JPS5834935B2 - Semiconductor wafer testing probe - Google Patents

Semiconductor wafer testing probe

Info

Publication number
JPS5834935B2
JPS5834935B2 JP55091356A JP9135680A JPS5834935B2 JP S5834935 B2 JPS5834935 B2 JP S5834935B2 JP 55091356 A JP55091356 A JP 55091356A JP 9135680 A JP9135680 A JP 9135680A JP S5834935 B2 JPS5834935 B2 JP S5834935B2
Authority
JP
Japan
Prior art keywords
probes
probe
mounting ring
tip
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55091356A
Other languages
Japanese (ja)
Other versions
JPS5717143A (en
Inventor
昌男 大久保
康良 吉光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Electronic Materials Corp
Original Assignee
Japan Electronic Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Electronic Materials Corp filed Critical Japan Electronic Materials Corp
Priority to JP55091356A priority Critical patent/JPS5834935B2/en
Priority to US06/266,054 priority patent/US4523144A/en
Publication of JPS5717143A publication Critical patent/JPS5717143A/en
Publication of JPS5834935B2 publication Critical patent/JPS5834935B2/en
Priority to US06/613,346 priority patent/US4567433A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07342Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card

Description

【発明の詳細な説明】 本発明は、IC,LSI等の半導体製品の検査に用いる
探針器に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a probe used for testing semiconductor products such as ICs and LSIs.

半導体ウエハーチツプーヒにおける試験用電極の配列は
、従来、第1図に示すようにチップの周辺部に沿って設
けられていたから、探針先端の間隔が0.5 myn以
下と極めて近接している場合であっても基板上から探針
先端と半導体電極の接触状態を視覚により確認すること
ができた。
Conventionally, the test electrodes in semiconductor wafer chips have been arranged along the periphery of the chip as shown in Figure 1, so the probe tips are very close to each other with a spacing of less than 0.5 myn. Even when the contact state between the tip of the probe and the semiconductor electrode was visually confirmed from above the substrate.

ところが最近、半導体チップ上の電極数の増大化と共に
、チップ周辺部のみでなく、例えば第2図に示すように
、チップの中央部をも含むチップ全面に規則的、或いは
不規則に電極が配列されたものが考案されつつある。
However, recently, with the increase in the number of electrodes on a semiconductor chip, electrodes are arranged regularly or irregularly not only on the periphery of the chip, but also over the entire surface of the chip, including the center of the chip, as shown in Figure 2. New ideas are being devised.

本発明はこのような電極を備えた半導体ウェハーを試験
するための探針器を提供することを目的としている。
The object of the present invention is to provide a probe for testing semiconductor wafers equipped with such electrodes.

以下、本発明の実施例を図面に基いて説明する。Embodiments of the present invention will be described below with reference to the drawings.

第3図に本発明実施例の断面図を示し、第4図に第3図
の要部拡大図、第5図に第4図の■−■断面図、第6図
に第3図実施例の平面図の部分図をそれぞれ示す。
Fig. 3 shows a sectional view of the embodiment of the present invention, Fig. 4 is an enlarged view of the main part of Fig. 3, Fig. 5 is a sectional view taken along the line ■-■ of Fig. 4, and Fig. 6 shows the embodiment of Fig. 3. Each shows a partial view of the plan view.

全体の構成は、基板1の中央部に円孔2と段部3を形成
し、その段部3に探針取付リング4を接着し、その取付
リング4上に探針5・・・5を後述するように支持し、
基板1の周辺部又は上面6上に外部接続用端子(図示せ
ず)を設け、探針5・・・5の根元部を半田付けした基
板表面の導体7・・・7と外部接続用端子をそれぞれ接
続している。
The overall structure consists of forming a circular hole 2 and a step 3 in the center of a substrate 1, adhering a probe mounting ring 4 to the step 3, and attaching probes 5...5 to the mounting ring 4. support as described below,
External connection terminals (not shown) are provided on the periphery or top surface 6 of the substrate 1, and the external connection terminals are connected to the conductors 7...7 on the substrate surface to which the bases of the probes 5...5 are soldered. are connected to each other.

なお、9は試験すべき半導体ウェハーを示す。Note that 9 indicates a semiconductor wafer to be tested.

探針5の一般的形状は、腰部(V−V線よりも根元側)
が一様な太さを有し、そこから屈折点Bまでが先端にな
るほど細くなるテーパ部をなし、先端部が前方へ向けて
カギ形に曲っている。
The general shape of the probe 5 is at the waist (on the base side of the V-V line)
It has a uniform thickness, and from there to the bending point B, it forms a tapered part that becomes thinner toward the tip, and the tip is bent forward into a hook shape.

