JPS5851163A - Multi-nozzle plate for liquid jet and manufacture thereof - Google Patents
Multi-nozzle plate for liquid jet and manufacture thereofInfo
- Publication number
- JPS5851163A JPS5851163A JP14982981A JP14982981A JPS5851163A JP S5851163 A JPS5851163 A JP S5851163A JP 14982981 A JP14982981 A JP 14982981A JP 14982981 A JP14982981 A JP 14982981A JP S5851163 A JPS5851163 A JP S5851163A
- Authority
- JP
- Japan
- Prior art keywords
- grooves
- nozzle plate
- nozzle
- substrate
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000005530 etching Methods 0.000 claims abstract description 8
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000013078 crystal Substances 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000003672 processing method Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 238000005323 electroforming Methods 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、マルチノズルインクジェット記録装置等の液
体噴射装置において使用するのに好適なマルチノズルプ
レート及びその製造方法に係り、特に一方の面に複数本
の■溝を異方性エツチングを利用して形成し、斯様にし
てV溝が形成された基板を2枚該■溝を対向して接合す
るようにし、もって、高密度配列可能なマルチノズルプ
レートを生産性よく、かつ、安価に提供できるようにし
たものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multi-nozzle plate suitable for use in a liquid ejecting device such as a multi-nozzle inkjet recording device and a method for manufacturing the same. By using directional etching, two substrates with V-grooves formed in this way are bonded with the grooves facing each other, thereby producing a multi-nozzle plate that can be arranged in high density with high productivity. , and can be provided at low cost.
マルチノズルインクジェット記録装置等の液体噴射装置
においては、周知のように、多数個のインクジェット噴
射ノズル孔を有するマルチノズルプレートが使用される
が、このマルチノズルプレートの製造方法として、従来
より、
(す、化学エツチングによるマルチノズル加工法。As is well known, in a liquid ejecting device such as a multi-nozzle inkjet recording device, a multi-nozzle plate having a large number of inkjet ejection nozzle holes is used. , a multi-nozzle processing method using chemical etching.
(2)、エレクトロフォーミングによるマルチノズル加
工法1゜
(3)、マイクロドリルによるマルチノズル加工法。(2), Multi-nozzle processing method using electroforming 1゜(3), Multi-nozzle processing method using micro drill.
等が提案されている。しかし、
(りの化学エツチングによって金属板にノズル孔をあけ
る方法は、
■、ノズル径と同程度の厚さの金属板にしか加工できず
、ノズルプレートの機械的強度が不足する。etc. have been proposed. However, the method of drilling nozzle holes in a metal plate by chemical etching (1) can only process a metal plate with a thickness comparable to the nozzle diameter, and the mechanical strength of the nozzle plate is insufficient.
■、ノズル断面が第1図に示すように摺鉢状になり、ノ
ズル孔径のコントロールが難かしい。(2) The cross section of the nozzle becomes mortar-shaped as shown in FIG. 1, making it difficult to control the nozzle hole diameter.
等の欠点があり゛、
(2)のエレクトロフォーミンクによる加工方法は、■
、ノズル内壁がさらさらしている。There are drawbacks such as (2) electroforming processing method,
, the inner wall of the nozzle is loose.
■、できたノズルプレー1・に、第2図に示すように電
着歪が残っている。(2) The formed nozzle play 1 still has some electrodeposition distortion as shown in FIG.
■、できたノズルプレー1・は薄状で°、機械的強度が
ない。■The resulting nozzle play 1 is thin and lacks mechanical strength.
等の欠点があり、また、
(3)のマイクロトリルによる加工方法は、■、ノズル
孔を1個ずつあけていくため、生産性が悪い。In addition, the microtrill processing method (3) has poor productivity because the nozzle holes are drilled one by one.
■、マイクロトリルの消耗が撤しく、コスI・高になる
。■, Microtrill consumption is eliminated, resulting in high cost.
等の欠点があった。There were other drawbacks.
本発明は、上述のごとき従来技術の欠点を解消するため
になされたもので、以下、図面を参照しながら詳細に説
明する。The present invention has been made to eliminate the drawbacks of the prior art as described above, and will be described in detail below with reference to the drawings.
