JPS59102953A - Electrically conductive synthetic resin composition - Google Patents

Electrically conductive synthetic resin composition

Info

Publication number
JPS59102953A
JPS59102953A JP57212997A JP21299782A JPS59102953A JP S59102953 A JPS59102953 A JP S59102953A JP 57212997 A JP57212997 A JP 57212997A JP 21299782 A JP21299782 A JP 21299782A JP S59102953 A JPS59102953 A JP S59102953A
Authority
JP
Japan
Prior art keywords
synthetic resin
resin
nickel
plating
pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57212997A
Other languages
Japanese (ja)
Other versions
JPH0238108B2 (en
Inventor
Tatsuro Nakagawa
達朗 中川
Yoshihiro Takigawa
義弘 滝川
Takio Yatabe
矢田部 多喜男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIN KAGAKU KOGYO KK
Original Assignee
RIN KAGAKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIN KAGAKU KOGYO KK filed Critical RIN KAGAKU KOGYO KK
Priority to JP57212997A priority Critical patent/JPS59102953A/en
Publication of JPS59102953A publication Critical patent/JPS59102953A/en
Publication of JPH0238108B2 publication Critical patent/JPH0238108B2/ja
Granted legal-status Critical Current

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  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Chemically Coating (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Conductive Materials (AREA)

Abstract

PURPOSE:To provide a composition imparted with excellent electrical conductivity and high shielding capability of electromagnetic wave, and suitable as the casing of electronic apparatus, economically without lowering the physical properties and formability, applying metallic film to the surface of small pieces of synthetic resin by electroless plating, and using the pieces as a filter for the composition. CONSTITUTION:The objective synthetic resin composition contains a filler comprising small pieces of a synthetic resin applied with metallic film (e.g. silver, copper, nickel, cobalt, copper-nickel alloy, nicke-cobalt alloy, nickel-iron alloy, etc.) by electroless plating. The maximum dimension of the piece is preferably 0.01-3mm. for particle, 1-3mm. for flake, and 0.01-1mm. in diameter and 0.5- 1mm. in length for fiber, and pieces having high aspect ratio are used. The thickness of the metallic film is preferably 1-3microns. The amount of the filler is >=10% based on the base resin, and the resin constituting the piece is selected to have higher heat resistant temperature than the base resin.

Description

【発明の詳細な説明】 法と、これを添加してなる合成樹脂組成物に関する。[Detailed description of the invention] The present invention relates to a method and a synthetic resin composition obtained by adding the same.

昨今のコンピューター機器を始めとし、デンタル技術を
応用した電子装置の急速な発展に併い、これらから外部
に放射される不要な電磁波による障害が深刻な社会問題
になりつつある。衆知の如く、上記電子設備は半導体な
どの回路要素の[(:化とその大規模集積化およびバッ
キング技術の進歩に支えられ、人間社会の隅々にまで浸
透している。
With the recent rapid development of computer equipment and other electronic devices that apply dental technology, interference caused by unnecessary electromagnetic waves emitted from these devices to the outside is becoming a serious social problem. As is well known, the above-mentioned electronic equipment has penetrated into every corner of human society, supported by the development of circuit elements such as semiconductors, their large-scale integration, and advances in backing technology.

これら゛市r−装(肖から作動中に発する高周波パルス
は互に干渉し合い誤動作の原因をつくり、叉テレビ、・
2ンオ受信機、無線通信機、音響機器等の般公」19の
″市r設留Iにもu]害をLJへ、いわゆる電磁波公害
と称さ力、る新たな公害+J、l因を胚胎させようとし
ている。
The high-frequency pulses emitted during operation of these commercial equipment interfere with each other and cause malfunctions.
2) General public use of receivers, radio communication equipment, audio equipment, etc. 19 "City R Installation I] Harm to LJ, so-called electromagnetic wave pollution, a new pollution +J, l cause is born. I'm trying to make it happen.

従来、このような深刻fヒしつつある゛)E磁波障害を
克服する為の種々の方法が提案されて(、−するが、現
在のところ不′Bコなr(f、磁波の発生源を電気的に
シールドする方法が唯一の実用的手段とされている。
In the past, various methods have been proposed to overcome such serious f)E magnetic wave disturbances (, -), but at present there are only a few methods that can be used to overcome the source of the magnetic waves. The only practical method is to electrically shield the

本発明の目的はこれら電r−機器の組込まれた膜幅の外
筐に便用される合成樹脂、合成ゴム等に電磁シールドの
目的で添加される導電性充填材の改良された製造法を提
供することにある。
The purpose of the present invention is to provide an improved manufacturing method for conductive fillers that are added to synthetic resins, synthetic rubbers, etc. for the purpose of electromagnetic shielding, which are conveniently used in the outer casings of electrical equipment. It is about providing.

従来提案されている電磁シールドを施すだめの手段とし
ては、■)プラス千ツク成型品の外部表面に導電性膜を
形成させるもの、例えば亜鉛溶剤、銅、ニッケル等の金
属粒子を含む導電塗装、真空蒸着、メッキ、ヌパノタリ
ンク等を挙げることができ、2)成型材料内に導電性フ
ィラーを混入させるものでd:、フィラーとしてカーボ
ンブラック、金属フレークや繊維、金属パウダー、カー
ボン繊維、メタライズドカラス等が挙げられる。
Conventionally proposed methods for applying electromagnetic shielding include ■) methods that form a conductive film on the external surface of a plus-sealed molded product, such as zinc solvent, conductive coating containing metal particles such as copper or nickel; Vacuum deposition, plating, Nupanotalink, etc. can be mentioned. 2) A conductive filler is mixed into the molding material, and the filler includes carbon black, metal flakes, fibers, metal powder, carbon fiber, metallized glass, etc. Can be mentioned.

