JPS5847216B2 - Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro - Google Patents

Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro

Info

Publication number
JPS5847216B2
JPS5847216B2 JP8916675A JP8916675A JPS5847216B2 JP S5847216 B2 JPS5847216 B2 JP S5847216B2 JP 8916675 A JP8916675 A JP 8916675A JP 8916675 A JP8916675 A JP 8916675A JP S5847216 B2 JPS5847216 B2 JP S5847216B2
Authority
JP
Japan
Prior art keywords
gas
reactor
cyclone
fluidized bed
distribution plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8916675A
Other languages
Japanese (ja)
Other versions
JPS5213476A (en
Inventor
俊樹 古江
達雄 村高
虔治 有崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Power Ltd
Original Assignee
Babcock Hitachi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Babcock Hitachi KK filed Critical Babcock Hitachi KK
Priority to JP8916675A priority Critical patent/JPS5847216B2/en
Publication of JPS5213476A publication Critical patent/JPS5213476A/en
Publication of JPS5847216B2 publication Critical patent/JPS5847216B2/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/44Fluidisation grids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
  • Gasification And Melting Of Waste (AREA)

Description

【発明の詳細な説明】 この発明は直列多段流動層を用いた粉鉄鉱石の還元反応
炉の構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the structure of a reduction reactor for fine iron ore using serial multi-stage fluidized beds.

反応炉で直列多段流動層を使用するものにおいては、ガ
スの均一な分散を目的として分散板下部に風箱を設け、
かつ分散板抵抗を充分にとるために多数の小さな孔を有
する分散板を用いるのが通常である。
In reactors that use serial multi-stage fluidized beds, a wind box is installed at the bottom of the dispersion plate for the purpose of uniformly dispersing the gas.
In addition, in order to obtain a sufficient distribution plate resistance, a distribution plate having a large number of small holes is usually used.

しかし粉鉄鉱石のごとき高温(800〜900℃)下で
操業を必要とするものにおいては、特に分散板に粒子の
焼結成長、微粉の付着、蓄積を生じやすく、均質な流動
と非流動部分のない構造とする必要がある。
However, in products that require operation at high temperatures (800 to 900°C), such as powdered iron ore, sintering and growth of particles, adhesion, and accumulation of fine powder occur particularly on the dispersion plate, causing homogeneous flow and non-flow parts. It is necessary to have a structure without

しかし従来の分散板では粒子の焼結などにより長期連続
運転をすることができなかった。
However, with conventional dispersion plates, long-term continuous operation was not possible due to sintering of particles.

この現象を観察するに、第1の問題である粒子の焼結成
長は多孔型もしくはバブルキャップ型の一般ガス分散板
においてはガス分散板上面のガス流に対して死角にある
非流動帯、所謂デッドスペースができることが原因で、
この部を足掛りに焼結が促進され流動層の安全運転を困
難としているものである。
Observing this phenomenon, the first problem, the sintering growth of particles, is caused by the so-called non-flow zone, which is a blind area to the gas flow on the top surface of the gas distribution plate, in a porous or bubble cap type general gas distribution plate. This is due to the creation of dead space.
Sintering is promoted using this part as a foothold, making safe operation of the fluidized bed difficult.

第2の問題として微粉のガス流路側壁への付着蓄積があ
る。
A second problem is the accumulation of fine particles on the side walls of the gas flow path.

これは微粉を伴うガス流れにおいてガス流路が滑かな形
状でないとき、もしくはガス流れの急角度変針などのと
きにガス流路に淀み部を生じ、同時にこの部には渦流が
でき、流路壁には微粉が付着し戊長し、これがさらに新
たな小渦流を生ぜしめ微粉の付着蓄積を促進するもので
ある。
This is because when a gas flow with fine powder is not smooth, or when the gas flow changes direction sharply, a stagnation area is created in the gas flow path, and at the same time, a vortex is created in this area, causing the wall of the flow path to stagnate. Fine powder adheres to and elongates, which further generates new small eddy currents and promotes the adhesion and accumulation of fine powder.

