JPS5829630A - Manufacture of optical part - Google Patents

Manufacture of optical part

Info

Publication number
JPS5829630A
JPS5829630A JP12861981A JP12861981A JPS5829630A JP S5829630 A JPS5829630 A JP S5829630A JP 12861981 A JP12861981 A JP 12861981A JP 12861981 A JP12861981 A JP 12861981A JP S5829630 A JPS5829630 A JP S5829630A
Authority
JP
Japan
Prior art keywords
layer
metal reflective
matrix
photo
reflective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12861981A
Other languages
Japanese (ja)
Inventor
Takaaki Miyashita
宮下 隆明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP12861981A priority Critical patent/JPS5829630A/en
Publication of JPS5829630A publication Critical patent/JPS5829630A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00865Applying coatings; tinting; colouring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00596Mirrors

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To obtain inexpensively an optical part good in accuracy of the surface, by providing a photo-setting resin layer on a plastic substrate surface, and a releasing agent layer and a metal reflective layer on a surface of a matrix, bringing them into firm contact with each other, irradiating an activation energy beam on the photo-setting resin layer, and separating the matrix at the releasing agent layer from the matrix. CONSTITUTION:A photo-setting resin (e.g. an ultraviolet-curing resin, etc.) layer 2 is formed on the surface of a plastic substrate 1 (e.g. a polymethyl methacrylate resin, etc.), and after a releasing agent (e.g. a polydimethyl siloxane, etc.) layer 4 and then a metal reflective film 5 (e.g. an Al deposited film, etc.) are successively formed on the surface of the matrix 3 for an optical part to be produced, the photo-setting resin layer 2 and the metal reflective layer 5 are brought into firm contact with each other. Then an activation energy beam (e.g. ultraviolet beam, etc.) is irradiated to set the photo-setting resin layer 2, and the matrix 3 is separated with the aid of the releasing agent layer 4 from the plastic substrate 1 to obtain the intended reflective optical part.

Description

【発明の詳細な説明】 この発明は、光学部品の製造方法、特にレプリツノ法V
こ」ころ反射用光学部品の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an optical component, particularly a method for manufacturing an optical component, and in particular a method for manufacturing an optical component.
The present invention relates to a method for manufacturing a reflective optical component.

従来における光学部品の製造方法は、光学部品の本体ま
たは基体として、例えばプラスチックを使用する場合、
射1」1成形法、圧縮成形法などが利用されていた。し
かしながら、これらによる製造法は、コストは安いもの
の、光学部品の形状か複■[になればなるほど、成形用
の型からの転写性が悪くなり、必要な光学特性を得ろこ
とが難しくなる。特に反射面のような平面を得ようとす
る場合、成形条イ/1によっては而Kl−ひけ]等が発
生して、成形用】−リの面積度がいくらよくても、これ
を忠実に111現できないことが多い。また、これら成
形法によって形成さJl、 ftニブラスチックt4(
4<に、A)。
In the conventional manufacturing method of optical components, for example, when plastic is used as the main body or base of the optical component,
The injection molding method and the compression molding method were used. However, although these manufacturing methods are low in cost, the more complex the shape of the optical component, the worse the transferability from the mold, and the more difficult it becomes to obtain the necessary optical properties. In particular, when trying to obtain a flat surface such as a reflective surface, depending on the molding strip A/1, problems such as "Kl-sink" may occur, and no matter how good the surface area of the molding strip A/1 is, it is difficult to faithfully reproduce this. 111 There are many things that cannot be done. In addition, Jl, ft Niblastik t4 (
4<, A).

