JPS5888180A - Treated matter containing structure - Google Patents

Treated matter containing structure

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Publication number
JPS5888180A
JPS5888180A JP56186567A JP18656781A JPS5888180A JP S5888180 A JPS5888180 A JP S5888180A JP 56186567 A JP56186567 A JP 56186567A JP 18656781 A JP18656781 A JP 18656781A JP S5888180 A JPS5888180 A JP S5888180A
Authority
JP
Japan
Prior art keywords
glass
crucible
treated
sheet
storage structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56186567A
Other languages
Japanese (ja)
Other versions
JPS6222954B2 (en
Inventor
正人 守時
隆男 藤川
宮永 順一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP56186567A priority Critical patent/JPS5888180A/en
Publication of JPS5888180A publication Critical patent/JPS5888180A/en
Publication of JPS6222954B2 publication Critical patent/JPS6222954B2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 物収納構造体に係り、詳しくは低軟化点のガラスケ溶解
し、該ガラスを被処理セラミックス成形のシール材とし
て用いる圧媒ガス利用のセラミックス熱間静水圧プレス
処理におけるシール性の改善された被処理成形体収納結
合構造体に関する。
DETAILED DESCRIPTION OF THE INVENTION This invention relates to an object storage structure, and more specifically to a seal in a hot isostatic pressing process for ceramics using a pressurized gas, in which low softening point glass is melted and the glass is used as a sealing material for molding ceramics to be treated. The present invention relates to a processing object storage and combination structure with improved properties.

ガラスをシール材として用いる熱間静水圧プレス(以下
、HIPと略記する。)処理方法は異形成形が可能であ
ること、通常カプセル材として使用される銅,鋼などで
は使用できない高温下でもHUPすることが可能である
等の利点かあり1高温強度構造材料として近時、その開
発が推進されているセラミックスの高密度化処理に適用
が試みられており、ガラスカプセル法(Bf!f公昭4
6−2”31号公報参照)、成形体をガラス粉粒体中に
埋設する方法(特開昭55−89405号公報参照)な
どが知られている。
The hot isostatic pressing (hereinafter abbreviated as HIP) process that uses glass as a sealing material allows for irregular shapes, and can be HUPed even at high temperatures that cannot be used with copper, steel, etc., which are normally used as encapsulants. It has been attempted to be applied to the densification treatment of ceramics, which has recently been developed as a high-temperature strength structural material, and the glass capsule method (Bf!
6-2" No. 31) and a method of embedding a molded body in glass powder (see Japanese Patent Laid-Open No. 55-89405).

これらの方法は何れも黒鉛坩堝などカーボン製坩堝が通
常、使用され、該坩堝内でガラスを溶解し、被処理成形
体を包囲するものであるが、セラミックス粉末は、その
焼結温度が比較的高く、従前の金属粉末成形時に比べH
工P温度に高温が要求されるところから低軟化点のガラ
スを用いて窒化珪素、炭化珪素などのセラミックスを処
理する際には、前記ガラス封入方式でも、ガラス粉粒体
埋設方式でも結局、同じように被処理セラミックス成形
体はガラス浴に浸漬された状態となる。ところが、セラ
ミックス成形体は高密度になるまでは比重が1.8〜2
.12/m3と、ガラスの比重2.2〜2、397m”
より小さい几め、前記の如くガラスが溶解した場合には
成形体が設置場所から浮上し、移動し易すくなって、カ
ーボン製坩堝と接触を起し易くなる。
In each of these methods, a carbon crucible such as a graphite crucible is usually used, and the glass is melted in the crucible to surround the molded object to be processed. However, the sintering temperature of ceramic powder is relatively low. Higher H compared to conventional metal powder molding
When processing ceramics such as silicon nitride and silicon carbide using glass with a low softening point, since a high temperature is required for the process, both the glass encapsulation method and the glass powder embedding method are the same. In this way, the ceramic molded body to be treated is immersed in the glass bath. However, the specific gravity of a ceramic molded body is 1.8 to 2 until it reaches high density.
.. 12/m3 and specific gravity of glass 2.2-2, 397m”
If the glass is smaller and the glass is melted as described above, the molded body will float up from the installation location, become more likely to move, and come into contact with the carbon crucible.

