JPS5845380A - Alkaline chemical polishing liquid for aluminum - Google Patents

Alkaline chemical polishing liquid for aluminum

Info

Publication number
JPS5845380A
JPS5845380A JP14390781A JP14390781A JPS5845380A JP S5845380 A JPS5845380 A JP S5845380A JP 14390781 A JP14390781 A JP 14390781A JP 14390781 A JP14390781 A JP 14390781A JP S5845380 A JPS5845380 A JP S5845380A
Authority
JP
Japan
Prior art keywords
chemical polishing
polishing liquid
nitrate
aluminum
nitrite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14390781A
Other languages
Japanese (ja)
Other versions
JPS5945756B2 (en
Inventor
Kazuo Yokoyama
横山 一男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YOKOYAMA HYOMEN KOGYO KK
Original Assignee
YOKOYAMA HYOMEN KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YOKOYAMA HYOMEN KOGYO KK filed Critical YOKOYAMA HYOMEN KOGYO KK
Priority to JP14390781A priority Critical patent/JPS5945756B2/en
Publication of JPS5845380A publication Critical patent/JPS5845380A/en
Publication of JPS5945756B2 publication Critical patent/JPS5945756B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • C23F3/02Light metals

Abstract

PURPOSE:To obtain a polished surface which is smooth and glossy with ease by contg. a specific silicic acid-contg. material together with a heavy metallic salt catalyst in Al chemical polishing liquid contg. caustic soda and nitrate and/or nitrite. CONSTITUTION:A silicic acid-contg. material selected from alkali silicate and bentonite is contained together with a heavy metallic salt catalyst in Al chemical polishing liquid cosisting of aq. liquid contg. caustic soda and >=1 kind of nitrate and nitrite. If the resultant alkaline Al chemical polishing liquid is held at about 80-110 deg.C and an Al material to be polished is dipped therein, the polished surface which is smooth and glossy is obtained with ease. Here the heavy metallic salt catalysts which promote the conversion of nitrate ions to nitrite ions, for example, copper salts, cobalt salts, etc. are preferable.

Description

【発明の詳細な説明】 本発明はア“カリ性ア″ミ°つ1化学竺磨液や改爽に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to chemical polishing fluids and refreshers containing acalytic agents.

従来、アル4wラムの化学研磨液としては、リン酸を主
体とし、これに硝酸や硫酸醇を添加し九ものが使用され
ていた。しかし、辺部、廃水のリン規制がきびしくなり
、か′)仁の種の酸性化学研磨液にシいて硝酸を添加し
□染の原因となる勢の欠点があった。4、して、アル建
ニウムの化学研磨にアルカリ性ために著しく有利で、か
つ経済釣上なる。
Conventionally, nine types of chemical polishing liquids have been used for Al 4W ram, consisting mainly of phosphoric acid, to which nitric acid and sulfuric acid are added. However, phosphorus regulations have become stricter on the edges and wastewater, and nitric acid has been added to the acidic chemical polishing solution for kernel seeds, which has the disadvantage of causing staining. 4. It is extremely advantageous and economical for chemical polishing of aluminum due to its alkalinity.

しかし、従来、アルカリ性のアル2ニウム化学研磨液と
しては、上着→)→(N a OHを主体とし、これに
硝酸ソーダ、亜硝酸ソーダ、リン酸ソーダ及び硝酸銅尋
を配合する程度のことが発表されていただけで、その詳
細は殆んど不明でめつな。
However, conventional alkaline aluminum chemical polishing liquids mainly consist of NaOH and contain sodium nitrate, sodium nitrite, sodium phosphate, and copper nitrate. was only announced, but the details are largely unknown.

本発明者は、アルカリ性アル建エウふ化学研磨液を実際
K11l製してその研磨処理をした結果によると、この
種のアルカリ性アルixウム化学研磨液には下記の問題
点があることが判明した。
The inventor of the present invention has actually produced K11L alkaline aluminum chemical polishing liquid and performed polishing treatment on it, and found that this type of alkaline aluminum chemical polishing liquid has the following problems. .

