JPH11322374A - Production of glass substrate for magnetically recording medium - Google Patents

Production of glass substrate for magnetically recording medium

Info

Publication number
JPH11322374A
JPH11322374A JP13203098A JP13203098A JPH11322374A JP H11322374 A JPH11322374 A JP H11322374A JP 13203098 A JP13203098 A JP 13203098A JP 13203098 A JP13203098 A JP 13203098A JP H11322374 A JPH11322374 A JP H11322374A
Authority
JP
Japan
Prior art keywords
disk
glass
glass substrate
chemical strengthening
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP13203098A
Other languages
Japanese (ja)
Inventor
Kazuhisa Kimura
和久 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Asahi Techno Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Techno Glass Corp filed Critical Asahi Techno Glass Corp
Priority to JP13203098A priority Critical patent/JPH11322374A/en
Publication of JPH11322374A publication Critical patent/JPH11322374A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To make the surface smoothness and flatness of glass substrate excellent without impairing the effect of chemical strengthening treatment, by polishing the surface of a glass disk to conduct chemical strengthening, by removing formed surface projections to attain a specific surface roughness without reducing a compressive stress layer. SOLUTION: The purpose of this invention is achieved by the following steps: (1) polishing the surface of a disk molded from glass base by means of an abrasive such as cerium oxide; (2) chemically strengthening treatmenting this disk wherein the disk is dipped in a fused salt to replace the ions (e.g. Li<+> , Na<+> ) near the glass surface with ions in the fused salt, larger in their ionic radius than that of the ions near the glass surface, and e.g. Li<+> is displaced with Na<+> and Na<+> is displaced with K<+> . This treatment forms a compressed layer in the surface of the disk and strengthens the disk; (3) preferentially removing peaking formed on the disk surface due to the chemically strengthening treatment by floating polish, etc., to attain the average surface roughness Ra of the disk, surface of <=0.5 nm, the maximum height Ry of the peaking of <=5.0 nm and the average flatness of <=3 μm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、磁気ディスクなど
に用いられる磁気記録媒体用ガラス基板の製造方法に関
する。
The present invention relates to a method for manufacturing a glass substrate for a magnetic recording medium used for a magnetic disk or the like.

【0002】[0002]

【従来の技術】コンピュータなどの外部記憶装置として
用いられる磁気ディスク装置は、近年のコンピュータソ
フトウエアやオペレーティングシステムの進歩に伴い、
急激な大容量化が進んでおり、これに伴って記録媒体で
ある磁気ディスクの高記録密度化が進められている。
2. Description of the Related Art A magnetic disk device used as an external storage device of a computer or the like has been developed in accordance with recent advances in computer software and operating systems.
With the rapid increase in capacity, the recording density of magnetic disks, which are recording media, is being increased.

【0003】現用の磁気ディスク装置のほとんどはCS
S(コンタクト・スタート・ストップ)方式を採用して
おり、この方式によれば、装置の停止時に磁気ヘッドは
磁気ディスクと接触した状態にある。しかし装置が稼働
を開始しディスクが回転を始めると、気流による浮力が
発生して磁気ヘッドは浮上する。CSS方式の磁気ディ
スクは、こうして磁気ヘッドが浮上した状態で記録・再
生が行われる。
Most of the current magnetic disk drives are CS
The S (contact start / stop) method is employed, and according to this method, the magnetic head is in contact with the magnetic disk when the apparatus stops. However, when the apparatus starts operating and the disk starts rotating, buoyancy is generated by airflow, and the magnetic head flies. Recording and reproduction are performed on the CSS type magnetic disk with the magnetic head flying above.

【0004】このような磁気ディスク装置において、記
録密度を高めるために、磁気ヘッドの浮上高さを小さく
することが行われている。磁気ヘッドの浮上高さが小さ
くなるにつれて、信号の正確な記録・再生のためには、
磁気ディスク表面がより平滑で且つより平面性が優れる
ことが必要となってきている。
In such a magnetic disk device, the flying height of a magnetic head has been reduced to increase the recording density. As the flying height of the magnetic head becomes smaller, for accurate recording and reproduction of signals,
It has become necessary for the magnetic disk surface to be smoother and more flat.