これら従来法には種々欠点が指摘されており木だ決定的
に1夏侍な実用的シールド方法が見出されていない。例
えば、亜鉛忰包、1法では、シールド効果は優れている
が、高価な設(dllが必すであり、導電性塗装は設備
が安く済むが、塗装1のコストが高い、。
Various shortcomings have been pointed out in these conventional methods, and no definitive practical shielding method has yet been found. For example, the zinc packaging method 1 has an excellent shielding effect, but requires expensive equipment (DLL), and conductive coating requires less expensive equipment, but the cost of coating 1 is high.

11す(すC4<1.−曲でのj]・4、ニー・ケル、
りIIノベqのノ・x−7人では、l−Iス1i’、’
Jの1、メ1キuHiヒな]A月に制限がある。
11su (suC4<1.-j in the song]・4, knee kel,
In the No.
J's 1, me 1 kiuHihi] There is a limit on month A.

白字M2!1″″(、スハ・タリ〜り′:9は411殊
な設侑を安し、ハしく商filiである ス、+1η1
汁1)f′ツノ−は、カーホ〜)”i、夕はコツト安テ
9ルカJ!’i’、lLl’l:UIKぐ、jN] ハ
、1ツタ”  ヤ計i74裁イ(1ば、中’、’Rでp
> 61酸化K J: ル尭市1′1)低1・、−y−
> −y、 −t−’J ’y l、l−1−:l t
y)B」y、2r、り加I]の間!11n等が挙げられ
る3、 本発明者らはfiC来の′市磁波ンール1”方法にみら
れる高面な(]!Iと設friii s物11.の変化
、1+y、バi」の困テ1[、性能不1′↓′砧の欠点
を東服すべく検d−1シた結果、無電解メッキ法により
表面に金属11着膜を施し、導′市加下しだ合成樹脂の
小)1を一種もしくに、異種のベース合成樹脂に添加、
分散もしくは混練りすることにより、これらの合1+1
21位1脂に卓越せる′tE磁波バ暗能を(、i、1j
せしめうることを見出しだ。
White letters M2!
Juice 1) f'horn is kaho~) ``i, evening is Kotsuto Ante 9 Luka J!'i', lLl'l: UIKgu, jN] Ha, 1 Tsuta'' ya total i74 judgment (1 , medium', 'R in p
>61 oxidation K J: Le Yaichi 1'1) Low 1・, -y-
> -y, -t-'J'y l, l-1-:lt
y) B”y, 2r, Rika I] between! 11n, etc. 3. The present inventors have solved the problem of the high-level (]! I and the changes in the set material 11. 1 [, poor performance 1'↓' As a result of the inspection d-1 to solve the shortcomings of Kinuta, a metal 11 film was applied to the surface by electroless plating method, and the synthetic resin was ) 1 is added to one or more different types of base synthetic resins,
By dispersing or kneading, the combination of these 1+1
21st place 1 The 'tE magnetic wave darkening ability (, i, 1j
Headline what you can do.

心′屯加1′の71象とする小11化された合成樹脂の
(la f+’iは、無′市lII’I’〕・ギにより
、これらの表面に密ノロしだ金属性i占膜か1)珀トな
熱(iすj (11を 1’lおよびゼ駆■≠1槓l脂の全てに及O・、代表例
としてフィメール、ユリア、ノラミノ、ポリエステル、
エポキシ、ウレタ/、ポリオレフィン、ポリアミI−、
ポリイミ1−1ABS1ホリカーボ不−1−、ポリスチ
レン、円゛0、ツタクリル、含弗素71!リオレフf〕
、I?1.Xビ、耐ヒの各位j脂および各fΦ繊繊素素
糸各槓1脂をントげるCとかできる1、1..1.!各
樹脂の小11の形状は特に制限はないか、不定+pのt
)“f−1ノい球状、円盤状、ベレ・1−状、薄IH状
、もしくは繊卸状およびこれの集【11本としての1夕
Q線、綱4ノ品、1□亀 次JU、、 1次lL、  
次ノi1に展開した各種の形状を佳0、に選定すること
がでへる。こねも小j1の1法はケ外的な粒「状のもの
では最大iYかo、 o + my〜30問、嶋・14
状のものでは、最大径がl、 Q mm〜3.Qmm、
繊卸状のものではB 0.0 ] nm〜1. OII
Im 、長さ05xm 〜l(1+mが一般ト1的の電
磁波遮蔽杓として使用する場合の好適な範囲であり、特
にアスペク1−比の大きい薄片、1状および繊維状を呈
する充填(」が人なる電磁波遮蔽効果を与える。
By means of the 71-sized synthetic resin (la f+'i is 無'市1II'I') made of 71 images of Shin'tunka 1', a densely scorched metallic surface is formed on these surfaces. Membrane 1) Extensive heat (Isuj (11 to 1'l) and heat to all ≠ 1 ml fat, typical examples include female, urea, noramino, polyester,
Epoxy, urethane/, polyolefin, polyamide I-,
Polyimide 1-1 ABS1 Polycarbo-1-, Polystyrene, Yen 0, Tsutacryl, Fluorine-containing 71! Lyoreff f]
,I? 1. 1,1. .. 1. ! Is there any particular restriction on the shape of the small 11 of each resin?
) "f-1 spherical shape, disk shape, beret 1-shape, thin IH shape, or fiber shape, and collection of these [11 Q lines, 4 ropes, 1□Kameji JU ,, 1st order lL,
The various shapes developed in the next step i1 can be selected as good. Konemo small j1's 1st method is the maximum iY or o, o + my ~ 30 questions, Shima 14 for external grains.
The maximum diameter is 1, Q mm to 3. Qmm,
In the case of fiber-shaped ones, B 0.0 ] nm to 1. OII
Im, length 05xm ~ l (1+m is a suitable range when used as a general electromagnetic wave shielding scoop, and in particular, fillings exhibiting a flaky, 1-shaped and fibrous shape with a large aspect ratio of 1-1) Provides an electromagnetic shielding effect.

