JPS5851832B2 - thermal recording head - Google Patents

thermal recording head

Info

Publication number
JPS5851832B2
JPS5851832B2 JP51106080A JP10608076A JPS5851832B2 JP S5851832 B2 JPS5851832 B2 JP S5851832B2 JP 51106080 A JP51106080 A JP 51106080A JP 10608076 A JP10608076 A JP 10608076A JP S5851832 B2 JPS5851832 B2 JP S5851832B2
Authority
JP
Japan
Prior art keywords
thermal recording
recording head
heating resistor
wiring
insulating sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51106080A
Other languages
Japanese (ja)
Other versions
JPS5331143A (en
Inventor
清春 山下
辰行 富岡
孝道 服部
登 由上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP51106080A priority Critical patent/JPS5851832B2/en
Publication of JPS5331143A publication Critical patent/JPS5331143A/en
Publication of JPS5851832B2 publication Critical patent/JPS5851832B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads

Landscapes

  • Multi-Conductor Connections (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • Electronic Switches (AREA)

Abstract

PURPOSE:To compose a multi-layer wiring part on an insulator sheet containing plural openings with plural pieces of upper layer wiring provided in parallel to the heat generating resistance row and the lower wiring containing L-shaped electrode terminal connected to the heat generating resistor. In this way, the production can be facilitated with enhanced quality.

Description

【発明の詳細な説明】 本発明はファクシミリ等の情報記録装置に用いる熱記録
ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thermal recording head used in an information recording device such as a facsimile.

現在、フックジミリ等の情報記録装置の記録方式には通
電感熱記録、放電破壊記録、静電記録等の電気感応記録
方式や感熱記録方式等があるが、一次発色性を持つつ筐
り現像が不必要であるため装置を非常に小型化すること
ができることから、感熱記録方式が今後相当に使われる
ことが予想される。
At present, the recording methods of information recording devices such as Hook Jimiri include electrically sensitive recording methods such as current thermal recording, discharge breakdown recording, and electrostatic recording, as well as thermosensitive recording methods. It is expected that the thermal recording method will be used considerably in the future, since it is necessary to make the device very compact.

そこで感熱記録方式の従来例について説明する。Therefore, a conventional example of the thermal recording method will be explained.

感熱記録方式とは微少な抵抗発熱体を一列又はマトリク
ス状に配置した熱記録ヘッドに、加熱によって発色する
感熱紙を接触させ、前記ヘッドの特定の発熱抵抗体を選
択して通電発熱させ、感熱紙の特定部を加熱発色させる
ことによって電気的情報を視覚化するものである。
Thermal recording method is a thermal recording head in which minute resistance heating elements are arranged in a row or in a matrix, and a thermal paper that develops color when heated is brought into contact with the head, and specific heating resistors of the head are selected and energized to generate heat. Electrical information is visualized by heating and coloring specific parts of the paper.

熱記録ヘッドの制御には一般にマトリクス制御方式が使
われているが、ここで具体的な回路構成を図面に従って
説明する。
A matrix control method is generally used to control thermal recording heads, and a specific circuit configuration will be explained below with reference to the drawings.

第1図Aにおいて、2は発熱抵抗体であり、3は発熱抵
抗体2に流れる電流の逆流防止用のダイオードあるいは
トランジスタ等の方向性素子であり、1は発熱抵抗体2
を特定数ずつ1とめた電極端子であり、4は画信号端子
部5からの導体と発熱抵抗体2からの導体とを接続して
いる多層線部である。
In FIG. 1A, 2 is a heating resistor, 3 is a directional element such as a diode or transistor for preventing the backflow of current flowing through the heating resistor 2, and 1 is a heating resistor 2.
4 is a multilayer wire portion connecting the conductor from the image signal terminal portion 5 and the conductor from the heating resistor 2.

い1発熱抵抗体2をN個ずつ昔とめ、M個の区分に分け
たとすると電極端子1は0本となり、他方の端子はN本
の画信号端子部5に、他の区分からの導線と共通に接続
される。
If N 1 heat generating resistors 2 are stored in the past and divided into M sections, there will be 0 electrode terminals 1, and the other terminal will be connected to the N image signal terminals 5, with conductors from other sections. connected in common.