また、第4図から明らかなように、取付リングの軸方向
について複数個の探針が互に平行な多層円錐面を形成し
て多層に取付けられており、その内層(取付リングに近
い層)に取付けられた探針の先端部は、それより外層に
取付けられた探針の先端部よりも長く形成され、内層に
取付けられた探針は主として半導体チップの中央部に設
けられた電極に接触し、外層に取付けられた探針は主と
して半導体チップの周辺部に設けられた電極に接触する
Furthermore, as is clear from Fig. 4, a plurality of probes are attached in multiple layers forming parallel multilayer conical surfaces in the axial direction of the mounting ring, and the inner layer (layer close to the mounting ring) The tip of the probe attached to the semiconductor chip is longer than the tip of the probe attached to the outer layer, and the tip of the probe attached to the inner layer mainly contacts the electrode provided in the center of the semiconductor chip. However, the probe attached to the outer layer mainly contacts electrodes provided at the periphery of the semiconductor chip.

このような配設状態において、回路基板の背面から半導
体チップを見たとき、第6図のCに示すように、3〜4
個の探針の先端位置が視覚できるように配設されている
In such an arrangement state, when looking at the semiconductor chip from the back side of the circuit board, as shown in C of FIG.
The probes are arranged so that the tip positions of the probes can be visualized.

このような探針の取付は方法は、取付リング4の上に一
度接着剤を塗布して先端部の長い探針を固着して最も内
層の探針群を放射状に形成したのち、その上に再度接着
剤を塗布して先端部がそれよりも短い探針を固着し、更
にその上に接着剤を塗布して先端部が更に短い探針を固
着することにより、第4図及び第5図に示すように、接
着剤10に探針5・・・5が埋設固定された構造が得ら
れる。
The method for attaching such probes is to apply adhesive once on the mounting ring 4 and fix the probe with the long tip to form the innermost probe group in a radial pattern, and then attach the probe on top of it. By applying adhesive again to fix the probe with a shorter tip, and then applying adhesive on top of that to fix the probe with an even shorter tip, as shown in Figures 4 and 5. As shown in the figure, a structure in which the probes 5 are embedded and fixed in the adhesive 10 is obtained.

この接着剤10としてはエポキシ樹脂が好ましい。The adhesive 10 is preferably an epoxy resin.

なお本発明の変形実施例として、基板1の孔2の背面周
辺にも第2の取付リングを設け、その取付リング上に探
針を率層又は複層に固着したものを附加して実施するこ
とができ、また他の変形実施例として、孔2の背面周辺
に導体からなるブレードを放射状に設け、そのブレード
の先端に探針を半田付は又はろう付けする、いわゆるブ
レード型探針と併用して実施することができる。
As a modified embodiment of the present invention, a second mounting ring is also provided around the back surface of the hole 2 of the substrate 1, and a probe fixed in a layer or multiple layers is attached to the mounting ring. In addition, as another modified embodiment, a blade made of a conductor is provided radially around the back surface of the hole 2, and a probe is soldered or brazed to the tip of the blade, in combination with a so-called blade type probe. It can be implemented by

本発明によれば、接着剤を用いて探針を取付リングの円
周方向に放射状に、かつ、軸方向に多層に固着配設し、
しかも探針の先端部の長さを取付リングに近いものをよ
り長く形成したから、半導体チップの周縁部だけでなく
中央部にも多数のテスト用端子電極が分布した、回路集
積度の高い半導体チップの試験に用いる、狭い面積に多
数の探針が密集した試験用探針器を比較的容易に、かつ
、コンパクトに製作することができる。
According to the present invention, the probes are fixedly disposed radially in the circumferential direction of the mounting ring and in multiple layers in the axial direction using an adhesive,
Moreover, since the tip of the probe is made longer near the mounting ring, a large number of test terminal electrodes are distributed not only on the periphery of the semiconductor chip but also in the center, making it possible to create semiconductors with high circuit integration. It is possible to relatively easily and compactly manufacture a test probe in which a large number of probes are densely packed in a small area, which is used for chip testing.

なお、探針の固着は接着剤によっているので、機械的に
も頑丈で、探針固着部にゆるみが生じるようなことはな
い。
Note that since the probe is fixed using adhesive, it is mechanically strong and there is no chance of the probe fixing part becoming loose.

さらに、探針の先端部の配列は、いくつかの探針の先端
部が基板背面より視覚できるように行われているので、
それらについて半導体チップのテスト用端子との対応を
確立させれば、探針の総数が如何に多くても他の探針と
テスト用端子との位置合わせは自動的に完了し、作業能
率が向上する。
Furthermore, the tips of the probes are arranged so that the tips of some of the probes can be seen from the back of the board.
If you establish correspondence between them and the test terminals of the semiconductor chip, no matter how large the total number of probes is, the alignment between the other probes and the test terminals will be completed automatically, improving work efficiency. do.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体チップ上の電極配列例を示す拡大
図、第2図は本発明が適用される半導体チップ上の電極
配列例を示す拡大図である。 第3図は本発明実施例の断面図、第4図は第3図の要部
拡大図、第5図は第4図の■−■断面図、第6図は第3
図実施例の平面図の部分図を示す。 1・・・・・・基板、2・・・・・・孔、4・・・・・
・探針取付リング、5・・・・・・探針、9・・・・・
・半導体ウェハー、10・・・・・・接着剤。
FIG. 1 is an enlarged view showing an example of an electrode arrangement on a conventional semiconductor chip, and FIG. 2 is an enlarged view showing an example of an electrode arrangement on a semiconductor chip to which the present invention is applied. Fig. 3 is a sectional view of an embodiment of the present invention, Fig. 4 is an enlarged view of the main part of Fig. 3, Fig. 5 is a cross-sectional view taken along
Figure 3 shows a partial view of the top view of the embodiment; 1... Board, 2... Hole, 4...
・Probe mounting ring, 5... Probe, 9...
・Semiconductor wafer, 10...Adhesive.

