showing deburrability of an example and a comparative example. 1.2... Mold, 3... Crushed pieces made of carbide material, 5
...Edge, 7...Crack, 8...Abrasive, 9
...Lead frame, 1-1 semiconductor molded product,
12.° Resin Paris, 13... Processing room, 14... Hopper, 15... Water, 16. 11'... Pump, 18.
...Gun, 2)...Crack 0 Fang 1 Fig. Fang 2 Fig. Fang 3 Fig. 4 Fig. 5

Claims (10)

【特許請求の範囲】[Claims] (1)外力にょリタ開可能なりラックをもつ合成樹脂粒
体からなることを特徴とする研磨材。
(1) An abrasive material comprising synthetic resin granules having a rack that can be opened by external force.
(2)合成樹脂素材を滅ノ形する方法と、この合成樹脂
素材全粒状化する方法とからなり、上記合成樹脂素材全
成形及び又は粒状化するときクラックを発生させること
を特徴とする研磨材の製造方法。
(2) An abrasive material comprising a method of forming a synthetic resin material into a shape and a method of granulating the synthetic resin material, and generating cracks when the synthetic resin material is completely formed and/or granulated. manufacturing method.
(3)内部歪全保持する合成樹脂素材を成形することを
特徴とする特許請求の範囲第2項記載の研磨材の製造方
法。
(3) The method for manufacturing an abrasive material according to claim 2, characterized in that a synthetic resin material that retains all internal strain is molded.
(4)熱硬化性樹脂粒体を核として合成樹脂素材を成形
することを特徴とする特許請求の範囲第2項記載の研磨
材の製造方法。
(4) A method for manufacturing an abrasive material according to claim 2, characterized in that a synthetic resin material is molded using thermosetting resin particles as cores.
(5)合成樹脂素材を加熱又は触媒の添加によりゲル化
させ硬化のすすまない段階で歪をかけることを特徴とす
る特許請求の範囲第2項記載の研磨材の製造方法。
(5) A method for manufacturing an abrasive material according to claim 2, characterized in that the synthetic resin material is gelled by heating or the addition of a catalyst, and then strain is applied at a stage where hardening has not progressed.
(6)合成樹脂素材を高温にて成形させることを特徴と
する特許請求の範囲第2項記載の研磨材の製造方法。
(6) A method for manufacturing an abrasive material according to claim 2, characterized in that a synthetic resin material is molded at a high temperature.
(7)合成樹脂素材に熱衝撃を与えクラックを発生させ
ることを特徴とする特許請求の範囲第2項記載の研磨材
の製造方法。
(7) The method for producing an abrasive material according to claim 2, which comprises applying a thermal shock to the synthetic resin material to generate cracks.
(8)合成樹脂素材を成形後に薬液に浸漬することを特
徴とする特許請求の範囲第2項記載の研磨材の製造方法
(8) The method for manufacturing an abrasive material according to claim 2, wherein the synthetic resin material is immersed in a chemical solution after being molded.
(9)合成樹脂素材の粒状化は、いったん粗粒体化した
のち微細粒体化することにより行い、上記粗粒体化した
ものを多数の切刃をもった加工具により加圧して微細粒
体化させることを特徴とする特許請求の範囲第2項記載
の研磨材の製造方法。
(9) The synthetic resin material is granulated by first making it into coarse particles and then making it into fine particles. 3. The method for producing an abrasive material according to claim 2, wherein the abrasive material is formed into a solid material.
(10)合成樹脂素材の粒状化は、いったん粗粒体化し
たのち微細粒体化することにエリ行い、上記粗粒゛体化
したものを10℃以下の温度で微細粒体化させることを
特徴とする特許請求の範囲第2項記載の研磨材の製造方
法。 Ql)  合成樹脂素材の粒状化は、いったん粗粒体化
したのち微細粒体化することにエリ行い、上記粗粒体化
したものを高温下の強度低下状態で微細粒体化させるこ
とを特徴とする特許請求の範囲第2項記載の研磨材の製
造方法。
(10) The granulation of the synthetic resin material is carried out by first making it into coarse particles and then making it into fine particles, and then turning the coarse particles into fine particles at a temperature of 10°C or less. A method for producing an abrasive material according to claim 2, characterized in that: Ql) The granulation of the synthetic resin material is characterized by first turning it into coarse particles, then turning it into fine particles, and then turning the coarse particles into fine particles in a state of reduced strength at high temperatures. A method for manufacturing an abrasive material according to claim 2.
JP22923182A 1982-08-20 1982-12-28 Abrasive material and preparation thereof Granted JPS59124573A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP22923182A JPS59124573A (en) 1982-12-28 1982-12-28 Abrasive material and preparation thereof
US06/522,736 US4548617A (en) 1982-08-20 1983-08-12 Abrasive and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22923182A JPS59124573A (en) 1982-12-28 1982-12-28 Abrasive material and preparation thereof

Publications (2)

Publication Number Publication Date
JPS59124573A true JPS59124573A (en) 1984-07-18
JPH0329549B2 JPH0329549B2 (en) 1991-04-24

Family

ID=16888883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22923182A Granted JPS59124573A (en) 1982-08-20 1982-12-28 Abrasive material and preparation thereof

Country Status (1)

Country Link
JP (1) JPS59124573A (en)

Also Published As

Publication number Publication date
JPH0329549B2 (en) 1991-04-24

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