JPS59100550A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS59100550A
JPS59100550A JP57211619A JP21161982A JPS59100550A JP S59100550 A JPS59100550 A JP S59100550A JP 57211619 A JP57211619 A JP 57211619A JP 21161982 A JP21161982 A JP 21161982A JP S59100550 A JPS59100550 A JP S59100550A
Authority
JP
Japan
Prior art keywords
pads
wiring
chip
pad
vss
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57211619A
Other languages
Japanese (ja)
Inventor
Kiichi Morooka
諸岡 毅一
Koichiro Masuko
益子 耕一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57211619A priority Critical patent/JPS59100550A/en
Publication of JPS59100550A publication Critical patent/JPS59100550A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To make the width of a wiring pattern narrow, by providing a plurality of pads for connecting power sources. CONSTITUTION:In a semiconductor device such as a memory, a plurality of Vcc pads 2a and 2b and Vss pads 3a and 3b, which supply power to a memory chip 1, are provided. Lead frames 4a, 4b, 5a and 5b are provided in correspondence with the pads. The parts between the pads and the lead frames are connected by bonding wires 6a, 6b, 7a and 7b. Since there are a plurality of power source pads, wiring to each circuit becomes short, and the width of a wiring pattern can be made small without increasing wiring resistance. In this case, not only the power source pads, but also a plurality of input and output pads for signals can be provided.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は半導体装置、特にデュアルインライン型パッ
ケージ(以下DIPと略称する)内に収容される半導体
メモリ装置に関するものでおる。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a semiconductor device, and particularly to a semiconductor memory device housed in a dual in-line package (hereinafter abbreviated as DIP).

〔従来技術〕[Prior art]

従来のこの種の半導体メモリ装置におけるDIP内部の
概要構成を第1図に示しである。この第1図において、
符号(1)はメモリチップ、(2)はこのメモリチップ
(1)に電源電圧を供給するためにチップ上に形成され
たパッド(以下Vccパッドと略称する)、(31は同
様にこのメモリチップ(1)に接地電位を与えるために
チップ上に形成されたパッド(以下Vssパッドと略称
する)であり、また(4)はDIPの電源電圧ピン(以
下Vccピンと略称する)に連なるリードフレーム、(
5)は同様にDIPの接地電位ピン(以下Vssピンと
略称する)に連なるリードフレーム、(6)はVccパ
ッド(2)とフレーム(4)とを電気的に接続するボン
ディングワイヤ、(7)はVssパッド(3)とフレー
ム(5)とを電気的に接続するポンディングワイヤであ
シ、各パッド(2+ 、 (31は1チップ当シ1個づ
\形成されている。
FIG. 1 shows a schematic structure inside a DIP in a conventional semiconductor memory device of this type. In this Figure 1,
Symbol (1) is a memory chip, (2) is a pad (hereinafter abbreviated as Vcc pad) formed on the chip for supplying power supply voltage to this memory chip (1), (31 is also this memory chip) (1) is a pad (hereinafter abbreviated as Vss pad) formed on the chip to give a ground potential to the lead frame connected to the power supply voltage pin (hereinafter abbreviated as Vcc pin) of the DIP; (
5) is a lead frame that similarly connects to the ground potential pin of the DIP (hereinafter abbreviated as Vss pin), (6) is a bonding wire that electrically connects the Vcc pad (2) and frame (4), and (7) is a A bonding wire electrically connects the Vss pad (3) and the frame (5), and each pad (2+, (31) is formed once per chip.

この従来例による半導体メモリ装置にあって装置動作に
必要な電圧は、外部からVccピンとVssピン間に印
加され、リードフレーム(4)、(5)およびVccパ
ッド(21、Vssパッド(3)を通し、第2図にも示
されているように、これらの各パッド(2+ 、 (3
1よシ相互に延長されたVcc配線(8) 、 Vss
配線(9)を経て、メモリ回路各部に供給するようにし
ている。
In this conventional semiconductor memory device, the voltage necessary for device operation is applied from the outside between the Vcc pin and the Vss pin, and the voltage is applied to the lead frames (4), (5), the Vcc pad (21, and the Vss pad (3)). As shown in Figure 2, each of these pads (2+, (3
Vcc wiring (8) mutually extended from 1 to Vss
The power is supplied to each part of the memory circuit via wiring (9).