これら合成樹脂小Jjに金属着膜させるには、従来一般
に知られている各種無電解メッキ法より、盾眸しようと
する金属の種類によって適宜選択される。
In order to deposit a metal film on these synthetic resin small Jj, an appropriate method is selected from among various conventionally known electroless plating methods depending on the type of metal to be shielded.

無電解メッキ法は、人別して、エノチノ先−感受性化−
活111.化−メッキの各工程よりなり、いずれも単純
な浴侵漬のみによ ・で達成されるが、本発明方法も原
則としてこの順序に従う。しかし、被メッキ物の表面状
態によ−・ては、工、チンクおよび感受性化を省くこと
もできる。
Electroless plating method has different effects depending on the person.
Live 111. It consists of the steps of oxidation and plating, all of which are accomplished by simple immersion in a bath, and the method of the present invention also follows this order in principle. However, depending on the surface condition of the object to be plated, etching, tinting and sensitization may be omitted.

無電解メッキ法は、使用される還元剤の種類によ・で、
次111i 1ン酸法、ホルマリン法、ヒトランン法、
水素(1−ホウ7+2法および各種改良法が知られてい
るが、水沫ではこのいずれも適用1でき、メッキ浴には
上記いずれかの還元剤・f中もしくは、tΦ11月と、
+rf lI&jしようとされる金属のnf浴性塩を不
nJ欠的に念み、必゛沈に応じて、JT調整剤、緩衝剤
、安定剤、錯化剤、助剤等をlん加された水溶液」;り
なる。還元剤としては、銅の場合はホルマリン、ヒト′
ラシン、次tJli IJン酸ソータが、ニッケル、コ
バルトおよび合金の場合はヒドラジン、次亜リン酸ソー
タ、水酸化ホウ素が好しく、叉I−記金属のnJ溶性」
九としては、それぞれの硫酸塩、塩酸塩等が適当である
。錯化剤としては、酒石酸、クエン酸、1・:1日′Δ
、縮合リン酸塩、ポリポスホン酸塩、エチレンシアミン
等が、緩衝剤としては低分子1什のカルボン酸もしくは
オギシカルボン酸、その他助剤として硫酸アンモニウム
、塩化アンモニウム、ホウ酸等を使用しうる。
The electroless plating method depends on the type of reducing agent used.
Next 111i monophosphoric acid method, formalin method, human run method,
Hydrogen (1-Ho7+2 method and various improved methods are known, but any of these can be applied to water droplets, and the plating bath should contain one of the above reducing agents, f or tΦ11,
+rf lI&j Make sure that the nf bath salt of the metal to be mixed is not present, and add JT regulators, buffers, stabilizers, complexing agents, auxiliaries, etc. as required. Aqueous solution. In the case of copper, formalin, human
In the case of nickel, cobalt, and alloys, hydrazine, hypophosphorous acid sorter, and boron hydroxide are preferable, and the nJ solubility of the metals listed above is preferable.
Suitable examples of 9 are sulfates, hydrochlorides, etc. As a complexing agent, tartaric acid, citric acid, 1.:1day'Δ
, condensed phosphates, polysulfonates, ethylenecyamine, etc., low molecular weight carboxylic acid or oxycarboxylic acid, and other auxiliary agents such as ammonium sulfate, ammonium chloride, boric acid, etc. can be used.

−1−記ノノや工程に先立ち、前処用jとして、エノチ
ンク 感受性化−活性化が必要である。エノチンクはメ
ッキ膜と波メッキ物間の密着1イ1向1.の1」的で行
なわれるもので、本発明の対象物では硫酸−クロト酸の
混液に浸漬することによ−・で達成される。感受性化処
理は次段における活性化金属の析出を容易にするために
行われ、通常1%の塩化第−揚水溶液へのθ夛漬によ・
で、叉活性化処理は001%のi+(金1萬イオノを含
む水溶液への浸11Tによ・で達成される。
-1- Prior to the steps described above, enotinic sensitization and activation are required as a pretreatment. Enotink has 1. In the case of the object of the present invention, it is achieved by immersing it in a mixed solution of sulfuric acid and crotic acid. Sensitization treatment is carried out to facilitate the precipitation of the activated metal in the next step, and is usually carried out by immersion in 1% chloride-pumped water solution.
The activation treatment is accomplished by immersion in an aqueous solution containing 10,000 ions of gold at 11%.