つ筐り一本の画信号端子はM個の発熱抵抗体と接続して
いることになる。
One image signal terminal per housing is connected to M heating resistors.

外部回路においては発熱抵抗体のドライバ回路をN個持
ち、それをM個スイッチング回路で切り換えることによ
りMXNのマトリクス制御が可能になる。
The external circuit has N driver circuits for heating resistors, and by switching them using M switching circuits, matrix control of MXN is possible.

な耘第1図Bのごとく、方向性素子3と発熱抵抗体2の
位置を入れ替えてもよい。
Alternatively, as shown in FIG. 1B, the positions of the directional element 3 and the heating resistor 2 may be interchanged.

上記のごとく熱記録ヘッドは回路的にはきわめて簡単に
構成されている。
As mentioned above, the thermal recording head has a very simple circuit structure.

しかし実際に製作するとなると必ずしも簡単ではない。However, actually producing it is not always easy.

なぜなら、ファクシミリの普及にともなって記録情報と
して最低1關当り4本の分解能が要求されるようになり
、l mvt当り4個の発熱素子を形成し駆動すること
が必要となってきた。
This is because, with the spread of facsimile, a resolution of at least four lines per unit has become required for recording information, and it has become necessary to form and drive four heating elements per l mvt.

このためフォトエツチングによる薄膜成形が唯一の方法
であり、しかも通常数百側以上を配列しなければならな
い。
For this reason, thin film formation by photoetching is the only method, and moreover, usually several hundred sides or more must be arranged.

そのためかなり高度な技術を要する。Therefore, quite advanced technology is required.

一般に第1図のように構成される回路を薄膜成形してマ
トリクス制御する場合、多層配線が必要となる。
Generally, when a circuit configured as shown in FIG. 1 is formed into a thin film and controlled in a matrix, multilayer wiring is required.

ところが多層配線の上下2層の導体のうち1層は熱記録
ヘッドの全長と同程度の長さに達するため、薄膜では抵
抗値が高くなシ、この抵抗が発熱抵抗体と直列に入るの
で、導体内での電圧降下を生じ、発熱抵抗体を正常に発
熱させることが困難となり必要な記録品質を得ることが
できない。
However, one of the upper and lower conductor layers of the multilayer wiring reaches a length comparable to the total length of the thermal recording head, so a thin film has a high resistance value, and this resistance is in series with the heating resistor. A voltage drop occurs within the conductor, making it difficult to cause the heating resistor to generate heat normally, making it impossible to obtain the necessary recording quality.

ここで薄膜導体は腐食等に対する信頼性及び接着容易性
のために金が用いられているのだが、抵抗値を下げるた
めに金を厚くするとエツチングが困難となるのみならず
、コストが高くつくので薄膜導体のシート抵抗値を10
m、2層口以下にすることはむずかしく、そのために画
質に少なからず影響をあたえる。
Here, gold is used for the thin film conductor for its reliability against corrosion and ease of adhesion, but if the gold is made thicker to lower the resistance value, it will not only be difficult to etch but also be expensive. The sheet resistance value of the thin film conductor is 10
It is difficult to reduce the number of layers to less than 2 m, which has a considerable effect on image quality.

また薄膜の絶縁層はピンホールが原因の上下導体間のシ
ョートが多く、歩留ジがきわめて悪い。
In addition, the thin insulating layer has many short circuits between the upper and lower conductors due to pinholes, resulting in extremely low yield.

本発明は感熱記録方式の実用比と上記従来技術に鑑み、
十分な品質をもつ記録を提供し、製作容易で生産時の歩
ど筐りを向上できる構成の熱記録ヘッドを提供するもの
である。
The present invention has been made in view of the practicality of the thermal recording method and the above-mentioned conventional technology.
To provide a thermal recording head having a structure that provides recording with sufficient quality, is easy to manufacture, and can improve production efficiency.

以下本発明の一実施例を回向にもとすいて説明する。Hereinafter, one embodiment of the present invention will be explained in detail.

第2図は本発明の熱記録ヘッドの拡大平面図である。FIG. 2 is an enlarged plan view of the thermal recording head of the present invention.

