JPS583959A - Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping - Google Patents

Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping

Info

Publication number
JPS583959A
JPS583959A JP9958581A JP9958581A JPS583959A JP S583959 A JPS583959 A JP S583959A JP 9958581 A JP9958581 A JP 9958581A JP 9958581 A JP9958581 A JP 9958581A JP S583959 A JPS583959 A JP S583959A
Authority
JP
Japan
Prior art keywords
strip
gas wiping
zinc
nozzles
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9958581A
Other languages
Japanese (ja)
Inventor
Kenzo Fukumoto
福本 健三
Ryoya Yamashita
山下 了也
Mitsuhiko Koyasu
子安 三彦
Minoru Kodama
児玉 実
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP9958581A priority Critical patent/JPS583959A/en
Publication of JPS583959A publication Critical patent/JPS583959A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/14Removing excess of molten coatings; Controlling or regulating the coating thickness
    • C23C2/16Removing excess of molten coatings; Controlling or regulating the coating thickness using fluids under pressure, e.g. air knives
    • C23C2/18Removing excess of molten coatings from elongated material
    • C23C2/20Strips; Plates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating With Molten Metal (AREA)

Abstract

PURPOSE:To decrease the variance in the weights of hot dip-plated zinc upon a strip by maintaing the distance from the surfaces of the strip and the leading ends of the nozzles of gas wiping devices at certain intended value by moving the gas wiping devices in correspondence to the oscillations of the strip. CONSTITUTION:A strip 5 which advances in an arrow direction and is stuck with zinc in a zinc plating bath 1 is passed between wiping nozzles 3 and 3, whereby the weights of hot dip-plated zinc are controlled. Here, the amplitudes of the strip 5 oscillating between pinch rolls 12 and top roll 4 are detected 9, and the detection signals thereof are fed to an arithmetic controller 10. The controller 10 calculates the amplitude of the strip 5 in the set position of the nozzles in accordance with said signals, and feeds the signals corresponding to these to servocontrol valve mechanisms 7. The mechanism 7 supplied with working fluid of high pressure controls the flow rates and directions of the working fluid according to the signals from the controller 10 and feeds the controlled working fluid to driving devices 6 consisting of oil hydraulic cylinders which in turn move and control the nozzles 3 in such a way that the spacings from the strip 5 are maintained at a constant set value.

Description

【発明の詳細な説明】 この発明は、ガスワイピング装置を設けた溶融亜鉛めっ
きにおける亜鉛付着量制御方法および装置、特にガスワ
イピング装置を設けた連続浴融亜鉛めつさラインにおい
て、ストリップの振動に対応してガスワイピング装置を
移動させ、ストリップ表面とガスワイピング装置のノズ
ル先端との距離分−尾の目的値に保持し、ストリップに
付着する亜鉛量のバラツキを小さくするとともに、この
亜鉛量を目的値に近付けて亜鉛付着量を制御するための
方法および装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method and apparatus for controlling the amount of zinc deposited in hot-dip galvanizing equipped with a gas wiping device, particularly in a continuous bath dip galvanizing line equipped with a gas wiping device. The gas wiping device is moved accordingly and maintained at the target value of the distance between the strip surface and the nozzle tip of the gas wiping device - the tail, thereby reducing the variation in the amount of zinc deposited on the strip and keeping this amount of zinc at the target value. The present invention relates to a method and apparatus for controlling zinc deposition close to the value.

ストリップ表面とガスワイピング装置のノズル先端との
間隔は亜鉛の付着量と密接な関係がある。
The distance between the strip surface and the nozzle tip of the gas wiping device is closely related to the amount of zinc deposited.

この間隔を大きくとり過ぎると亜鉛が付着し過ぎること
となり、製品コストがilr くなる。またストリップ
の振動によりストリップとガスワイピング装置との間隔
が変動し、これにより亜鉛付着量が変動することは製品
の品質1nfで好ましくない。
If this interval is too large, too much zinc will adhere, increasing the product cost. Furthermore, the distance between the strip and the gas wiping device changes due to the vibration of the strip, which is undesirable in terms of product quality 1nf, which causes the amount of zinc deposit to change.