・連のメッキ1(、l、lでの操業条件や操作方法にu
:!t、7別の制限はないか、水沫で71象とする波メ
、キ物は合成樹脂の小)1であるので、−・般のメッキ
の71偽物である入りイスの物(イ・に化し、比表面[
【1fは馨しく大きくなる1、この、y)メ ・ギ浴の
容(Lliとi+υメッキ物)の谷表曲債の比で表わさ
れる浴比およびメッキ膜のH:、)さを重接左右する浸
漬時の金DA析出1jtに苅する操業1の管理が11に
中間である5、メ・キ膜p7は本発明の目的物だる電磁
11犯餞(イとしてのl’bripに直接影響を与える
。即ち、膜片が大きくなれば皮膜の電−(抵抗1]i’
、iが低1−シ、人なる遮蔽効果が得られるか、一方(
」月の中位EF、’ fit当りの金属の析出量を大き
くしなければkらないので、メッキ浴のりy賃が頻繁に
なり経済的に不利である。このU点から、ブ[づγ′I
■磁遮蔽効果が得られ、かつ経済的なメッキ膜厚は1ミ
クロン〜3ミクロンが適当である。
・Ream plating 1 (, l, u depending on the operating conditions and operating methods
:! t, 7 Is there no other restriction? Since the wave pattern is made of water droplets and the kimono is made of synthetic resin (small) 1, it is -. , and the specific surface [
[1f increases exponentially 1, this, y) The bath ratio expressed by the ratio of the valley surface curve of the volume of the bath (Lli and i + υ plated material) and the H of the plating film: The management of operation 1, which is applied to the gold DA precipitation 1jt during immersion, is intermediate to 115, and the Meki film p7 is directly attached to l'brip as the object of the present invention. In other words, the larger the film piece, the more the film's electric current (resistance 1) i'
, if i is low 1-shi, one can obtain a shielding effect, while (
Since it is necessary to increase the amount of metal deposited per month's medium EF and fit, the plating bath requires frequent replenishment, which is economically disadvantageous. From this point U,
(2) A plating film thickness of 1 to 3 microns is suitable for obtaining a magnetic shielding effect and being economical.

合成樹脂小片を無電解ノブキする場合の第ユの開立1と
して、前段から後段処即二を稈への浴液汚染を挙けるこ
とができる。これを防止するため、各段における処理の
終了後、常法によ−・て十分水洗し、必要に応じて、圧
沖過法、遠・bン濾過法、前月法等によ−・て洗液を可
及的に除去し処即物を次段へ11込むようにする。これ
ら特記事項似外のメッキ条件や浴管理′ηは71象とす
るlri wy K対し従来から提案されている要領に
従うことにより1゛つ1実施1り能である3゜無電解メ
ッキ法により金属着膜されだI’+il記樹脂小11の
添加の7.1象としうるベース樹脂は、該盾膜槓j脂と
同種もしくは異f中にかかわらず州)硬化性、熱(iJ
、!!’El性の全てに及び、代表例として、)1ノ−
ル、 不fGq和ポリニス−アル、ユリア、エボN−ン
、ポリウレタン、ポリアミ1−、ボリイミ1−、ポリオ
レフずノ、l ’ 111 ’l’ 、  円・1.′
1.′・11+萬、ポリアクリロニl−リル、J焦ヒ’
、P[itヱ゛、ポリカーボ不−1、ポリスチレン、メ
タアクリル、1川゛C)、ポリアセタール、含弗素ポリ
オレフイノ、ンリコーンの各樹脂および、これらの複介
樹脂等を挙げることができる。該着膜樹脂の小11を電
磁越蔽イ」として利用する場合、所望のベース樹脂を目
的物に成型する1)IIに、通常の充填イ」を混入せし
めると同様の常套的な手段により、添加、分散もしくは
混練りさせるたけでよい。又単なるベース樹脂への添加
、促練り以外に、S M C’:等の複合材料の素材か
塗料の充填材としても使用iiJ能である。
In the case of electroless removal of small pieces of synthetic resin, the first step is to contaminate the culm with the bath liquid from the first stage to the second stage. In order to prevent this, after completing the treatment at each stage, thoroughly wash with water by the usual method, and if necessary, use the pressure offshore filtration method, centrifugal filtration method, filtration method, etc. The washing liquid is removed as much as possible and the treated material is transferred to the next stage. The plating conditions and bath management 'η other than these special notes are based on 71 conditions.Metals can be manufactured using the 3° electroless plating method, which can be carried out one by one by following the previously proposed procedures. The base resin, which can be considered as the addition of the resin 11 for forming a film, is curable, heat-curable, heat-curable,
,! ! Covers all of the 'El characteristics, as a representative example) 1 no-
Le, FuGq polynis-al, urea, ebon, polyurethane, polyamide 1-, polyimide 1-, polyolefzuno, l' 111 'l', yen・1. ′
1. '・11+man, polyacrylonyl l-lyl, J Jiaohi'
, polycarbonate, polystyrene, methacrylic, polyacetal, fluorine-containing polyolefin, phosphoricone, and composite resins thereof. When using the coating resin 11 as an electromagnetic shielding material, the desired base resin is molded into the object 1) By the same conventional means as mixing the ordinary filling material 1 into II, It is sufficient to simply add, disperse or knead. In addition to being simply added to base resins and expedited, it can also be used as a material for composite materials such as SMC' or as a filler for paints.