(1)光沢及び平滑性のある化学研磨が得られK〈い。(1) Chemical polishing with gloss and smoothness can be obtained.

(1)  化学研磨終了後、水洗中酸洗等を行なうため
K、研磨されたアルミニウム材が空気中に引上げられた
際に、短時間空気に触れただけでアルカリエツチングを
起し、光沢や平滑性が失なわれやすい。
(1) After chemical polishing, when the polished aluminum material is lifted into the air for pickling during water washing, alkali etching occurs even if it comes into contact with the air for a short time, causing gloss and smoothness. Gender is easily lost.

そして、本発明者は、アルカリ性アルis−ウム化学研
磨液のかかる欠点を改良するために種々研究を重ねた結
果、重金属塩触媒とと有物質を添加することによシ、上
記の欠点。
The inventor of the present invention has conducted various studies to improve the above-mentioned drawbacks of alkaline aluminum chemical polishing liquids, and as a result, the above-mentioned drawbacks can be overcome by adding a heavy metal salt catalyst and a certain substance.

qIK光沢及び平滑性の低下を防止できることを知〕、
本発明に到達したのである。なお、本発明におけるアル
ミニウムとは、純すいなアルミニウムだけに隈られるも
のでなく、こ;hKFiアル0→ム合金も含まれる。
Knowing that qIK can prevent a decrease in gloss and smoothness],
The present invention has been achieved. Note that aluminum in the present invention is not limited to pure aluminum, but also includes hKFi aluminum alloys.

すなわち、本発明のアルカリ性アル1=ウム化学研磨液
は、苛性ソーダと硝酸塩及び/又は亜硝酸塩とを含有す
る水性液よりなるアルlxウム化学研磨液において、重
金属塩触媒とともに珪酸アルカリ及びベントナイトよ塾
なる群から選ばれた珪酸含有物質を含有せしめてなるこ
とを特徴とするものである。
That is, the alkaline aluminum chemical polishing liquid of the present invention is an aluminum chemical polishing liquid consisting of an aqueous liquid containing caustic soda and nitrates and/or nitrites. It is characterized by containing a silicic acid-containing substance selected from the group consisting of:

本発明の化学研磨液を構成する各成分の主要な作用効果
、について説明をすると、アルミニウム祉苛性ソーダ水
溶液中で下記式にしたがってアルミニウムイオンとなっ
て溶出し、化学研磨され、その際に電子(e)が放出さ
れるcIAI−+AI+Je 本発明の化学研磨液中に含有せしめられ九硝酸塩及び亜
硝酸塩は、その放出された電子<e)を1配式にしたが
って吸収して、適度の速度でその化学研磨作用を進行さ
せ、同時に生成する亜硝酸イオン(No1″′″)がイ
ンとビターとしての作用をして、適度の化学研磨、し九
がって平滑な研磨面が得られるOK寄与する、と推測さ
れる。
To explain the main effects of each component constituting the chemical polishing liquid of the present invention, it is eluted as aluminum ions according to the following formula in an aluminum chloride aqueous solution, chemically polished, and at that time, electrons (e. cIAI−+AI+Je) is released, and the nine nitrates and nitrites contained in the chemical polishing solution of the present invention absorb the emitted electrons according to the 1 coordination formula, and While the polishing action progresses, the nitrite ions (No. 1'''') generated at the same time act as in and bitter, contributing to moderate chemical polishing and resulting in a smooth polished surface. It is assumed that.

H,0+ NO,−+26−J#NO,−+コ0H−N
OI−十e−4Nm 1 ’NH,↑ 本発明の化学研磨液中に含有せしめられた重金属塩触媒
は、上記の機構による化学研磨の触媒作用をする。特に
、硝酸イオンの亜硝酸イオン< N Ol−)への変換
を助長し、生成した亜硝酸イオンのイノヒビター作用に
よって、アルζニウム表面を徐々に均一に溶解させて、
研磨面を平滑化するのに貢献する。と推測される。
H,0+ NO,-+26-J#NO,-+KO0H-N
OI-10e-4Nm 1 'NH,↑ The heavy metal salt catalyst contained in the chemical polishing liquid of the present invention catalyzes chemical polishing by the above-mentioned mechanism. In particular, it promotes the conversion of nitrate ions to nitrite ions <NOl-), and the inhibitor action of the generated nitrite ions gradually and uniformly dissolves the aluminum surface.
Contributes to smoothing the polished surface. It is assumed that.