従ってこの従来構成によると、メモリチップ(1)上の
Vcc、Vss各パッド(2+ 、 (3)がそれぞれ
に1個づ−であるために、この例でのようにこれらの各
パッド(2) 、 (31が、チップの長手方向(以下
X方向と略称する)各端部に対向して配置されていると
、相対的に各パッド(2)、(3jとは反対の端部近く
に形成される回路部分に電力を供給するためには、当然
のことではあるがX方向長さ程度の配線(8) 、 (
9Jが必要であシ、一方でこの配線の抵抗を下げようと
すると、各配線パターンの幅を大きくとらなければなら
ず、これはとりもなおさずチップの短手方向(以下X方
向と略称する)の長さ増加となシ、他方でこのX方向長
さを小さく保持しようとすると、各配線パターンの幅が
小さくなって、配線抵抗が犬きくなシ、充分な電力を供
給できなくなるという欠点があった。
Therefore, according to this conventional configuration, since there is one each of Vcc and Vss pads (2+, (3)) on the memory chip (1), as in this example, each of these pads (2) , (31 is arranged facing each end of the chip in the longitudinal direction (hereinafter abbreviated as the In order to supply power to the circuit section where the
On the other hand, in order to lower the resistance of this wiring, it is necessary to increase the width of each wiring pattern, which is necessary in the short direction of the chip (hereinafter abbreviated as the X direction). ), but on the other hand, if you try to keep the length in the X direction small, the width of each wiring pattern will become smaller, resulting in increased wiring resistance and the inability to supply sufficient power. was there.

〔発明の概要〕[Summary of the invention]

ζ、の発明は従来のこのような欠点に鑑み、1チップ当
りのVcc、Vss各パッド数を増加させることによシ
、チップ幅、もしくは配線抵抗を大きくせずに、パッド
に加えられる電力、または信号をチップ上の回路に供給
し得るようにしたものである。
In view of these conventional drawbacks, the invention of ζ was developed by increasing the number of Vcc and Vss pads per chip, thereby increasing the power applied to the pads without increasing the chip width or wiring resistance. Alternatively, signals can be supplied to circuits on the chip.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明装置の一実施例につき、第3図および第
4図を参照して詳細に説明する。
Hereinafter, one embodiment of the inventive device will be described in detail with reference to FIGS. 3 and 4.

Vssの各パッドを2個づ\設けた例であ勺、これらの
各図においても、符号(1)はメモリチップ、(2a)
、(2b)および(3a)、(3b)はチップのX方向
端部にそれぞれ2個づ\形成されたVccおよびVss
パッド、(4a)、(4b)および(5a)、(5b)
はVccおよびVssの各ピンに連なって、各パッド(
2a) 、 (2b)および(3a)、(3b)に対応
して設けられた各リードフレーム、(6a)、(6b)
および(7a)、(7b)はそれぞれのパッド、リード
フレーム(2a)と(4a) 、 (2b)と(4b)
 、 (3a)と(5a) 、 (ab)と(5b)を
接続するボンディングワイヤ、(8)および(9)は各
パッド(2a) 、 (2b)および(3a) 、 (
3b) t:r)VccおよびVss配綜であシ、実際
にメモリとして使用する場合には、これらのほかに必要
な信号を与えるために、前記DIPのそれぞれの信号ピ
ンに連なるリードフレームから、各信号を取シ入れるだ
めのチップ上の各パッドにボンディングワイヤによる接
続がなされる。
This is an example in which two Vss pads are provided, and in these figures, (1) is the memory chip, and (2a) is the memory chip.
, (2b), (3a), and (3b) are Vcc and Vss formed two each at the end of the chip in the X direction.
Pads, (4a), (4b) and (5a), (5b)
is connected to each pin of Vcc and Vss, and each pad (
Each lead frame (6a), (6b) provided corresponding to 2a), (2b) and (3a), (3b)
and (7a) and (7b) are the respective pads, lead frames (2a) and (4a), (2b) and (4b)
, (3a) and (5a), bonding wires connecting (ab) and (5b), (8) and (9) are each pad (2a), (2b) and (3a), (
3b) t:r) Vcc and Vss wiring. When actually used as a memory, in order to provide necessary signals in addition to these, from the lead frame connected to each signal pin of the DIP, Connections are made by bonding wires to each pad on the chip for receiving each signal.