一般に、添加の対象とするベース樹脂の熱変形温度75
哩1熱温度が前記着膜樹脂小片のそれより高い場合は混
練り操作中に両樹脂が互いに411溶すると同時に、小
j1樹脂表面の金属膜が卸B)化し、得られたブレンド
′樹脂内に微粒子とな−・て均一に分散する。又、逆に
該小片樹脂の耐熱温度か高い場合は一定の温度範囲内に
て着膜小片の原形を保持した状態でベース樹脂内に分散
する31両者の耐熱性の差による樹脂の組合せは、(す
、・111目的によ・て任αに選択しうるが、特例を除
いては一般に異種の樹脂をブレントイ″11溶させるこ
とによりベース樹脂の4′¥1イ1が失われること及び
小j11−の金属膜が破壊し微細r1:することによ 
1てTr!、置市な架橋効果が損れる結果、電磁遮蔽能
が低1−すること′IQの11t! +−11により、
ベース樹脂よす高い耐熱と品度をイ1する・IJ’+樹
脂を選択するのが好しい3、カバる観、・、°、1、よ
り例を挙げれば、ベース樹脂としては、塩ビ、ポリエチ
レン、ポリスチレン、△トS、メククリルMの各樹脂を
、又金属着膜の対物とする小片樹脂としてフェノール、
ポリエステル、エポキシ、ポリウレタン′、ポリアミド
、ボリイミ1−゛、ボリカーホ不−l−1I゛PO、ポ
リアセタール等の各樹脂を一般的な選択規準として挙け
ることができるが、もちろん必要に応じて双方を4−配
回−の1■より選ぶこともii■能である。耐熱性のよ
り高い樹脂の小j1に金属着膜を施し、目的のベース樹
脂に均一に分散さぜる場合これにI?越せる電磁遮暗能
をf:I”:、Lうると同時に材料補強、4・]質改善
の機能をも発揮させつる。通常の合成樹脂の成型品には
(」月改質の1・1的で、クラースウールか無機質の粉
体が添加されるが、本発明に係る電磁遮蔽素桐とOL用
添加することにより、イ゛4月改質およ0・軽IIF化
の而でもより一層の向上を図ることができる。
Generally, the heat distortion temperature of the base resin to be added is 75
If the thermal temperature of the resin particles is higher than that of the resin particles, the two resins will melt into each other during the kneading operation, and at the same time the metal film on the surface of the small resin will become B), and the resulting blend will be dissolved in the resin. It becomes fine particles and is evenly dispersed. On the other hand, if the heat resistance temperature of the resin pieces is high, the coated pieces will be dispersed in the base resin while maintaining their original shape within a certain temperature range.31 The combination of resins due to the difference in heat resistance between the two is (It can be selected arbitrarily depending on the purpose, but except for special cases, generally speaking, by dissolving a different type of resin, 4'\1\1\1 of the base resin is lost and small The metal film of j11- is destroyed and the fine r1:
1 Tr! As a result, the cross-linking effect is impaired, resulting in a low electromagnetic shielding ability with an IQ of 11t! Due to +-11,
The base resin has high heat resistance and quality.It is preferable to select IJ' + resin. Various resins such as polyethylene, polystyrene, △ToS, and Mekkryl M were used, and phenol,
Resins such as polyester, epoxy, polyurethane', polyamide, polyimide 1-', polycarbonyl-1I'PO, and polyacetal can be mentioned as general selection criteria, but of course both resins can be used as necessary. It is also possible to choose from 1. - distribution -. When applying a metal coating to a small j1 of resin with higher heat resistance and uniformly dispersing it in the target base resin, I? It has an electromagnetic shielding ability that can exceed f:I'':, L, and at the same time it also has the function of reinforcing the material and improving the quality.Ordinary synthetic resin molded products have the following properties: In general, Krass wool or inorganic powder is added, but by adding the electromagnetic shielding paulownia according to the present invention and OL use, it is even more effective in April modification and 0/light IIF. It is possible to improve the

木材の合成樹脂等に対する添加割合は最低lO%程度を
含(jさせることにより、十分に通常目的の電磁遮蔽効
果を得ることができる。木材は、合成樹脂小片の表面に
僅か1ミクロン〜3ミクロンの金属が着膜されているの
みであるので、従来の金属パラターの使用にみられる俺
端な4:A月の重質化はなく、i4i位容積当りの月利
の型部にはほとんど変化はない。又、金属バラタ−の液
状樹脂に添加12だときにみられる沈降分離も起さない
のて却下が容易である。
The addition ratio of wood to synthetic resin, etc., should be at least about 10% (j), so that the electromagnetic shielding effect for normal purposes can be sufficiently obtained. Since only the metal is deposited on the film, there is no heavy 4:A month seen in the use of conventional metal paratars, and there is almost no change in the monthly yield per volume of i4i. In addition, it is easy to dismiss because it does not cause the sedimentation separation that occurs when metal balata is added to liquid resin.

本状!(よれば、真空蒸着法や、スパッタリング等の高
価で特殊な設備や、大サイズの成型体を対象とするメ、
7キ、導電塗装、金属溶削にみられる大規模な設備も不
要であり、ありきたりの小規模な無電解メッキ設備で充
分本来の目的を達しうる。
Honesty! (According to
There is no need for large-scale equipment found in conductive coating and metal melting, and the intended purpose can be fully achieved with ordinary small-scale electroless plating equipment.

一般に材料の電磁波遮蔽効果(S l> )は次式8式
% 但し、R′拐料の体積固有抵抗率(Ω・α)t′、、材
料の厚み(α ) f 周波数([旧−1z) で表わされ、SIE値として30〜40c+bであれば
実用可能とされている。本式によって一般に電磁波障害
の対象となる周波数l QMITz 〜l GHz(7
)範囲で実用化するにはlOΩ・rmpJ、l−′の体
積固有抵抗率が必要なことが判る。
In general, the electromagnetic wave shielding effect (S l>) of a material is expressed by the following formula 8%. ), and it is considered practical if the SIE value is 30 to 40c+b. According to this formula, the frequency l QMITz ~ l GHz (7
) It can be seen that a volume resistivity of lOΩ·rmpJ, l-' is required for practical use in the range.

本発明方法によ−て得られる金属着膜された小JA樹脂
の10〜40市量部を100重量部の合成樹脂に添加、
混練りして得られた成型体の体積固有抵抗率は10−2
〜10’Ω・cmを示し、充分に電磁波遮蔽材に供しう
ろことが確認された。
Adding 10 to 40 parts by weight of the metal-coated small JA resin obtained by the method of the present invention to 100 parts by weight of the synthetic resin;
The volume specific resistivity of the molded product obtained by kneading is 10-2
~10'Ω·cm, and it was confirmed that the electromagnetic wave shielding material was sufficiently covered.

