JPS59112693A - Method of plating printed board - Google Patents

Method of plating printed board

Info

Publication number
JPS59112693A
JPS59112693A JP22315282A JP22315282A JPS59112693A JP S59112693 A JPS59112693 A JP S59112693A JP 22315282 A JP22315282 A JP 22315282A JP 22315282 A JP22315282 A JP 22315282A JP S59112693 A JPS59112693 A JP S59112693A
Authority
JP
Japan
Prior art keywords
plating
hole
printed circuit
circuit board
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22315282A
Other languages
Japanese (ja)
Inventor
邦彦 武田
黒沢 啓治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22315282A priority Critical patent/JPS59112693A/en
Publication of JPS59112693A publication Critical patent/JPS59112693A/en
Pending legal-status Critical Current

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (1)発明の技術分野 本発明は電子機器等に用いられるプリント基板の製造工
程に於ける表面処理に係り、特にスルーホールメンキす
べき透孔内のメッキ方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to surface treatment in the manufacturing process of printed circuit boards used in electronic devices, etc., and particularly relates to a method of plating inside through-holes to be peeled. It is something.

(2)技術の背景 輻峻する回路網と小型で高集積の部品を稠密に搭載すべ
きプリント基板は、微細な導体パターンの多数層で成り
、各層の導体パターンはスルーホールメッキによって接
続されるが、スルーホールメッキの透孔の穿孔密度は高
く、穿孔径は小で、穿孔長は犬となり、斯るプリント基
板のスルーホールのメッキの接続性はプリント板パッケ
ージの信頼性の主な因子となるため、品位の高いスルー
ホールメッキが得られるメッキ方法が要望されている。
(2) Background of the technology Printed circuit boards that must be densely packed with dense circuit networks and small, highly integrated components are made up of multiple layers of fine conductor patterns, and the conductor patterns in each layer are connected by through-hole plating. However, the perforation density of through-hole plating is high, the perforation diameter is small, and the perforation length is small, so the connectivity of the through-hole plating of such printed circuit boards is the main factor for the reliability of printed circuit board packages. Therefore, there is a need for a plating method that can provide high-quality through-hole plating.

(3)従来技術と問題点 第1図はスルーホールをなすべきプリント基板の断面し
)、第2図は従来のプリント基板のスルーホールメッキ
方法を説明するための側面図である。
(3) Prior Art and Problems FIG. 1 is a cross section of a printed circuit board on which through holes are to be formed, and FIG. 2 is a side view for explaining a conventional through hole plating method for a printed circuit board.

第1図に於いて1はプリント基板、2は導体パターン、
3はスルーホールメンキのための透孔ミ4は透孔内のス
ルーホールメッキである。
In Figure 1, 1 is a printed circuit board, 2 is a conductor pattern,
3 is a through hole for through hole coating. 4 is a through hole plating inside the through hole.

第2図に於いて5はメッキ槽、6はメッキ液、7は移送
ポンプ、8は陽極、9は電源を夫々示す。
In FIG. 2, 5 is a plating tank, 6 is a plating solution, 7 is a transfer pump, 8 is an anode, and 9 is a power source.

スルーホールメッキずへき多層プリント基板1は第1図
に示す如く、プリント基板1の内層に複数の導体パター
ン2を持ち、表面層及び層間の導体パターン2の接続は
導体パターン2を貫通ずる透孔3の内壁を銅の電着によ
るスルーポールメッキ4をなして接続する。ところか、
近hプリント基析】に収容ずべき回路密度が犬で、プリ
ント基板1を構成する層数が多数となり、且つ導体パタ
ーンは徽細となるため、スルーホールメッキの透孔の穿
孔密度は高く、透孔径Aは小となり贅孔長Bは大となる
傾向にある。
As shown in FIG. 1, the multilayer printed circuit board 1 without through-hole plating has a plurality of conductor patterns 2 on the inner layer of the printed circuit board 1, and the connection of the conductor patterns 2 on the surface layer and between the layers is through holes passing through the conductor patterns 2. The inner walls of 3 are connected by forming through-pole plating 4 by electrodeposition of copper. However,
The circuit density that must be accommodated in recent printed circuit boards is high, the number of layers that make up the printed circuit board 1 is large, and the conductor pattern is narrow, so the perforation density of through-hole plating is high. The pore diameter A tends to be small and the pore length B tends to be large.