したがって、ガスワイピング装置を設けた連続溶融亜鉛
めっきラインにおいては、ガスワイピング装置のノズル
先端とストリップ表面との間隔を一定かつ極少に保つこ
とによって、ストリップに対する亜鉛付着量を一定かつ
極少に保つことが、連続亜鉛めっきライン操業上の大き
な課題であった。
Therefore, in a continuous hot-dip galvanizing line equipped with a gas wiping device, by keeping the distance between the nozzle tip of the gas wiping device and the strip surface constant and extremely small, it is possible to keep the amount of zinc deposited on the strip constant and extremely small. This was a major issue in operating a continuous galvanizing line.

このため、従来、ガスワイピング装置の近くにストリッ
プをはさむピンチロールを設けてストリングの振動を抑
制する方法およびストリップ端部近くに強力な磁石を配
置してストリップの振動を抑制する方法々どによる対策
が講じられてきた。
For this reason, conventional measures have been taken, such as installing pinch rolls that sandwich the strip near the gas wiping device to suppress string vibration, and arranging strong magnets near the ends of the strip to suppress string vibration. has been taught.

しかしながら、かかる従来技術における方法では、ガス
ワイピング装置1真近にピンチロールまたは磁石を設置
することはできないため、かなシの(8) 振動がストリップに残るととになり、ストリップとガス
ワイピング装置との間隔の縮少には限界があった。
However, in this conventional method, it is not possible to install a pinch roll or a magnet directly near the gas wiping device 1, so if the vibration (8) of Kanashi remains in the strip, it will cause damage to the strip and the gas wiping device. There was a limit to the reduction of the interval.

かくして、この発明の目的は、ストリップ表面とガスワ
イピング装置のノズル先端との間隔を一定かつ極少に保
ち、これによυ製品の品質向上、コスト低減、および生
産性向上を図ることのできる方法および装置を提供する
ことにある。
Thus, an object of the present invention is to provide a method and method that can maintain a constant and extremely small distance between the strip surface and the nozzle tip of a gas wiping device, thereby improving the quality of υ products, reducing costs, and increasing productivity. The goal is to provide equipment.

さらに、この発明の目的は、ガスワイピング装置を設け
た連続溶融亜鉛めっきラインにおいて、ガスワイピング
装置のノズル先端とストリップ表面との間隔をオンライ
ンで調整できるようにしてストリップへの亜鉛付着量を
一定かつ極少に制御するだめの方法と装置を提供するこ
とである。
Furthermore, it is an object of the present invention to maintain a constant amount of zinc deposited on the strip by making it possible to adjust the distance between the nozzle tip of the gas wiping device and the strip surface online in a continuous hot-dip galvanizing line equipped with a gas wiping device. It is an object of the present invention to provide a method and apparatus that require minimal control.

ここに、この発明は溶融亜鉛めっきしたストリδ ラグ亜鉛付着量をガスワイピング装置にょシ制御する方
法であって、ストリップ表面とガスワイピング装置のノ
ズル先端との間隔を一定値に保持するようにガスワイピ
ングノズルを、亜鉛メッキ槽から送り出されたストリッ
プの振動に合わせてス(4) トリップ表面に対して直角方向に移動せしめることを特
徴とする、連続溶融亜鉛めっきにおける亜鉛付着量制御
方法である。
The present invention is a method for controlling the amount of zinc deposited on a hot-dip galvanized strip lag using a gas wiping device, and in which the gas is This is a method for controlling the amount of zinc deposited in continuous hot-dip galvanizing, characterized by moving a wiping nozzle in a direction perpendicular to the strip surface (4) in accordance with the vibration of the strip sent out from the galvanizing tank.

