JPS59107078A - Shutter for sputtering device - Google Patents
Shutter for sputtering deviceInfo
- Publication number
- JPS59107078A JPS59107078A JP21724482A JP21724482A JPS59107078A JP S59107078 A JPS59107078 A JP S59107078A JP 21724482 A JP21724482 A JP 21724482A JP 21724482 A JP21724482 A JP 21724482A JP S59107078 A JPS59107078 A JP S59107078A
- Authority
- JP
- Japan
- Prior art keywords
- shield
- opening
- shutter
- aperture
- plates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
ロールするだめに、スパツタされるターゲット面とシリ
コンウエハー面との間で開閉するシャツタに関するもの
である。DETAILED DESCRIPTION OF THE INVENTION This invention relates to a shirt that opens and closes between a target surface to be sputtered and a silicon wafer surface during rolling.
従来この種のシャッタは第１図（ａ） 、 （ｂ）に示
すように、円形のターゲットを有するカソード・アセン
ブリ２と、該ターゲットと同上・円の開口部を有するシ
ールド４とをチャンバ壁１に取り（”Ｊリ、回転導入機
６のシャフトにシールドの開口部を閉塞する円形のシャ
ツタ板３を軸支し、駆動用モータ５によって７−ルドの
開口部が完全に開ききる位置寸て７ヤツタ板３を回転さ
せて、該開口部を開き、閉じるときは逆方向の回転をさ
せてシャック板３て７−ルドの開口部を閉じる構造にな
っていた。そのため、ジャツタが開くときに最も遅く開
いたシールド４の開口部は、シャッタが閉じるときには
最も早く閉じるので、シールドの開口部は部分的にジャ
ツタが開いている時間が一定でなくなり、ンリコンウエ
ハー内の膜厚分布にばらつきが生じるという問題があっ
た。Conventionally, as shown in FIGS. 1(a) and 1(b), this type of shutter has a cathode assembly 2 having a circular target and a shield 4 having a circular opening in the chamber wall 1. Then, the circular shutter plate 3 that closes the opening of the shield is supported on the shaft of the rotation introduction device 6, and the position where the opening of the shield is completely opened by the drive motor 5 is determined. The structure was such that the opening was opened by rotating the shack plate 3, and when closing, the shack plate 3 was rotated in the opposite direction to close the shack plate 3. Therefore, when the shack plate 3 was opened, The opening of the shield 4 that opens the latest will close the earliest when the shutter closes, so the opening time of the shield 4 will not be constant for some parts of the opening, and the film thickness distribution within the silicon wafer will vary. There was a problem that occurred.
本発明は前記問題点を解消するもので、／−ルドの開口
部を単独に閉塞するシャツタ板を２枚備え、該２枚のシ
ャツタ板を時間遅れをもって等速で同一方向に摺動させ
、一方のシャツタ板でシールドの開口部を開口した後、
遅れて他方のシャツタ板でシールドの開口部を閉塞し、
シールドの開口部全面の開いている時間をどの位置でも
同一にして７リコンウ工ハ〜面にスパッタさ第１て付着
する膜厚を均一にするようにしたことを特徴とするもの
である。The present invention solves the above-mentioned problems, and includes two shutter plates that individually close the opening of the /-led, and slides the two shutter plates in the same direction at a constant speed with a time delay, After opening the opening in the shield with one shirt plate,
After a delay, close the opening of the shield with the other shirt plate,
It is characterized in that the opening time of the entire surface of the opening of the shield is made the same at any position so that the thickness of the film deposited by sputtering on the surface of the 7-recontamination process is made uniform.
以下、本発明の一実施例を第２図によって説明する。第
２図に示すように、円形のターゲットを有するカッ−ド
・アセンブリ２と、該ターゲットと同心円の開口部を有
する円筒形のシールド４とを備えたチャンバ壁１に、シ
ールド４の開口部を有する面に平行で、かつ開口部をは
さんで対向する２本の平行レール８，８を取り付ける。An embodiment of the present invention will be described below with reference to FIG. As shown in FIG. 2, a chamber wall 1 is provided with a quad assembly 2 having a circular target and a cylindrical shield 4 having an opening concentric with the target. Two parallel rails 8, 8 are attached that are parallel to the surface and are opposite to each other with an opening in between.
