JPS5899163A - Manufacture of ceramic substrate - Google Patents

Manufacture of ceramic substrate

Info

Publication number
JPS5899163A
JPS5899163A JP56196081A JP19608181A JPS5899163A JP S5899163 A JPS5899163 A JP S5899163A JP 56196081 A JP56196081 A JP 56196081A JP 19608181 A JP19608181 A JP 19608181A JP S5899163 A JPS5899163 A JP S5899163A
Authority
JP
Japan
Prior art keywords
release powder
film
ceramic
ceramic substrate
raw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56196081A
Other languages
Japanese (ja)
Inventor
「く」島 秀次
弘 和田
堀部 芳幸
渡辺 武美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP56196081A priority Critical patent/JPS5899163A/en
Publication of JPS5899163A publication Critical patent/JPS5899163A/en
Pending legal-status Critical Current

Links

Landscapes

  • Producing Shaped Articles From Materials (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明はセラミック基板の製造方法に関する。[Detailed description of the invention] The present invention relates to a method for manufacturing a ceramic substrate.

従来セラミック基板9例えばアルミナ純[96慢のセラ
ミック基板は、ポリエチレンテレフタレシートを形成さ
せるための有機質の)くインダー、そして生のセラミッ
クシートに可塑性を付与する可塑剤、さらにこれらを均
一に混合し泥漿(以下スリップという)とするための有
機膨剤を混合し光スリップを流し込み、乾燥により有機
溶剤會除云し、生のセラミックシートとし9次いでこれ
を所望の形状に打ち抜色、その表面にアルミナなどの離
形粉を塗布し、これを合板上に*せ所要の温度で焼成し
て製造していた。しかし合板上に生のセラミックシート
を所望の形状に打ち抜いたものを一枚ずつ乗せていたの
では生産性が悪く、製品単価が高価になる欠点がある。
Conventional ceramic substrates 9 For example, pure alumina [96] ceramic substrates are made by uniformly mixing an inder (an organic material for forming a polyethylene terephthalate sheet) and a plasticizer to impart plasticity to the raw ceramic sheet. A light slip is mixed with an organic swelling agent to form a slurry (hereinafter referred to as slip), and the organic solvent is removed by drying to form a raw ceramic sheet.9 This is then punched into a desired shape, colored, and painted on its surface. It was manufactured by applying mold release powder such as alumina, placing it on plywood and firing it at the required temperature. However, if raw ceramic sheets punched into desired shapes are mounted one by one on plywood, productivity is low and the unit price of the product is high.

生産性を上げるには数枚積み重ねて焼成する方法がある
が、この方法ではセラミック基板同士が焼成中に融着す
る。従って融着するのt防止するため生のセラミックシ
ート表面に、アルミナ粒子などの離形粉を塗布1てから
焼成していた。しかし打ち抜いた生のセラミックシート
が複雑な形状をしている場合離形粉を均一に塗布するこ
とは―シ〈、塗布された離形粉が均一でないと打ち抜い
た生のセラミックシートを複数枚積み重ねるため焼成後
のセラミック基板にそりを生じさせるなどの欠点があっ
た。さらにテープキャスティングでスリップを乾燥して
生のセラミックシートとする際、乾燥後にフイルムを剥
離して生のセラミックシートだけ巻きとるが剥離する時
に静電気を帯びた生のセラミックシートはごみや粉じん
を吸着しゃすくなり、こ′れらの異物が付着すると焼成
後のセラミック基板に変形を起こし走り、異物付着を起
こすなどの欠点となっていた。
To increase productivity, there is a method of stacking several ceramic substrates and firing them, but in this method, the ceramic substrates are fused together during firing. Therefore, in order to prevent fusion, a release powder such as alumina particles is applied to the surface of a raw ceramic sheet before firing. However, if the raw punched ceramic sheet has a complicated shape, it is difficult to apply the mold release powder evenly.If the applied mold release powder is not uniform, multiple raw punched ceramic sheets may be stacked. Therefore, there were drawbacks such as warping of the ceramic substrate after firing. Furthermore, when drying the slip using tape casting to form a raw ceramic sheet, the film is peeled off after drying and only the raw ceramic sheet is rolled up. When these foreign substances adhere, the ceramic substrate after firing is deformed and runs, causing problems such as adhesion of foreign substances.

