JPS5866625A - Finishing method of magnetic head floating surface - Google Patents

Finishing method of magnetic head floating surface

Info

Publication number
JPS5866625A
JPS5866625A JP16453581A JP16453581A JPS5866625A JP S5866625 A JPS5866625 A JP S5866625A JP 16453581 A JP16453581 A JP 16453581A JP 16453581 A JP16453581 A JP 16453581A JP S5866625 A JPS5866625 A JP S5866625A
Authority
JP
Japan
Prior art keywords
head
magnetic head
disk
magnetic
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16453581A
Other languages
Japanese (ja)
Other versions
JPH0434203B2 (en
Inventor
Masahiro Yanagisawa
雅広 柳沢
Taku Koshiyama
越山 卓
Shiro Kimura
木村 史朗
Norio Ide
井手 規雄
Isao Kishigami
岸上 功夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16453581A priority Critical patent/JPS5866625A/en
Publication of JPS5866625A publication Critical patent/JPS5866625A/en
Publication of JPH0434203B2 publication Critical patent/JPH0434203B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/187Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/1871Shaping or contouring of the transducing or guiding surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE:To decrease adsorptive force caused between a magnetic head and disc, by finishing a floating surface of a magnetic head by abrasive work, further it through dry etching and roughing said surface. CONSTITUTION:A head floating surface in a ferrite core of Mn, Zn of a magnetic head, used for a magnetic disk device, is polished by abrasive work to 0.01mum in surface roughness. This floating surface is applied with ion etching of the plasma etching and the like for a time from several minutes to ten-odd minutes, and roughed to about 0.03mum in surface roughness, then the magnetic head is prepared. In this process, friction force between the magnetic head and disc, and absorptive force caused by interposition of oil and water can be decreased.

Description

【発明の詳細な説明】 本発明は、磁気ディスク装置又は磁気ドラム装置等の磁
気記憶装置に用いられる磁気ヘッド浮揚面の仕上げ方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for finishing a flying surface of a magnetic head used in a magnetic storage device such as a magnetic disk device or a magnetic drum device.

高密度磁気ディスク装置の高W?度化をはかる為には、
磁気ヘッドと磁気ディスクとの間隔(」〕ノ下スペーシ
ングと呼ぶ)を小さくする必要がある。
High W of high-density magnetic disk device? In order to measure the degree of
It is necessary to reduce the distance between the magnetic head and the magnetic disk (referred to as "lower spacing").

近年スペーシングを小さくする方法として、接触始動・
停市形の磁気ディスク装置が几」いられており、そこで
使用される磁気ヘッド(以下ヘッドと呼ぶ)の浮揚面及
び磁気ディスク(以下ディスクと呼ぶ)表面の面粗さは
研磨により10〜100A程度の小さなf+fiになっ
ている。
In recent years, contact starting and
The surface roughness of the floating surface of the magnetic head (hereinafter referred to as head) and the surface of the magnetic disk (hereinafter referred to as disk) used therein is 10 to 100A by polishing. It is a small degree of f+fi.

この為、ヘッドがディスク表面に長時間接触停止した場
合、ヘッドとディスクが互いに密着し、ディスクを回転
させるモーターが回転不能となったり、著るしい場合は
、ヘッドの支持バネが破損することが生じる。(以下こ
の現象をヘッド吸着と称する。) ヘッド吸着は油や水々どの吸着層がヘッド、ディスク界
面に存在すると特に顕著に見られる。
For this reason, if the head remains in contact with the disk surface for a long period of time, the head and disk will come into close contact with each other, and the motor that rotates the disk may become unable to rotate, or in severe cases, the head support spring may be damaged. arise. (Hereinafter, this phenomenon will be referred to as head adsorption.) Head adsorption is particularly noticeable when an adsorption layer of oil, water, etc. exists at the interface between the head and the disk.

ディスクとヘッドが摺動している時に両者間に働く摩擦
力も又、接触始動・停止形の磁気ディスク装置において
装置の信頼性に関して大きな要因となっている。
The frictional force that acts between the disk and the head when they are sliding is also a major factor in the reliability of a contact start/stop type magnetic disk device.

