JPS59121989A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS59121989A
JPS59121989A JP22900382A JP22900382A JPS59121989A JP S59121989 A JPS59121989 A JP S59121989A JP 22900382 A JP22900382 A JP 22900382A JP 22900382 A JP22900382 A JP 22900382A JP S59121989 A JPS59121989 A JP S59121989A
Authority
JP
Japan
Prior art keywords
sections
surface protective
protective film
semiconductor laser
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22900382A
Other languages
Japanese (ja)
Inventor
Toshihiro Mitsunari
光成 敏博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP22900382A priority Critical patent/JPS59121989A/en
Publication of JPS59121989A publication Critical patent/JPS59121989A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0201Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
    • H01S5/0202Cleaving
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2231Buried stripe structure with inner confining structure only between the active layer and the upper electrode

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To prevent a damaging by tweezers to P-N junction sections on both side surface adjacent to a reflection plane, the adhesion of moisture and fouling and the like and the deterioration of characteristics by coating the P-N junction sections on both side surfaces adjacent to the reflection plane with a surface protective film. CONSTITUTION:Diffusion sections 9 as current paths are formed to a semiconductor wafer consisting of four layers on an N type substrate 4. The central sections of the diffusion sections and the diffusion sections are etched up to the substrate. The whole surface of the wafer is coated with the surface protective film 11. The P-N junction sections on both side surfaces adjacent to the reflection planes are coated completely with the surface protective film 11 in the process. A film such as an SiO2 film is used as the surface protective film 11, and the structure formed through a CVD method can be realized easily. Lastly, the surface protective films 11 of the diffusion sections are removed, the surface is coated with an electrode 12, and the whole is separated into pellets by cutting or cleavage or the like at positions shown by broken lines 13.

Description

【発明の詳細な説明】 本発明は半導体レーザペレットに関するものである。[Detailed description of the invention] The present invention relates to semiconductor laser pellets.

従来の半導体レーザペレットは対向する反射面に、隣接
する両側面においてpn接合部が露出した溝造になって
いる。
A conventional semiconductor laser pellet has a groove structure in which pn junctions are exposed on both adjacent side surfaces of opposing reflecting surfaces.

そこでこの半導体レーザペレットをヒートシンクに半田
を用いて融着する際に、反射面に隣接する両側面をビン
セットでつまむことによりレーザ動作部であるpn接合
部に傷をつけたシ又は水分や汚れ等が付着して特性を劣
化させる欠点力(あった。また融着に用いた縛けた半田
力Zpn接合部にはい上カリ、pn接合を短絡させたり
特性を劣イヒさせる恐れがおった。特に半導体レーザの
温度特性を改善するために、活性層側をヒートシンクに
接着させる、いわゆるアツブサイドり゛ウン組立ではp
n接合は、半田接着面より約lOμmの所にあシ、この
場合には、半田のはい上刃工)の影響力S著しくなる。
Therefore, when fusing this semiconductor laser pellet to a heat sink using solder, the pn junction, which is the laser operating part, may be damaged by pinching both sides adjacent to the reflective surface with a bottle set, or there may be moisture or dirt. In addition, there was a drawback that the solder force used for fusion could get stuck in the Zpn joint, causing a short circuit in the pn junction and deteriorating the characteristics.Especially In order to improve the temperature characteristics of a semiconductor laser, the active layer side is bonded to a heat sink, so-called "above-side down assembly".
The n-junction is located at a distance of approximately 10 μm from the solder bonding surface, and in this case, the influence of the solder's curvature becomes significant.

本発明は、従来のこれらの欠点を解決することのできる
半導体レーザを提供することを目的とする。
An object of the present invention is to provide a semiconductor laser that can solve these conventional drawbacks.

本発明は、反射面に隣接する両側面のpn接合部を表面
保護膜で被うことを特徴とする半導体し。
The present invention provides a semiconductor characterized in that pn junctions on both sides adjacent to a reflective surface are covered with a surface protective film.

−ザである。-It is the.

本発明の詳細を図面で説明する。The details of the invention will be explained with reference to the drawings.

第1図は従来のプレーナストライフ型の半導体レーザペ
レットの斜視図である。反射面1は反射防止膜で保護さ
れているものがある〃5、反射面1に隣接する両側面2
においては、pn接合3は露出している。本発明はこの
ような半導体レーザの側面に、表面保護膜を形成したも
のである。表面保護膜の形成方法の一例を以下で述べる
FIG. 1 is a perspective view of a conventional planar strike life type semiconductor laser pellet. The reflective surface 1 may be protected with an anti-reflection film. 5. Both side surfaces 2 adjacent to the reflective surface 1
, the pn junction 3 is exposed. In the present invention, a surface protective film is formed on the side surface of such a semiconductor laser. An example of a method for forming a surface protective film will be described below.

まず第2図で示すように、n型基板4上の4層よりなる
半導体ウェハースに電流通路となる拡散部9を形成する
。次に第3図に示すように、拡販部と拡散部の中央部分
を基板に達するまでエツチングを行う。
First, as shown in FIG. 2, a diffusion portion 9 serving as a current path is formed in a semiconductor wafer consisting of four layers on an n-type substrate 4. Next, as shown in FIG. 3, the central portions of the sales promotion section and the diffusion section are etched until the substrate is reached.

次に第4図に示すように、ウェノ・−ス全面に表面保護
膜11を被看させる。この工程において反射面に隣接す
る両側面のpn接合部が表面保護膜11で完全に被われ
る。例えば、表面保護膜11としては5i02膜を用い
CVD法で形成すればこの構造は容易に実現できる。
Next, as shown in FIG. 4, a surface protective film 11 is applied over the entire surface of the wax. In this step, the pn junctions on both sides adjacent to the reflective surface are completely covered with the surface protection film 11. For example, this structure can be easily realized by using a 5i02 film as the surface protection film 11 and forming it by CVD.