本発明はかかる欠点のないセラミック基板の製造方法を
提供することを目的とするものである。
It is an object of the present invention to provide a method for manufacturing a ceramic substrate free of such drawbacks.

本発明は離形粉含有フィルム上にテープキャスティング
により生のセラミックシートを形成し、骸離形粉フィル
ムを剥離することなく少なくとも2枚以上積み重ねて焼
成するセラミック基板の製造方法に関する。
The present invention relates to a method for producing a ceramic substrate, in which raw ceramic sheets are formed on a release powder-containing film by tape casting, and at least two sheets are stacked and fired without peeling off the release powder film.

本発明におけるセラミック基板とは例えばアルミナ純度
96%以上のアルミナ基板があげられるが特に制限はな
い。離形粉は一般にアルミナ粒子が使用されるが、その
粒度形状などは特に制限しない。離形粉をフィルムに含
有させる方法はフィルム材料と均一に混合してフィルム
を形成させて含有させても良く、また2枚の2イルム関
に接着剤などで接着させて本良い。いずれにせよ複数枚
のフィルムを貼り合わせた形態になっていても単一のフ
ィルムとして取り扱えれば何ら制限されるものではない
。またフィルムに含有する離形粉の量も離形粉として機
能を果せば何ら制限しない。フィルムの材質及び厚さも
制限されず、ポリプロピレン、ポリエステル、ポリエチ
レンフタレートなどのフィルムが使用される。
The ceramic substrate in the present invention includes, for example, an alumina substrate with an alumina purity of 96% or more, but is not particularly limited. Alumina particles are generally used as the release powder, but there are no particular restrictions on the particle size or shape. The releasing powder may be incorporated into the film by uniformly mixing it with the film material to form a film, or by adhering it to two 2-ilms using an adhesive or the like. In any case, even if the film is made of a plurality of films pasted together, there is no restriction at all as long as it can be handled as a single film. Further, the amount of release powder contained in the film is not limited in any way as long as it functions as release powder. The material and thickness of the film are not limited either, and films such as polypropylene, polyester, and polyethylene phthalate are used.

焼成条件については特に制限はなく酸化2弱還元゛雰囲
気中等で焼成でき、席た焼成温度一ついてはセラミック
基板が焼結できる温度であれば何ら制限されるものでは
ない。
There are no particular restrictions on the firing conditions, and the firing can be performed in an oxidizing, slightly reducing atmosphere, etc., and the firing temperature is not restricted at all as long as it is a temperature at which the ceramic substrate can be sintered.

以下実施ガにより本発明を説明するが本発明はこれら実
施例により拘束されるものではない。
The present invention will be explained below with reference to Examples, but the present invention is not limited to these Examples.

以下余 第1表 第1或に示す組成物を各々20倍量配合し。The rest below Table 1 20 times the amount of each of the compositions shown in the first example was blended.

硬質磁器製6tボツトミルに直径25−φ)アルミナ製
ゴール3縁とともに投入し、100時間混合してスリッ
プとした。
The mixture was placed in a hard porcelain 6t bottom mill with three edges of an alumina goal (diameter 25-φ), and mixed for 100 hours to form a slip.