本発明の化学研磨液中に含有せしめられた珪酸含有物質
は、研磨される又は研磨されたアルζニウム表面に水溶
性の珪酸イオン(H810,−等と推測される)の膜、
すなわち一種の保饅属を形成せしめ、均一な溶解(研磨
)に寄与するとともに1研磨終了後に水洗中酸洗勢を施
すために空気中に短時間取出したと11に、研磨面が空
気に触れてアルカリエツチングを起すのを防止し、研磨
面の平滑性及び光沢保持に寄与す為、と推測きれる。
The silicic acid-containing substance contained in the chemical polishing solution of the present invention is a film of water-soluble silicate ions (estimated to be H810, etc.) on the polished or polished aluminum surface.
In other words, it forms a kind of adhesive, which contributes to uniform dissolution (polishing), and when the polishing surface is exposed to air when it is taken out for a short time in the air for pickling during water washing after one polishing is completed. It can be assumed that this is because it prevents alkali etching from occurring and contributes to maintaining the smoothness and gloss of the polished surface.

本発明の化学研磨液中の苛性ソーダ濃度は、通常7〜7
4モル/1、好ましくはλ〜/コモル/Jである。
The concentration of caustic soda in the chemical polishing solution of the present invention is usually 7 to 7.
4 mol/1, preferably λ~/comole/J.

本発明にシける硝酸塩としては、たとえば硝酸ソーダ、
硝酸カリ、硝酸マグネシウム及び硝酸カルシウム勢があ
げられる。好ましい硝酸塩は硝酸ソーダ及び硝酸カリで
ある。また、本発明における亜硝酸塩と七では、たとえ
ば亜硝酸ソーダ、亜硝酸カリ、亜硝酸マグネシウム及び
亜硝酸カルシウム等があげられる、好ましい亜硝酸塩は
亜硝酸ソーダ及び亜硝酸カリである。
Examples of nitrates used in the present invention include sodium nitrate,
Examples include potassium nitrate, magnesium nitrate, and calcium nitrate. Preferred nitrates are sodium nitrate and potassium nitrate. In the present invention, the nitrites include, for example, sodium nitrite, potassium nitrite, magnesium nitrite, calcium nitrite, etc. Preferred nitrites are sodium nitrite and potassium nitrite.

本発明の化学研磨液における硝酸塩及び/又は亜硝酸塩
の濃度は、合計量で通常0.3〜7モル/J、好ましく
は/〜jモル/Jである。
The total concentration of nitrate and/or nitrite in the chemical polishing solution of the present invention is usually 0.3 to 7 mol/J, preferably / to j mol/J.

本発明における重金属塩触媒としては、九とえば銅塩(
硫酸銅、硝酸銅等)、コバルト[(amコバル)、Ml
!コバルト等)、マンガン塩(硫酸iンガン、硝酸マン
ガン等)、モリブデン塩(モリブデン酸アンモニウム、
モリブデン酸ナトリウム岬)及び銀塩(硝酸銀#)があ
げられる、好ましい重金属塩触媒は銅塩、コバルト塩、
モリブデン塩及びマンガン塩であり、特にコバルト塩が
最4好ましい、そして、この種の化学研磨液において銅
塩以外の重金属塩触媒を使用することは、従来知られて
いなかった。
As the heavy metal salt catalyst in the present invention, nine examples include copper salt (
copper sulfate, copper nitrate, etc.), cobalt [(am cobal), Ml
! cobalt, etc.), manganese salts (inganese sulfate, manganese nitrate, etc.), molybdenum salts (ammonium molybdate,
Preferred heavy metal salt catalysts include copper salts, cobalt salts,
Molybdenum salts and manganese salts, particularly cobalt salts, are most preferred, and the use of heavy metal salt catalysts other than copper salts in this type of chemical polishing solution has not been previously known.

