JPS5864699A - Storage circuit device of semiconductor - Google Patents

Storage circuit device of semiconductor

Info

Publication number
JPS5864699A
JPS5864699A JP56163008A JP16300881A JPS5864699A JP S5864699 A JPS5864699 A JP S5864699A JP 56163008 A JP56163008 A JP 56163008A JP 16300881 A JP16300881 A JP 16300881A JP S5864699 A JPS5864699 A JP S5864699A
Authority
JP
Japan
Prior art keywords
address
signal line
read signal
voltage
igfet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56163008A
Other languages
Japanese (ja)
Inventor
Eiji Sugimoto
杉本 榮治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56163008A priority Critical patent/JPS5864699A/en
Publication of JPS5864699A publication Critical patent/JPS5864699A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • G11C17/08Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements
    • G11C17/10Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements in which contents are determined during manufacturing by a predetermined arrangement of coupling elements, e.g. mask-programmable ROM
    • G11C17/12Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards using semiconductor devices, e.g. bipolar elements in which contents are determined during manufacturing by a predetermined arrangement of coupling elements, e.g. mask-programmable ROM using field-effect devices

Landscapes

  • Read Only Memory (AREA)

Abstract

PURPOSE:To eliminate delay due to capacitance coupling, and to realize high- speed operation by setting the threshold voltage of an Y address IGFET for selecting a read signal line by an address signal lower than that of an IGFET for read signal line charging. CONSTITUTION:A memory circuit consists of plural IGFET memories M111- M211, address signal lines Y1, Y2-, and X1, X2- for address specification, Y address IGFETs S11-, and S21- for selecting read signal lines by signals from the address signal lines, and IGFETs QP10-, and QP21- for charging read signal lines connected to read signal lines. The threshold value (2.0V) of the charging IGFETs is set at least 0.5V higher than the threshold value (1.0V) of the Y selecting IGFETs to eliminate delay and to realize high-speed operation due to the capacitance coupling between the Y address lines and read signal lines.

Description

【発明の詳細な説明】 本発明は絶縁ゲート電界効果トランジスタ(以下IGF
ETと記す)t−主な構成要素とし友集積化半導体記憶
回路装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an insulated gate field effect transistor (hereinafter referred to as IGF).
(hereinafter referred to as ET) relates to an integrated semiconductor memory circuit device whose main component is an integrated semiconductor memory circuit device.

一般に、IGFETt−主な構成要素とし、集積回路化
−した記憶装置においては大容量になるに従って必然的
に増加するディジット線の容量を充放電する必要があり
、その充放電する時間が読み出し時間のうち大きな割合
をしめている。一般にNチャネル型電界効果トランジス
タで回路を構成する場合、放電に比べて充電に多くの時
間を要する。
In general, in a memory device that uses IGFETt as its main component and is integrated into an integrated circuit, it is necessary to charge and discharge the digit line capacity, which inevitably increases as the capacity increases, and the charging and discharging time is longer than the readout time. It accounts for a large proportion of this. Generally, when a circuit is constructed using N-channel field effect transistors, charging takes longer than discharging.

その九め前記ディジ、ト線t−読み出し期間前に充電(
プリチャージと記す)しておき、読み出し時には充電状
態を保持しているか、放電しているかの判定を行なう方
式がよく使用されている。しかしながら、上記方式の記
憶装置には、以下の如き重大な欠点がある。
The ninth digital, digital and digital t-charging period before the readout period (
A commonly used method is to precharge the battery (hereinafter referred to as precharging), and then determine whether the charged state is maintained or discharged at the time of reading. However, the storage device of the above type has the following serious drawbacks.

以下、従来技術による記憶装置として、NチャネルIG
FET?用い友読み出し専用記憶装置(以下ROMと記
す)の−例f:第1図〜第3図を用いて説明し、その欠
点を明らかにする。
Hereinafter, as a storage device according to the prior art, an N-channel IG
FET? Example f of a read-only storage device (hereinafter referred to as ROM) will be explained using FIGS. 1 to 3, and its drawbacks will be clarified.