この発明はこのような現象に着目し、上記の欠点を除い
たガス分散装置を提案するものである。
The present invention focuses on such a phenomenon and proposes a gas dispersion device that eliminates the above-mentioned drawbacks.

この発明は前記第1の問題点解決のため、三角、もしく
は四角、または六角の柱状の単位ブロック2をもってガ
ス分散板5の構成要素たらしめるものである。
In order to solve the first problem, the present invention uses triangular, square, or hexagonal columnar unit blocks 2 as constituent elements of the gas distribution plate 5.

単位ブロック2は第1図第2図に示すごとく外形は柱状
体で、底面側には、小径の円筒状ガス導入通路3aを設
け、これに倒立截頭角錐状の通路の頂部を接続させ拡散
通路3を構成せしめるものである。
As shown in Figs. 1 and 2, the unit block 2 has a columnar outer shape, and a small diameter cylindrical gas introduction passage 3a is provided on the bottom side, and the top of the inverted truncated pyramid-shaped passage is connected to this for diffusion. This constitutes the passage 3.

角錐の斜面数は単位ブロック2の外形をなす角柱の側面
数と数を同じくシ、単位ブロック2の上面では陵線4を
構成するようにする。
The number of slopes of the pyramid is the same as the number of sides of the prisms forming the outer shape of the unit block 2, and the upper surface of the unit block 2 forms a ridge line 4.

図示例は六角柱状の単位ブロックを示すが、六角はもつ
とも円に近く、単位ブロックの複数1固をよせあつめて
任意の形状の板を構成することが容易であり、単位ブロ
ックとしては六角柱状体とすることが望ましい。
The illustrated example shows a hexagonal columnar unit block, but a hexagon is close to a circle, and it is easy to assemble a plurality of unit blocks to form a plate of any shape. It is desirable to do so.

この単位ブロック2に、11固ごとにサイクロン14を
接続させ単位ガス分散体1を構成させるものである。
A unit gas dispersion element 1 is constructed by connecting a cyclone 14 every 11 blocks to this unit block 2.

ついでこの単位ガス分散体1の複数岡を集合させてガス
分散板5を形成させるときは、このガス分散板5の上面
は六角形の陵線の集合となり、陵線により所謂蜂巣状の
外観を呈するものである。
Next, when the gas distribution plate 5 is formed by assembling a plurality of units of the unit gas dispersion element 1, the upper surface of the gas distribution plate 5 becomes a collection of hexagonal ridge lines, and the ridge lines give a so-called honeycomb-like appearance. It is intended to be presented.

なおガス分散板5を円板状にするときは周辺に充填ブロ
ック6を必要とする。
Note that when the gas distribution plate 5 is made into a disk shape, a filling block 6 is required around the periphery.

このようなガス分散板5においては所謂デッドスペース
を生ずることがなく粒子の焼結はない。
In such a gas distribution plate 5, there is no so-called dead space and no particles are sintered.

第2の問題については前記のサイクロン14をガス導入
口3aと接続するので、単位ブロック2に入ってくる高
温ガス中の微分は、前記サイクロン14でその大部分が
除去されているので、含じん量は少く従ってガス導入口
33等に微粉の付着する機会は少くなり、さらにサイク
ロンで除去できなや)つたガス中の微粉も上段反応器内
の流動層で捕集されるので微粉の付着成長はなく装置の
連続運転に支障を生ずることはない。
Regarding the second problem, since the cyclone 14 is connected to the gas inlet 3a, most of the differential in the high-temperature gas entering the unit block 2 is removed by the cyclone 14, so no dust is included. The amount is small, so there is less opportunity for fine powder to adhere to the gas inlet 33, etc., and furthermore, the fine powder in the gas that cannot be removed by a cyclone is also collected in the fluidized bed in the upper reactor, so the fine powder adheres and grows. There is no problem with continuous operation of the equipment.

この発明にかかるガス分散板5を有する反応炉の一実施
例を第7図により説明する。
An embodiment of a reactor having a gas distribution plate 5 according to the present invention will be described with reference to FIG.