第2図はプリント基板1の従来のメッキ方法を示し、ス
ルーホールメッキすべきプリント基板1の透孔3の内面
を予め無電解メッキしたる後、メッキ層5のメッキ液6
中に陽極8と対向して浸漬し、電源9を接続して銅の電
解メッキをなすが、メッキ液6は杉毫ポンプ7によって
還流され、スルーポールメンキ4をずべき透孔3内を流
通せしめる。吉ころが、透孔3の穿孔径Aが小さく、穿
孔長Bが犬なる場合には、メッキ液2の流通抵抗が大と
なり、メッキ液6が流通し難く、メッキ液6は主として
プリント基板1の外周を流通して透、孔3内のメッキ液
の代謝が不充分となり、代謝の比較的容易な穿孔口に対
比してメッキ液の代謝の不充分な孔内中央部の電解銅の
電着量は少なく、不均一なスルーホールメッキ4吉なり
スルーホールメッキ4による各層間の導体パターン2の
接続の信頼性が得られなかった。
FIG. 2 shows a conventional plating method for a printed circuit board 1, in which the inner surface of the through hole 3 of the printed circuit board 1 to be through-hole plated is electrolessly plated, and then the plating solution 6 of the plating layer 5 is applied.
The electrolytic plating of copper is carried out by connecting the power source 9 and the plating solution 6. The plating solution 6 is refluxed by the cedar pump 7, and the through hole 3 is immersed facing the anode 8. Let it be distributed. Fortunately, if the perforation diameter A of the through hole 3 is small and the perforation length B is small, the flow resistance of the plating liquid 2 will be large, making it difficult for the plating liquid 6 to flow, and the plating liquid 6 will mainly be applied to the printed circuit board 1. The electrolytic copper in the center of the hole, where the plating solution is poorly metabolized, becomes inefficient, compared to the hole where the plating solution is metabolized relatively easily. The amount of plating was small, and the reliability of the connection of the conductive pattern 2 between each layer by the uneven through-hole plating 4 could not be obtained.

(4)発明の目的 本発明は上記従来の欠点に鑑み、透孔の穿孔径が小さく
、穿孔長が犬なるプリント基板のスルーポールメッキの
電解銅の電着量が透孔内に於いて均一となるプリント基
板のメッキ方法の提供を目的とするものである。
(4) Purpose of the Invention In view of the above-mentioned drawbacks of the conventional art, the present invention provides a method for through-pole plating of printed circuit boards in which the diameter of the through-hole is small and the length of the hole is long, so that the amount of electrolytic copper deposited is uniform within the through-hole. The purpose of this invention is to provide a method for plating printed circuit boards.

(5)発明の構成 そしてこの目的は本発明によれば、メッキ槽をスルーホ
ールメッキすべきプリント基板により隔壁して分割し、
移送ポツプの吸込口と吐出口とを夫々接続し、吐出口の
接続されるメッキ槽部を該スルーホールメッキすべきプ
リント基板の隔壁を用いた閉塞ぜる構造となし、移送ポ
ンプで加圧されたメッキ液をプリント基板のスルーホー
ルメッキすベキ透孔のみを通して、移送ポンプの吸込口
に接続されるメッキ槽部に流出せしめることによって達
成される。
(5) Structure and object of the invention According to the present invention, the plating tank is partitioned by a printed circuit board to be through-hole plated.
The suction port and the discharge port of the transfer pot are respectively connected, and the plating tank portion to which the discharge port is connected is closed using a partition wall of the printed circuit board to be plated through-holes, and the plating tank is pressurized by the transfer pump. This is achieved by allowing the plating solution to flow out into the plating tank connected to the suction port of the transfer pump through only the through-holes of the printed circuit board.

