JPS59121335A - フオトマスクの検査方法及び装置 - Google Patents

フオトマスクの検査方法及び装置

Info

Publication number
JPS59121335A
JPS59121335A JP57233078A JP23307882A JPS59121335A JP S59121335 A JPS59121335 A JP S59121335A JP 57233078 A JP57233078 A JP 57233078A JP 23307882 A JP23307882 A JP 23307882A JP S59121335 A JPS59121335 A JP S59121335A
Authority
JP
Japan
Prior art keywords
pixels
pixel
photomask
coordinates
octagon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57233078A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6412383B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Akihiko Oe
大江　昭彦
Masaki Fuse
正樹 布施
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP57233078A priority Critical patent/JPS59121335A/ja
Publication of JPS59121335A publication Critical patent/JPS59121335A/ja
Publication of JPS6412383B2 publication Critical patent/JPS6412383B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP57233078A 1982-12-28 1982-12-28 フオトマスクの検査方法及び装置 Granted JPS59121335A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57233078A JPS59121335A (ja) 1982-12-28 1982-12-28 フオトマスクの検査方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57233078A JPS59121335A (ja) 1982-12-28 1982-12-28 フオトマスクの検査方法及び装置

Publications (2)

Publication Number Publication Date
JPS59121335A true JPS59121335A (ja) 1984-07-13
JPS6412383B2 JPS6412383B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-28

Family

ID=16949451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57233078A Granted JPS59121335A (ja) 1982-12-28 1982-12-28 フオトマスクの検査方法及び装置

Country Status (1)

Country Link
JP (1) JPS59121335A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010083530A (ja) * 2008-09-30 2010-04-15 Takashi Iizuka 脈動防止具付きペットボトル

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010083530A (ja) * 2008-09-30 2010-04-15 Takashi Iizuka 脈動防止具付きペットボトル

Also Published As

Publication number Publication date
JPS6412383B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-28

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