反応器7は上段反応器8と下段反応器9とよりなり、粉
鉱石は粉鉱石人口10より上段反応器8に供給される。
The reactor 7 consists of an upper stage reactor 8 and a lower stage reactor 9, and fine ore is supplied to the upper stage reactor 8 from a fine ore population 10.

高温の還元ガスは還元ガス入口ノズル11より下段反応
器9のガス室12に入り、下段分散板13よりその板上
にある粉鉱石を流動させてこれを還元処理する。
The high-temperature reducing gas enters the gas chamber 12 of the lower reactor 9 through the reducing gas inlet nozzle 11, flows through the lower dispersion plate 13, and reduces the ore present on the plate.

下段反応器9を出た還元ガスは、各単位ブロック2の下
面にそれぞれ装着されたサイクロン14で、ガス中に含
まれる粉じんを分離し、ガス導入通路3aより拡散通路
3に入り、上段反応器8の粉鉱石を流動化させ粉鉱石の
予熱と一部還元作用をする。
The reducing gas that has exited the lower reactor 9 is separated from the dust contained in the gas by a cyclone 14 installed on the lower surface of each unit block 2, and then enters the diffusion passage 3 through the gas introduction passage 3a and is then transferred to the upper reactor. It fluidizes the fine ore in step 8, preheats the fine ore, and partially reduces the ore.

上段反応器8の流動層8aを通ったガスは上段内装サイ
クロン15でガス中の粉じんは除去され、集合室16経
由還元ガス出ロノズル17より排出される。
The gas that has passed through the fluidized bed 8a of the upper reactor 8 is passed through the upper internal cyclone 15 to remove dust from the gas, and is discharged from the reducing gas outlet nozzle 17 via the collecting chamber 16.

上段内装サイクロン15で集じんされた粉じんは上段反
応器8の流動層8aに戻され、サイクロン14で集じん
された粉じんは下段反応器9の流動層9aに戻される。
The dust collected by the upper internal cyclone 15 is returned to the fluidized bed 8a of the upper stage reactor 8, and the dust collected by the cyclone 14 is returned to the fluidized bed 9a of the lower stage reactor 9.

上段反応器8で予熱された粉鉱石は溢流管18より下段
反応器9の流動層9aに送られる。
The fine ore preheated in the upper stage reactor 8 is sent to the fluidized bed 9a of the lower stage reactor 9 through the overflow pipe 18.

還元反応を終った粉鉱石は製品出口ノズル19より取り
出される。
The fine ore that has undergone the reduction reaction is taken out from the product outlet nozzle 19.

この場合サイクロン14はシングルサイクロンであり集
じん効率には限界があるが単位ブロック2のガス拡散通
路3は表面仕上も良く、なめらかな拡散の形状をしてお
るので粉じんの付着もなく、粉じんはそのまま流動層8
aに入りここで捕集されることとなる。
In this case, the cyclone 14 is a single cyclone and there is a limit to its dust collection efficiency, but the gas diffusion passage 3 of the unit block 2 has a good surface finish and a smooth diffusion shape, so there is no adhesion of dust. Fluidized bed 8
a and will be collected here.

即ち単位ブロック2とサイクロン14の結合した単位ガ
ス分散体1の集合した分散板5を反応器T内に設けるこ
とにより粉じんの付着成長を防止し、分散板5の上面を
陵線のみで構成させるので所謂デッドスペースがなくな
り粒子の焼結の機会を生せしめないこととなる。
That is, by providing in the reactor T the dispersion plate 5 in which the unit gas dispersion elements 1 in which the unit blocks 2 and the cyclones 14 are combined are provided to prevent the adhesion and growth of dust, and the upper surface of the dispersion plate 5 is made up of only ridge lines. Therefore, there is no so-called dead space and there is no opportunity for particles to sinter.