第1図は従来技術によるROMの一部回路図である。こ
の例においては、配憶素子として第1の読み出し線11
1. +12. at3.−曲a21. a!2. !
!!、曲に並列に接続され九記憶用IGFET Mll
l、 Ml 1 +1゜Mus・・・・・・、 M12
1. M122. M1*s・・甲−・曲前記記憶用I
GFETのゲートに接続されXアドレスを指定するXア
ドレス線Xlt X2e X3t・曲およびXアドレス
を指定するYアドレス線Yl、 Y2. Ys、・・−
・・、前記第1の読み出し線(alx、 asz、 a
ss、−中〕、 (agx。
FIG. 1 is a partial circuit diagram of a ROM according to the prior art. In this example, the first readout line 11 is used as a storage element.
1. +12. at3. -Song a21. a! 2. !
! ! , nine memory IGFETs connected in parallel to the Mll
l, Ml 1 +1゜Mus..., M12
1. M122. M1*s・・A-・For memorizing the song I
X address lines Xlt, X2e, X3t, which are connected to the gates of the GFETs and specify the X address; and Y address lines Yl, Y2, which specify the song and the X address; Ys...-
..., the first readout line (alx, asz, a
ss, - inside], (agx.

+22. +2ト・・・・)、()、・・・・・・のう
ちそれぞれ1本′fcYアドレス信号によって選択して
第2の読み出し線bx、bz、・・・・・に接続するた
めのY選択用IGFET S11. at z、 Sl
a、・・・・・8zx、 S2t、 8鵞31曲;・・
を前記第1及び第2の読み出し信号線にプリチャージす
る友めのプリチャージ用IGFET Qpr。* Qp
I L・・・・・・及びプリチャージ信号@P、さらに
は前記第2の読み出し信号線bx、bz、・・−・・の
電位を基準電位と比較して増巾する検知増巾器Al、 
Ax、・・−・−により構成されている。
+22. +2 t...), (), . . . 1 Y for selecting and connecting to the second readout lines bx, bz, . . . by the fcY address signal. Selection IGFET S11. at z, Sl
a,...8zx, S2t, 8 goose 31 songs;...
a friend precharge IGFET Qpr that precharges the first and second readout signal lines; *Qp
A detection amplifier Al that amplifies the potential of I L... and the precharge signal @P, and further the second readout signal lines bx, bz,... by comparing it with a reference potential. ,
It is composed of Ax, . . . -.

本例の動作は以下の通りである。第3図(イ)〜(へ)
は、それぞれプリチャージ信号線P%Xア)” L/ 
X線X、Yアドレス線Y、第1の読み出し信号線a。
The operation of this example is as follows. Figure 3 (a) to (f)
are the precharge signal lines P%XA)”L/
X-ray X, Y address line Y, and first read signal line a.

[2の読み出し信号線す、検知増巾器の出力0の電圧波
形を示す図である。プリチャージ信号線の電圧VP (
第3図K1−1)が高レベル”H”になると、Xアドレ
ス信号の電圧Vx (第3図(ロ)−2)は低レベル1
L”になり、記憶用IGFETは全て非導通@OFF”
となり、Xアドレス信号の電圧V丁(第3図(/′I−
3,4)は全て′″H”になる、Xアドレス信号の回路
側を第2図に示しておく。従って、プリチャージ用IG
FETは全て導通し、電源CCを通して、第1の読み出
し信号線の電圧■a(第3図に)−5)及び第2の読み
出し信号線の電圧Vb (第3図(ホ)−6)は1H′
″に充電される。
2 is a diagram showing the voltage waveform of the output 0 of the detection amplifier. Precharge signal line voltage VP (
When the voltage Vx of the X address signal (K1-1) in Figure 3 becomes a high level "H", the voltage Vx (Figure 3 (B)-2) goes to a low level 1.
becomes low and all memory IGFETs are non-conducting @OFF”
Then, the voltage of the X address signal V (Fig. 3 (/'I-
FIG. 2 shows the circuit side of the X address signal where all of the signals 3 and 4) become ``H''. Therefore, IG for precharging
All the FETs are conductive, and the voltage of the first read signal line a (Fig. 3)-5) and the voltage of the second read signal line Vb (Fig. 3 (E)-6) are 1H'
” is charged.