本発明の化学研磨液における重金属塩触媒浸度は、無水
塩としてo、oJf/−11以上、好すぎると充分な触
媒効果を発揮せしめることができない。
The heavy metal salt catalyst immersion degree in the chemical polishing liquid of the present invention is o, oJf/-11 or more as an anhydrous salt, and if it is too good, a sufficient catalytic effect cannot be exhibited.

本発明Kかける珪酸含有物質としては、珪酸アルカリ及
びベントナイトよりなる群から選ばれたものが使用され
る。珪酸アルカリとしては、珪酸ソーダ、珪酸カリ及び
珪酸リチウム岬があげられるが、珪酸ソーダ及び珪酸カ
リが好ましい、また、ベントナイトも好ましい1本発明
の化学研磨液における珪酸含有物質o濃vu、810.
トL、テ、A常0.11174以上、好ましくは0.3
f/1j以上である。
The silicic acid-containing substance used in the present invention is selected from the group consisting of alkali silicates and bentonite. Examples of the alkali silicate include sodium silicate, potassium silicate, and lithium silicate; sodium silicate and potassium silicate are preferred, and bentonite is also preferred.
L, T, A are always 0.11174 or more, preferably 0.3
f/1j or more.

その濃度が低すぎると光沢及び平滑性の改善効果が得ら
れなくなる。
If the concentration is too low, the effect of improving gloss and smoothness cannot be obtained.

本発明のアルカリ性アル1=ウム化学研磨液には、必1
’に応じてさらに他の成分、たとえばリン酸アルカリ勢
を含有せしめることができる。
The alkaline aluminum chemical polishing liquid of the present invention must contain
Depending on the requirements, other components, such as alkaline phosphates, may be included.

本発明のアルカリ性アル1−ウふ化学研磨液を用いてア
ル1=ウム(その合金を含む)を化学研磨するには、こ
の研磨液を通常、70〜/10C,好壇しくはto〜1
00Cの温度に保持し、その化学研磨液中に研磨をすべ
きアル1=ウム材を浸漬して処理する。その浸漬処理時
間は、通常j〜30秒、好ましくは10〜.20秒であ
る。本発明の化学研磨液は、純アルミニウムのみならず
、アル建二りム合金の化学研磨くも用いられる。その化
学研磨を終了後は、常法にしたがって水洗中酸洗等の仕
上げ処理を行なう。
In order to chemically polish Al (including its alloy) using the alkaline Al-1-Uf chemical polishing liquid of the present invention, the polishing liquid is usually heated to 70~/10C, preferably to~10C.
The aluminum material to be polished is treated by being maintained at a temperature of 00C and immersed in the chemical polishing solution. The immersion treatment time is usually 1 to 30 seconds, preferably 10 to 30 seconds. It is 20 seconds. The chemical polishing liquid of the present invention can be used not only for chemical polishing of pure aluminum but also for chemical polishing of aluminum alloys. After the chemical polishing is completed, finishing treatments such as pickling during water washing are performed according to conventional methods.

本発明の化学研磨液は、上記した各成分を含有せしめて
なるものであるから、これを用いてアル1=ウム又はそ
の合金の化学研磨をすると、上記したように平滑で光沢
のある研磨面が容あに得られる。
Since the chemical polishing liquid of the present invention contains the above-mentioned components, when it is used to chemically polish aluminum or its alloy, a smooth and glossy polished surface can be obtained as described above. is easily obtained.

次に1夾施例及び比較例をあげて本発明をさらに詳述す
る。
Next, the present invention will be further explained in detail by giving one example and a comparative example.

実施例7〜! 比較例/−j 表7に1載の各種の組成の化学研磨液を調製し、それぞ
れの化学研磨液を10〜10OCKiち、平滑なアルミ
−ラム板を30秒間浸漬して化学研磨処−をし、次いで
取出して直ちに水洗、又は30秒間空気中に放置してか
ら水洗し良。
Example 7~! Comparative Example/-j Chemical polishing liquids having various compositions listed in Table 7 were prepared, and a smooth aluminum plate was immersed in 10 to 10 OCKi of each chemical polishing liquid for 30 seconds to undergo chemical polishing treatment. Then take it out and wash it with water immediately, or leave it in the air for 30 seconds and then wash it with water.