(6)発明の実施例 以下本発明の実施例を図面によって詳述する。(6) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

第3図は本発明によるプリント基板のメッキ方法を説明
するための図であり、図に於いて51はメッキ液6の加
圧槽、52はメッキ液6の受槽、53は加圧槽51の密
閉機構、71は移送ボングアの吸込口、72は移送ポン
プ7の吐出口を夫々示す。
FIG. 3 is a diagram for explaining the method of plating a printed circuit board according to the present invention. In the figure, 51 is a pressure tank for the plating solution 6, 52 is a receiving tank for the plating solution 6, and 53 is a pressure tank for the plating solution 6. In the sealing mechanism, 71 is the suction port of the transfer bongua, and 72 is the discharge port of the transfer pump 7, respectively.

メッキ槽5は密閉機構53とスーホールメソキすべき透
孔3の穿孔されたプリント基板Iによる隔壁とで密閉さ
れた加圧槽51を形成し、移送ポンプ7の吐出ロア2と
接続され、受槽52を移送ポンプ7の吸込ロア1と接続
する。
The plating tank 5 forms a sealed pressurized tank 51 with a sealing mechanism 53 and a partition wall made of a printed circuit board I in which through-holes 3 to be coated are formed, and is connected to the discharge lower 2 of the transfer pump 7, and a receiving tank 52 is connected to the plating tank 5. Connected to the suction lower 1 of the transfer pump 7.

メッキ液6は移送ポンプ7によって加圧槽51に移送し
、加圧状態のメッキ液6となし、プリント基板1の透孔
3のみを通して受槽52に流出せしめ、メッキすべき時
間に於いてメンキ液6は常時プリント基板1のスルーホ
ールメッキ4をずべき透孔3の孔内を停滞することなく
流通してメッキ液は確実に代謝する。
The plating solution 6 is transferred to the pressurized tank 51 by the transfer pump 7 to form the plating solution 6 in a pressurized state, and is made to flow out into the receiving tank 52 only through the through hole 3 of the printed circuit board 1. The plating solution 6 constantly flows through the through hole 3 of the printed circuit board 1 without stagnation, and the plating solution is surely metabolized.

又受槽52も加Ef−,槽51と同様な密閉機構とする
ことにより、移送ポンプ7によるメッキ液6の移送方向
を経時的に交互に反転し、プリント基板lの透孔3を流
通するメッキ液6の流通方向を反転することにより更に
均一な電解銅の電着が得られる。
Furthermore, by providing the receiving tank 52 with a sealing mechanism similar to that of the tank 51, the direction in which the plating solution 6 is transferred by the transfer pump 7 is alternately reversed over time, and the plating solution flowing through the through hole 3 of the printed circuit board l is By reversing the flow direction of the liquid 6, more uniform electrodeposition of electrolytic copper can be obtained.

(7)発明の効果 以上評細に説明したように、本発明によるプリント基板
のスルーホールのメッキ方法によれは、穿孔径0.4 
mrr+ψ、穿孔長5.5 mmの透孔にスルーホール
メッキをなし、透孔のメッキ液流入口の電着量を100
とした時、透孔の穿孔長の中央部で95、透孔のメッキ
液の流出口で90であり、透孔に対するメッキ液の流通
方向を経時的に反転した場合はそれぞれの値は略100
となる。これに対し、従来のメッキ方法に於いてメッキ
液の流通方向を経時的に反転した場合に透孔の両端の重
着量が100である時、透孔の穿孔長の中央部に於いて
30〜40の電着詰、シかイ↓)られなかった。これに
対比ずれは本発明は、極めて均一な瓜屏銅の゛重着値が
’!Sられ、才孔径がより/ノ・で穿孔長かより大であ
る透孔・\のスルーホールメッキに対して、(へめで有
効なスルーポールメッキ方法であり、各層の導体パター
ン間のメッキによる接続の信頼性を確保することか出来
る。
(7) Effects of the Invention As explained in detail above, the plating method for through-holes in printed circuit boards according to the present invention has a hole diameter of 0.4
mrr + ψ, hole length 5.5 mm, through-hole plating was performed, and the amount of electrodeposition at the plating liquid inlet of the through hole was 100.
Then, the value is 95 at the center of the hole length, and 90 at the outlet of the plating solution in the hole, and if the flow direction of the plating solution to the hole is reversed over time, each value is approximately 100.
becomes. On the other hand, in the conventional plating method, when the flow direction of the plating solution is reversed over time, when the amount of heavy coating at both ends of the through hole is 100, the weight at the center of the drilling length of the through hole is 30. ~40 electrodepositions, ↓) could not be done. In contrast, the present invention has an extremely uniform ``weighted value'' of the copper sheet! This is an effective through-pole plating method for through-hole plating, which has a hole diameter of 200 mm and a hole diameter of 200 mm and a longer drilling length. It is possible to ensure the reliability of the connection.