また、この発明は、亜鉛めっき槽から送り出されたスト
リップの振動の振幅を適宜位置で検出する振幅検出装置
、この検出した振幅からガスワイピングノズルの設定位
114tKおける前記ストリップの熾幅を算出するとと
もに、該ガスワイピング装置のノズル先端と該ストリッ
プ表面との間隔を一定の設定値に保持するように、該ス
トリップの算出された前記振幅に対応して前記ガスワイ
ピングノズルの前記ストリップに対する直角方向の移動
量を算出する演算装置、および−F記の算出した移動針
に対応して前記ガスワイピングノズルを前記ストリップ
に対して直角方向に移動させる手段とを具備することを
%倣とする連続溶融亜鉛めっきラインにおける亜鉛付着
量制御装置である。
The present invention also provides an amplitude detection device that detects the amplitude of vibration of a strip sent out from a galvanizing tank at an appropriate position, and calculates the width of the strip at a set position of 114 tK of a gas wiping nozzle from the detected amplitude. , movement of the gas wiping nozzle in a direction perpendicular to the strip in response to the calculated amplitude of the strip so as to maintain a distance between the nozzle tip of the gas wiping device and the surface of the strip at a constant set value; Continuous hot-dip galvanizing comprising: a calculation device for calculating the amount; and means for moving the gas wiping nozzle in a direction perpendicular to the strip in response to the calculated moving needle in -F. This is a zinc coating amount control device in the line.

前述のように1従来は主としてストリップの振動それ自
体を抑制して、この抑制された振動の分だけガスワイピ
ングノズルをストリップに近付けてセットする対策をと
ってきた。しかしながら、高速で走行しているストIJ
ツブの振動を完全に抑制することは困難であシ、そのた
めガスワイピング装置のストリップへの接近にも限界が
あった。
As mentioned above, conventional measures have been taken to mainly suppress the vibration of the strip itself, and to set the gas wiping nozzle closer to the strip by the amount of the suppressed vibration. However, the strike IJ traveling at high speed
It is difficult to completely suppress the vibration of the knob, and therefore there is a limit to how close the gas wiping device can get to the strip.

そこで、この発明においては、ガスワイピングノズルの
位置をス) IJツブの振動に対して追従制御して、ガ
スワイピング装置のノズル先端とストリップの表面との
間隔を完全に目的値に維持させようとするものである。
Therefore, in the present invention, the position of the gas wiping nozzle is controlled to follow the vibration of the IJ knob to maintain the distance between the nozzle tip of the gas wiping device and the surface of the strip at the target value. It is something to do.

この発明で利用するガスワイピング装置は慣用の装置で
あって、両面メッキの場合は走行するストリップを中心
に対になって設けられる。ストリップの振動検出位置は
可及的にガスワイピング装置に近付けることが好ましい
The gas wiping device used in this invention is a conventional device, and in the case of double-sided plating, it is provided in pairs around the running strip. It is preferable that the vibration detection position of the strip be as close to the gas wiping device as possible.

検出されたストIJツブの振動の振幅の量に応じて、対
になったガスワイピング装置の位置を平行移動させ、ス
トリップが対になったガスワイピング装置の中心に常に
位置するように保持してもよい。この場合には、両ガス
ワイピング装置の間の間隔は予じめ設定される。勿論、
対になったガスワイピング装置はその位置をそれぞれ独
立に制御してもよい。そして、その場合にはストリップ
の両面の亜鉛付着ね1を互いに独立して変えることがで
きる。
The position of the paired gas wiping device is moved in parallel according to the detected amplitude of the vibration of the strip IJ knob, and the strip is always maintained at the center of the paired gas wiping device. Good too. In this case, the distance between both gas wiping devices is preset. Of course,
The paired gas wiping devices may have their positions independently controlled. In that case, the zinc adhesion layers 1 on both sides of the strip can be changed independently of each other.