この1H″の電位はプリチャージ信号の電圧vPからI
GFET Qpxo、Qptt、・・−、Qrzo、・
・=;のしきい値電圧を引いた値となる。検知増巾器の
出力は、比較基準電圧(第3図(ホ)−7)と第2の読
み出し信号線の電圧vbt−比較する事によって得られ
、この場合@H″となる1次にプリチャージ信号V、が
@ L IIになると、選択されたXアドレス信号は@
H″となり、Xアドレス信号に対しては選択され九信号
は@H”のままに保持され、非選択の信号線は′″L”
(IlF3図←1−4)となる。
The potential of this 1H" is from the voltage vP of the precharge signal to I
GFET Qpxo, Qptt,...-, Qrzo,...
It is the value obtained by subtracting the threshold voltage of .=;. The output of the detection amplifier is obtained by comparing the comparison reference voltage (Fig. 3 (E)-7) with the voltage vbt of the second read signal line. When the charge signal V becomes @L II, the selected X address signal becomes @
The selected signal for the X address signal remains @H'', and the unselected signal line becomes ``L''.
(IIF3 diagram ← 1-4).

Xアドレス信号Vxが6H”となり、選択された記憶用
IGFETが導通状態にあれば、第1の読み出し信号線
の電圧■3は記憶用IGFETt−通して除去に放電し
、電圧は低下してゆく、一方、第2の読み出し信号線の
電圧vbも、Y選択用IGFETを通して、前記第1の
読み出し信号線の電圧V。
When the X address signal Vx becomes 6H" and the selected storage IGFET is in a conductive state, the voltage 3 on the first read signal line is discharged through the storage IGFET t-, and the voltage decreases. , On the other hand, the voltage Vb of the second read signal line is also applied to the voltage V of the first read signal line through the Y selection IGFET.

の低下に供って低下してゆき、比較基準電圧と交叉する
と、検知増巾器は′″L″を出力する。
The detection amplifier outputs ``L'' when it crosses the comparison reference voltage.

以上、動作の概要を述べ九が、このような従来技術には
以下の如き欠点があることが判っ九、すなわち、前記放
電中の動作において、第1の読み出し信号線の電圧が低
下すると、Y選択用IGF’E’Iのゲート(Xアドレ
ス信号線)−とソース(glの読み出し信号線)の間の
容量結合により、Xアドレス信号も低下する(第3図(
/→−3の凹部参照)。
The outline of the operation has been described above, but it has been found that such conventional technology has the following drawbacks. Namely, when the voltage of the first read signal line decreases during the operation during discharge, Y Due to the capacitive coupling between the gate (X address signal line) and source (gl read signal line) of the selection IGF'E'I, the X address signal also decreases (see Figure 3).
/→Refer to the concave part of -3).

その九め、Y選択用IGFETが非導通に近い状態とな
り、第2の読み出し信号線の放電が極めて遅くなってし
まう。本来、#!lの読み出し信号線の容量に比較して
第2の読み出し信号線の容量は極く小さく、従って上記
現象さえなければ、第2の読み出し信号線の電圧は第1
の読み出し信号線の電圧とはぼ同じに低下してゆくはず
である。しかるに上記現象により第1の読み出し信号線
の電圧が低下し、Xアドレス信号線の電圧との差が大き
くなるまでは、第2の読み出し信号線の電圧は低下せず
、従って比較基準電圧と交叉するに要する時間は極めて
遅くなってしまうのである(第3図(へ)−8)6 本発明の目的は前述の欠点を除去した大容量。
Ninth, the Y selection IGFET becomes almost non-conductive, and the discharge of the second read signal line becomes extremely slow. Originally #! The capacitance of the second read signal line is extremely small compared to the capacitance of the read signal line of l, and therefore, if the above phenomenon does not occur, the voltage of the second read signal line will be the same as that of the first read signal line.
The voltage on the readout signal line should drop to about the same level as the voltage on the readout signal line. However, due to the above phenomenon, the voltage on the first read signal line decreases, and the voltage on the second read signal line does not decrease until the difference with the voltage on the X address signal line becomes large. The time required to do so is extremely slow (Fig. 3(f)-8).6 The object of the present invention is to provide a large capacity that eliminates the above-mentioned drawbacks.

高速度々記憶装置を提供することにある。The purpose of the present invention is to provide a high-speed storage device.