この場合、坩堝は圧媒ガスを通過させるべく通気性を有
しているため、被処理物がカーボン坩堝に接触すると、
Hxp処理処理圧力媒体として使用されている気体が接
触部分から侵入し、肝腎のシールが不完全になり、HI
Pの目的を十分に達成できない。そして又これは、圧媒
ガス中に含まれる微量の酸累とセラミックスとの反応を
誘起する。さらに又、カーボン坩堝内側に離型剤として
BN粉末を付着させることが考へられるが、このように
しても処理後、凝固し次ガラスをカーボン坩堝から取り
出丁のは困難である。
In this case, since the crucible has air permeability to allow the pressurized gas to pass through, when the object to be processed comes into contact with the carbon crucible,
The gas used as the Hxp treatment pressure medium enters through the contact area, resulting in incomplete hepato-kidney sealing and HI
The purpose of P cannot be fully achieved. This also induces a reaction between a trace amount of acid accumulation contained in the pressure medium gas and the ceramic. Furthermore, it has been considered to attach BN powder as a mold release agent to the inside of the carbon crucible, but even with this method, it is difficult to solidify the glass after treatment and then take it out from the carbon crucible.

しかしながら、以上のような欠点はあるにしても低軟化
点のガラスは取扱いが容易であること、価格が安いこと
などの多くの利点があり、その利用は工業上有利である
ところから、前記欠点の改良を図ることが等しく望まれ
ている。
However, even though it has the above-mentioned disadvantages, glass with a low softening point has many advantages such as ease of handling and low price, and its use is industrially advantageous. It is equally desirable to improve the

本発明は、かかる時代の要求に即応し、前記の欠点を克
服することにより、低軟化点のガラスによるシールをよ
り有効に達成し得る、改善されたシール構造を有する被
処理体収納構造体を提供することを目的とするものであ
る。
The present invention, in response to the demands of the times, provides a processing object storage structure having an improved sealing structure that can more effectively achieve sealing with low softening point glass by overcoming the above-mentioned drawbacks. The purpose is to provide

しかしてかかる目的を達成する本発明の特徴はH工P装
置内に装入する被処理物収納坩堝において、被処理物及
び該被処理物を包囲してガラスシール材を収納すると共
に、被処理物及びガラスシール材を更に可撓性を有する
無通気性の黒鉛の箔又はシートで包み、かつその上面に
重錘を自由動可能に載置せしめt被処理物収納結合構造
体の構成にある。
The feature of the present invention that achieves such an object is that in the crucible for storing the processed material loaded into the H-P apparatus, the processed material and the glass sealing material surrounding the processed material are stored, and the The object and the glass sealing material are further wrapped in a flexible and non-porous graphite foil or sheet, and a weight is placed on the top surface of the sheet so as to be freely movable. .

以下、更に本発明の具体的な実施態様を添付図面に示す
具朱例にもとづいて詳述する。
Hereinafter, specific embodiments of the present invention will be further described in detail based on examples shown in the accompanying drawings.

図は本発明被処理物収納構造体の1例であV%坩堝(1
)内に被処理物(2)がその上下のガラス板(31(3
1’と、中間のガラス粉粒体(4)とによって包囲され
て収納されており、坩堝(11と、それら被処理物(2
)及びガラス(31(3)’(4)との間には被処理物
(2)及びガラス(31(31’(4)の全面を囲繞し
て本発明の要部をなす無通気性で、かつ可撓性を有する
黒鉛の箔又はシート(51が繞設され、更にその上面に
nHxP時における前記ガラスの溶解時の被処理物(2
)の浮上を抑止する重錘(6)が自由動可能に載置され
ている。
The figure shows an example of the object storage structure of the present invention, and shows a V% crucible (1
), the object to be processed (2) is placed between the glass plates (31 (3) above and below it).
1' and an intermediate glass powder granule (4).
) and glass (31(3)'(4)), there is an air-impermeable material that surrounds the entire surface of the object to be treated (2) and glass (31(31'(4)) and forms the essential part of the present invention. , and a flexible graphite foil or sheet (51) is provided on the top surface of the graphite foil or sheet (51).
) is mounted so as to be freely movable.

このうち、坩堝(1)はHIP時、Ar、N1等の圧媒
ガスを透過すべく通気性を有しており′−C通常カーボ
ン製坩堝が用いられている。
Among these, the crucible (1) has air permeability to allow pressure medium gases such as Ar and N1 to permeate during HIP, and a carbon crucible is usually used.