次に、この発明を添付図面に関連させて説明する。The invention will now be described in conjunction with the accompanying drawings.

添付図面はこの発明の1実施例を示すものであり、亜鉛
めっき浴1.浸漬ロール2.対になったガスワイピング
ノズル8およびトップロール4から構成される連続溶融
唾鉛めっきラインを示す。
The attached drawings show one embodiment of the present invention, and show a galvanizing bath 1. Dipping roll2. A continuous hot dip lead plating line consisting of a pair of gas wiping nozzles 8 and a top roll 4 is shown.

矢印方向に走行するスl−’Jツブ5には前記亜鉛めっ
き浴1において亜鉛が付着し、次いで前記ガスワイピン
グノズル8においてこのストリップに向かってガスを噴
出させて余分に付着した亜鉛が吹き飛ばされ、所定の付
着厚みに仕上げられる。
Zinc adheres to the strip 5 traveling in the direction of the arrow in the galvanizing bath 1, and then gas is jetted toward this strip in the gas wiping nozzle 8 to blow away the excess zinc. , finished to a predetermined adhesion thickness.

そして、この発明によれば、上記ガスワイピングノズル
8を移動させるための油圧シリンダーから成る駆動装置
6、該駆動装置に供給する油圧作動油を制御するサーボ
パルプ機構7、ストリップ5の振動を検出する振動検出
器9、サーボパルプ機(7) 構を制御するための演算制御装置10、ガスワイピング
ノズルの移動を検出するシリンダー位置検出器11が設
けられる。
According to the present invention, a drive device 6 consisting of a hydraulic cylinder for moving the gas wiping nozzle 8, a servo pulp mechanism 7 for controlling hydraulic oil supplied to the drive device, and vibrations of the strip 5 are detected. A vibration detector 9, a calculation control device 10 for controlling the servo pulp machine (7) mechanism, and a cylinder position detector 11 for detecting movement of the gas wiping nozzle are provided.

ストリップ5 ij l−ノブロール4とピンチロール
12によって支持されているが、この支持距離は通常数
十メートルに及ぶ。したがって、ストリップ5は図中破
線で示したように振動する。この発明によれば、このス
トリップ5の振動状態、つまり振動の振幅を、ガスワイ
ピング装置8の近傍に設けた振動検出装置9によって検
出し、この検出信号を演算制御装置10に送る。振動検
出器は、図示の場合、磁気式金属片位置検出器2個をス
トリップ50幅方向端部に取り付けた。変更例としては
、静電容量型金属片位置検出器、レーザ等を用いた距離
計等であってもよい。
The strip 5 ij l-is supported by a knob roll 4 and a pinch roll 12, and the supporting distance typically extends to several tens of meters. Therefore, the strip 5 vibrates as shown by the broken line in the figure. According to the present invention, the vibration state of the strip 5, that is, the amplitude of the vibration, is detected by the vibration detection device 9 provided near the gas wiping device 8, and this detection signal is sent to the arithmetic and control device 10. In the illustrated case, two magnetic metal piece position detectors were attached to the ends of the strip 50 in the width direction as vibration detectors. As a modification, a capacitive metal piece position detector, a distance meter using a laser, etc. may be used.

演算制御装置10は的d己検出信号にもとすいてガスワ
イピングノズルの設定位置におけるストリップ5の振動
、つまシ撮幅を算出し、この算出されたストリップ5の
振動に応じた信号をサーボパルプ機構7に送る。例えば
、図示例において、ス(8) トリップが向かって左手方向に符号14で示す点線の位
1谷にまで振動すれば、対になったガスワイピングノズ
ル3を矢印で示すように左手方向に動かすように信号を
出す。
The arithmetic and control unit 10 calculates the vibration of the strip 5 at the set position of the gas wiping nozzle and the width of the strip 5 based on the target detection signal, and sends a signal corresponding to the calculated vibration of the strip 5 to the servo pulp. Send it to mechanism 7. For example, in the illustrated example, if the trip (8) vibrates to the left as shown by the dotted line 14, the paired gas wiping nozzles 3 are moved to the left as shown by the arrow. give a signal like this.