さらにシールド４の開口部を単独に閉塞する長方形のシ
ャツタ板を２枚配設し、該シャツタ板７Ａ、７Ｂをガイ
ドロー ラ９を介して平行レール８，８に摺動自在に支
持し、一方のシャツタ板７Ａの前線と他方のシャツタ板
７Ｂの後縁とにそれぞれレール８に直交する方向に延び
る直線溝１１Ａ、ＩＩＢを設け、該各港１１Ａ、ＩＩＢ
内にアームＩＯＡ、１０Ｂの一端を嵌合し、該アーム１
０ Ａ 、 ＩＯＢの他端を、駆動モータ５Ａ、５Ｂに
直結させた回転導入機６Ａ、６Ｂの各シャツ］・にそれ
ぞれ一体に連結する。前記駆動モータ５Ａ、５Ｂは２枚
の７ヤツタ板７Ａ、７Ｂを時間遅れをもって、同一方向
に等速で摺動させるものである。これによって一方の・
／ヤノタ板７Ａ（又は７Ｂ）がシールド４の開口部を開
き、その後遅れて他方のシャッタ＆７Ｂ（又は７Ａ）が
これを閉塞する。Further, two rectangular shirt plates that individually close the opening of the shield 4 are provided, and the shirt plates 7A and 7B are slidably supported on parallel rails 8 and 8 via guide rollers 9, and one Straight grooves 11A and IIB extending in a direction perpendicular to the rail 8 are provided in the front line of the shirt flap plate 7A and the rear edge of the other shirt flap plate 7B, respectively, and the respective ports 11A and IIB
Fit one end of the arm IOA, 10B into the arm 1.
0A, the other end of the IOB is integrally connected to each shirt of the rotation introducing machines 6A and 6B which are directly connected to the drive motors 5A and 5B. The drive motors 5A, 5B are used to slide the two 7-piece plates 7A, 7B in the same direction at a constant speed with a time delay. This allows one of the
/Yanota board 7A (or 7B) opens the opening of shield 4, and then the other shutter &7B (or 7A) closes it after a delay.
第２図に示す／ヤツタの状態は、シャツタ板７Ａが／−
ルト４の開口部を閉じており、シャツタ板７Ｂか後方に
待機している状態である。い才、シャッタを開ける場合
は、駆動モータ５Ａを１駆動しアームＩＯＡを時計方向
に回転させてツヤツタ板７Ａを矢印Ａ方向にスライドさ
せて開ける。そして、時間遅れをもって駆動モータ５Ｂ
を、駆動し、アーｌ、ＩＯＢを反時計方向に回転させて
シャツタ板７Ｂをシャツタ板７Ａ側、すなわち矢印Ａ方
向に同一速度でスライドさせて、該シャツタ板７Ｂでシ
ールド４の開口部を閉しる。寸だ、その後７〜ルト４の
開口部を開閉するには、前記とは逆に廿ずシーヤッタ板
７Ｂを矢印Ｂ方向にスライドさせてシールド４の開１コ
部を開き、時間遅れをもってシャツタ板７Ａを同一速度
で矢印Ｂ方向にスライドさせて、該シャツタ板７Ａてシ
ールド４の開口部を閉じる。In the state of / shown in FIG. 2, the shirt plate 7A is /-
The opening of the route 4 is closed, and the shirt cover plate 7B is in a waiting state at the rear. When opening the shutter, drive the drive motor 5A once, rotate the arm IOA clockwise, and slide the glossy plate 7A in the direction of arrow A to open it. Then, with a time delay, the drive motor 5B
, and rotate AR and IOB counterclockwise to slide the shirt flap plate 7B toward the shirt flap plate 7A, that is, in the direction of arrow A, at the same speed, and close the opening of the shield 4 with the shirt flap plate 7B. Sign. Then, to open and close the opening of the shield 4, contrary to the above, slide the shield plate 7B in the direction of arrow B to open the opening part of the shield 4, and after a time delay, open the shield plate 7B. 7A is slid in the direction of arrow B at the same speed, and the opening of the shield 4 is closed with the shutter plate 7A.
尚、実施例ではシャツタ板の送り機構を、５駆動モＴり
５Ａ、５Ｂ、アームＩＯＡ、１０１３．直線溝１１Ａ、
ＩＩＢ、回転導入機６Ａ、６Ｂから構成した場合につい
て説明しだが、これに限定されるものではない。In the embodiment, the feeding mechanism for the shirt flap plate is composed of five drive motors 5A, 5B, arms IOA, 1013. Straight groove 11A,
Although a case has been described in which the configuration is comprised of IIB, rotation introduction machines 6A and 6B, the present invention is not limited to this.