【0005】ところで、最近は磁気ディスクの小形化に
伴って磁気ディスク用基板として、ガラス基板が用いら
れるようになった。ガラス基板は、アルミニウム合金基
板に比べて容易に良好な平滑性および良好な平面性が得
られるため、高密度化を目指す磁気記録媒体用基板とし
て好適である。但し、ガラスはアルミニウム合金よりも
一般的には脆いという強度上の難点を有しているため、
磁気記録媒体基板に用いる場合には、強化処理を施して
ガラスの強度を高めるということが、一般に行われてい
る。
Recently, as the size of magnetic disks has been reduced, glass substrates have been used as magnetic disk substrates. Since a glass substrate can easily obtain good smoothness and good planarity as compared with an aluminum alloy substrate, it is suitable as a substrate for a magnetic recording medium aiming at high density. However, glass has a drawback in strength, which is generally more brittle than aluminum alloys.
When used for a magnetic recording medium substrate, it is common practice to perform a strengthening process to increase the strength of the glass.

【0006】このガラス基板の強化処理の方法として
は、例えばイオン交換による化学強化処理方法(特公平
3−52130号公報)などが挙げられる。この方法
は、ガラス基板を研磨したあとに硝酸カリウム融液中に
数時間保持し、ガラス中のNaイオンと硝酸カリウム
融液中のKイオンとの交換を行ってガラス表面に圧縮
応力を生じさせ、ガラス基板の強度を上げようとするも
のである。
As a method of strengthening the glass substrate, for example, a chemical strengthening method by ion exchange (Japanese Patent Publication No. 3-52130) can be mentioned. In this method, after polishing a glass substrate, the glass substrate is held in a potassium nitrate melt for several hours, and exchange of Na + ions in the glass with K + ions in the potassium nitrate melt to generate a compressive stress on the glass surface. It is intended to increase the strength of the glass substrate.

【0007】しかしながら、上記方法によってガラス基
板の化学強化を行った場合、ガラスの強度は向上するも
のの、表面性が低下するという問題が生じていた。表面
性が損なわれた場合には、磁気ヘッドの低浮上化対応の
基板としての使用が難しくなる。
However, when the glass substrate is chemically strengthened by the above-mentioned method, the strength of the glass is improved, but the surface property is deteriorated. If the surface property is impaired, it becomes difficult to use the magnetic head as a substrate for low flying height.

【0008】そこで上記難点を解消する方法の一つとし
て、ガラス基板を研磨して表面粗さ(Rmax)を50nm
以下にした後、イオン交換による化学強化処理を行なっ
た後に、再度研磨を行って研磨による厚さの減少が片面
で0.7μmより大きくなるようにすることによって、
ガラス基板の強度を向上させるとともに、表面性を向上
させる方法(特開平8−124153号公報)がある。
Therefore, as one of the methods for solving the above-mentioned difficulties, a glass substrate is polished to have a surface roughness (Rmax) of 50 nm.
After the following, after performing a chemical strengthening treatment by ion exchange, by performing polishing again so that the reduction in thickness due to polishing is larger than 0.7 μm on one side,
There is a method of improving the surface properties while improving the strength of a glass substrate (Japanese Patent Application Laid-Open No. 8-124153).

【0009】[0009]

【発明が解決しようとする課題】しかしながら、この方
法においては、ガラス基板の表面平滑性は向上するもの
の、イオン交換による化学強化処理によって生じた基板
表面のごく近傍の圧縮応力層の一部が再研磨処理によっ
て除去されてしまうため、化学強化処理の効果が損なわ
れるとともに、ガラスの表面と裏面の間の応力のバラン
スが崩れて基板に反りが生じ、平面性が低下するという
新たな問題を発生していた。このような平面性の低下
は、厚さ1mm以下のガラス基板で顕著に現れ、とくに
厚さ0.7mm以下のガラス基板においては致命的な欠
陥となる。
However, in this method, although the surface smoothness of the glass substrate is improved, a part of the compressive stress layer very close to the substrate surface caused by the chemical strengthening treatment by ion exchange is re-used. Because of the removal by the polishing process, the effect of the chemical strengthening process is impaired, and the balance between the stresses between the front and back surfaces of the glass is broken, causing a new problem that the substrate is warped and the flatness is reduced. Was. Such a decrease in flatness appears remarkably in a glass substrate having a thickness of 1 mm or less, and becomes a fatal defect particularly in a glass substrate having a thickness of 0.7 mm or less.

