JPS5851932Y2 - Regulating device for gas flow path for gas absorption equipment - Google Patents

Description

[Detailed Description of the Invention] This invention relates to a regulating device for a gas flow path for a gas absorption device.

In an inert gas explosion-proof system that supplies inert gas such as carbon dioxide gas to the gas phase of an oil tanker, etc., for the purpose of explosion-proofing cargo oil tanks of oil tankers, this inert gas or from a boiler installed in the engine room of an oil tanker is used. It is advantageous to use the emitted combustion gas after desulfurization, dust removal, and cooling.

By the way, the boiler combustion gas usually contains impurities such as sulfur oxides and dust, and in order to remove these impurities, a gas absorption device such as a scrubber is usually installed in the gas pipe system. is provided.

This gas absorption device consists of a venturi that accelerates and releases combustion gas, a lower compartment that has a liquid reservoir where the gas blown out from the venturi is vaporized or atomized, and a gas that flows into the lower compartment through a through hole. Consisting of a spiral passage and a gas-liquid separation chamber for the gas coming out of the spiral passage, the combustion gas inlet at the upper end of the venturi and the gas passage in the lower compartment, the spiral passage in the middle compartment, and the gas-liquid separation chamber in the upper stage. A plurality of spray nozzles are arranged in multiple stages in each chamber, and fine droplets sprayed from the spray nozzles are scattered in opposition to the gas flow, and impurities in the combustion gas are removed by contact between the droplets and the gas. It is configured to be easy to use.

However, when the gas released from the venturi flows into the spiral passage from the lower compartment through the through hole,
There is a strong tendency that the water does not flow uniformly over the entire area of the through hole and is biased toward the inflow direction, and the plurality of spray nozzles provided at the upper part of the through hole contribute to only a portion of the absorption.

In other words, the high-speed gas flowing into the through hole causes uneven flow.
The contact efficiency between the droplets ejected from the spray nozzle and the gas decreases.

Further, since the droplets after spraying flow together with the gas flow to the spray nozzle group provided in the spiral passage, the effect of multistage parallel flow cannot be achieved.

This invention was made to solve the above problem, and in order to regulate the gas flow path that flows from the gas discharge end of the lower part of the venturi in the lower compartment via the liquid reservoir to the spiral passage in the middle compartment, A semi-circular partition plate is provided on the outside of the liquid reservoir, a gas passage is formed between this partition plate and the outer cylinder, and a plurality of horizontal spray nozzles are arranged in opposition to the circumferential gas flow of this gas passage. This provides a regulating device for a gas flow path for a gas absorption device in which droplets sprayed from a plurality of horizontal spray nozzles can come into contact with the entire gas flow area to improve absorption efficiency.

Examples of this invention will be described below based on the drawings.

FIG. 1 is a vertical side view of the gas absorption device, and FIG. 2 is a view taken along the line A-A in FIG.
This is an outer cylinder of a gas absorption device that is divided into three chambers in the vertical direction, and a venturi 4 is provided concentrically with this outer cylinder 1.

The upper end of the venturi 4 protrudes above the outer cylinder top plate 1A, and a combustion gas inlet 5 is formed at the top, and a horizontal spray nozzle 6 is attached to the peripheral wall.

The middle compartment 7 of the outer cylinder 1 is divided vertically into two parts by an intermediate partition plate 8.
Each compartment 9, 10 is provided with a spiral band plate 11, 12 to form a spiral passage 13, 14.

Through holes 15A, 15B, 16 are formed along the outer periphery of the lower partition plate 3 and the offshore partition plate 8, and the spiral passage 1 is formed by these through holes 15A, 15B, 16.
The starting portions 13A, 14A of 3.14 and the outermost passage 14B are communicated with the lower compartment 17.

and the outermost passages 13B, 1 of said spiral passages 13.14.
A plurality of collision type spray nozzles 18.19 are provided in the collision type spray nozzles 18.19, and impurities in the gas can be absorbed and removed by contact between the fine droplets sprayed from the collision type spray nozzles 18.19 and the gas.

Further, a liquid reservoir 20 is provided in the lower compartment 17, and the liquid reservoir 20 is opposed to the gas discharge end 21 of the venturi 4.