Claims (1)

【特許請求の範囲】[Claims] 1 回路基板の中央部に形成した孔の周辺にお0)で、
上記回路基板の片面に探針取付リングを設け、この取付
リング上に腰部に対して断面が円形で先端部が前方へ屈
曲した探針の複数個を、その探針の各先端が、上記回路
基板上の上記取付リングの設けられた側の面に対向して
保持され試験される半導体電極のそれぞれに接触するよ
うに取付け、これら複数個の探針の根元部を外部接続用
端子に接続してなる装置において、上記探針を接着剤を
用いて上記取付リングの円周方向に放射状に、かつ、軸
方向に多層平行円錐面を形成して層状に固着配設し、内
層(取付リングに近い層)に設けられた探針の先端部を
それより外層に設けられた探針の先端部よりも長く形成
し、全体として内側に設けられた探針が半導体チップの
中央部に設けられた電極に接触し外側に設けられた探針
が半導体チップの周辺部の電極に接触し、且つ上記回路
基板の孔の背面から半導体チップを見たときいくつかの
探針の先端位置が視覚できるように配置されていること
を特徴とする半導体ウェハー試験用探針器。
1.0) around the hole formed in the center of the circuit board,
A probe mounting ring is provided on one side of the circuit board, and a plurality of probes each having a circular cross-section and a tip bent forward relative to the waist are mounted on the mounting ring, and each tip of the probe is attached to the above-mentioned circuit board. The probes are held opposite the surface of the substrate on which the mounting ring is provided, and are mounted so as to contact each of the semiconductor electrodes to be tested, and the bases of these multiple probes are connected to external connection terminals. In this device, the probes are fixedly arranged in a layered manner using an adhesive to form a multilayer parallel conical surface radially in the circumferential direction of the mounting ring and in the axial direction, and the inner layer (on the mounting ring) The tips of the probes provided on the nearer layers are made longer than the tips of the probes provided on the outer layers, and the probes provided on the inside as a whole are provided in the center of the semiconductor chip. The probes provided on the outside in contact with the electrodes are in contact with the electrodes on the periphery of the semiconductor chip, and the tip positions of some of the probes are visible when the semiconductor chip is viewed from the back side of the hole in the circuit board. A probe for testing semiconductor wafers, characterized in that the probe is located at.
JP55091356A 1980-05-27 1980-07-03 Semiconductor wafer testing probe Expired JPS5834935B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP55091356A JPS5834935B2 (en) 1980-07-03 1980-07-03 Semiconductor wafer testing probe
US06/266,054 US4523144A (en) 1980-05-27 1981-05-21 Complex probe card for testing a semiconductor wafer
US06/613,346 US4567433A (en) 1980-05-27 1984-05-23 Complex probe card for testing a semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55091356A JPS5834935B2 (en) 1980-07-03 1980-07-03 Semiconductor wafer testing probe

Publications (2)

Publication Number Publication Date
JPS5717143A JPS5717143A (en) 1982-01-28
JPS5834935B2 true JPS5834935B2 (en) 1983-07-29

Family

ID=14024100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55091356A Expired JPS5834935B2 (en) 1980-05-27 1980-07-03 Semiconductor wafer testing probe

Country Status (1)

Country Link
JP (1) JPS5834935B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605900U (en) * 1983-06-22 1985-01-16 畑佐 正巳 Freely transferable floor wall
JPH048973U (en) * 1990-05-14 1992-01-27
JP4074677B2 (en) * 1996-10-24 2008-04-09 株式会社日本マイクロニクス Inspection head
KR101016387B1 (en) 2008-08-11 2011-02-21 티에스씨멤시스(주) Probe structure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138224A (en) * 1974-09-30 1976-03-30 Hitachi Metals Ltd Fe cr co keijishakugokinnoseizohoho
JPS5353265A (en) * 1976-10-26 1978-05-15 Citizen Watch Co Ltd Prober

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138224A (en) * 1974-09-30 1976-03-30 Hitachi Metals Ltd Fe cr co keijishakugokinnoseizohoho
JPS5353265A (en) * 1976-10-26 1978-05-15 Citizen Watch Co Ltd Prober

Also Published As

Publication number Publication date
JPS5717143A (en) 1982-01-28

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