しかしてこの実施例においても、チップ上に形成される
各回路への電源電圧の供給はVccおよびVss各パッ
ド(2a)、(2b)および(3a)、(3b)よシ、
チップ上の各配線(8)、(9)を介してなされるが、
このときの各回路への配線は、それぞれ2個のパッド、
配線のうちの容易な方に接続させればよいのである。こ
\で配線例として第2図と第4図の場合について考えて
みる。
However, in this embodiment as well, the power supply voltage is supplied to each circuit formed on the chip through the Vcc and Vss pads (2a), (2b) and (3a), (3b).
This is done through each wiring (8) and (9) on the chip,
The wiring to each circuit at this time is two pads each,
All you have to do is connect it to the easier wire. Now let's consider the cases shown in Figures 2 and 4 as wiring examples.

すなわち、第2図のようにVcc、Vssの各パッド(
2)および(3)が各1個づ\の従来例の場合と、第4
図のようにこれらの各パッド(2a) 、 (zb)お
よび(3a) 、 (3b)が各2個づ5の場合とを比
較すると、チップ(1)のX方向の長さをLとし、かつ
X方向の長さを無視すると、パッドから最も離れた位置
までの配線長さは、第2図の場合がり、第4図の場合が
L/2となシ、 シート抵抗0.10んのkl配線で、
L==8wnの配線をパッドから最も離れた位置までの
抵抗が0.1 KQとなるようにするのには、その配線
の幅は、第2図の場合が8μm、第4図の場合が4μm
となる。このときの配線の幅の差4μmによる面積の差
は約64000μ−となる。
That is, as shown in Figure 2, each pad of Vcc and Vss (
2) and (3) are the case of the conventional example with one each, and the case of the fourth
Comparing the case where there are 5 pads (2a), (zb) and 2 pads (3a), (3b) each as shown in the figure, the length of the chip (1) in the X direction is L, And if we ignore the length in the X direction, the wiring length from the pad to the farthest position is L/2 in the case of Figure 2 and L/2 in the case of Figure 4, and the sheet resistance is 0.10 mm. With kl wiring,
In order to make the resistance of L==8wn wiring from the pad to the farthest position 0.1 KQ, the width of the wiring is 8 μm in the case of Fig. 2 and 8 μm in the case of Fig. 4. 4μm
becomes. At this time, the difference in area due to the difference in wiring width of 4 μm is approximately 64000 μ−.

これにだいしパッドを100μmX100μmとしたと
き、パッド2個の追加による面積の増大は20Ω00・
μイとなる。したがって上記のような条件を考えれば、
第3図に比べ第4図はパッドと配線の部分の面積を小さ
くすることができる。
If the pad is 100μm x 100μm, the increase in area due to the addition of two pads is 20Ω00.
It becomes μi. Therefore, considering the above conditions,
Compared to FIG. 3, the area of the pad and wiring portion in FIG. 4 can be made smaller.

なお前記実施例では、チップX方向の両端部にパッドを
形成する場合について述べたが、パッドの形成位置はチ
ップ上のどこであってもよく、また各パッドは2個以上
の複数個形成してもよい。
In the above embodiment, a case has been described in which pads are formed at both ends of the chip in the X direction, but the pads may be formed anywhere on the chip, and each pad may be formed in two or more. Good too.

さらに実施例はVccおよびVssパッドの場合である
が、このほか信号の人、出力パッドに適用してもよいこ
とは勿論である。
Furthermore, although the embodiments are for Vcc and Vss pads, it goes without saying that the present invention may also be applied to other signal pads and output pads.