得られ九各化学研磨アル1=ウム板について、研磨面の
光沢及び肌荒れ状態を調べて評価した結果は1!/に示
すとシりで6つえ。
For each of the nine chemically polished aluminum plates obtained, the gloss and roughness of the polished surface were examined and the results were 1! As shown in /, there are 6 pieces.

その評価は、下記の基準にし九がって行ない、下記の表
示方法で表示した(以下の各実施例及び比較例も同様)
The evaluation was performed based on the following criteria and displayed using the following display method (the same applies to the following examples and comparative examples).
.

(1)光沢の評価基準 ム・・・鏡面を示す B・・・素材面よりも光沢が優れているC・・・素材*
a同程度の光沢がある D・・−素材面よシ光沢がやや劣る E・・・素材面よ)光沢が劣る Fl・素材面より光沢がか′なシ劣る G・・・素材面より光沢が著しく劣る (λ)肌荒れの評価基準 1・・・肌荒れが素材面よp少ない b・・・肌荒れが素材面と同11度であるC・・・肌荒
れが素材面よp中や著しいd・・・浅い梨地を示す C・・・梨地を示す f・・・部分的に腐蝕が認められる (3)評価の表示 光沢及び肌荒れの評価、の表示は、たとえばAxa又は
BXd岬のように表示しえ、なお、DXd@Rでも梨地
勢に使用でき、るので、Dxd以上であれば、工、集的
実施が可能である。
(1) Gloss evaluation criteria M... Indicates a mirror surface B... Gloss is superior to the material surface C... Material *
A has the same level of gloss D... - Slightly less glossy than the material surface E... Material surface has inferior gloss Fl - Glossier than the material surface, inferior G... More gloss than the material surface (λ) Rough skin evaluation criteria 1... Rough skin is less than the material surface b... Rough skin is 11 degrees the same as the material surface C... Rough skin is medium or severe compared to the material surface d. ...C indicates a shallow satin finish...F indicates a satin finish...Corrosion is observed partially (3) Evaluation display The evaluation of gloss and rough skin is indicated as, for example, Axa or BXd Misaki. By the way, DXd@R can also be used for pear-shaped terrain, so if it is Dxd or higher, it can be used in a concentrated manner.

実施例6 比較例6 苛性ソーダをt参011/IJC/4モル/J)、硝酸
ソーダを3001/−1i(約j、 jモル/J)、触
媒として硝酸フパルトを鍼水塩として/f/J及び水ガ
ラスをJ P/J (810゜として/ ?/J )含
む水性液を調製した。?−の水性液を化学研磨液として
用い、平滑なアル00ム板を10〜100Cの温度の同
液FCJO秒間浸漬して化学研磨処理をした。その結果
はl11.2に示すとお〕であった。
Example 6 Comparative Example 6 Caustic soda: 011/IJC/4 mol/J), sodium nitrate: 3001/-1i (approximately J, j mol/J), fupart nitrate as a catalyst/f/J An aqueous solution containing JP/J (as 810°/?/J) and water glass was prepared. ? Using an aqueous solution of - as a chemical polishing solution, a smooth aluminum plate was chemically polished by immersing it in the same solution for FCJO at a temperature of 10 to 100C. The results were as shown in 11.2.

會た比較のために、水ガラスを全く用いないで、そのな
かは上記組成と同様の組成の化学研磨液を調製した。こ
の化学研磨液を用いて上記と同一の条件でアル00ム板
の化学研磨を行なった。その結果は表2に示すとお〕で
あった。
For comparison, a chemical polishing liquid having the same composition as above was prepared without using any water glass. An aluminum plate was chemically polished using this chemical polishing liquid under the same conditions as above. The results are shown in Table 2.