すなわち、摩擦力が小さい方が、ヘッドとディスクが互
いに接触摺動している時にヘッド又はディスクに与えら
れる機械的負担が少なく、キズなども生じにくい。
That is, the smaller the frictional force, the less mechanical load is applied to the head or the disk when the head and disk are sliding in contact with each other, and scratches are less likely to occur.

上述のヘッド吸対によりヘッドディスク間に鋤く力(ヘ
ッド吸着力)は一般に言う摩擦力ではない。ヘッド吸着
力は平滑な面どうしが接触した場合働く力で、接触面の
面積に比例するが、摩擦力は接触面の面積には関係しな
い。ヘッドとディスク間に動く力はヘッド吸着力と摩擦
力の木1になるが、ヘッドとのディスクの接触が短時間
の場合(秒の程吠)はヘッド吸着力は無ネ〃できるので
摩擦力(荷重で除せば静摩擦係数、動摩擦係数)で表わ
し、接触が長時間(日の程度)の場合ヘッド吸着力とし
て表わす。
The force (head adsorption force) exerted between the head disk by the above-mentioned head suction pair is not a frictional force in general. Head attraction force is the force that acts when smooth surfaces come into contact with each other, and is proportional to the area of the contact surfaces, but frictional force is not related to the area of the contact surfaces. The force moving between the head and the disk is the head adsorption force and the friction force. However, if the contact between the head and the disk is for a short time (seconds), the head adsorption force can be nullified, so the friction force (If divided by the load, it is expressed as static friction coefficient and dynamic friction coefficient), and when the contact is for a long time (on the order of days), it is expressed as head adsorption force.

本発明の目的は、表面粗さの小さな磁気ディスクとの組
合せにおいて、ヒ記ヘッド吸着及びSjl力を減少させ
、信頼性に優れた磁気ヘッドを製造するだめの磁気ヘッ
ド浮揚面の仕上げ方法を提供rることにある。
An object of the present invention is to provide a method for finishing the flying surface of a magnetic head, which reduces head adsorption and Sjl force as described above in combination with a magnetic disk having a small surface roughness, thereby producing a highly reliable magnetic head. It's about r.

本発明による磁気ヘッド?!%揚面の仕上げ方法は研賠
仕上げされた磁気ヘッドの浮揚面をドライエツチングに
よりエツチングすることにより表面を粗くすることを特
徴としている。
A magnetic head according to the present invention? ! The finishing method for the floating surface is characterized by etching the flying surface of the magnetic head which has been polished by dry etching to make the surface rough.

ここで言うドライエツチングとはイオンエツチング法、
又はプラズマエツチング法又はリアクディプイオンエッ
チング法が用いられる。ドライエツチング法により、ベ
ッドギャップ部を侵すことなしに、すなわちヘッドの電
磁変換特性を損ねることなしにヘッドの浮揚面を和くし
、ヘッド吸着を防ぐことが出来る。これは酸、塩基など
の化学薬品によるエツチングに見られない特徴である。
The dry etching referred to here is an ion etching method.
Alternatively, a plasma etching method or a reactive deep ion etching method may be used. The dry etching method makes it possible to soften the flying surface of the head and prevent head adsorption without damaging the bed gap, that is, without impairing the electromagnetic characteristics of the head. This is a feature not seen in etching using chemicals such as acids and bases.

又、ヘッドコアはディスクに比べて形状が小さいので真
空系を用いるドライエツチング法を用いても量産性に与
える影響は極めて少ない。
Furthermore, since the head core has a smaller shape than the disk, even if a dry etching method using a vacuum system is used, it has very little effect on mass productivity.

以下、実施例により本発明の詳細な説明する。Hereinafter, the present invention will be explained in detail with reference to Examples.