以上のように本発明は、２枚の７ヤツタを備え、両シャ
ッタ板を時間遅れをもって同一方向に等速で摺動させ、
一方のシャツタ板てシールドの開口部を開いた後遅れて
他方の７ヤツタ板でシールドの開口部を閉じるようにし
たので、７ヤツタがシールドの開口部を開閉するときに
最も遅く開いたシールドの開口部分と最も早く開いたシ
ールドの開口部分とは、開いている時間に差がなく、開
口部全範囲にわたりいずれの部分でも開口時間を等しく
てきるため、ノリコンウェハーに付着した膜厚を均一に
できる効果を有するものである。As described above, the present invention includes two 7-piece shutters, slides both shutter plates in the same direction at a constant speed with a time delay,
After opening the opening of the shield with one shirt plate, the opening of the shield is closed with the other 7 Yatsuta plate, so when the 7 Yatsuta opens and closes the opening of the shield, the shield that opens the latest will close. There is no difference in the opening time between the opening part and the opening part of the shield that opens the fastest, and the opening time is the same for all parts over the entire opening range, so the thickness of the film attached to the Noricon wafer is uniform. It has the effect of
第１図（ａ）は、従来のスパッタ用シャッタ及びシール
ド、カソード・アセンブリを示す平面図、第１図（ｂ）
は側面図、第２図は本発明の一実施例を示す斜視図であ
る。
１・・・チャンバ壁、２・・・カソード・アセンブリ、
４・・・ンー ルト板、５Ａ１５Ｂ・・・１駆動モータ
、６Ａ、６Ｂ・・・回転導入機、７Ａ、７Ｂ・・・シャ
ツタ板、８・・・平行レール
特許出願人 日本電気株式会社
第２図FIG. 1(a) is a plan view showing a conventional sputtering shutter, shield, and cathode assembly, and FIG. 1(b) is a plan view showing a conventional sputtering shutter, shield, and cathode assembly.
2 is a side view, and FIG. 2 is a perspective view showing an embodiment of the present invention. 1... Chamber wall, 2... Cathode assembly,
4...Rot plate, 5A15B...1 drive motor, 6A, 6B...rotation introduction machine, 7A, 7B...shaft plate, 8...parallel rail patent applicant NEC Corporation No. 2 figure
Claims (1)
カソード・アセンブリのターゲットと同心の開口部を有
するシールドとを備えだチャンバ壁に、シールドの開口
部を有する面に平行て、かつ該開口部をはさむ２本の平
行レールを取り付け、シールドの開口部を単独に閉塞す
る２枚のシャツタ板を前記平行レールに摺動可能に支持
し、該２枚のツヤツタ板を時間遅れをもって等速で同一
方向に摺動させて、一方のシャツタ板てシールドの開口
部を開いた後、遅れて他方のシャツタ板でシールドの開
口部を閉塞するシャツタ板の送り機構を備えだことを特
徴とするスパッタ装置用ジャツタ。(1) a chamber wall comprising a cathode assembly having a target and a shield having an opening concentric with the target of the cathode assembly, parallel to and sandwiching the opening of the shield; Two parallel rails are attached, two shattered plates that individually close the opening of the shield are slidably supported on the parallel rails, and the two shattered plates are moved at a uniform speed and in the same direction with a time delay. A jacket for a sputtering apparatus, characterized in that it is equipped with a mechanism for feeding a shield plate which slides to open an opening in the shield using one shield plate, and then closes the opening in the shield with the other shield plate after a delay. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21724482A JPS59107078A (en) | 1982-12-11 | 1982-12-11 | Shutter for sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21724482A JPS59107078A (en) | 1982-12-11 | 1982-12-11 | Shutter for sputtering device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59107078A true JPS59107078A (en) | 1984-06-21 |
Family
ID=16701107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21724482A Pending JPS59107078A (en) | 1982-12-11 | 1982-12-11 | Shutter for sputtering device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59107078A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022033757A1 (en) * | 2020-08-13 | 2022-02-17 | Singulus Technologies Ag | Slit diaphragm |
-
1982
- 1982-12-11 JP JP21724482A patent/JPS59107078A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022033757A1 (en) * | 2020-08-13 | 2022-02-17 | Singulus Technologies Ag | Slit diaphragm |
| US20230274922A1 (en) * | 2020-08-13 | 2023-08-31 | Singulus Technologies Ag | Slit diaphragm |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6279901B1 (en) | Identification card inverter that maintains the card support plane | |
| US5210616A (en) | Sheet carrier apparatus and a picture image recording apparatus | |
| JPS59107078A (en) | Shutter for sputtering device | |
| US4282439A (en) | X-ray photographing machine using sheet films | |
| JP2007162049A (en) | Carousel type sputtering system | |
| JPS59202452A (en) | Print mask device | |
| US2253052A (en) | Reversing arrangement for document reproducing machine | |
| US2784831A (en) | Automatic inverter | |
| JPS5950045B2 (en) | focal plane ivy | |
| JPH07127631A (en) | Variable suction width type suction roller | |
| JPH04193948A (en) | Film forming device | |
| JP2972655B2 (en) | Complex type library device | |
| JPS59226177A (en) | Thin film forming device | |
| US2203783A (en) | Camera traversing apparatus for photographing nearby large object surfaces | |
| JPS642188B2 (en) | ||
| US1690673A (en) | Camera | |
| JPH041068B2 (en) | ||
| US5330117A (en) | Cassette adaptable tape widning apparatus and assembly | |
| JPS5917060U (en) | Cassette cover opening/closing device | |
| JPS586836Y2 (en) | sorter | |
| JPS62140288A (en) | Cassette loading device | |
| JPS6141236Y2 (en) | ||
| JPH0456766A (en) | Vacuum conveyor | |
| JPH04313569A (en) | Sheet stacking device in image forming | |
| JPS6335102B2 (en) |