13は発熱抵抗体であシ、14は発熱抵抗体を流れる電
流の逆流を防ぐためのダイオード・トランジスタ等の一
方向性素子部、12は発熱抵抗体13を特定数ずつ1と
めた電極端子、6はアルミナ基板である。
13 is a heat generating resistor; 14 is a unidirectional element such as a diode or transistor for preventing the current flowing through the heat generating resistor from flowing backward; 12 is an electrode terminal in which a specific number of heat generating resistors 13 are connected; 6 is an alumina substrate.

7はアル□す基板上に周辺部を残した全面に印刷焼成さ
れ表面の荒さが250A以下の平滑性に優れたブレース
面であり一般には1100℃以上の温度で焼成すること
によす得られる。
7 is a brace surface with excellent smoothness, which is printed and fired on the entire surface of the aluminum substrate except for the peripheral area, and has a surface roughness of 250A or less, and is generally obtained by firing at a temperature of 1100℃ or higher. .

8はスリット10を有するポリイ□ドまたはポリエステ
ルフィルムから成る絶縁シート、9は絶縁シート8上に
接着された厚み35μの銅箔導体である。
8 is an insulating sheet made of polyamide or polyester film having slits 10, and 9 is a copper foil conductor with a thickness of 35 μm bonded onto the insulating sheet 8.

15は多層配線部であう。L字形の下層配線11と銅箔
導体から成る上層配線9とから成っている。
15 is a multilayer wiring section. It consists of an L-shaped lower layer wiring 11 and an upper layer wiring 9 made of a copper foil conductor.

第3図は多層配線部の上層配線となるフィルムリードの
平面固転よび側断面図である。
FIG. 3 is a plan view and a side cross-sectional view of a film lead that becomes the upper layer wiring of the multilayer wiring part.

8は絶縁シート、9は銅箔導体、10はスリット、16
は組立時の固定および位置合せ用の孔である。
8 is an insulating sheet, 9 is a copper foil conductor, 10 is a slit, 16
are holes for fixing and positioning during assembly.

第2図においてブレースされたセラミック基板6I/c
、ケイ素(Si )やタンタル(Ta)等の発熱抵抗体
13と、クロム(Cr)や金(Au)等の導体を薄膜技
術で形成後、フォトエツチング技術で共通端子部12、
発熱抵抗体部13および多層配線部4の薄膜下層配線1
1を形成すの。
Braced ceramic substrate 6I/c in FIG.
After forming a heating resistor 13 such as silicon (Si) or tantalum (Ta) and a conductor such as chromium (Cr) or gold (Au) using thin film technology, the common terminal portion 12 is formed using photoetching technology.
Thin film lower wiring 1 of heating resistor section 13 and multilayer wiring section 4
Form 1.

このとき下層配線11をL字形にし5発熱抵抗体13の
配列と平行になっている部分の電極間ピッチ及び電極幅
を上層配線に合わせて大きくしておく。
At this time, the lower layer wiring 11 is made into an L-shape, and the inter-electrode pitch and electrode width of the portion parallel to the arrangement of the five heating resistors 13 are made large to match the upper layer wiring.

次に耐摩耗膜として炭化ケイ素(SiC)等をスパッタ
リング等の方法により発熱抵抗体部13の近傍に形成し
た後、1チップKN個(第2図の場合6個)のダイオー
ドを含むチップをミニモツド等の方法によりボンディン
グし、方向性素子部14を形成する。
Next, silicon carbide (SiC) or the like is formed as a wear-resistant film near the heating resistor section 13 by a method such as sputtering, and then a chip containing KN diodes (6 in the case of Fig. 2) per chip is assembled into a minimod. The directional element portion 14 is formed by bonding using a method such as the above.

次に本発明の特徴とする多層配線部について説明する。Next, the multilayer wiring section, which is a feature of the present invention, will be explained.

多層配線部15は第3図の如きフィルムリードを別に準
備して、それを前記セラミック基板の薄膜下層配線部に
付けることによって熱記録ヘッドが形成される。
For the multilayer wiring section 15, a thermal recording head is formed by separately preparing a film lead as shown in FIG. 3 and attaching it to the thin film lower layer wiring section of the ceramic substrate.