サーボパルプ機構7にはiV4圧の作動油が供給されて
おり、演算制i!11装置10からの信号に応じて作動
油の蝋、方向を制御して、油圧シリンダーから成る1駆
動装置6に送り込み、ガスワイピングノズル8を適宜方
向に移動させる。一方、ガスワイピングノズル8に付属
したシリンダー位置検出器11によって、ガスワイピン
グノズル移動者を検出し、その信号を演算制御装置f1
0にフィードバックして、追従制御特性を高めるように
してもよい。シリンダー位置検出語は、図示例の場合イ
ンダクトシンを用いたが、変更例としては差動トランス
、マグネスケール等であってもよい。図中、信号系統は
点線に矢印を付けて示しである。
The servo pulp mechanism 7 is supplied with iV4 pressure hydraulic oil, and the i! The direction of the hydraulic oil is controlled in accordance with the signal from the device 10 and sent to the drive device 6 consisting of a hydraulic cylinder to move the gas wiping nozzle 8 in an appropriate direction. On the other hand, the cylinder position detector 11 attached to the gas wiping nozzle 8 detects the person moving the gas wiping nozzle, and the signal is sent to the arithmetic and control unit f1.
0 may be fed back to improve the follow-up control characteristics. In the illustrated example, an inductosin is used as the cylinder position detection word, but as a modification, a differential transformer, a magnescale, etc. may be used. In the figure, the signal system is indicated by a dotted line with an arrow.

なお、ガスワイピングノズル移動用のモータ15はガス
ワイピング装置の位置の粗設定用であり、また修理等で
大幅に動かすときに使うものであるが、変更例としてこ
のモータをサーボモータとして前記サーボパルプ機構の
代りに位置制御に使ってもよい。
The motor 15 for moving the gas wiping nozzle is used to roughly set the position of the gas wiping device, and is also used when moving it significantly for repairs, etc. As a modification, this motor can be used as a servo motor to move the servo pulp It may be used for position control instead of a mechanism.

この発明の装置の制御系の周波数応答は、図示例の構成
を採る場合80Hzでめった。 これに対し、ス) I
Jツブの撮動周期はα5〜8Hz程度であり、したがっ
て充分にストリップの振動に合わせてガスワイピングノ
ズルを移動させることができる。
The frequency response of the control system of the device of the present invention was 80 Hz when using the illustrated example configuration. In contrast, S) I
The photographing period of the J-tube is approximately α5 to 8 Hz, and therefore the gas wiping nozzle can be moved sufficiently in accordance with the vibration of the strip.

この発明を実施例によりさらに説明する。This invention will be further explained by examples.

実施例1〜3 図示装置を使って、この発明を次の8種の態様に分けて
実施した。
Examples 1 to 3 Using the illustrated apparatus, this invention was carried out in the following eight ways.

実施例1は普通のめっき材における付着量平均の低下を
目的とした操業例、実施例2は非常に薄いめっきを行な
うことを目的とした操業例、また実施例8は高速で操業
する例である。操業条件とその結果を次表にまとめて示
す。参考までに、ストリップの振動防止にピンチロール
を使った従来法による操業結果も合わせて示す。
Example 1 is an example of operation aimed at reducing the average coating weight on ordinary plating materials, Example 2 is an example of operation aimed at performing very thin plating, and Example 8 is an example of operation at high speed. be. The operating conditions and results are summarized in the table below. For reference, the results of a conventional method using pinch rolls to prevent strip vibration are also shown.