【0010】本発明は上記の事情に基づいてなされたも
ので、化学強化処理されたガラス基板において、化学強
化処理の効果を損なわずに、表面平滑性と平面性がとも
良好であって、磁気ヘッドの低浮上化対応の磁気ディス
ク用として好適な磁気記録用ガラス基板の製造方法を提
供することをその目的とする。
The present invention has been made on the basis of the above circumstances. In a glass substrate which has been subjected to a chemical strengthening treatment, both the surface smoothness and the flatness are good without impairing the effect of the chemical strengthening treatment, and It is an object of the present invention to provide a method of manufacturing a glass substrate for magnetic recording suitable for use in a magnetic disk compatible with a low flying head.

【0011】[0011]

【課題を解決するための手段】本発明の磁気記録媒体用
ガラス基板の製造方法は、ガラス母材を円板に成形する
工程と、前記円板の表面を研磨する工程と、前記円板を
化学強化処理する工程と、前記化学強化処理によって前
記円板の表面に生じた突起を除去し実質的に圧縮応力層
の減少を伴わない工程とを有することを特徴とするもの
である。
According to the present invention, there is provided a method of manufacturing a glass substrate for a magnetic recording medium, comprising the steps of: forming a glass base material into a disk; polishing the surface of the disk; The method is characterized by including a step of performing a chemical strengthening treatment and a step of removing a protrusion generated on the surface of the disk by the chemical strengthening treatment and substantially not reducing the compressive stress layer.

【0012】また本発明の磁気記録媒体用ガラス基板の
製造方法は、ガラス母材を円板に成形する工程と、前記
円板の表面を研磨する工程と、前記円板を化学強化処理
する工程と、前記化学強化処理によって生じた前記円板
の表面の突起を除去し実質的に圧縮応力層の減少を伴わ
ない工程とによって、前記円板面の平均表面粗さRaを
0.5nm以下、最大高さRyを5.0nm以下、且つ
平面度を3μm以下にすることを特徴とするものであ
る。
Further, in the method of manufacturing a glass substrate for a magnetic recording medium according to the present invention, a step of forming a glass base material into a disk, a step of polishing the surface of the disk, and a step of chemically strengthening the disk And a step of removing protrusions on the surface of the disk caused by the chemical strengthening treatment and substantially not reducing the compressive stress layer, thereby reducing the average surface roughness Ra of the disk surface to 0.5 nm or less, The maximum height Ry is 5.0 nm or less, and the flatness is 3 μm or less.

【0013】ここに表面粗さを表示する量RaはJIS
規格B0601に定義されている算術平均粗さ、Ryは
同じくJIS規格B0601に定義されている最大高さ
である。また、平面度とは、幾何学的に正しい平面から
の狂いの大きさであって、本発明においてはフィゾー型
干渉計を用いて得られる数値をもって平面度の大きさと
する。
Here, the amount Ra indicating the surface roughness is JIS.
The arithmetic average roughness, Ry, defined in standard B0601 is the maximum height also defined in JIS standard B0601. Further, the flatness is a magnitude of deviation from a geometrically correct plane, and in the present invention, a value obtained by using a Fizeau interferometer is defined as the magnitude of the flatness.

【0014】本発明は、化学硬化処理後の表面性の低下
が微小な突起の発生によるものであるとの知見を得て、
この微小な突起のみ除去すれば、表面性を回復すること
ができるとの着想にもとづいてなされたものである。
The present invention has been made based on the finding that the decrease in surface properties after the chemical curing treatment is due to the generation of minute projections.
This is based on the idea that the surface property can be restored by removing only these minute projections.

【0015】本発明において、基板となるガラス材料と
してはその組成に特に制限はなく、例えばアルミノシリ
ケートガラスやソーダガラスなど、化学強化処理が可能
なものであればとのようなものであっても使用可能であ
る。例えばアルカリイオンとして、Li+ およびNa+
を有し、50重量%以上のSiO2 および10重量%以
上のAl2 3 を含むガラスが好適に使用できる。
In the present invention, the composition of the glass material used as the substrate is not particularly limited. For example, a glass material such as aluminosilicate glass or soda glass, which can be subjected to a chemical strengthening treatment, may be used. Can be used. For example, Li + and Na + as alkali ions
And a glass containing 50% by weight or more of SiO 2 and 10% by weight or more of Al 2 O 3 can be suitably used.