又、本発明のメッキ液の流通手法はメッキ以外の透孔内
の表面処理のための処理等に対しても有効である。
Furthermore, the plating solution distribution method of the present invention is also effective for processes other than plating, such as surface treatment inside through-holes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はスルーホールメッキをなすべきプリント基板の
断面図、第2図は従来のプリント基板のスルーポールメ
ッキ方法を説明するための側面図、第3図は本発明の一
実施例によるプリント基板のメッキ方法を説明するため
の側面図である。 図に於いて1はプリント基板、2は導体パターン、3は
スルーホールメッキのための透孔、4は透孔内のスルー
ホールメッキ、5はメッキ槽、52は受槽、53は密閉
機構、6はメッキ液、7は移送ポンプ、71は吸込口、
72は吐出口を夫々示す。 躬1図 8.2 図 第3図
Fig. 1 is a cross-sectional view of a printed circuit board to which through-hole plating is to be performed, Fig. 2 is a side view for explaining a conventional through-pole plating method for printed circuit boards, and Fig. 3 is a printed circuit board according to an embodiment of the present invention. FIG. 3 is a side view for explaining a plating method. In the figure, 1 is a printed circuit board, 2 is a conductor pattern, 3 is a through-hole for through-hole plating, 4 is through-hole plating inside the through-hole, 5 is a plating tank, 52 is a receiving tank, 53 is a sealing mechanism, 6 is a plating solution, 7 is a transfer pump, 71 is a suction port,
Reference numeral 72 indicates a discharge port. Figure 1 Figure 8.2 Figure 3

Claims (2)

【特許請求の範囲】[Claims] (1)  メッキ槽をスルーホールを有するプリント基
板で分割し、分割された一方の槽を密閉構造とし、密閉
構造とした槽にメッキ液を圧送し、スルーホールにメッ
キ液を流通ぜしめることを特徴さするプリント基板のメ
ッキ方法。
(1) The plating tank is divided by a printed circuit board with through holes, one of the divided tanks is made into a sealed structure, and the plating solution is pumped into the tank with the sealed structure, and the plating solution is made to flow through the through holes. Characteristic printed circuit board plating method.
(2)  前記分割されたメッキ槽に吸入口と吐出口を
有する移送ポンプを設け、該移送ポンプにより前記密閉
構造とした槽よりメッキ液を圧送し、メッキ液を循環さ
せることを特徴とする特許請求の範囲第1項記載のプリ
ント基板のメッキ方法。
(2) A patent characterized in that the divided plating tank is provided with a transfer pump having an inlet and a discharge port, and the transfer pump pumps the plating solution from the sealed tank to circulate the plating solution. A method for plating a printed circuit board according to claim 1.
JP22315282A 1982-12-20 1982-12-20 Method of plating printed board Pending JPS59112693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22315282A JPS59112693A (en) 1982-12-20 1982-12-20 Method of plating printed board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22315282A JPS59112693A (en) 1982-12-20 1982-12-20 Method of plating printed board

Publications (1)

Publication Number Publication Date
JPS59112693A true JPS59112693A (en) 1984-06-29

Family

ID=16793599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22315282A Pending JPS59112693A (en) 1982-12-20 1982-12-20 Method of plating printed board

Country Status (1)

Country Link
JP (1) JPS59112693A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122198A (en) * 1980-02-28 1981-09-25 Matsushita Electric Ind Co Ltd Method of plating through hole of printed board

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122198A (en) * 1980-02-28 1981-09-25 Matsushita Electric Ind Co Ltd Method of plating through hole of printed board

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