最後に拡散部の表面保護膜11を除去し、電イタ12を
被着した後、第5図の破線13で示す位置を切断または
へき開等によりペレットに分離すれば、第6図に示すよ
うに反射面に隣接する両側面のpn接合部が表面保護膜
で被われた半導体レーザペレットを実現することができ
る。
Finally, after removing the surface protective film 11 of the diffusion part and coating it with a capacitor 12, if the position shown by the broken line 13 in FIG. 5 is separated into pellets by cutting or cleaving, as shown in FIG. It is possible to realize a semiconductor laser pellet in which the pn junction portions on both side surfaces adjacent to the reflective surface are covered with a surface protective film.

すなわち本発明によれば、反射面に隣接する両側面のp
n接合部をビンセットで傷つけたり、水分や汚れ等を付
着させ、特性を劣化させる欠点およびヒートシンクに融
着した後、融着に用いた浴けた半田がpn接合部にはい
上がり、pn接合を短絡させたり、特性を劣化させる欠
点を防ぐことができる。
That is, according to the present invention, p on both side surfaces adjacent to the reflective surface
The drawback is that the n-junction may be damaged with a bottle set, or moisture or dirt may adhere to it, degrading its characteristics. It is possible to prevent defects that cause short circuits and deteriorate characteristics.

以上の説明ばn基板のプレーナストライプ型半導体レー
ザについてであるが、p基板ケ用いたもの、また他の構
造の半導体レーザにも適用できる。
Although the above explanation is about a planar stripe type semiconductor laser with an n-substrate, it can also be applied to semiconductor lasers using a p-substrate or other structures.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、従来のプレーナストライプ型半導体レーザベ
レットの斜視図。 第2図は、拡散部を形成する工程を示す断面図。 第3図は、エソチング工程を示す断面図。 第4図は、表面保護膜を形成する工程を示す断面図。 第5図は拡散部の表面保護膜を除去した後、電極を形成
する工程を示す断面図。 第6図は反射面に隣接する両側面のpn接合部を表面保
護膜で被った、本発明の1実施例を示す半導体レーザペ
レットの斜視図。 ここで、1・・・・・・反射面、2・・・・・・反射面
に隣接する両側面、3・・・・・・pn接合、4・・・
・・・n基板、5・・・・・・第1層(n型クラッド層
)、6・・・・・・第2ノー(活性層)、7・・・・・
・第3層(n型クラッド層) 8・・・・・・84層(
キャップ層)、9・・・・・・拡散部、10・・・・・
・エツチングにより除去された部分、11・・・・・・
表面保護膜、12・・・・・・金属電惟% 13・・・
・・・切断またはへき関する位置。 半1図 療2I¥1 第3ゾ ¥40 型左回 串に回
FIG. 1 is a perspective view of a conventional planar stripe type semiconductor laser pellet. FIG. 2 is a cross-sectional view showing the process of forming a diffusion section. FIG. 3 is a sectional view showing the etching process. FIG. 4 is a cross-sectional view showing the process of forming a surface protective film. FIG. 5 is a cross-sectional view showing the process of forming electrodes after removing the surface protective film of the diffusion section. FIG. 6 is a perspective view of a semiconductor laser pellet showing an embodiment of the present invention, in which the pn junctions on both side surfaces adjacent to the reflective surface are covered with a surface protective film. Here, 1... reflective surface, 2... both side surfaces adjacent to the reflective surface, 3... pn junction, 4...
...n substrate, 5...first layer (n-type cladding layer), 6...second no (active layer), 7...
・Third layer (n-type cladding layer) 8...84 layers (
cap layer), 9...diffusion section, 10...
・Part removed by etching, 11...
Surface protective film, 12...Metal electric strength % 13...
...Position related to cutting or separation. Half 1 illustration therapy 2I ¥1 3rd Zo ¥40 Type left rotation skewer

Claims (1)

【特許請求の範囲】[Claims] 半導体レーザペレットの対向する反射面に隣接する両側
面のpn接合部を表面保護膜で被うことを特徴とする半
導体レーザ。
A semiconductor laser characterized in that pn junctions on both sides of a semiconductor laser pellet adjacent to opposing reflecting surfaces are covered with a surface protective film.
JP22900382A 1982-12-28 1982-12-28 Semiconductor laser Pending JPS59121989A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22900382A JPS59121989A (en) 1982-12-28 1982-12-28 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22900382A JPS59121989A (en) 1982-12-28 1982-12-28 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS59121989A true JPS59121989A (en) 1984-07-14

Family

ID=16885229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22900382A Pending JPS59121989A (en) 1982-12-28 1982-12-28 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS59121989A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180685A (en) * 1990-04-02 1993-01-19 Sharp Kabushiki Kaisha Method for the production of a semiconductor laser device
US5192985A (en) * 1991-01-16 1993-03-09 Kabushiki Kaisha Toshiba Semiconductor light-emitting element with light-shielding film
US8625646B2 (en) 2010-04-07 2014-01-07 Mitsubishi Electric Corporation Semiconductor device
US10419845B2 (en) 2017-04-24 2019-09-17 Onkyo Corporation Headphones and speaker unit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180685A (en) * 1990-04-02 1993-01-19 Sharp Kabushiki Kaisha Method for the production of a semiconductor laser device
US5192985A (en) * 1991-01-16 1993-03-09 Kabushiki Kaisha Toshiba Semiconductor light-emitting element with light-shielding film
US8625646B2 (en) 2010-04-07 2014-01-07 Mitsubishi Electric Corporation Semiconductor device
US10419845B2 (en) 2017-04-24 2019-09-17 Onkyo Corporation Headphones and speaker unit

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