一方、被処理物(2)ハ金属又はセラミックス粉末など
HIP処理するすべての材料が含まれるが、ガラスをシ
ール材とするHIP−法が高温下処理に丁ぐれ、セラミ
ックスのH工P処理に好適であるところからセラミック
ス材料が特に効果的であり、窒化珪素、炭化珪素、炭化
硼素の何れかを主成分とするセラミックス、就中、窒化
珪素を主成分とするセラミックスは最も好ましく、本発
明における被処理物の主流である。そして、この被処理
物(2)は通常粉末でなく、既知の焼結助剤を含み又は
含まない予備成形体又は更にこれを予備焼結した予備焼
結体に形成されて適用される。
On the other hand, the object to be treated (2) includes all materials to be subjected to HIP treatment, such as metal or ceramic powder, but the HIP method, which uses glass as a sealing material, is suitable for high-temperature treatment and is suitable for H-P treatment of ceramics. For this reason, ceramic materials are particularly effective, and ceramics containing silicon nitride, silicon carbide, or boron carbide as a main component, especially ceramics containing silicon nitride as a main component, are the most preferred and are the materials to be used in the present invention. It is the mainstream of processed materials. The object to be treated (2) is usually not a powder, but is formed into a preformed body containing or not containing a known sintering aid, or a presintered body obtained by presintering the same.

又前記シールに使用するガラスはシリカガラスバイフー
ルガラス、パイレックスガラスなど通常、H工P処理用
として使用されているガラスをすべて使用することがで
きるが、セラミックスとの反応防止あるいはH工P処理
後の除去の容易さから一般にパイレックスガラスが最も
実用的なものとして選ばれる。このシール用ガラスは図
では上下のガラス板(31(31’と中間のガラス粉粒
体(4)によって構成されているが、別設、かかる両者
の併用ではなく、ガラス粉粒体(4)のみの使用でもよ
く、又、ガラスカプセルに封入し比ものでもよい。しか
し、坩堝内の組立配置上、図示の配置は形態に変化があ
るにせよ、最も好適である。なお、ガラスは前記板状、
粉粒体形状の外、種々の形状のものを利用することがで
きる。
The glass used for the seal can be any glass normally used for H-P treatment, such as silica glass, biful glass, or Pyrex glass. Pyrex glass is generally chosen as the most practical because of its ease of removal. In the figure, this sealing glass is composed of the upper and lower glass plates (31 (31') and the intermediate glass powder (4), but it is not installed separately or in combination with the glass powder (4). It may be used alone, or it may be encapsulated in a glass capsule. However, the arrangement shown in the figure is the most suitable in terms of the assembly arrangement within the crucible, even though the form may vary. Note that the glass is condition,
In addition to the granular shape, various shapes can be used.

次に前記本発明の要部をなす黒鉛の箔又はシート(5)
による囲繞は、通気性を有する坩堝(11を通過して来
九圧媒ガスの侵入を防ぐと共にH3P時における等方圧
縮力を被処理物(2)に対し適確に伝達するもので、圧
媒ガス利用のJ(IP処理において特にその有用性を発
揮し、無通気性であると共に圧縮変形に対応する可撓性
が必要である。しかも、H工P処理時、溶融しては前記
機能を遂行することができないので当然、H工P処理時
、不溶性であることが要求される。
Next, the graphite foil or sheet (5) which forms the main part of the present invention
The surrounding area prevents the intrusion of pressurized gas from passing through the crucible (11), which has air permeability, and also accurately transmits the isotropic compressive force during H3P to the workpiece (2). It is particularly useful in the J (IP) process, which utilizes a medium gas, and must be non-porous and flexible to cope with compressive deformation.Moreover, during the H/P process, if it is melted, it will not function as described above. Naturally, it is required to be insoluble during H-P treatment.