【0016】本発明において、化学強化処理前に行う研
磨処理の方法としては、ガラス基板の一般的な製造方法
を採用することができる。例えば、酸化セリウム、シリ
カ、コロイダルシリカ、あるいは酸化アルミニウムなど
を研磨材として用い、面圧力0〜100g/cm2 、加工
時間0.5〜30分程度の条件で行う研磨などを採用す
ることができる。
In the present invention, as a method of the polishing treatment performed before the chemical strengthening treatment, a general method of manufacturing a glass substrate can be adopted. For example, polishing performed using cerium oxide, silica, colloidal silica, aluminum oxide, or the like as an abrasive, under conditions of a surface pressure of 0 to 100 g / cm 2 and a processing time of about 0.5 to 30 minutes can be employed. .

【0017】本発明において、化学強化処理の方法は、
イオン交換処理によるものであってガラス基板を溶融塩
中に浸漬して、ガラスの表面近くのイオンをより大きい
イオン半径を有する溶融塩のイオンに置き換えること、
例えばLi+ とNa+ とを有するガラス基板をNaNO
3 とKNO3 の混合溶融塩に浸漬してLi+ をNa
+に、Na+ をK+ に置き換えることによって、表面に
圧縮層を形成するものである。
In the present invention, the method of chemical strengthening treatment is as follows:
Immersing the glass substrate in a molten salt by an ion exchange treatment to replace ions near the surface of the glass with ions of a molten salt having a larger ionic radius;
For example, a glass substrate having Li + and Na + is
I was immersed in 3 and mixed molten salt of KNO 3 and Li + Na
+ , And a compressed layer is formed on the surface by replacing Na + with K + .

【0018】本発明において、化学強化処理後の突起を
除去する方法としては、特に制限はなく、例えば研磨を
行ってガラス基板の厚さ方向の減少量が片面で0.05
μm未満の範囲、より好ましくは0.02μm未満の範
囲で行う方法を用いることができる。
In the present invention, there is no particular limitation on the method of removing the projections after the chemical strengthening treatment. For example, the reduction in the thickness direction of the glass substrate by polishing may be 0.05% on one side.
A method performed in a range of less than μm, more preferably in a range of less than 0.02 μm can be used.

【0019】また本発明の化学強化処理後の突起を除去
する方法として、流体浮上研磨(フローティングポリッ
シュ)の方法が好適に利用できる。この方法を用いれば
研磨工具は研磨剤を含む流体を介して浮上するので直接
に円板表面に接触せず、また研磨剤を含む流体は円板面
方向に走るので突起の除去を優先的に行うことができ
る。
Further, as a method for removing the projections after the chemical strengthening treatment of the present invention, a method of fluid floating polishing (floating polishing) can be suitably used. If this method is used, the polishing tool floats through the fluid containing the abrasive, so that it does not directly contact the surface of the disk, and the fluid containing the abrasive runs in the direction of the disk surface. It can be carried out.

【0020】また本発明の化学強化処理後の突起を除去
する方法として、磁気ディスクの仕上げ工程で広く用い
られているバーニッシュを応用することができる。この
方法によってガラス円板を高速で回転させ、円板面にブ
レードを近付けることによって突起のみを除去すること
ができる。
As a method for removing the protrusions after the chemical strengthening treatment of the present invention, varnish widely used in a finishing step of a magnetic disk can be applied. By this method, the glass disk is rotated at a high speed, and the blade can be brought close to the disk surface to remove only the protrusions.

【0021】本発明によれば、化学強化処理後のガラス
基板表面の突起部分のみを除去している点で、広く表面
層を除去する従来技術と相違し、化学強化処理の効果を
損なってしまうことを防止できる。またガラス基板面の
圧縮応力を有する部分が一部除かれて二つの面の圧縮応
力のバランスがくずれて平面度を損なうことを防止でき
る。
According to the present invention, only the protrusions on the surface of the glass substrate after the chemical strengthening treatment are removed, which is different from the prior art in which the surface layer is widely removed, thereby impairing the effect of the chemical strengthening treatment. Can be prevented. In addition, it is possible to prevent a part of the glass substrate surface having a compressive stress from being removed, thereby preventing the balance between the compressive stresses of the two surfaces from being lost and impairing the flatness.