表  λ 実施例7 苛性ソーダ3.20f/JCIモル/J)、硝酸ソーダ
ダ00P/IjC約tA7%ル/1)、硫酸鋼をCu8
04として0.4!f/J及び水ガラスをJP/J(8
10mとして/ff/J)含む化学研磨液を調製し、こ
れを用いて100Cの温度で30秒間縄通した。
Table λ Example 7 Caustic soda 3.20f/JCI mol/J), nitrate soda 00P/IjC approx. 7% mol/1), sulfuric acid steel Cu8
0.4 as 04! f/J and water glass to JP/J (8
A chemical polishing solution containing 10 m/ff/J) was prepared, and a rope was run through the rope at a temperature of 100C for 30 seconds.

その評価結果は、直ちに水洗の場合、及び30秒間空中
に放置徒水洗の場合ともBXcであった。
The evaluation results were BXc both in the case of immediate water washing and in the case of leaving in the air for 30 seconds and washing with water.

実施例1〜ノ2 比較例7 トナイトを組合わせて種々の化学研磨液を調製した。ま
た、比較のためにベントナイトを用いない化学研磨液(
比較例7)を調製した。
Examples 1 to 2 Comparative Example 7 Various chemical polishing liquids were prepared by combining tonite. For comparison, a chemical polishing solution that does not use bentonite (
Comparative Example 7) was prepared.

これらの各化学研磨液をそれぞれ用いて平滑なアル00
ム板を10OCの温度で30秒間処理した。研磨後直ち
に引上けて30秒間空気中に放置してから水洗した。そ
の評価結果は表3に示すとおりであった。
Using each of these chemical polishing solutions, smooth aluminum 00
The plate was treated at a temperature of 10°C for 30 seconds. Immediately after polishing, it was pulled up, left in the air for 30 seconds, and then washed with water. The evaluation results are as shown in Table 3.

実施例73〜/1 表IK示すように、各種の重金属塩触媒の添加量を変え
て各種の化学研磨液を調製し、この研磨液を用いて平滑
なアル電ニウム板を1ooco温度で30秒間処通した
Example 73~/1 As shown in Table IK, various chemical polishing solutions were prepared by changing the amounts of various heavy metal salt catalysts added, and a smooth aluminum plate was polished using this polishing solution at 1ooco temperature for 30 seconds. It was processed.

その評価結果は表参に示すとおシであった、触媒金属環
線無水塩として0.0JPlJla度以上の添加で有効
である。
The evaluation results are shown in the table, and it is effective when added as a catalytic metal ring anhydride salt in an amount of 0.0 JPlJla degree or more.

実施例1り〜λO 表jK示すように触媒金属塩としてモリブデン酸ナトリ
クムを使用し、tた珪酸含有物質としてベントナイトを
用いて各種の化学研磨液を調製しえ。
Example 1~λO As shown in Table JK, various chemical polishing liquids were prepared using sodium molybdate as the catalyst metal salt and bentonite as the silicic acid-containing substance.

これらの咎化学研磨液Kioocの温度で平滑なアル電
ニウム板を30秒間浸漬して処理をしえ、その評価結果
は表jK示すとおシであった。
A smooth aluminum plate was immersed in the chemical polishing liquid Kiooc for 30 seconds to complete the treatment, and the evaluation results are shown in Table JK.

実施例、2/〜−3 表6に示すように1珪酸含有物質の添加量を種々に変化
させて各種の化学研磨液を調製した。これらの各化学研
磨液を用いて平滑なアルミzウム板を10OCで30秒
間処理しえ。
Examples 2/-3 As shown in Table 6, various chemical polishing liquids were prepared by varying the amount of the monosilicic acid-containing substance added. Treat a smooth aluminum z plate with each of these chemical polishing solutions at 10OC for 30 seconds.

その評価結果はl!乙に示すとお9であった、珪酸含有
物質はsio、として0./f/J以上含有されていれ
ば有効である。
The evaluation results are l! The silicic acid-containing substance shown in Figure B is 0.0 as sio. It is effective if the content is /f/J or more.