フィルムリードは厚み50μのポリイミドフィルム8上
に一定間隔でスリット10を設け、厚み35μの銅箔を
接着し、フォトエツチング技術によりN本のストライプ
状電極を形成し、更にスリット10で露出された部分に
錫あるいはハンダメッキをほどこしておく。
For the film lead, slits 10 are formed at regular intervals on a polyimide film 8 with a thickness of 50μ, a copper foil with a thickness of 35μ is adhered, N striped electrodes are formed using photoetching technology, and the portions exposed by the slits 10 are formed. Apply tin or solder plating to the surface.

この様な厚み35μ程度の銅箔ストライプ状電極の電極
間ピッチは、薄膜技術による場合のように小さくするこ
とは困難である。
It is difficult to reduce the inter-electrode pitch of such copper foil striped electrodes having a thickness of about 35 μm as in the case of thin film technology.

したがって薄膜下層配線はL字型にして、上層銅箔配@
に、合わせて電極間ピッチおよび電極幅は広げである。
Therefore, the thin film lower layer wiring should be L-shaped, and the upper layer copper foil wiring @
In addition, the pitch between the electrodes and the width of the electrodes are widened accordingly.

今、前記フイルムリードを銅箔電極を上側にして、すな
わちポリイミドフィルムを電気絶縁としてセラミック上
の薄膜下層電極と銅箔上層電極の間にはさんだ形で七う
□ンク基板上に位置合わせして置く。
Now, position the film lead on the 7-inch board with the copper foil electrode facing upward, that is, with the polyimide film as an electrical insulator sandwiched between the thin film lower layer electrode on the ceramic and the copper foil upper layer electrode. put.

位置合せおよび固定は絶縁シート上の孔16を利用して
ピンの立った組立治具を用いる。
For positioning and fixing, an assembly jig with pins is used using the holes 16 on the insulating sheet.

すなわち組立治具のピンに絶縁シート上の孔16をはめ
込み絶縁シートを張る。
That is, the holes 16 on the insulating sheet are fitted into the pins of the assembly jig, and the insulating sheet is stretched.

その絶縁シートの下に薄膜下層配線をほどこしたセラミ
ック基板を挿入する。
A ceramic substrate with thin-film lower layer wiring is inserted under the insulating sheet.

このときセラミック基板上の薄膜下層配線と絶縁シート
上の銅箔上層配線はスリット10部分で絶縁シートの厚
み分50μだけ浮いた状態になっている。
At this time, the thin film lower layer wiring on the ceramic substrate and the copper foil upper layer wiring on the insulating sheet are in a state where they are floating at the slit 10 portion by 50 μm, which is the thickness of the insulating sheet.

ただし第3間断面図Bのごとくスリット10部分で銅箔
9をへこ1せてもよい。
However, as shown in the third sectional view B, the copper foil 9 may be dented at the slit 10 portion.

この状態でスリット10に、は筐り込むようなツールで
スリット10部分の銅箔上層配線を薄膜下層配線に接す
る筐で押えつけ、ツールにパルス電流を流して加熱する
In this state, a tool that fits into the slit 10 is used to press the copper foil upper layer wiring in the slit 10 portion with the casing that is in contact with the thin film lower layer wiring, and a pulse current is passed through the tool to heat it.

今、薄膜下層配線としてクロム・全構造で銅箔上層配線
の銅表面に錫メッキをしておくと、ツールを500℃程
度に加熱することにより。
Now, if the copper surface of the copper foil upper layer wiring is plated with chromium as the thin film lower layer wiring and tin is applied to the entire structure, then by heating the tool to about 500 degrees Celsius.

金と錫の合金化が起り、銅箔上層配線と薄膜下層配線が
接続される。
Alloying of gold and tin occurs, and the copper foil upper layer wiring and thin film lower layer wiring are connected.

この場合、スリットを横切るN本の配線(第2図の場合
6本)は同時にボンディングされる。
In this case, N wires (six wires in FIG. 2) crossing the slit are bonded at the same time.