本発明による記憶装flは、例えば行列状に接続した複
数個のIGFETより成る記憶素子群と、前記記憶素子
群の番地を指定するXアドレス信号線、及びXアドレス
信号線と、前記記憶素子群のうち選択され友記憶素子の
状態により変化する複数個の第1の読み出し信号により
選択するための複数個のYアドレス用IGFETと、前
記Xアドレス信号により選択された第2の読み出し信号
線と前記第2の読み出し信号線の電圧全検出増巾する検
知増巾器とを少なくともそなえ次記憶装置であり、前記
第1及び第2の読み出し信号線の電位は前記Xアドレス
信号が印加される前は、少なくとも前記第1の読み出し
信号線に接続された前充電用IG−FETにより充電さ
れている記憶装置において、前記前充電用IGFETの
しき一値電圧の方が前記Yアドレス用IGFETのしき
い値電圧より少なくとも0.5v以上高い事會特徴とす
る。
The memory device fl according to the present invention includes, for example, a memory element group consisting of a plurality of IGFETs connected in a matrix, an X address signal line for specifying an address of the memory element group, an X address signal line, and the memory element group. a plurality of Y-address IGFETs to be selected by a plurality of first readout signals that are selected among them and vary depending on the state of the companion memory element; a second readout signal line selected by the X-address signal; The second storage device includes at least a detection amplifier for amplifying the total detection of the voltage of the second read signal line, and the potential of the first and second read signal lines is before the X address signal is applied. , in the storage device being charged by at least the pre-charging IGFET connected to the first read signal line, the threshold voltage of the pre-charging IGFET is higher than the threshold voltage of the Y-address IGFET. It is characterized by being at least 0.5V higher than the voltage.

次に本発明の一実施例を述べる。従来例との対比が容易
な様に、前提第1図、2図、3図を参照して説明する。
Next, one embodiment of the present invention will be described. In order to facilitate comparison with the conventional example, the explanation will be made with reference to the premise of FIGS. 1, 2, and 3.

なお記憶装置の基本的構成、動作については従来例と同
様であるので説明を省略し、両者の差違を主に説明する
Note that the basic configuration and operation of the storage device are the same as those of the conventional example, so the explanation will be omitted, and the differences between the two will be mainly explained.

本発明による実施例では、第1図のプリチャージ用IG
FET  Qyso、Qpxt、°=、Qyio、Qy
is。
In the embodiment according to the present invention, the precharge IG shown in FIG.
FET Qyso, Qpxt, °=, Qyio, Qy
is.

・・・・・・のしきい値電圧をおおよそ2.OV、Y遺
択用IGFET  S11. St2.・・−・・82
1.・・−・・のしきい値電圧をおおよそ1.Ovに設
定しておく。上記しきい値電圧の設定によるのみで、従
来技術の欠点は解消できる。つまり、プリチャージ用I
()FETのしきい値電圧を高くしたため充電状態での
第1及び第2の読み出し信号線の電圧(第3図(=1.
−105゜及び第3図困−106)tit従来例に比べ
て、およそ1.OV低くなる。そのため、選択されたY
選択用IGFETは非導違近くになることなくXアドレ
ス信号線電圧が印加され、第1の読み出し信号線の電圧
が低下してゆくと、はとんど時間的遅れなく、第2の読
み出し信号線の電圧も低下し、すみやかに比較基準電圧
(第3図(ホ)−107)と交叉し、従来例に比べて極
めて少ない遅延時間で出力が得られる(第3図(へ)−
108)。
The threshold voltage of ...... is approximately 2. OV, Y selection IGFET S11. St2.・・・-・82
1. The threshold voltage of ...-... is approximately 1. Set it to Ov. The drawbacks of the prior art can be overcome only by setting the threshold voltage. In other words, the precharge I
() Since the threshold voltage of the FET is increased, the voltage of the first and second read signal lines in the charged state (Fig. 3 (=1.
-105° and Fig. 3 -106)tit compared to the conventional example. OV becomes lower. Therefore, the selected Y
The selection IGFET is applied with the X address signal line voltage without becoming nearly non-conducting, and as the voltage of the first readout signal line decreases, the selection IGFET receives the second readout signal without any time delay. The line voltage also decreases and quickly crosses the comparison reference voltage (Fig. 3 (E)-107), and an output is obtained with an extremely short delay time compared to the conventional example (Fig. 3 (E)-107).
108).