実施例−≠ 苛性ソーダ−j Ot/J (1,,2J−篭ル/J)
、硝酸ソーダ100t/J<約tコ毫ル/J)、硝酸カ
リ/ 00 t/J (約1モル/J)、硫酸鋼を無水
塩として0.2’if/−6,水ガラスJ f/J (
810,として/ P/’、J )含有する化学研磨液
を調製した。
Example-≠ Caustic soda-j Ot/J (1,,2J-basket/J)
, Sodium nitrate 100t/J<about tKol/J), Potassium nitrate/00t/J (about 1mol/J), Sulfuric acid steel as anhydrous salt 0.2'if/-6, Water glass J f /J (
A chemical polishing solution containing 810, P/', J) was prepared.

得られた化学研磨液を用いて各種のアル建凰つ五合金材
の平滑な板を1oocで30秒間−理しえ、その評価結
果拡狭7に示すとおシであった。
Using the obtained chemical polishing solution, smooth plates of various types of Al construction and pentalloy materials were polished at 100° for 30 seconds, and the evaluation results were shown in 7.

表   7 表7の結果から明らかなように、本発明のアルカリ性ア
ルンニウム化学研磨液はアルミニウム合金材に対しても
有効に使用できるものである。
Table 7 As is clear from the results in Table 7, the alkaline alunium chemical polishing liquid of the present invention can be effectively used for aluminum alloy materials.

#着出願人 横山表面工業株式会社#Applicant: Yokoyama Surface Industry Co., Ltd.

Claims (1)

【特許請求の範囲】 t 苛性ソーダと硝酸塩及び/メは亜硝酸塩とを含有す
る水性液よシなるアルミ工、ラム化学研磨液にお諭て1
、重金属塩触媒とともに珪酸アルカリ及びベントt、イ
トよりなる−から選ばれた珪酸含有物質を寅、有せし−
め工なることを特徴とするアルカリ性ア+雫、テ9ムず
ヒ学研磨液L           、:”%:、: 
1.、 、、。 2 苛性ソーダが7〜/6モル/Jt’41されてなる
特許請求の範囲第7項記載の化学研磨液。 ・3. 硝酸塩及び/又は亜硝酸塩が合計量で0、3〜
7モル/J3含有されてなる特許請求の範囲第1項、又
0%コ項記載の化学研磨液。 弘 珪酸含有物質、が、810.として0.1971以
上含有されて咋る特許請求の範囲#I1項、第一項、又
ii第3項記載、の化学研磨液。 よ 重金属塩触媒が銅塩、コバルト塩、モリブデン塩及
びマンガン塩よりなる群より選一れ下なる特許請求の範
囲第7項、−一項、第1項・又は第亭項記載0些学竺磨
液・
[Scope of Claims] t. An aqueous solution containing caustic soda, nitrate, and/or nitrite.
, a silicic acid-containing substance selected from the group consisting of an alkali silicate and a heavy metal salt catalyst.
Alkaline a+drop, Te9mzuhigaku polishing liquid L, which is characterized by its sharpening properties.
1. , ,,. 2. The chemical polishing liquid according to claim 7, comprising 7 to 6 moles/Jt'41 of caustic soda.・3. Total amount of nitrate and/or nitrite is 0,3~
The chemical polishing liquid according to claim 1 or claim 1, containing 7 mol/J3. Hiroshi Silicic acid-containing substance, 810. The chemical polishing liquid according to claim #I1, 1, or ii, 3, which contains 0.1971 or more. The heavy metal salt catalyst is selected from the group consisting of copper salts, cobalt salts, molybdenum salts, and manganese salts. Polishing liquid/
JP14390781A 1981-09-14 1981-09-14 Alkaline aluminum chemical polishing liquid Expired JPS5945756B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14390781A JPS5945756B2 (en) 1981-09-14 1981-09-14 Alkaline aluminum chemical polishing liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14390781A JPS5945756B2 (en) 1981-09-14 1981-09-14 Alkaline aluminum chemical polishing liquid

Publications (2)

Publication Number Publication Date
JPS5845380A true JPS5845380A (en) 1983-03-16
JPS5945756B2 JPS5945756B2 (en) 1984-11-08