なお、かかる機能を満足するものとしては、黒鉛に限ら
ず、モリブデン等の高融点金属の箔、シートもあるが、
何れもコスト面で難があり、商品名グラホイルで知られ
る黒鉛の箔又はシート状物は一般も有用である。特にこ
の黒鉛の箔又はシートf5]は離型材としての役割をも
有しており、処理後、これに凝固したガラスを坩堝から
容易に取り出すことができる。
Note that materials that satisfy this function are not limited to graphite, but also foils and sheets made of high-melting point metals such as molybdenum.
All of them are disadvantageous in terms of cost, but graphite foil or sheet-like products known by the trade name Graphoil are also useful. In particular, this graphite foil or sheet f5] also has a role as a mold release material, and after treatment, the glass solidified thereon can be easily taken out from the crucible.

更に前述の構成において黒鉛の無通気性7.箔又はシー
ト(5)で包囲され几被処理物(2)及びシールガラス
f31 f31’(4)の上面には重錘(6)が載置さ
れているが、この重錘(6)は前述の如くガラスが溶解
したとき浮き上る被処理物(2)の−浮上を押える定め
であり、高温材料で、かつガラスよりも比重の小さい被
処理体の浮上を押えるにする重量のものであればよいが
例えば窒化珪素、タングステン、モリブデン等が使用さ
れる。そして、この重錘(6)は処理時における変形に
対応すべく自由に坩堝内壁面に沿う方向に動くことが必
要で、前記被処理物及びガラス上面の黒鉛シート又は箔
の上に荷重がかかるようにしである。
Furthermore, in the above-mentioned configuration, the air impermeability of graphite7. A weight (6) is placed on the upper surface of the object to be processed (2) and the seal glass f31 f31' (4) surrounded by a foil or sheet (5). It is designed to suppress the floating of the object to be processed (2) that floats up when glass is melted, and if it is made of a high-temperature material and is heavy enough to suppress the floating of the object to be processed, which has a specific gravity smaller than that of glass. For example, silicon nitride, tungsten, molybdenum, etc. may be used. This weight (6) needs to move freely in the direction along the inner wall surface of the crucible to accommodate deformation during processing, and a load is applied to the object to be processed and the graphite sheet or foil on the top surface of the glass. That's how it is.

なお、図中、(7)は坩堝内側に噴霧又は塗布されたB
N粉末からなる離型剤層であり1特に必須ではないが黒
鉛の箔又はシートの離型効果と相俟って処理後の取出し
を容易ならしめることは勿論である。
In the figure, (7) indicates B sprayed or applied inside the crucible.
The mold release agent layer is made of N powder, and although it is not particularly essential, it goes without saying that, together with the mold release effect of the graphite foil or sheet, it facilitates removal after processing.

本発明被処理物収納構造体は叙十のような構成によって
なり、主として圧力媒体にAr 、 N、等の気体を用
い之H工P処理に使用され、その形態でH工P炉内に装
入きれ、H工P処理されるが、゛H工P処理は概して被
処理物内に残存するガスを閉じ込めない上から又ガラス
シールを完成させてから加圧する意味から、先ず昇温し
、その後、所定温度に至り、昇圧およびさらに昇温する
のが一般的である。従ってガラスとしてパイレックスガ
ラスを使用した場合、1200℃を過ぎると軟化溶解が
起り、未だ高密度化していない被処理物は比重の軽さか
ら浮上し、上部の無通気性黒鉛の箔又はシートを押し上
げガラス浴から被処理物の一部が浮上してくる。
The object storage structure of the present invention has the structure as described above, and is mainly used for H-process P processing using gases such as Ar, N, etc. as the pressure medium, and is installed in the H-process P furnace in this form. However, in the H-process P treatment, the temperature is raised first, and then the temperature is increased because the gas remaining in the object to be treated is not trapped, and the pressure is applied after the glass seal is completed. , it is common to reach a predetermined temperature, then increase the pressure and further increase the temperature. Therefore, when Pyrex glass is used as the glass, it softens and melts when the temperature exceeds 1200°C, and the workpiece that has not yet been densified floats to the surface due to its light specific gravity, pushing up the non-porous graphite foil or sheet above. A part of the material to be treated floats up from the glass bath.

しかし、このとき、上方には重錘(6)が存在するため
この浮上を抑え圧力媒体である気体の侵入を防ぐことが
でき、完全なシール状態を保持する。
However, at this time, since the weight (6) is present above, this floating can be suppressed and the intrusion of gas, which is a pressure medium, can be prevented, and a complete sealing state can be maintained.

