JPS5843416A - ミラ−集光型逆エキスパンドアフオ−カル照明光学系 - Google Patents

ミラ−集光型逆エキスパンドアフオ−カル照明光学系

Info

Publication number
JPS5843416A
JPS5843416A JP56141677A JP14167781A JPS5843416A JP S5843416 A JPS5843416 A JP S5843416A JP 56141677 A JP56141677 A JP 56141677A JP 14167781 A JP14167781 A JP 14167781A JP S5843416 A JPS5843416 A JP S5843416A
Authority
JP
Japan
Prior art keywords
light
optical system
optical axis
condenser lens
afocal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56141677A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0125046B2 (no
Inventor
Makoto Uehara
誠 上原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP56141677A priority Critical patent/JPS5843416A/ja
Priority to US06/416,029 priority patent/US4498742A/en
Publication of JPS5843416A publication Critical patent/JPS5843416A/ja
Publication of JPH0125046B2 publication Critical patent/JPH0125046B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
JP56141677A 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系 Granted JPS5843416A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56141677A JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系
US06/416,029 US4498742A (en) 1981-09-10 1982-09-08 Illumination optical arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56141677A JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系

Publications (2)

Publication Number Publication Date
JPS5843416A true JPS5843416A (ja) 1983-03-14
JPH0125046B2 JPH0125046B2 (no) 1989-05-16

Family

ID=15297627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56141677A Granted JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系

Country Status (1)

Country Link
JP (1) JPS5843416A (no)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6265014A (ja) * 1985-07-23 1987-03-24 フュージョン・システムズ・コーポレーション 不均等な光源を像平面上に映すための光学的システム
EP0231029A2 (en) * 1986-01-31 1987-08-05 Dainippon Screen Mfg. Co., Ltd. Optical system
JPS6382408A (ja) * 1986-09-19 1988-04-13 ミネソタ　マイニング　アンド　マニユフアクチユアリング　カンパニ− オ−バ−ヘッド・プロジェクタ−用照明装置
EP0299475A2 (en) * 1987-07-17 1989-01-18 Dainippon Screen Mfg. Co., Ltd. Optical system for effecting increased irradiance in peripheral area of object
JPH02250016A (ja) * 1989-03-23 1990-10-05 Mitsutoyo Corp 落射暗視野照明装置
US5345292A (en) * 1992-03-31 1994-09-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
JP2012191148A (ja) * 2011-03-14 2012-10-04 Ricoh Co Ltd 面発光レーザモジュール、光走査装置及び画像形成装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6265014A (ja) * 1985-07-23 1987-03-24 フュージョン・システムズ・コーポレーション 不均等な光源を像平面上に映すための光学的システム
EP0231029A2 (en) * 1986-01-31 1987-08-05 Dainippon Screen Mfg. Co., Ltd. Optical system
JPS6382408A (ja) * 1986-09-19 1988-04-13 ミネソタ　マイニング　アンド　マニユフアクチユアリング　カンパニ− オ−バ−ヘッド・プロジェクタ−用照明装置
EP0299475A2 (en) * 1987-07-17 1989-01-18 Dainippon Screen Mfg. Co., Ltd. Optical system for effecting increased irradiance in peripheral area of object
JPH02250016A (ja) * 1989-03-23 1990-10-05 Mitsutoyo Corp 落射暗視野照明装置
US5345292A (en) * 1992-03-31 1994-09-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
US5726740A (en) * 1992-03-31 1998-03-10 Canon Kabushiki Kaisha Projection exposure apparatus having illumination device with ring-like or spot-like light source
JP2012191148A (ja) * 2011-03-14 2012-10-04 Ricoh Co Ltd 面発光レーザモジュール、光走査装置及び画像形成装置

Also Published As

Publication number Publication date
JPH0125046B2 (no) 1989-05-16

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