JPS59102236A - ライト・テ−ブル - Google Patents

ライト・テ−ブル

Info

Publication number
JPS59102236A
JPS59102236A JP57212125A JP21212582A JPS59102236A JP S59102236 A JPS59102236 A JP S59102236A JP 57212125 A JP57212125 A JP 57212125A JP 21212582 A JP21212582 A JP 21212582A JP S59102236 A JPS59102236 A JP S59102236A
Authority
JP
Japan
Prior art keywords
work
straight lines
turned
plywood
horizontally
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57212125A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0157338B2 (enrdf_load_stackoverflow
Inventor
Takashi Numakura
沼倉　孝
Sukeaki Umehara
梅原　祐明
Yoichi Yoshida
洋一 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamatoya and Co Ltd
Original Assignee
Yamatoya and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamatoya and Co Ltd filed Critical Yamatoya and Co Ltd
Priority to JP57212125A priority Critical patent/JPS59102236A/ja
Publication of JPS59102236A publication Critical patent/JPS59102236A/ja
Publication of JPH0157338B2 publication Critical patent/JPH0157338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57212125A 1982-12-03 1982-12-03 ライト・テ−ブル Granted JPS59102236A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57212125A JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57212125A JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Publications (2)

Publication Number Publication Date
JPS59102236A true JPS59102236A (ja) 1984-06-13
JPH0157338B2 JPH0157338B2 (enrdf_load_stackoverflow) 1989-12-05

Family

ID=16617294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57212125A Granted JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Country Status (1)

Country Link
JP (1) JPS59102236A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0157338B2 (enrdf_load_stackoverflow) 1989-12-05

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