以下実施例によって具体的に説明する。This will be specifically explained below using examples.

実施例1 平均粒径が50ミクロンの粒状AI鼾;樹脂50Fを遂
次60%硫酸−2%無水クロム酸混液によるエノチンク
、水洗、1%塩化錫による感受性化、水洗、および0.
01%塩化パランウl、による活性化を施したものを下
記組成のメッキ浴1rに25 ’cにて30分間浸漬し
、ゆるやかに攪ばんする。
Example 1 Particulate AI with an average particle size of 50 microns; Resin 50F was sequentially treated with a mixture of 60% sulfuric acid and 2% chromic anhydride, washed with water, sensitized with 1% tin chloride, washed with water, and washed with 0.05% tin chloride.
The product activated with 01% parachloride was immersed in a plating bath 1r having the following composition at 25'C for 30 minutes and gently stirred.

メ ツキ浴組成 硝酸銅    0.05モル/r 酒石酸すトリウム     01   〃苛性ソーダ 
       05    //ホルムアルデヒド  
   10   〃pH11,5(塩酸による) メッキ終了後、水洗、乾燥した結果、A t:3 S樹
脂の個々の粒子表面に畦面な金属光沢を有する銅メッキ
膜が得られた。
Plating bath composition Copper nitrate 0.05 mol/r Thorium tartrate 01 Caustic soda
05 // formaldehyde
10 pH 11.5 (by hydrochloric acid) After completion of plating, washing with water and drying resulted in a copper plating film having a ridged metallic luster on the surface of each particle of At:3S resin.

本処理物20重量部を常法に従−〕て/\IIs樹脂原
体100重量部に加熱混練りして得られた成型体の体積
固有抵抗率は127Ω・αであり、十分?+・磁遮蔽用
途に供しうることが確認された。
The volume specific resistivity of the molded product obtained by heating and kneading 20 parts by weight of this treated product with 100 parts by weight of /\IIs resin base material according to a conventional method is 127Ω·α, which is sufficient? +・It was confirmed that it can be used for magnetic shielding purposes.

実施例2 直径が20ミクロン、長さが3Mの繊維状ポリカーボネ
ー1−樹脂50 yに遂次イソプロピルアルコールによ
るプレエノチンク、水洗、60%硫酸−2%無水クロム
酸混液によるエノチン夕、水洗、1%塩化第一錫による
感受性fヒ、および001%塩化パラジウムによる活性
化を施し、だものを[・記組成のメッキ浴1eに65’
Cにて30分間浸漬し、ゆるやかに攪はんする。
Example 2 A fibrous polycarbonate with a diameter of 20 microns and a length of 3M 1-resin 50 y was sequentially pretreated with isopropyl alcohol, washed with water, and treated with a mixture of 60% sulfuric acid and 2% chromic anhydride, washed with water, and 1% Sensitivity with stannous chloride and activation with 0.001% palladium chloride were applied to the plating bath 1e with the following composition.
Soak at C for 30 minutes and stir gently.

メッキ浴組成 疏酸二、ケル       01モル/eヒドラジン 
       10  〃酒石酸す1−リウム    
 0.1   //匡D ’I’Δ 2Na     
O,05’/■旧          11.0 (1
’(υ、0[]による)メメッキ終了後水洗乾燥した結
果、ポリカーボネー1−繊随表面」−に鮮明な金属光沢
を有するニノケルメッギ膜が得られた。
Plating bath composition Di, Kel sulfate 01 mol/e hydrazine
10 1-lium tartrate
0.1 //匡D 'I'Δ 2Na
O,05'/■Old 11.0 (1
As a result of washing with water and drying after completing the plating (according to υ, 0[]), a Nino Kermeggi film with a clear metallic luster was obtained on the polycarbonate 1 - fibrous surface.

本処即物15重■部を常法に従−てΔl”(S樹脂内に
加熱混練りして得られた成型体の体積固有抵抗率は03
8Ω・mでありト分電磁遮蔽用途に供しうることか確認
された。
The volume specific resistivity of the molded product obtained by heating and kneading 15 parts by weight of this product into Δl'' (S resin) according to a conventional method is 0.3 parts by weight.
It was confirmed that the resistance was 8Ω・m and that it could be used for electromagnetic shielding purposes.

実施例3 厚さ50ミクロン、縦および横がそれぞれ2問および3
mmのポリプロピレンの薄J42OFを遂次、60%硫
酸−5%無水クりム酸混腋による工7チング、水洗、1
%塩化第一錫による感受性化、水洗および0.01%塩
化パラジウムによる活性化を施しブζものを下記組成の
メッキ浴1eに70Cにて20分間浸漬し、ゆるやかに
tf、tid、んする。
Example 3 Thickness 50 microns, 2 questions and 3 questions in the vertical and horizontal directions, respectively
Thin J42OF of polypropylene of mm thickness was sequentially treated with a mixture of 60% sulfuric acid and 5% chromic anhydride, washed with water, and washed with water.
% stannous chloride, washed with water, and activated with 0.01% palladium chloride, the plate was immersed in a plating bath 1e having the following composition at 70C for 20 minutes, and then gently tf, tid, and so on.