別に厚さ25μmのポリエステルフィルムの片(ffi
K、粒径5μmのアルミナ粒子を8031量部、エポキ
シ樹脂GY280(チバ・ガイギー社製)20Ji量部
およびBfi’、−モノエチルアミン0.61量部を6
−0℃で混合したものを25μmと の厚さに塗工し、そのメから前述の厚さ25μmのポリ
エステルフィルムを貼り合わせ9巻きとつた後60℃で
60時間熟成してエポキシ樹脂を半硬化状態にし、厚さ
75μmの離形粉含有フィルムとした。
Separately, a piece of polyester film with a thickness of 25 μm (ffi
K, 8031 parts of alumina particles with a particle size of 5 μm, 20Ji parts of epoxy resin GY280 (manufactured by Ciba Geigy), and 6 parts of Bfi', -monoethylamine 0.61 parts.
The mixture was applied at -0°C to a thickness of 25 μm, and then the 25 μm thick polyester film described above was pasted and rolled into 9 rolls, and then aged at 60°C for 60 hours to semi-cure the epoxy resin. This was made into a release powder-containing film having a thickness of 75 μm.

前述のスリップを前述の離形粉含有フィルム上にドクタ
ーブレード法でギャップλ1■で塗工し、40℃3時藺
、60℃30分、70℃30分、80℃30分および1
00℃30分の条件で乾燥させて厚さ1sllの生のセ
ラミツタシートとし、離形粉含有フィルムとともに巻き
取った。
The above-mentioned slip was coated onto the above-mentioned release powder-containing film using a doctor blade method with a gap of λ1, and then applied at 40°C for 3 hours, 60°C for 30 minutes, 70°C for 30 minutes, 80°C for 30 minutes, and 1 hour.
It was dried at 00° C. for 30 minutes to obtain a raw ceramic ivy sheet with a thickness of 1 sll, which was then rolled up together with a release powder-containing film.

次に核生のセラミックシートと離形粉含有フィルムを一
体のまま50s1角にパンチにより打ち抜き離形粉含有
フィルムと一体のまま15枚積み重ね室温から300℃
まで2時間で昇温し。
Next, the nucleated ceramic sheet and the release powder-containing film were punched into 50s square pieces, and stacked together with the release powder-containing film, 15 sheets were stacked at room temperature to 300°C.
The temperature will rise in 2 hours.

30分保持したのち30℃/時間で1300℃まで昇温
し、さら4C50℃/時間で1600℃まで昇温し、3
0分保持して焼成し、セラミック基板とした。
After holding for 30 minutes, the temperature was raised to 1300°C at 30°C/hour, and further raised to 1600°C at 50°C/hour for 4C.
It was held for 0 minutes and fired to obtain a ceramic substrate.

この15枚のセラミック基板は離形粉を均一に介在させ
たため融着も起こさず容易に一枚ずつに剥離することが
でき、さらに離形粉はセラミック基板から容易にとり除
くことができた。
These 15 ceramic substrates had release powder evenly interposed therein, so that they could be easily peeled off one by one without causing any fusion, and furthermore, the release powder could be easily removed from the ceramic substrates.

比較例 実施例記載のスリップを厚さ75μmのポリエステルフ
ィルム上に同条件でテープキャスティングし、犀さ1■
の生のセラミックシートとし、ポリエステルフィルムを
剥離除去した後、50−角にパンチにより打ち抜き、こ
の上から離形粉の粒径5μmのアルミナ粒子20重量部
、エピコート1001(シェル社)4重量部およびメチ
ルエチルケトン76重量部からなるスラリーをスプレー
でi s o t/m”塗布し、ただちに80℃で30
分乾燥してメチルエチルケトンを蒸発させ離形粉を生の
セラミックシートの表面に付着させ、さらに前記セラミ
ックシートを15枚積み重ね、実施例と同条件で焼成し
たところセラミック基$15枚中4枚が部分的な融着を
起こし、また15枚中1枚はパンチのさいのパンチのか
すが付着して凹凸面を生じた0部分的な融着はプラスチ
ックハンマーでたたいて剥離出来たがその際セラミック
基板の端部が破損した。
Comparative Example The slip described in Example was tape cast on a 75 μm thick polyester film under the same conditions.
After peeling off the polyester film and punching out the raw ceramic sheet, 20 parts by weight of alumina particles with a particle size of 5 μm as release powder, 4 parts by weight of Epicoat 1001 (Shell Co., Ltd.) and A slurry consisting of 76 parts by weight of methyl ethyl ketone was applied by spraying at a rate of 30% by weight at 80°C.
After drying for 1 minute to evaporate the methyl ethyl ketone and adhere mold release powder to the surface of the raw ceramic sheet, 15 of the ceramic sheets were stacked and fired under the same conditions as in the example. In addition, 1 out of 15 sheets had punch residue adhering to it, creating an uneven surface. 0 Partial fusion was able to be peeled off by hitting it with a plastic hammer, but at that time the ceramic substrate The end of the was damaged.