なお、被処理物から放出されるガス[H工Pの初期には
、ガラスシールが完成していないためにガラスの間を通
って流出する。
Note that the gas released from the object to be treated [at the initial stage of H-P, the glass seal is not yet completed, so the gas flows out through the gaps between the glasses.

ガラスが融解した後はパイレックスガラスが該ガスを溶
解する機能をもつところからガラス内に溶解され、被処
理物は所要のHIF温度、圧力下で高密度化を達成する
ことができる。そして前記ガラス内に溶解したガスは処
理後において、再び気化され、ガラスを発泡状態として
ガラスの除去を容易とするー。
After the glass is melted, the Pyrex glass has the function of dissolving the gas, so it is dissolved into the glass, and the object to be processed can achieve high density under the required HIF temperature and pressure. After the treatment, the gas dissolved in the glass is vaporized again, making the glass foamy and making it easier to remove the glass.

かくして本発明構造体は被処理物を無通気性の黒鉛箔又
はシートで囲み、上部に重錘を載せることにより圧力媒
体の気体による被処理物への侵入を防ぐことが出来るの
みならず、H工P処理の懸案である途中の被処理物の浮
上傾向に対してもこれを重錘により押下しその無通気性
と相俟ってシールを完全ならしめることができる。
Thus, the structure of the present invention not only prevents pressure medium gas from entering the workpiece by surrounding the workpiece with an air-impermeable graphite foil or sheet and placing a weight on top, but also prevents pressure medium gas from entering the workpiece. Even if the object to be treated tends to float up during the process, which is a problem in the P process, it can be pressed down with a weight and the seal can be made perfect, combined with its non-porous property.

しかも本発明における黒鉛の箔又はシートは可撓性を具
備し、被処理物の緻密化を何ら阻害することがないと共
に離型材としての効用をも有し、カーボン坩堝から凝固
したガラスを容易に取り出す上にも頗る効果的であり、
H工P処理するには圧力媒体である気体を被処理物に侵
入させてはならないとするH工P処理の基本に則り高密
度セラミックス焼結体の製造に極めて実効性を発揮する
ものである。
Moreover, the graphite foil or sheet in the present invention has flexibility and does not inhibit the densification of the processed material in any way, and also has an effect as a mold release agent, so that it can easily remove glass solidified from a carbon crucible. It is also extremely effective in removing
This method is highly effective in producing high-density ceramic sintered bodies based on the basic principle of H-P processing, which states that gas as a pressure medium must not be allowed to enter the workpiece. .

以下、更に本発明の実施例を掲げる。Examples of the present invention will be further described below.

(実施例) 純度99%、α相70%、平均粒径線1μmのSi 、
N、粉末をシリコンゴムのチューブに入れ栓をt、て5
0005aの圧力で等方プレスを行ない相対密度58%
の予備成形体(約18wφ ×30■t)を作製した。
(Example) Si with purity 99%, α phase 70%, average grain size line 1 μm,
N.Pour the powder into a silicone rubber tube and close the stopper.5
Perform isostatic pressing at a pressure of 0005a to obtain a relative density of 58%.
A preformed body (approximately 18wφ×30■t) was prepared.

この予備成形体を内面1kBNでコーティングした黒鉛
製坩堝に図示の如くパイレックスガラスからなる上下ガ
ラス板と中間のパイレックスガラスからなる粉粒体に埋
設し比状態でグラファイト製ホイルで全面を包囲して配
置し重錘を載せてH工P装置に装入した。H工P装置内
を300℃に昇温し、約l Q Torr  まで真空
引きを行った後、15獅のN2ガスを注入して排気操作
を2度行い、30tのN、ガスを注入した。このまま1
200℃まで昇温してガラスを軟化溶解させた後、N2
ガスを補給すると共に更に昇温し、l’750℃、20
00一台 で約2時間HIP処理を行った。
This preformed body was buried in a graphite crucible whose inner surface was coated with 1 kBN, and the entire surface was surrounded by graphite foil in a ratio state. A weight was placed on it and it was loaded into the H-P equipment. After heating the inside of the H-P equipment to 300° C. and evacuating it to about 1 Q Torr, 15 tons of N2 gas was injected, exhaust operation was performed twice, and 30 tons of N and gas were injected. As is 1
After heating up to 200℃ to soften and melt the glass, N2
While replenishing gas, the temperature was further increased to l'750℃, 20
HIP processing was performed for about 2 hours using one 00 machine.