メッキ浴組成 硫酸二ノゲル       01モル/f次卯リン酸ナ
トリウ1.    0,2   //クエン酸ナトリウ
J、     0,2   //硫酸アンモニウJ−,
Q、5   //[旧        100(アンモ
ニアによる)メッキ終了後水洗、乾燥した結果、ポリプ
ロピレン薄j1の表面十に鮮明な金属光沢を有するニア
ケル膜が得られた。
Plating bath composition Dinogel sulfate 01 mol/f Sodium diphosphate 1. 0,2 // Sodium citrate J, 0,2 // Ammonium sulfate J-,
Q, 5 // [Old 100 After completion of plating (with ammonia), washing with water and drying resulted in a Niacel film having a clear metallic luster on the surface of the thin polypropylene j1.

本処理物I Oat部を]7均粒径35ミクロンの水和
アルミナ20Φ゛計部とともに、常法に従−てエポキシ
槓・j脂(Cy−206、チハ社製)100屯量部に混
練り′)′J′敗させた後、硬化剤(Ill−1951
、チハt1−製)を添加して硬化して得られた成バIJ
体の体積固有抵抗率は341Ω・CMを示し、−1゛分
71イ磁遮蔽用途に供しうろことが確認された。
The Oat part of the treated product I was mixed with 100 tonne parts of epoxy resin (Cy-206, manufactured by Chiha Co., Ltd.) according to the usual method, along with a 20Φ meter part of hydrated alumina with an average particle size of 35 microns. After kneading, hardening agent (Ill-1951
, manufactured by Chiha t1-) and cured by adding
The volume specific resistivity of the body was 341Ω·CM, and it was confirmed that it could be used for -1° min.71 magnetic shielding purposes.

実施例4 ポリエステルポリオ−v(Mo 618、シェル化学)
およびイソシア不−1−(カラテ゛−1−30、シェル
化′/)をハ;(*1として得られた硬質発泡ポリウレ
タ/の小1’+’(・1′均(−E5Mff)の109
を遂次、1%第一塩化錫による感受III: (IS、
水洗、および0.01%塩化パラジウムによるl’i性
化を施したものを1・1it粛1成の)、N−浴1eに
6,0℃にて15分間浸漬し、ゆるやかに攪けんする3
、メッキ浴組成 1i4e酸二 ノケル             0.
08 モル/ r硫酸銅    0.02  // 次rnrリン酸すI−リウl、   02   〃クエ
ン酸−ノートリウl、     03   〃I+ll
           I O,o (苛性ソーダによ
る)メッキ終了後、水洗、乾燥した結果、ポリウレタン
発泡体の各細胞の内部−面にalt明な金属光沢を有す
る銅−二ノケlし合金メッキ膜が得られた。
Example 4 Polyester polyol-v (Mo 618, Shell Chemical)
and isocyanun-1-(karate-1-30, shelled'/);
Sensitization III with 1% tinnous chloride: (IS,
Washed with water and treated with 0.01% palladium chloride, then immersed in N-bath 1e for 15 minutes at 6.0°C and gently stirred. 3
, plating bath composition 1i4e acid dinokel 0.
08 mol/ r copper sulfate 0.02 // nextrnr phosphoric acid I-liul, 02 〃citric acid-noturiul, 03〃I+ll
After completion of plating (with caustic soda), washing with water and drying resulted in a copper-nickel alloy plating film having a bright metallic luster on the inner surface of each cell of the polyurethane foam.

本処理物15爪計部を常法に従−)て一般用11ミリス
チレン100重隈部に加熱混練りして得られた成型体の
体積固有抵抗率は074Ω・渭であり、十分電磁遮蔽用
途に供しうろことが確認された。
The volume specific resistivity of the molded product obtained by heating and kneading 15 parts of this treated material according to a conventional method into 100 parts of general purpose 11 mm styrene is 074 Ω, which is sufficient for electromagnetic shielding purposes. It was confirmed that the food could be served.

実施例5〜7 表に掲るメッキ11象の樹脂止11、メッキ浴および添
加対象のベース樹脂を用いて実施例1〜4と同様の′政
領により樹脂止)1のメッキおよび樹脂成バ1川・の作
成を行い体積固有抵抗率を測定した結果を・括して示し
、いずれも1′分に電磁直両用途に1バしうろことを確
認した。
Examples 5 to 7 Using the resin stopper 11 of the plating 11 shown in the table, the plating bath, and the base resin to be added, plating and resin stopper 1 were carried out in the same manner as in Examples 1 to 4. The results of the measurement of the specific volume resistivity of 100% of the total resistivity are summarized below, and it was confirmed that both of them can be used for both electromagnetic and direct applications in 1' minutes.

Claims (2)

【特許請求の範囲】[Claims] (1)無′1目1h′メノギ法により表面に金犀性着膜
を施しだ合成樹脂の小片を充填材として便用することを
特徴とする導電性の合成樹脂組成物。
(1) An electrically conductive synthetic resin composition, characterized in that a small piece of synthetic resin is applied as a filler by applying an osmanthus-like film on the surface by the 1 hour 1 hour barley method.
(2)  金属性霞嘆カ8R1銅、ニッケル、コバルl
−1i−ニッケル合金、ニッケルーコバ)v1゛合金、
もしくはニッケル鉄合金である特許請求の範囲第1項記
載の導電性の合成樹脂組成物。
(2) Metallic haze 8R1 copper, nickel, cobal
-1i-nickel alloy, nickel-coba) v1゛ alloy,
The conductive synthetic resin composition according to claim 1, which is a nickel-iron alloy.
JP57212997A 1982-12-03 1982-12-03 Electrically conductive synthetic resin composition Granted JPS59102953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57212997A JPS59102953A (en) 1982-12-03 1982-12-03 Electrically conductive synthetic resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57212997A JPS59102953A (en) 1982-12-03 1982-12-03 Electrically conductive synthetic resin composition