本発明は離形粉含有フィルム上にスリップを供給し、テ
ープキャスティングで生のセラミックシートを形成した
のち、その離形粉含有フィルムを剥離せず離形粉含有フ
ィルムと生のセラミックシートが一体のものを打ち抜い
て所望の形状とするため、離形粉含有フィルムと生のセ
ラミックシートを剥離した時に発生する静電気により異
物が付着することを防止でき、さらに畦形粉含有フィル
ムと生のセラミックシートを一体のまま打ち抜くため打
ち抜きかすが付着することも防止できる。
In the present invention, a slip is supplied onto a release powder-containing film, a raw ceramic sheet is formed by tape casting, and then the release powder-containing film and the raw ceramic sheet are integrated without peeling off the release powder-containing film. Since the object is punched into the desired shape, it is possible to prevent foreign matter from adhering to the film containing mold release powder and the raw ceramic sheet due to the static electricity generated when the film is peeled off. Since it is punched out in one piece, it is also possible to prevent punching debris from adhering to it.

さらには生のセラミックシートを打ち抜く前に離形粉を
フィルム上に含有させるため離形粉を均一に塗布す仝こ
とができ、セラミック基板の融着やそりや変形が生じな
いセラミック基板を製造することができる。
Furthermore, since the mold release powder is contained on the film before punching out the raw ceramic sheet, the mold release powder can be applied uniformly, and a ceramic substrate can be manufactured without fusion, warpage, or deformation of the ceramic substrate. be able to.

Claims (1)

【特許請求の範囲】[Claims] 1.1IiI形粉含有フイルム上にテープキャスティン
グにより生のセラミックシートを2着し。 該離形粉含有フィルムを剥離することなく少なくとも2
枚以上積み重ねて焼成することを**とrるセラミック
基板の製造方法。
1.1 Two raw ceramic sheets were placed on the IiI type powder-containing film by tape casting. At least 2 times without peeling off the release powder-containing film.
A method of manufacturing a ceramic substrate, which involves stacking and firing two or more ceramic substrates.
JP56196081A 1981-12-04 1981-12-04 Manufacture of ceramic substrate Pending JPS5899163A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56196081A JPS5899163A (en) 1981-12-04 1981-12-04 Manufacture of ceramic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56196081A JPS5899163A (en) 1981-12-04 1981-12-04 Manufacture of ceramic substrate

Publications (1)

Publication Number Publication Date
JPS5899163A true JPS5899163A (en) 1983-06-13

Family

ID=16351880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56196081A Pending JPS5899163A (en) 1981-12-04 1981-12-04 Manufacture of ceramic substrate

Country Status (1)

Country Link
JP (1) JPS5899163A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6345163A (en) * 1986-08-11 1988-02-26 北陸化工株式会社 Manufacture of flexible ceramic sheet
US4756959A (en) * 1986-02-20 1988-07-12 Ishizuka Garasu Kabushiki Kaisha Sheet for use in firing base plates
JPH03154305A (en) * 1989-11-13 1991-07-02 Jgc Corp Manufacture of superconducting coil

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4756959A (en) * 1986-02-20 1988-07-12 Ishizuka Garasu Kabushiki Kaisha Sheet for use in firing base plates
JPS6345163A (en) * 1986-08-11 1988-02-26 北陸化工株式会社 Manufacture of flexible ceramic sheet
JPH03154305A (en) * 1989-11-13 1991-07-02 Jgc Corp Manufacture of superconducting coil

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