このようなボンディングをスリットの数すなわちM回く
り返し、多層配線の接続を終了する。
Such bonding is repeated for the number of slits, that is, M times, to complete the connection of the multilayer wiring.

この接続により、N本の画信号端子が得られる。This connection provides N image signal terminals.

N本の画信号端子は第2図の多層配線用フィルムをその
まま延長してもよいが、いったん多層配線用は多層配線
用としてセラミック基板上で打ち切り、別のフレキシブ
ルフラットケーブルをセラミック基板端部で薄膜下層配
線と接続させてもよい。
For the N picture signal terminals, the multilayer wiring film shown in Figure 2 may be extended as is, but the multilayer wiring film should be cut off on the ceramic board, and another flexible flat cable should be connected to the edge of the ceramic board. It may also be connected to thin film lower layer wiring.

以上説明したように、本発明の熱記録ヘッドにおいて、
多層配線部を複数個のスリットを有する絶縁シート上に
発熱抵抗体列と平行で前記スリットを横切って設けられ
た複数本の上層配線と、発熱抵抗体に接続する電極端子
をL字型にした下層配線とで構成し、下層配線の発熱抵
抗体列と平行の電極部と上層配線とを絶縁シートの開口
部において接続するものであり、多層配線部の構成がき
わめて製作容易である。
As explained above, in the thermal recording head of the present invention,
The multilayer wiring part is formed by having a plurality of upper layer wirings provided on an insulating sheet having a plurality of slits, parallel to the heating resistor row and across the slits, and an L-shaped electrode terminal connected to the heating resistor. The electrode section parallel to the heating resistor array of the lower layer wiring is connected to the upper layer wiring through the opening of the insulating sheet, and the structure of the multilayer wiring section is extremely easy to manufacture.

すなわち共通端子部の数をM=24、画信号端子部の数
をN−32とすると、本来24X32=768箇所のボ
ンディングをしなければならないが、本発明の熱記録ヘ
ッドでは1回の位置合せと24回のボンディングですべ
て終了する。
In other words, if the number of common terminal sections is M = 24 and the number of image signal terminal sections is N-32, bonding would normally have to be done at 24 x 32 = 768 locations, but with the thermal recording head of the present invention, bonding can be performed only once. It all ends with 24 bondings.

また薄膜下層配線と銅箔上層配線間の絶縁物として、厚
み50μ程度のポリイミドフィルム又はポリエステルフ
ィルムを用いているので、薄膜絶縁物の場合、よく起こ
るピンホールによる絶縁不良はほとんどなくなり、した
がってそのための絶縁不良による歩留り低下はほとんど
無くなる。
In addition, since a polyimide film or polyester film with a thickness of about 50 μm is used as the insulator between the thin film lower layer wiring and the copper foil upper layer wiring, insulation defects due to pinholes, which often occur with thin film insulators, are almost eliminated. Yield deterioration due to poor insulation is almost eliminated.

さらに、発熱抵抗体の列の長さと同等又はそれ以上の長
さを必要とする配線は、配線部分の電気抵抗が問題とな
るが、その部分を本発明のごとく厚み35μ、幅160
μの銅箔で配線を行なうとその部分の電気抵抗は発熱抵
抗体の抵抗値に対して無視できる。
Furthermore, for wiring that requires a length equal to or longer than the length of the row of heat-generating resistors, the electrical resistance of the wiring portion becomes a problem, but as in the present invention, that portion has a thickness of 35 μm and a width of 160 μm.
If the wiring is done using μ copper foil, the electrical resistance of that part can be ignored compared to the resistance value of the heating resistor.