Publications (2)

Publication Number Publication Date
JPS59102953A true JPS59102953A (en) 1984-06-14
JPH0238108B2 JPH0238108B2 (en) 1990-08-29

Family

ID=16631758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57212997A Granted JPS59102953A (en) 1982-12-03 1982-12-03 Electrically conductive synthetic resin composition

Country Status (1)

Country Link
JP (1) JPS59102953A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012603A (en) * 1983-07-01 1985-01-23 住友化学工業株式会社 Conductive resin filler
JPS61285608A (en) * 1985-06-12 1986-12-16 岩井 謙治 Precious metal covered fine particle body and manufacture thereof
JPS62196378A (en) * 1986-02-21 1987-08-29 Brother Ind Ltd Forming method for thin film
JPS63287098A (en) * 1987-05-20 1988-11-24 Mitsubishi Metal Corp Magnetic powder for magnetic shield
JPS63287099A (en) * 1987-05-20 1988-11-24 Mitsubishi Metal Corp Magnetic powder for magnetic shield
JPH01195284A (en) * 1987-10-05 1989-08-07 Rhone Poulenc Chim Plated reticulated functional polymer particle, production thereof and used thereof in production of conductive material
JPH0224358A (en) * 1988-07-14 1990-01-26 Nippon Chem Ind Co Ltd Polymer composition containing electrolessly plated powder
WO2001024198A1 (en) * 1999-09-27 2001-04-05 Metallveredlung Gmbh & Co. Kg Method for producing a coating for absorption of neutrons produced in nuclear reactions of radioactive materials
JP2006036912A (en) * 2004-07-27 2006-02-09 Koyo Sangyo Co Ltd Electromagnetic wave shielding material and its manufacturing method
WO2007004765A1 (en) * 2005-07-05 2007-01-11 Cheil Industries Inc. Conductive particles comprising complex metal layer with density gradient, method for preparing the particles, and anisotropic conductive adhesive composition comprising the particles
US7295646B1 (en) 1999-09-27 2007-11-13 Metallveredlung Gmbh & Co. Kg Method for producing a coating for absorption of neutrons produced in nuclear reactions of radioactive materials
JP2011063791A (en) * 2009-08-19 2011-03-31 Mitsubishi Engineering Plastics Corp Electromagnetic wave-suppressing resin composition and molded article

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5229835A (en) * 1975-09-02 1977-03-07 Asahi Glass Co Ltd Improved filler for synthetic resin
JPS55160061A (en) * 1979-05-31 1980-12-12 Showa Highpolymer Co Ltd Production of treated filler having beautiful metallic luster

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5229835A (en) * 1975-09-02 1977-03-07 Asahi Glass Co Ltd Improved filler for synthetic resin
JPS55160061A (en) * 1979-05-31 1980-12-12 Showa Highpolymer Co Ltd Production of treated filler having beautiful metallic luster

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012603A (en) * 1983-07-01 1985-01-23 住友化学工業株式会社 Conductive resin filler
JPH0519241B2 (en) * 1983-07-01 1993-03-16 Sumitomo Chemical Co
JPS61285608A (en) * 1985-06-12 1986-12-16 岩井 謙治 Precious metal covered fine particle body and manufacture thereof
JPS62196378A (en) * 1986-02-21 1987-08-29 Brother Ind Ltd Forming method for thin film
JPS63287098A (en) * 1987-05-20 1988-11-24 Mitsubishi Metal Corp Magnetic powder for magnetic shield
JPS63287099A (en) * 1987-05-20 1988-11-24 Mitsubishi Metal Corp Magnetic powder for magnetic shield
JPH01195284A (en) * 1987-10-05 1989-08-07 Rhone Poulenc Chim Plated reticulated functional polymer particle, production thereof and used thereof in production of conductive material
JPH0224358A (en) * 1988-07-14 1990-01-26 Nippon Chem Ind Co Ltd Polymer composition containing electrolessly plated powder
WO2001024198A1 (en) * 1999-09-27 2001-04-05 Metallveredlung Gmbh & Co. Kg Method for producing a coating for absorption of neutrons produced in nuclear reactions of radioactive materials
US7295646B1 (en) 1999-09-27 2007-11-13 Metallveredlung Gmbh & Co. Kg Method for producing a coating for absorption of neutrons produced in nuclear reactions of radioactive materials
JP2006036912A (en) * 2004-07-27 2006-02-09 Koyo Sangyo Co Ltd Electromagnetic wave shielding material and its manufacturing method
JP4657644B2 (en) * 2004-07-27 2011-03-23 光洋産業株式会社 Method for manufacturing electromagnetic wave shielding sealant
WO2007004765A1 (en) * 2005-07-05 2007-01-11 Cheil Industries Inc. Conductive particles comprising complex metal layer with density gradient, method for preparing the particles, and anisotropic conductive adhesive composition comprising the particles
JP4812834B2 (en) * 2005-07-05 2011-11-09 チェイル インダストリーズ インコーポレイテッド Conductive fine particles comprising a composite metal layer having a density gradient, a method for producing the conductive fine particles, and an anisotropic conductive adhesive composition comprising the conductive fine particles
US8828543B2 (en) 2005-07-05 2014-09-09 Cheil Industries Inc. Conductive particles comprising complex metal layer with density gradient, method for preparing the particles, and anisotropic conductive adhesive composition comprising the particles
JP2011063791A (en) * 2009-08-19 2011-03-31 Mitsubishi Engineering Plastics Corp Electromagnetic wave-suppressing resin composition and molded article

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