HIP装置より取り出した成形体は、その全体が黒味を
帯びたガラスで覆われていたが、グラファイト製ホイル
ならびにガラスを除去したところSi 、N4の表面は
全く圧媒ガス侵入の跡もなく清浄でその相対密度は98
.5%であった。
The molded body taken out from the HIP device was entirely covered with dark glass, but when the graphite foil and glass were removed, the Si and N4 surfaces were clean with no trace of pressure gas intrusion. And its relative density is 98
.. It was 5%.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明に係る被処理物収納構造体の1例を示す断面
概要図である。 (1)・・・坩堝、(2)・・・被処理物。 (31(31’・・・ガラス板、(4)・・・ガラス粉
粒体。 (5)・・・黒鉛箔又はシー)、(61・・・重錘。 (7)・・・BN離型剤層。 □□−−−−−下 し−I
The figure is a schematic cross-sectional view showing one example of a processing object storage structure according to the present invention. (1)... Crucible, (2)... Processing object. (31 (31'... Glass plate, (4)... Glass powder granule. (5)... Graphite foil or sheet), (61... Weight. (7)... BN release material. Molding agent layer.

Claims (1)

【特許請求の範囲】 / 通気性ヲ有する坩堝内に熱間静水圧プレス処理する
被処理セラミックス成形体を収納してなる構造体であっ
て、前記被処理成形体は、坩堝内部において該成形体を
包み込むシール材ガラスと共に可撓性を有する無通気性
黒鉛の箔又はシートによって全面が包囲されており、そ
の上面の前記無通気性黒鉛の箔又はシート上には重錘が
載置されていることを特徴とする被処理物収納構造体。 2 通気性を有する坩堝がカーボン製坩堝である特許請
求の範囲第1項記載の被処理物収納構造体。 3 被処理セラミックス成形体が窒化珪素を主成分とし
て含む成形体である特許請求の範囲第1項又は第2項記
載の被処理物収納構造体。 j 被処理物成形体全面を上下のガラス板と、その中間
に充填されるガラス粉粒体によって包囲してなる特許請
求の範囲第1項、第2項又は第3項記載の被処理物収納
構造体。 S ガラスがパイレックスガラスである特許請求の範囲
第1項又は第4項記載の被処理物収納構造体。
[Scope of Claims] / A structure comprising a ceramic molded body to be treated by hot isostatic pressing in a crucible having air permeability, wherein the molded body to be treated is The entire surface is surrounded by a flexible non-porous graphite foil or sheet together with the sealing material glass, and a weight is placed on the top surface of the non-porous graphite foil or sheet. A processing object storage structure characterized by: 2. The processed material storage structure according to claim 1, wherein the crucible having air permeability is a carbon crucible. 3. The object storage structure according to claim 1 or 2, wherein the ceramic molded object to be treated is a molded object containing silicon nitride as a main component. j The storage of the processed object according to claim 1, 2 or 3, in which the entire surface of the molded object is surrounded by upper and lower glass plates and glass powder filled between them. Structure. The object storage structure according to claim 1 or 4, wherein the S glass is Pyrex glass.
JP56186567A 1981-11-19 1981-11-19 Treated matter containing structure Granted JPS5888180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56186567A JPS5888180A (en) 1981-11-19 1981-11-19 Treated matter containing structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56186567A JPS5888180A (en) 1981-11-19 1981-11-19 Treated matter containing structure

Publications (2)

Publication Number Publication Date
JPS5888180A true JPS5888180A (en) 1983-05-26
JPS6222954B2 JPS6222954B2 (en) 1987-05-20

Family

ID=16190783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56186567A Granted JPS5888180A (en) 1981-11-19 1981-11-19 Treated matter containing structure

Country Status (1)

Country Link
JP (1) JPS5888180A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018148163A (en) * 2017-03-09 2018-09-20 日本特殊陶業株式会社 Method of manufacturing component for semiconductor manufacturing equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018148163A (en) * 2017-03-09 2018-09-20 日本特殊陶業株式会社 Method of manufacturing component for semiconductor manufacturing equipment

Also Published As

Publication number Publication date
JPS6222954B2 (en) 1987-05-20

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