以上詳述し九如く、本発明によればXアドレス信号線と
読み出し信号線の容量結合による必然性のない大巾な遅
延を解幽でき、高速度の記憶装置を提供でき、しかもい
かなる余分の素子を付は加える必要もない7 なお、以上の実施例は、読み出し専用記憶装置に本発明
を適用したものであるが、記憶装置としては一般の書き
込み読み出し記憶装置などであってもよいことは当然で
ある。
As described in detail above, according to the present invention, it is possible to eliminate the unavoidable large delay due to capacitive coupling between the There is no need to add 7. Note that in the above embodiment, the present invention is applied to a read-only storage device, but it goes without saying that the storage device may be a general read/write storage device. It is.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来技術及び本発明による記憶装置を説明する
ための読み出し専用記憶装置の一部回路図で、図中Ml
 t 1. Mt t !、・・−・・M121.・・
−・・Mt s 1゜・・−・・、M211.・・・は
記憶素子、811. St s、 、−−−−。 QF t o、 QP 11.−”、はIGFET、 
Yl、 Yl、 ・−・。 XI、 X2.・・−・・はアドレス信号線、Pはプリ
チャージ信号線、CCは電源、ALl、入2.・・・・
・・は検知増巾器、Qt、02・・・・・・、はその出
力、を示す。 第2図はYアドレスデコーダー回路の一例を示す回路図
、第3図(イ)〜(へ)は、第1図の各点に対応した電
圧波形を示す図、である。 8 f 図 L Z 図
FIG. 1 is a partial circuit diagram of a read-only storage device for explaining storage devices according to the prior art and the present invention.
t1. Mt t! ,...-M121.・・・
-...Mt s 1゜..., M211. . . . is a memory element, 811. St s, ,---. QF t o, QP 11. -”, is IGFET,
Yl, Yl, ・-・. XI, X2. ... is an address signal line, P is a precharge signal line, CC is a power supply, ALl, input 2.・・・・・・
. . . indicates a detection amplifier, and Qt, 02 . . . indicates its output. FIG. 2 is a circuit diagram showing an example of a Y address decoder circuit, and FIGS. 3(A) to 3(F) are diagrams showing voltage waveforms corresponding to each point in FIG. 1. 8 f Figure L Z Figure

Claims (1)

【特許請求の範囲】[Claims] 複数個の絶縁ゲート型電界効果トランジスタより成る記
憶素子群と、前記記憶素子群の番地を指定するアドレス
信号線と、前記アドレス信号線の信号により読み出し信
号線を選択するYアドレス用絶縁ゲート型電界効果トラ
ンジスタと、前記読み出し信号線に接続された読み出し
信号線充電用絶縁ゲート型電界効果トランジスタとを含
む半導体記憶回路装置において、前記読み出し信号線充
電用絶縁ゲート型電界効果トランジスタのしきい値電圧
は、前記Yアドレス用絶縁ゲート型電界効果トランジス
タのしきい値電圧より少なくとも05ボルト以上高い事
を特徴とする半導体記憶回路装置。
A memory element group consisting of a plurality of insulated gate field effect transistors, an address signal line specifying an address of the memory element group, and an insulated gate electric field for Y address that selects a read signal line based on a signal of the address signal line. In a semiconductor memory circuit device including an effect transistor and an insulated gate field effect transistor for charging the read signal line connected to the read signal line, the threshold voltage of the insulated gate field effect transistor for charging the read signal line is , a semiconductor memory circuit device characterized in that the threshold voltage is at least 0.5 volts higher than the threshold voltage of the Y-address insulated gate field effect transistor.
JP56163008A 1981-10-13 1981-10-13 Storage circuit device of semiconductor Pending JPS5864699A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56163008A JPS5864699A (en) 1981-10-13 1981-10-13 Storage circuit device of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56163008A JPS5864699A (en) 1981-10-13 1981-10-13 Storage circuit device of semiconductor

Publications (1)

Publication Number Publication Date
JPS5864699A true JPS5864699A (en) 1983-04-18

Family

ID=15765437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56163008A Pending JPS5864699A (en) 1981-10-13 1981-10-13 Storage circuit device of semiconductor

Country Status (1)

Country Link
JP (1) JPS5864699A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5787033A (en) * 1995-08-22 1998-07-28 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device with reduced probability of power consumption

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JPS5369551A (en) * 1976-12-03 1978-06-21 Toshiba Corp Memory unit

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JPS5369551A (en) * 1976-12-03 1978-06-21 Toshiba Corp Memory unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5787033A (en) * 1995-08-22 1998-07-28 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device with reduced probability of power consumption
CN1071489C (en) * 1995-08-22 2001-09-19 三菱电机株式会社 Semiconductor storing device

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