(注)(A)  ガスワイピングノズル先端とストリッ
プ表面との間隔(順) (B)  ガスワイピングノズルのガス噴出圧OV讐) (C)  亜鉛付着駄平均(17mす (至)亜鉛例着!最少〜最大(j’/rILりこのよう
に、従来法においてはストリップの撮動による振幅が最
大約52門もあったため、ガスワイピング装置のノズル
先端とス) IJツブ表面との間の予じめセットする間
隔は80箇もとらなければならなかったが、この発明に
よれば、実施例1の場合、同じ振幅にもかかわらず、ガ
スワイピング装置のノズル先端とストリップ表面との間
隔は予じめ10mmにセットすることによって、実際に
この間隔を8〜12門に抑えることができた。
(Note) (A) Distance between the tip of the gas wiping nozzle and the strip surface (in order) (B) Gas ejection pressure of the gas wiping nozzle OV) (C) Average of zinc adhesion (up to 17m) Example of zinc adhesion!Minimum ~ Maximum (j'/rIL Riko) In the conventional method, the amplitude due to strip imaging was up to about 52 gates, so the pre-adjustment between the nozzle tip of the gas wiping device and the IJ knob surface. However, according to the present invention, in the case of Embodiment 1, the distance between the nozzle tip of the gas wiping device and the strip surface was set in advance even though the amplitude was the same. By setting the distance to 10 mm, we were actually able to reduce this distance to 8 to 12 gates.

そして、8〜12wnの間隔を保持できたため、めっき
付着量も92〜9797m”と正確に制御できた。同様
の理由から、実施例2の従来得られにくかった非常にう
すいめっきの場合、および実施例8の振動周期および振
幅が大きくなる高速操業の場合にも、非常に均一なめっ
き付着量が得られた。
Since we were able to maintain a spacing of 8 to 12 wn, we were able to accurately control the amount of plating to 92 to 9797 m. Even in the case of high-speed operation with high vibration frequency and amplitude in Example 8, a very uniform coating weight was obtained.

かくして、この発明によれば、従来法とは逆にストリッ
プの振動に対応してガスワイピングノズルが移動するた
め、従来法と比較して、ストリップ表面とガスワイピン
グ装置のノズル先端との間隔を大幅に狭めることができ
る。その結果、製品の品質向上、コストの低減および生
産性向上に大きく貢献する。
Thus, according to the present invention, since the gas wiping nozzle moves in response to the vibration of the strip, contrary to the conventional method, the distance between the strip surface and the nozzle tip of the gas wiping device can be significantly increased compared to the conventional method. can be narrowed down to As a result, it greatly contributes to improving product quality, reducing costs, and improving productivity.

なお、この発明はピンチロールまたは磁石を用いる従来
法と併用して実施することも可能で、その場合、ストリ
ップの振動はさらに可及的に抑えられ、この発明の効果
は相乗的に高まる。
Note that the present invention can also be implemented in combination with the conventional method using pinch rolls or magnets, in which case the vibration of the strip is further suppressed as much as possible, and the effects of the present invention are synergistically enhanced.

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面はこの発明の1実施例を示す略式説明図である
。 1:亜鉛めっき浴     2:浸漬ロール3:ガスワ
イピングノズル 4ニドツブロール5ニストリツプ  
    6:駆動装置9:撮動検出装置    10:
演算制御装置特許出願人  住友金属工業株式会社 代理人 弁理士広瀬章−
The accompanying drawings are schematic illustrations showing one embodiment of the present invention. 1: Galvanizing bath 2: Dipping roll 3: Gas wiping nozzle 4 Ni dot roll 5 Ni strip
6: Drive device 9: Imaging detection device 10:
Arithmetic control device patent applicant Sumitomo Metal Industries Co., Ltd. Patent attorney Akira Hirose

Claims (2)