第:3図乃至第5図は、本発明によるマルチノズルプレ
−1・の製造方法の一例を説明するための工程図で、最
初、第3図に示すように、一方の面に複数本のV溝が形
成された基板10を準備する。この基板10としては、
例えば、Sl、GaAs 等の半導体を利用するが、
これは必すしも半導体材料に限定されるものではなく、
金属の単結晶を利用してもよい。また、溝の形成は、(
100)面から異方性エツチングをすることによって両
壁面が(111)面に囲まれた寸法精度のよいV字形の
溝か得られる。なお、異方性エツチングの技術は周知で
あるので、ここでは詳しい工程の説明は省略するが、異
方性エッチャントとじては、Sl 基板に対してはN
H2(CH2)2NH2、C6H4(O)」)2、H2
Oの混液(A P Wエツチング液)を、また、0aA
s 基板に対してはNI4.OH、、、、H2O2、H
2Oの混液を用いるとよい。次いで、上述のようにして
■樹が形成された基板10を第4図に示すように該V溝
を対向して接合する。この接合方法としては、エポキシ
系接着剤を利用する方法、静電接合する方法等種々考え
られるが、いずれにせよ、最後にノズル孔となるべき溝
をつぶさないように注意する必要がある。次いで、上述
のようにして接合された基板を第5図に示すようにV溝
に対して直角方向にスライスしてマルチノズルプレート
20を完成する。第6図は、上述のようにして製作され
たマルチノズルプレ−1・の拡大正面図で、ノズル孔の
形状は図示のように(100)面と(111)面のなす
角度θが54・tで規定されたV溝を対向させてできた
菱形となる。3 to 5 are process diagrams for explaining an example of the method for manufacturing the multi-nozzle plate 1 according to the present invention. Initially, as shown in FIG. A substrate 10 in which a V-groove is formed is prepared. As this substrate 10,
For example, semiconductors such as Sl and GaAs are used,
This is not necessarily limited to semiconductor materials;
A metal single crystal may also be used. In addition, the formation of the groove is (
By performing anisotropic etching from the (100) plane, a V-shaped groove with good dimensional accuracy, with both wall surfaces surrounded by (111) planes, can be obtained. Since the anisotropic etching technique is well known, a detailed explanation of the process will be omitted here, but as an anisotropic etchant, N
H2(CH2)2NH2, C6H4(O)'')2, H2
A mixed solution of O (APW etching solution) was also added to 0aA
s substrate is NI4. OH,,,,H2O2,H
It is preferable to use a mixture of 2O. Next, the substrate 10 on which the V-shaped grooves have been formed as described above is bonded with the V-grooves facing each other, as shown in FIG. Various bonding methods can be considered, such as a method using an epoxy adhesive or an electrostatic bonding method, but in any case, care must be taken not to crush the groove that is to become the nozzle hole. Next, the substrates bonded as described above are sliced in a direction perpendicular to the V-groove as shown in FIG. 5 to complete the multi-nozzle plate 20. FIG. 6 is an enlarged front view of the multi-nozzle plate 1 manufactured as described above, and the shape of the nozzle hole is such that the angle θ between the (100) plane and the (111) plane is 54 mm. A diamond shape is formed by opposing the V grooves defined by t.
以上の説明から明らかなように、本発明によると、高密
度配列可能で、かつ、寸法精度、噴射方向精度に優れた
マルチノズルプレ−1・を安価に提供することができる
。As is clear from the above description, according to the present invention, a multi-nozzle plate 1 that can be arranged in high density and has excellent dimensional accuracy and jet direction accuracy can be provided at a low cost.
第1図は、金属板にエツチングによってノズル孔を形成
した場合の断面図、第2図は、エレクトロフォーミンク
の断面図、第3図乃至第5図は、本発明によるマルチノ
ズルプレートの製造工程の一例を説明するための余[桿
図、第6図は、本発明によるマルチノズルプレー1・の
拡大正面図である。
10・・V溝が形成された基板、20・・・マルチノズ
ルプレ−1・。FIG. 1 is a sectional view of nozzle holes formed in a metal plate by etching, FIG. 2 is a sectional view of electroforming, and FIGS. 3 to 5 are manufacturing steps of a multi-nozzle plate according to the present invention. FIG. 6 is an enlarged front view of the multi-nozzle play 1 according to the present invention. 10... Substrate in which a V groove is formed, 20... Multi-nozzle play-1.
Claims (2)
向して接合されていることを特徴とする液体噴射装置の
マルチノズルプレート。(1) A multi-nozzle plate for a liquid ejecting device, characterized in that two substrates each having a plurality of square grooves are joined with the V grooves facing each other.
用して形成し、次いで、前記基板を前記■溝を対向して
接合し、この接合された基板を前記V溝に対して直角方
向にスライスしたことを特徴とする液体噴射装置のマル
チノズルプレート製造方法。(2) Form a plurality of grooves on the substrate using anisotropic etching, then bond the substrate with the grooves facing each other, and place the bonded substrate against the V-groove. A method for manufacturing a multi-nozzle plate for a liquid injection device, characterized in that the plate is sliced in a right angle direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14982981A JPS5851163A (en) | 1981-09-21 | 1981-09-21 | Multi-nozzle plate for liquid jet and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14982981A JPS5851163A (en) | 1981-09-21 | 1981-09-21 | Multi-nozzle plate for liquid jet and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5851163A true JPS5851163A (en) | 1983-03-25 |
Family
ID=15483581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14982981A Pending JPS5851163A (en) | 1981-09-21 | 1981-09-21 | Multi-nozzle plate for liquid jet and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5851163A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6032673A (en) * | 1983-08-03 | 1985-02-19 | Seiko Epson Corp | Preparation of ink jet head |
-
1981
- 1981-09-21 JP JP14982981A patent/JPS5851163A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6032673A (en) * | 1983-08-03 | 1985-02-19 | Seiko Epson Corp | Preparation of ink jet head |
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