〔発明の効果〕〔Effect of the invention〕

以上詳述したようにこの発明によれば、外部との接続を
なすパッドをもつチップにおいて、■CCおよびVss
の各パッド、ならびにその他の信号パッドを、同一チッ
プ上の比較的離れた位置に複数個形成するようにしたの
で、チップ上にあって配線を長く引き廻す必要が疫く、
これによって配線抵抗を抑え、かつ配線面積、ひいては
チップ大きさを縮少し得る特長がある。
As detailed above, according to the present invention, in a chip having pads for connection with the outside, CC and Vss
Since a plurality of pads and other signal pads are formed at relatively distant positions on the same chip, there is no need to run long wiring on the chip.
This has the advantage of suppressing wiring resistance and reducing the wiring area and ultimately the chip size.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は従来例でのデュアルインライン型
パッケージ内に収容される半導体メモリ装置の概要構成
および配線例を示すそれぞれ平面図、第3図および第4
図はこの発明の一実施例を適用した同上装置の概要構成
および配線例を示すそれぞれ平面図である。 (1)・・・寺メモリチップ、(2a)、(2b)およ
び(3a)+(3b)  ・” ” ”パッド、(4a
)、(4b)および(5a)、(5b) II @ *
 11リードフレーム、 (6a)。 (6b)および(7a)、(7b)・Φ・・ボンディン
グワイヤ、(8)および(9)・・・・配線。 代理人  葛 野 信 − 筒1図 y方向 20 y方剪
1 and 2 are plan views, respectively, showing the general configuration and wiring examples of a semiconductor memory device housed in a conventional dual in-line package; FIGS. 3 and 4, respectively.
The figures are plan views showing a schematic configuration and wiring example of the above device to which an embodiment of the present invention is applied. (1) ... temple memory chip, (2a), (2b) and (3a) + (3b) ・""" pad, (4a
), (4b) and (5a), (5b) II @ *
11 lead frame, (6a). (6b) and (7a), (7b) Φ... bonding wire, (8) and (9)... wiring. Agent Makoto Kuzuno - Tube 1 drawing y direction 20 y direction cutting

Claims (3)

【特許請求の範囲】[Claims] (1)外部との接続をなすパッドをもつ半導体装置にお
いて、同一の入力または出力信号のためのパッドを2個
以上の複数個設けたことを特徴とする半導体装置。
(1) A semiconductor device having a pad for connection with the outside, characterized in that a plurality of two or more pads for the same input or output signal are provided.
(2)同一の入力または出力信号のだめのそれぞれに複
数個のパッドを、チップ両端部に対向して設けたことを
特徴とする特許請求の範囲第1項記載の半導体装置。
(2) The semiconductor device according to claim 1, wherein a plurality of pads are provided for each of the same input or output signal reservoirs, facing each other at both ends of the chip.
(3)同一の入力または出力信号が電源電圧および接地
電位であることを特徴とする特許請求の範囲第1項又は
第2項記載の半導体装置。
(3) The semiconductor device according to claim 1 or 2, wherein the same input or output signal is a power supply voltage and a ground potential.
JP57211619A 1982-11-30 1982-11-30 Semiconductor device Pending JPS59100550A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57211619A JPS59100550A (en) 1982-11-30 1982-11-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57211619A JPS59100550A (en) 1982-11-30 1982-11-30 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS59100550A true JPS59100550A (en) 1984-06-09

Family

ID=16608758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57211619A Pending JPS59100550A (en) 1982-11-30 1982-11-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS59100550A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103455U (en) * 1982-12-28 1984-07-12 富士通株式会社 semiconductor equipment
JPS609134A (en) * 1983-06-29 1985-01-18 Fujitsu Ltd Semiconductor device
JPS62145835A (en) * 1985-12-20 1987-06-29 Nec Corp Semiconductor device
EP0486027A2 (en) * 1990-11-15 1992-05-20 Kabushiki Kaisha Toshiba Resin sealed semiconductor device
JPH05129526A (en) * 1991-09-16 1993-05-25 Samsung Electron Co Ltd Electrostatic discharge protective device for semiconductor device
US5276352A (en) * 1990-11-15 1994-01-04 Kabushiki Kaisha Toshiba Resin sealed semiconductor device having power source by-pass connecting line

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103455U (en) * 1982-12-28 1984-07-12 富士通株式会社 semiconductor equipment
JPH0124933Y2 (en) * 1982-12-28 1989-07-27
JPS609134A (en) * 1983-06-29 1985-01-18 Fujitsu Ltd Semiconductor device
JPS62145835A (en) * 1985-12-20 1987-06-29 Nec Corp Semiconductor device
EP0486027A2 (en) * 1990-11-15 1992-05-20 Kabushiki Kaisha Toshiba Resin sealed semiconductor device
US5276352A (en) * 1990-11-15 1994-01-04 Kabushiki Kaisha Toshiba Resin sealed semiconductor device having power source by-pass connecting line
JPH05129526A (en) * 1991-09-16 1993-05-25 Samsung Electron Co Ltd Electrostatic discharge protective device for semiconductor device
JPH077820B2 (en) * 1991-09-16 1995-01-30 サムサン エレクトロニクス シーオー., エルティーディー Electrostatic discharge protection device for semiconductor devices

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