【特許請求の範囲】[Claims] (1)溶融亜鉛めっきしたストリップの亜鉛付着量をガ
スワイピング装置により制御する方法であって、ストリ
ップ表面とガスワイピング装置のノズル先端との間隔を
一定値に保持するようにガスワイピングノズルを、亜鉛
メッキ槽から送り出されたストリップの振動に合わせて
ストリップ表面に対して直角方向に移動せしめることを
特徴とする、連続溶融亜鉛めっきにおける亜鉛付着量制
御方法。
(1) A method for controlling the amount of zinc deposited on a hot-dip galvanized strip using a gas wiping device, in which the gas wiping nozzle A method for controlling the amount of zinc deposited in continuous hot-dip galvanizing, characterized by moving the strip in a direction perpendicular to the surface of the strip in accordance with the vibration of the strip sent out from a plating tank.
(2)亜鉛めっき槽から送り出されたストリップの振動
の振幅を適宜位置で検出する振幅検出装置と、この検出
した振幅からガスワイピングノズルの設定位置における
前記ストリップの1辰幅を算出するとともに、ガスワイ
ピング装置wのノズル先端とストリップ表面との間隔を
一定の設定値に保持するように、該ストリップの算出さ
れた前記振幅に対応して前記ガスワイピングノズルの前
記ストリップに対する直角方向の移動址を算出する演算
装置と、上記の算出した移動数に対応して前記ガスワイ
ピングノズルを前記ストリップに対して直角方向に移動
させる手段とを具備することを特徴とする、連続浴融亜
鉛めっきにおける亜鉛付着量制御装置。
(2) An amplitude detection device that detects the vibration amplitude of the strip sent out from the galvanizing tank at an appropriate position, and calculates the width of one arm of the strip at the set position of the gas wiping nozzle from the detected amplitude, and Calculating the movement of the gas wiping nozzle in the direction perpendicular to the strip in response to the calculated amplitude of the strip so as to maintain the distance between the nozzle tip of the wiping device w and the strip surface at a constant set value. and means for moving the gas wiping nozzle in a direction perpendicular to the strip in accordance with the calculated number of movements. Control device.
JP9958581A 1981-06-29 1981-06-29 Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping Pending JPS583959A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9958581A JPS583959A (en) 1981-06-29 1981-06-29 Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9958581A JPS583959A (en) 1981-06-29 1981-06-29 Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping

Publications (1)

Publication Number Publication Date
JPS583959A true JPS583959A (en) 1983-01-10

Family

ID=14251167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9958581A Pending JPS583959A (en) 1981-06-29 1981-06-29 Method and device for controlling weight of hot dip plated zinc in continuous zinc hot dipping

Country Status (1)

Country Link
JP (1) JPS583959A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01188656A (en) * 1988-01-22 1989-07-27 Nisshin Steel Co Ltd Snout in continuous hot-dipping device
EP0395759A1 (en) * 1988-09-29 1990-11-07 Nisshin Steel Co., Ltd. Apparatus for manufacturing minimized spangle molten plated steel plate
FR2690170A1 (en) * 1992-04-17 1993-10-22 Clecim Sa Device with an air knife regulating a metal deposit.
JP2017101308A (en) * 2015-12-04 2017-06-08 Jfeスチール株式会社 Production method of melting metal plate steel strip and continuous melting metal plate equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5348032A (en) * 1976-10-15 1978-05-01 Hitachi Ltd Continuous plating apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5348032A (en) * 1976-10-15 1978-05-01 Hitachi Ltd Continuous plating apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01188656A (en) * 1988-01-22 1989-07-27 Nisshin Steel Co Ltd Snout in continuous hot-dipping device
EP0395759A1 (en) * 1988-09-29 1990-11-07 Nisshin Steel Co., Ltd. Apparatus for manufacturing minimized spangle molten plated steel plate
FR2690170A1 (en) * 1992-04-17 1993-10-22 Clecim Sa Device with an air knife regulating a metal deposit.
JP2017101308A (en) * 2015-12-04 2017-06-08 Jfeスチール株式会社 Production method of melting metal plate steel strip and continuous melting metal plate equipment

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