【0022】次に本発明の作用について述べる。Next, the operation of the present invention will be described.

【0023】本発明は化学強化処理後のガラス基板面の
表面性低下が微小突起によるものであるとの知見を得
て、化学強化処理後のガラス基板面の突起のみを除去す
ることによって表面性を回復させたものであって、従来
技術のように化学強化処理後の基板面を全面的に研磨す
ることはせず、突起のみを除去するので、化学硬化処理
効果の低下や反りの発生による平面性の低下が回避され
る。
According to the present invention, it has been found that the surface property of the glass substrate surface after the chemical strengthening treatment is reduced by the minute projections, and only the protrusions on the glass substrate surface after the chemical strengthening treatment are removed. It does not polish the entire surface of the substrate after the chemical strengthening treatment as in the prior art, and removes only the protrusions, so that the effect of the chemical curing treatment is lowered or the warpage occurs. Deterioration of flatness is avoided.

【0024】[0024]

【発明の実施の形態】以下、実施例に基づいて本発明の
発明の実施の形態を具体的に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments of the present invention will be specifically described below based on examples.

【0025】(実施例)アルミノシリケートガラス基板
を常法に従って直径65mm、厚さ0.635mmの円
板状に成形し、酸化セリウムを用いて研磨処理を行っ
た。研磨処理された円板状ガラス基板の表面性を測定し
た結果を図1の記号1に示す。
EXAMPLE An aluminosilicate glass substrate was formed into a disk having a diameter of 65 mm and a thickness of 0.635 mm according to a conventional method, and polished with cerium oxide. The result of measuring the surface properties of the polished disk-shaped glass substrate is shown by symbol 1 in FIG.

【0026】このガラス基板を硝酸カリウム融液中に4
時間保持して化学強化処理を行った。化学強化処理後の
表面性を測定した結果を図1の記号2に示す。化学強化
処理後の表面粗さRaが0.45nm、Ryは30.6
nm、平面度は0.8μmであった。
The glass substrate was placed in a potassium nitrate melt for 4 hours.
The chemical strengthening treatment was performed by holding for a time. The result of measuring the surface properties after the chemical strengthening treatment is shown by symbol 2 in FIG. Surface roughness Ra after chemical strengthening treatment is 0.45 nm, Ry is 30.6
nm and the flatness were 0.8 μm.

【0027】次にこのガラス基板を研磨処理して突起を
除去した。突起を除去した後の表面性を測定した結果を
図1の記号3に示す。研磨処理に際して研磨量はおよそ
0μmであった。突起除去後の基板の表面粗さRaが
0.30nm、Ryは3.0nm、また平面度は0.8
μmと変化がなかった。
Next, the glass substrate was polished to remove protrusions. The result of measuring the surface properties after removing the protrusions is shown as symbol 3 in FIG. The polishing amount during the polishing treatment was approximately 0 μm. The surface roughness Ra of the substrate after removing the protrusions is 0.30 nm, Ry is 3.0 nm, and the flatness is 0.8.
μm and no change.

【0028】[0028]

【発明の効果】本発明によって、化学強化処理によるガ
ラス基板の強化に伴う表面性および平面性低下の問題が
解決され、高強度で表面性と平面性の良好なガラス基板
の製造が可能になった。この製造方法によって製造され
たガラス基板を用いることにより、磁気ディスク装置に
おいて低ヘッド浮上量が可能になるので、磁気ディスク
装置のさらなる高密度大容量化に貢献できる。
According to the present invention, the problem of deterioration in surface properties and flatness due to the strengthening of the glass substrate by the chemical strengthening treatment is solved, and it becomes possible to manufacture a glass substrate having high strength and good surface properties and flatness. Was. By using the glass substrate manufactured by this manufacturing method, a low head flying height can be achieved in the magnetic disk device, which can contribute to further increase in the density and capacity of the magnetic disk device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】化学強化処理前、化学強化処理後および表面突
起除去後の円板面の表面粗さを示す図である。
FIG. 1 is a diagram showing the surface roughness of a disk surface before a chemical strengthening process, after a chemical strengthening process, and after removing surface protrusions.