要するに本発明の実施により粉鉱石の還元反応炉内特に
ガス分散板への粉じんの付着成長および粒子の焼結を防
止することができ反応炉の長期連続運転も可能ならしめ
る効果を奏するものである。
In short, by carrying out the present invention, it is possible to prevent the adhesion and growth of dust and the sintering of particles in the fine ore reduction reactor, particularly on the gas distribution plate, and to have the effect of enabling long-term continuous operation of the reactor. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は単位ブロックの平面図、第2図はその側面図、
第3図は充填ブロックの平面図、第4図はその側面図、
第5図はこの発明にかかるガス分散板の部分平面図、第
6図は第5図のA−A視図、第7図はこの発明にかかる
反応炉の縦断面図である。 1・・・単位ガス分散体、2・・・単位ブロック、3・
・・拡散通路、4・・・陵、5・・・ガス分散板、6・
・・充填ブロック、7・・・反応器、8・・・上段反応
器、9・・・下段反応器、8a・・・上段流動層、9a
・・・下段流動層、10・・・粉鉱石入口、11・・・
還元ガス入口ノズル、12・・・ガス室、13・・・下
段分散板、14・・・サイクロン、15・・・上段内装
サイクロン、16・・・集合室、17・・・還元ガス出
口ノズル、18・・・溢流管、19・・°製品出口ノズ
ル。
Figure 1 is a plan view of the unit block, Figure 2 is its side view,
Figure 3 is a plan view of the filling block, Figure 4 is its side view,
FIG. 5 is a partial plan view of a gas distribution plate according to the present invention, FIG. 6 is a view taken along the line AA in FIG. 5, and FIG. 7 is a longitudinal sectional view of a reactor according to the present invention. 1...Unit gas dispersion, 2...Unit block, 3.
...Diffusion passage, 4...Ring, 5...Gas dispersion plate, 6.
... Packing block, 7... Reactor, 8... Upper reactor, 9... Lower reactor, 8a... Upper fluidized bed, 9a
...lower fluidized bed, 10...fine ore inlet, 11...
Reducing gas inlet nozzle, 12... Gas chamber, 13... Lower dispersion plate, 14... Cyclone, 15... Upper internal cyclone, 16... Gathering chamber, 17... Reducing gas outlet nozzle, 18...Overflow pipe, 19...°Product outlet nozzle.

Claims (1)

【特許請求の範囲】[Claims] 1 倒立截頭多角錐通路を有する単位ブロックとサイク
ロンとを接続してなる単位ガス分散体の複数1固の集合
からなるガス分散板を有することを特徴とする直列多段
流動層ガス分散装置つき反応炉。
1. Reaction with a series multi-stage fluidized bed gas dispersion device characterized by having a gas dispersion plate consisting of a plurality of unit gas dispersion bodies formed by connecting a unit block having an inverted truncated polygonal pyramid passage and a cyclone. Furnace.
JP8916675A 1975-07-23 1975-07-23 Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro Expired JPS5847216B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8916675A JPS5847216B2 (en) 1975-07-23 1975-07-23 Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8916675A JPS5847216B2 (en) 1975-07-23 1975-07-23 Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro

Publications (2)

Publication Number Publication Date
JPS5213476A JPS5213476A (en) 1977-02-01
JPS5847216B2 true JPS5847216B2 (en) 1983-10-21

Family

ID=13963216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8916675A Expired JPS5847216B2 (en) 1975-07-23 1975-07-23 Chiyokuretsutadanriyuudousogasbunsansochitsukihannouro

Country Status (1)

Country Link
JP (1) JPS5847216B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6322114U (en) * 1986-07-28 1988-02-13
JPH0345715U (en) * 1989-09-12 1991-04-26

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IN152345B (en) * 1979-04-30 1983-12-24 Cpc International Inc
DE3001961C2 (en) * 1980-01-21 1984-08-16 Didier Engineering Gmbh, 4300 Essen Inflow plate for a fluidized bed reactor
JPS57120178U (en) * 1981-01-21 1982-07-26
JPS5959244A (en) * 1982-09-27 1984-04-05 Mitsui Eng & Shipbuild Co Ltd Gaseous phase fluidized layer reactor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6322114U (en) * 1986-07-28 1988-02-13
JPH0345715U (en) * 1989-09-12 1991-04-26

Also Published As

Publication number Publication date
JPS5213476A (en) 1977-02-01

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