実施例1゜ 市駅の磁気ディスク装置に使用する荷重61の磁少ヘッ
ド用のMn7.nフェライトコアのヘッド浮揚面を表面
粗さ0.01μmに研磨した後、イオンエツチング法を
305)行ない表面粗さ0.03μmに粗くした後、支
持バネ及びコイル装着し磁気ヘッドを製作し、摩擦係数
、ヘッド吸着力を評佃;した。
Example 1 Mn7. After polishing the head floating surface of the n-ferrite core to a surface roughness of 0.01 μm, ion etching was performed (305) to roughen the surface to 0.03 μm, and a support spring and coil were attached to fabricate a magnetic head. The coefficient and head adsorption force were evaluated.

実施例2 実施flJ 1と同様にして、但しイオンエツチングを
2分、6分、8分、12分、18分行ない、それぞれ磁
気ヘッド人、B、C2D、Eとした。
Example 2 Ion etching was carried out in the same manner as in Example 1, except that ion etching was carried out for 2 minutes, 6 minutes, 8 minutes, 12 minutes, and 18 minutes, and the magnetic heads were set to 1, B, C2D, and E, respectively.

実施列3 実施例1と同様にして但しイオンエツチングの代りにプ
ラズマエツチング法を用いて表面粗さを0.03μmK
m<して磁気ヘッドを製作した。
Implementation row 3 Same as Example 1, except that plasma etching was used instead of ion etching, and the surface roughness was reduced to 0.03 μmK.
A magnetic head was manufactured using m<.

実施例4 実施例1と同様にして但しイオンエツチングの代りにリ
アクティブイオンエツチング法ヲ甲いて表面粗さを0.
04μmに粗くして磁気ヘッドを製作した。
Example 4 Same as Example 1 except that reactive ion etching was used instead of ion etching to reduce the surface roughness to 0.
A magnetic head was manufactured by roughening it to 0.04 μm.

実施例5 実施例1と同様にして但しMnZnフェライトコアの代
りにNiZn 7エライトコアを用いて磁気ヘッドを製
作した。
Example 5 A magnetic head was manufactured in the same manner as in Example 1, except that a NiZn 7 erite core was used instead of the MnZn ferrite core.

以上実施例11〜5で示しだヘッドを用いて最大静摩擦
係数、平均動摩擦係数、スティックスリップ1を測定し
たどころ下表の様であった。
Using the heads shown in Examples 11 to 5 above, the maximum static friction coefficient, average dynamic friction coefficient, and stick-slip 1 were measured, and the results were as shown in the table below.

ここで最大静摩擦係数、平均摩擦係数、スティックスリ
ップ量は次の様に定義される。
Here, the maximum static friction coefficient, average friction coefficient, and stick-slip amount are defined as follows.

最大静摩擦係数:ディスクの回転開始直後のヘッドにか
かる力をヘッド荷重で除した値でヘッド吸着量と正の相
関関係におる。
Maximum static friction coefficient: The value obtained by dividing the force applied to the head immediately after the disk starts rotating by the head load, and has a positive correlation with the head suction amount.

平均動摩擦係数:ディスクが0.5m/secでヘッド
と摺動している時にヘッドにかかる力の平均値をヘッド
荷重で除した値。スティックスリップ量はディスクが0
.5wa/seeでヘッドと摺動時にヘッドにかかる力
の最大値と最小値の差であり、ヘッド吸着と正の相関を
有する量でおる。
Average dynamic friction coefficient: The value obtained by dividing the average value of the force applied to the head by the head load when the disk is sliding against the head at 0.5 m/sec. The stick-slip amount is 0 for the disc.
.. It is the difference between the maximum value and the minimum value of the force applied to the head when the head slides at 5 wa/see, and is an amount that has a positive correlation with the head adsorption.

以上の様に、実施例1〜5に示したドライエツチングに
より浮揚面をエツチングしたヘッドはドライエツチング
しないヘッドに比べ各々の値が非常に減少していること
が分る。
As described above, it can be seen that the heads whose floating surfaces were etched by dry etching as shown in Examples 1 to 5 had each value significantly reduced compared to the heads that were not dry etched.