【符号の説明】 1……化学強化処理前の円板面、 2……化学強化
処理後の円板面、3……表面突起除去後の円板面
[Description of Signs] 1... Disk surface before chemical strengthening treatment 2... Disk surface after chemical strengthening treatment 3... Disk surface after removal of surface protrusions

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガラス母材を円板に成形する工程と、前
記円板の表面を研磨する工程と、前記円板を化学強化処
理する工程と、前記化学強化処理によって生じた前記円
板表面の突起を除去し実質的に圧縮応力層の減少を伴わ
ない工程とを有することを特徴とする磁気記録媒体用ガ
ラス基板の製造方法。
1. A step of forming a glass base material into a disk, a step of polishing a surface of the disk, a step of chemically strengthening the disk, and a surface of the disk produced by the chemical strengthening processing. Removing the projections and substantially not reducing the compressive stress layer.
【請求項2】 ガラス母材を円板に成形する工程と、前
記円板の表面を研磨する工程と、前記円板を化学強化処
理する工程と、前記化学強化処理によって生じた前記円
板表面の突起を除去し実質的に圧縮応力層の減少を伴わ
ない工程とによって、前記円板面の平均表面粗さRaを
0.5nm以下、最大高さRyを5.0nm以下、且つ
平面度を3μm以下にすることを特徴とする磁気記録媒
体用ガラス基板の製造方法。
2. A step of forming a glass base material into a disk, a step of polishing the surface of the disk, a step of chemically strengthening the disk, and a surface of the disk produced by the chemical strengthening processing. By removing the projections and substantially not reducing the compressive stress layer, the average surface roughness Ra of the disk surface is 0.5 nm or less, the maximum height Ry is 5.0 nm or less, and the flatness is reduced. A method for producing a glass substrate for a magnetic recording medium, wherein the glass substrate has a thickness of 3 μm or less.
JP13203098A 1998-05-14 1998-05-14 Production of glass substrate for magnetically recording medium Withdrawn JPH11322374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13203098A JPH11322374A (en) 1998-05-14 1998-05-14 Production of glass substrate for magnetically recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13203098A JPH11322374A (en) 1998-05-14 1998-05-14 Production of glass substrate for magnetically recording medium

Publications (1)

Publication Number Publication Date
JPH11322374A true JPH11322374A (en) 1999-11-24

Family

ID=15071864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13203098A Withdrawn JPH11322374A (en) 1998-05-14 1998-05-14 Production of glass substrate for magnetically recording medium

Country Status (1)

Country Link
JP (1) JPH11322374A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100532159B1 (en) * 2000-05-26 2005-11-30 미츠이 긴조쿠 고교 가부시키가이샤 Method for the production of glass substrates for magnetic recording mediums
JP2006225181A (en) * 2005-02-15 2006-08-31 Konica Minolta Opto Inc Glass substrate, method of manufacturing glass substrate, glass substrate for magnetic recording medium and method of manufacturing glass substrate for magnetic recording medium
JP4524515B2 (en) * 2000-07-10 2010-08-18 富士電機デバイステクノロジー株式会社 Method for producing press-molding mold for glass substrate for magnetic disk and method for producing glass substrate for magnetic disk
US9187365B2 (en) 2013-02-25 2015-11-17 Corning Incorporated Methods for measuring the asymmetry of a glass-sheet manufacturing process
CN113121125A (en) * 2021-04-14 2021-07-16 万津实业(赤壁)有限公司 Processing method for 2.5D float glass

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100532159B1 (en) * 2000-05-26 2005-11-30 미츠이 긴조쿠 고교 가부시키가이샤 Method for the production of glass substrates for magnetic recording mediums
JP4524515B2 (en) * 2000-07-10 2010-08-18 富士電機デバイステクノロジー株式会社 Method for producing press-molding mold for glass substrate for magnetic disk and method for producing glass substrate for magnetic disk
JP2006225181A (en) * 2005-02-15 2006-08-31 Konica Minolta Opto Inc Glass substrate, method of manufacturing glass substrate, glass substrate for magnetic recording medium and method of manufacturing glass substrate for magnetic recording medium
US9187365B2 (en) 2013-02-25 2015-11-17 Corning Incorporated Methods for measuring the asymmetry of a glass-sheet manufacturing process
US9840436B2 (en) 2013-02-25 2017-12-12 Corning Incorporated Methods for measuring the asymmetry of a glass-sheet manufacturing process
CN113121125A (en) * 2021-04-14 2021-07-16 万津实业(赤壁)有限公司 Processing method for 2.5D float glass

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