Family

ID=15349847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14390781A Expired JPS5945756B2 (en) 1981-09-14 1981-09-14 Alkaline aluminum chemical polishing liquid

Country Status (1)

Country Link
JP (1) JPS5945756B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105039992A (en) * 2015-07-21 2015-11-11 安徽江威精密制造有限公司 Alkaline polishing solution and preparation method thereof
CN105177586A (en) * 2015-07-21 2015-12-23 安徽江威精密制造有限公司 Aluminum alloy polishing solution and preparing method thereof
CN106676529A (en) * 2015-03-30 2017-05-17 江苏理工学院 Alkaline chemical polishing method for 1060 aluminum alloy and alkaline chemical polishing solution adopted by alkaline chemical polishing method
CN107699897A (en) * 2017-09-11 2018-02-16 苏州盈腾五金制品有限公司 A kind of processing of surface polishing of Al-alloy parts
CN113718328A (en) * 2021-11-04 2021-11-30 山东裕航特种合金装备有限公司 Surface treatment method for aluminum alloy casting for ship

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63179443A (en) * 1987-01-20 1988-07-23 Fuji Photo Film Co Ltd Signal fetching device
JPH0320044U (en) * 1989-07-03 1991-02-27

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106676529A (en) * 2015-03-30 2017-05-17 江苏理工学院 Alkaline chemical polishing method for 1060 aluminum alloy and alkaline chemical polishing solution adopted by alkaline chemical polishing method
CN106702389A (en) * 2015-03-30 2017-05-24 江苏理工学院 7075 aluminum alloy alkaline chemical polishing method and adopted alkaline chemical polishing liquid
CN105039992A (en) * 2015-07-21 2015-11-11 安徽江威精密制造有限公司 Alkaline polishing solution and preparation method thereof
CN105177586A (en) * 2015-07-21 2015-12-23 安徽江威精密制造有限公司 Aluminum alloy polishing solution and preparing method thereof
CN107699897A (en) * 2017-09-11 2018-02-16 苏州盈腾五金制品有限公司 A kind of processing of surface polishing of Al-alloy parts
CN113718328A (en) * 2021-11-04 2021-11-30 山东裕航特种合金装备有限公司 Surface treatment method for aluminum alloy casting for ship

Also Published As

Publication number Publication date
JPS5945756B2 (en) 1984-11-08

Similar Documents

Publication Publication Date Title
US2114151A (en) Art of finishing ferrous metal
US2485529A (en) Composition for removing scale from ferrous metal surfaces
US2828193A (en) Method for rejuvenation of aluminum treating solutions
US3709824A (en) Method and composition for chemical polishing of stainless steel surfaces
JPS5845380A (en) Alkaline chemical polishing liquid for aluminum
US3692583A (en) Desmutting etched aluminum alloys
US3951681A (en) Method for descaling ferrous metals
US5098517A (en) Baths and process for chemical polishing of copper or copper alloy surfaces
CN109576088A (en) A kind of preparation method for the scale cleaning agent that changes colour
KR930003606B1 (en) Baths and process for chemical polishing of stainless steel surfaces
JPS61587A (en) Solution for chemical conversion treatment
US3575747A (en) Chemical polishing of aluminum
US3351555A (en) Chromic acid-sulfuric acid solutions containing a mercuric ion catalyst for dissolving of copper and its alloys
JP2001262380A (en) Method for removing copper precipitated film from pickled surface of copper-containing alloy and composition therefor
US3997361A (en) Coin cleaner
US3595799A (en) Pickling additive
JPS61217600A (en) Bath and method for chemically polishing steel
JPS63161179A (en) Both and method for chemically polyshing surface of stainless steel
JP2994428B2 (en) Composition for treating phosphate film and treatment method
US2392404A (en) Pickling bath for ferrous metals and inhibitor for use therein
US2692189A (en) Chemical polishing solution and method
JP4436885B1 (en) Chemical conversion treatment liquid and chemical film forming method
US1969678A (en) Ferric chloride etching solutions
JP2790145B2 (en) Compositions and methods for metal treatment
SU1627592A1 (en) Solution for simultaneous degreasing, etching and polishing of copper and its alloys