そのため発熱抵抗体に十分な電圧を加えることができ、
必要な記録品質を得ることができる。
Therefore, sufficient voltage can be applied to the heating resistor,
The necessary recording quality can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図A、Bは共に発熱抵抗体を一列に配置した熱記録
ヘッドの配線図、第2図は本発明の熱記録ヘッドの一実
施例を示す平面図、第3図A、Bは各々多層配線部の上
層配線用フィルムリードの平面図および断面図である。 1.12・・・・・・電極端子、2,13・・・・・・
発熱抵抗体、3,14・・・・・・方向性半導体素子、
4,15・・・・・・多層配線部、6・・・・・・アル
ミナ基板、7・・・・・・グレーズ層、8・・・・・・
絶縁シート、9・・・・・・銅箔上層配線、10・・・
・・・開口部(スリン))、16・・・・・・組立時の
固定及び位置合せ用の孔。
1A and 1B are wiring diagrams of a thermal recording head in which heating resistors are arranged in a row, FIG. 2 is a plan view showing an embodiment of the thermal recording head of the present invention, and FIGS. 3A and 3B are respectively FIG. 3 is a plan view and a cross-sectional view of a film lead for upper layer wiring of a multilayer wiring section. 1.12... Electrode terminal, 2,13...
heating resistor, 3, 14... directional semiconductor element,
4, 15...Multilayer wiring section, 6...Alumina substrate, 7...Glaze layer, 8...
Insulating sheet, 9... Copper foil upper layer wiring, 10...
...Opening (Surin)), 16...Hole for fixing and positioning during assembly.

Claims (1)

【特許請求の範囲】 1 絶縁基板上に一列に配列された複数個の発熱抵抗体
群と、前記発熱抵抗体と接続される一方向性半導体素子
群と、前記発熱抵抗体を数群にわけ各群毎に前記発熱抵
抗体の一方の端子を共通接続した共通端子部と、前記一
方向性半導体素子の他端に接続される長さの異なるL字
型導線と、このL字型導線をマトリクス状続する配線部
とを具備し、前記配線部を複数個の開口部を有する絶縁
シート上VC@記発熱抵抗体列と平行に設けた複数本の
マトリクス配線用導体で構成し、前記絶縁シートの開口
部において、前記り字型導線と前記マトリクス配線用導
体を接続することを特徴とする熱記録ヘッド。 2、特許請求の範囲第1項において、前記マトリクス配
線用導体の各々は開口部に釦いても連続して絶縁シート
に形成していることを特徴とする熱記録ヘッド。 3 特許請求の範囲第1項または第2項において前記絶
縁シートはポリエステルフィルムもしくはポリイミドフ
ィルムであることを特徴とする熱記録ヘッド。
[Scope of Claims] 1. A plurality of heating resistor groups arranged in a row on an insulating substrate, a unidirectional semiconductor element group connected to the heating resistors, and the heating resistors divided into several groups. A common terminal portion in which one terminal of the heating resistor is commonly connected for each group, an L-shaped conducting wire of different lengths connected to the other end of the unidirectional semiconductor element, and this L-shaped conducting wire. a wiring section connected in a matrix, the wiring section being constituted by a plurality of matrix wiring conductors provided on an insulating sheet having a plurality of openings in parallel with the heating resistor rows, and the insulating 1. A thermal recording head, wherein the cross-shaped conductive wire and the matrix wiring conductor are connected at an opening in the sheet. 2. The thermal recording head according to claim 1, wherein each of the matrix wiring conductors is formed continuously on an insulating sheet even when a button is placed in the opening. 3. A thermal recording head according to claim 1 or 2, wherein the insulating sheet is a polyester film or a polyimide film.
JP51106080A 1976-09-03 1976-09-03 thermal recording head Expired JPS5851832B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51106080A JPS5851832B2 (en) 1976-09-03 1976-09-03 thermal recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51106080A JPS5851832B2 (en) 1976-09-03 1976-09-03 thermal recording head

Publications (2)

Publication Number Publication Date
JPS5331143A JPS5331143A (en) 1978-03-24
JPS5851832B2 true JPS5851832B2 (en) 1983-11-18

Family

ID=14424588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51106080A Expired JPS5851832B2 (en) 1976-09-03 1976-09-03 thermal recording head

Country Status (1)

Country Link
JP (1) JPS5851832B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953875B2 (en) * 1978-06-14 1984-12-27 株式会社東芝 thermal recording head
JPS5979776A (en) * 1982-10-29 1984-05-09 Toshiba Corp Thermal head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5419876Y2 (en) * 1974-04-24 1979-07-20

Also Published As

Publication number Publication date
JPS5331143A (en) 1978-03-24

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