Gas discharge end 21 of the venturi 4 of the lower compartment 17
to the spiral passage 13 of the middle compartment 7 via the liquid reservoir 20.
In order to regulate the gas flow path flowing into the tank 14, a semicircular partition plate 22 is provided outside the liquid reservoir 20 along the gas flow, as shown in FIG. A gas passage 23 is formed between the through holes 15A and 15A.
, 15 B, 16 respectively through the spiral passage 13.1
4, a plurality of horizontal spray nozzles 24 are arranged at appropriate intervals in the circumferential direction of the gas passage 23, facing the gas flow.

The structure is such that droplets sprayed from the large number of horizontal spray nozzles 24 come into contact with the entire area of the gas flow and can efficiently absorb impurities in the gas.

Furthermore, a gas-liquid separation chamber 28 having a large number of slits 27 in the circumferential direction of the cylindrical wall 26 is formed in the upper compartment 25 of the outer cylinder 1 so as to surround the venturi 4. A plurality of downward spray nozzles 29 are provided in the circumferential direction of the plate 1A.

This gas-liquid separation chamber 28 communicates with the spiral passage end portions 13C and 14C via a through hole 30 formed in the center of the upper partition plate 2 and the offshore partition plate 8, and the outside of the gas-liquid separation chamber 28 is The annular passage 31 is connected to a processing gas discharge pipe 32 fixed to the outer cylinder 1.

This device has the above-mentioned configuration, and the gas released from the lower end of the bench lily 4 in the center of the outer cylinder 1 of the gas absorption device collides with the stored liquid in the liquid reservoir 20 provided in the lower compartment 17. This is then vaporized or atomized.

The flow direction of the gas is reversed by this collision, and the gas comes into contact with the vaporized or atomized liquid, so that the soot and sulfur dioxide that have not yet been removed are absorbed and removed.

Next, the gas released from the liquid reservoir 20 is introduced into the gas passage 23 while the gas flow direction is regulated by a semicircular partition plate 22 provided along the flow direction, and is arranged in the gas passage 23. Multiple horizontal spray nozzles 2
The impurities are absorbed and removed by contact with the droplets sprayed from step 4.

The gas flowing into the spiral passage 13.14 through the through holes 15A, 15B, and 16 of the middle compartment 7 is then discharged from the impingement type spray nozzle 18゜19 provided in the spiral passage 13.14. Sulfur dioxide gas is absorbed and removed by contact with the ejected fine droplets.

According to the present invention explained in the above embodiments, the flow direction of the high-speed gas released from the venturi in the center of the outer cylinder of the gas absorption device into the liquid reservoir in the lower compartment is regulated by the partition plate provided on the outside of the liquid reservoir. The gas is introduced into the gas passage while being in contact with droplets sprayed from multiple horizontal spray nozzles arranged in opposition to the gas flow, and absorbs and removes impurities contained in the combustion gas. Because of this structure, the high-speed gas flowing into the spiral passage of the middle compartment through the liquid reservoir does not cause drift as in the conventional case, and effectively contacts all the horizontal spray nozzles. can improve its absorption efficiency.

[Brief explanation of the drawing]

The drawings show an embodiment of this invention; FIG. 1 is a vertical side view of the gas absorption device, FIG. 2 is a sectional view taken along line A-A in FIG. 1, and FIG. It is a sectional view in the BB line. 1...Outer cylinder, 4...Venturi, 5.
... Combustion gas inlet section, 6, 24 ... Horizontal spray nozzle, 7 ... Middle compartment, 13.
14... spiral passage, 15 A, 15 B, 1
6゜30...Through hole, 17...Lower compartment, 18.19...Collision type spray nozzle, 2
0... Liquid reservoir, 22... Partition plate, 23.
...Gas passage, 25...Upper compartment, 2
8... Gas-liquid separation chamber, 29... Downward spray nozzle, 32... Processing gas discharge pipe.

Claims (1)

[Scope of utility model registration request] In a gas absorption device consisting of a venturi that accelerates combustion gas and releases it into the lower compartment, a spiral passage for the gas released from the venturi, and a gas-liquid separation chamber for the gas released from the spiral passage, A semi-circular partition plate is installed along the gas flow on the outside of the liquid reservoir facing the lower end of the venturi.
A gas flow path regulating device for a gas absorption device, which has a gas path formed between the partition plate and the outer cylinder.