又、ヘッドとディスクを湿度50チ、温度25−0で接
触させたま139時間放置した時のヘッドとディスクに
働くヘッド吸着力はドライエツチングしないヘッドの1
02に比べ実施例1〜5に示したドライエツチングした
ヘッドは全て2.5f以下であった。以上の様にドライ
エツチングにより浮揚面をエツチングする方法はヘッド
ディスク間に働く力を非常に減少させ信頼性に優れた磁
気ディスク装置を製造できることが分った。
Furthermore, when the head and disk are left in contact for 139 hours at a humidity of 50 degrees and a temperature of 25-0 degrees, the adsorption force acting on the head and disk is 1 of that of a non-dry etching head.
Compared to No. 02, all of the dry-etched heads shown in Examples 1 to 5 were 2.5 f or less. As described above, it has been found that the method of etching the floating surface by dry etching can greatly reduce the force acting between the head and disk, thereby making it possible to manufacture a highly reliable magnetic disk drive.

Claims (4)

【特許請求の範囲】[Claims] (1)研磨仕上げされた磁気ヘッドの浮揚面をドライエ
ツチングによりエツチングすることを特徴とする磁気ヘ
ッド浮揚面の仕上げ方法。
(1) A method for finishing a flying surface of a magnetic head, which comprises etching the polished flying surface of a magnetic head by dry etching.
(2)  ドライエツチングがイオンエツチング法であ
る特許請求の範囲第1項に記載の磁気ヘッド浮揚面の仕
上げ方法。
(2) A method for finishing a magnetic head flying surface according to claim 1, wherein the dry etching is an ion etching method.
(3)  ドライエツチングがプラズマエツチング法で
ある特許請求の範囲第1項に記載の磁気ヘッド浮揚面の
仕上げ方法。
(3) A method for finishing a magnetic head flying surface according to claim 1, wherein the dry etching is a plasma etching method.
(4)  ドライエツチングがリアクティブイオンエツ
チング法である特許請求の範囲第1項に記載の磁気ヘッ
ド浮揚面の仕上げ方法。
(4) A method for finishing a magnetic head flying surface according to claim 1, wherein the dry etching is a reactive ion etching method.
JP16453581A 1981-10-15 1981-10-15 Finishing method of magnetic head floating surface Granted JPS5866625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16453581A JPS5866625A (en) 1981-10-15 1981-10-15 Finishing method of magnetic head floating surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16453581A JPS5866625A (en) 1981-10-15 1981-10-15 Finishing method of magnetic head floating surface

Publications (2)

Publication Number Publication Date
JPS5866625A true JPS5866625A (en) 1983-04-20
JPH0434203B2 JPH0434203B2 (en) 1992-06-05

Family

ID=15795000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16453581A Granted JPS5866625A (en) 1981-10-15 1981-10-15 Finishing method of magnetic head floating surface

Country Status (1)

Country Link
JP (1) JPS5866625A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180242A2 (en) * 1984-11-02 1986-05-07 Teijin Limited Magnetic recording medium, method for producing the same, and method of recording and reproduction using the same and magnetic head
JPH01133274A (en) * 1987-11-18 1989-05-25 Victor Co Of Japan Ltd Floating magnetic head and its manufacture
JPH01251308A (en) * 1987-12-03 1989-10-06 Hitachi Metals Ltd Floating magnetic head and its manufacture

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423517A (en) * 1977-07-25 1979-02-22 Nippon Telegr & Teleph Corp <Ntt> Floating head slider

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423517A (en) * 1977-07-25 1979-02-22 Nippon Telegr & Teleph Corp <Ntt> Floating head slider

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180242A2 (en) * 1984-11-02 1986-05-07 Teijin Limited Magnetic recording medium, method for producing the same, and method of recording and reproduction using the same and magnetic head
JPH01133274A (en) * 1987-11-18 1989-05-25 Victor Co Of Japan Ltd Floating magnetic head and its manufacture
JPH01251308A (en) * 1987-12-03 1989-10-06 Hitachi Metals Ltd Floating magnetic head and its manufacture

Also Published As

Publication number Publication date
JPH0434203B2 (en) 1992-06-05

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