Ag、 Orなどの金属薄膜を蒸ス’f して反Q−1
1rji w 1する場合、蒸着源からの輻射熱に、1
:リブラスチ、り基体が変形したり、蒸発金属が1・1
着する際1c、プラスチック基体表面が部分的(で高温
に/fっで、熱にJ:る歪みが発生したりすることかあ
る。別σ)ソ醒?部品製造方法として、光学部品のI(
1P、jiずなわち1.IJI;41の形状を基[イク
に転写′するレプリカ法があ2)が、これは基体として
ガラスを利用するため、部品の形状が複雑になるとそれ
たけコストが高<Z(:る欠点がある。
Anti-Q-1 is formed by vaporizing a thin film of metal such as Ag or Or.
1 rji w 1, the radiant heat from the evaporation source is 1
: Liblast, the substrate may be deformed, or the evaporated metal may be 1.1
When attaching the product, the surface of the plastic substrate may become partially distorted due to the heat. As a part manufacturing method, I(
1P, jizu, 1. There is a replica method that transfers the shape of IJI; be.

この発明の1]的は、:1ストの安いプラスチックを基
体として用い、しかり、■’I’l’i度か良く、光学
特性の優れた特に反射1摸を有する光学部品の製造方法
を提供することにある。この発明は、得ようとする光学
部品に近い形状にプラスデック利1”+ 6: Q=を
出成形法等により成形して基体とし、その+に光硬化性
樹脂層を設けるとともに、原器となる光学部品の母、型
に離型剤層および金属反射膜層全順次設けて両者をri
に接合した後、紫外線等の1占性エ 5− ネルギー線を照射して、光硬化性樹脂層を母型の形状に
なられせながら硬化させ、金属反射層膜層を光硬化性樹
脂を介してプラスチック基体に転写して光学部品を得る
ことを特徴とする。
1] The object of the present invention is to provide a method for manufacturing an optical component using cheap plastic as a substrate, and having good optical properties, especially reflection. It's about doing. In this invention, a plus deck 1"+6: Q= is formed into a shape similar to the desired optical component by a molding method, etc., as a base, a photocurable resin layer is provided on the +, and a prototype is formed. A mold release agent layer and a metal reflective film layer are all sequentially provided on the mold of the optical component that will be used, and both are ri.
After bonding to the metal reflective layer, the photocurable resin layer is cured by irradiating it with mono-occupant energy rays such as ultraviolet rays, and is shaped into the shape of the matrix, and the metal reflective layer is bonded to the photocurable resin layer. It is characterized in that an optical component is obtained by transferring it to a plastic substrate through a plastic substrate.

以下、この発明の実施例を第1図を参照して説明する。An embodiment of the present invention will be described below with reference to FIG.

まず初めに、光学riJr摩により表面舎仕上げた金属
寸たはガラスブ工どの射111成形用型を成形機に取り
(−Jけ、その中にアクリル樹脂などを射出させて光学
部品となる基体1を成形する。この光学部品の基体は、
一応の面精度がでており、その表面に光硬化性樹脂層2
を、塗布などの方法により設ける。一方、原器となる母
型ろも、金属やガラスなどを光学ω[昭して形成され、
その表面に離型剤層4を塗布、スプレーまたは真空蒸着
等の方法により設けた後、さらてその上にA4.Ag、
Or、 Auなとの金属反射膜層5を真空蒸着法、スパ
ッタリング法、イオンプレーテインク法等てより、厚さ
5 ト+ 00nm程度に形成する。プラスチック基体
1と母型5とは、少なくとも一方が透光性材料で形成き
れて= 4 − いることが好ましい。そして、プラスヂノクノ、I:体
1と母型ろとを、第1図(B)に示ずよう区−、ソl′
;硬化性樹脂層2と金属反射膜層5とが密着するように
接合した後、紫外線なとの活性エネルギー線6を光硬化
性樹脂層2に向けて照Q=)ずZl o これに3にり
、薄い光硬化性樹脂層2か、IU母型の而にならうよう
にして硬化するとともに、金属反射膜層5が光硬化性樹
脂層2を介してプラスチック基体1に転写される。した
がって、プラスチックJ、l; (4\1と1zJ型ろ
とを肉[]型剤層4を介して分肉[1ずろことにより、
第1図(C) IC示すように、IJ型の而:R’) 
Ir、tがそっくりその捷−!耘?メされた面精度の高
い反射用光学部品が得られる。
First, a mold for injection molding of a metal or glass plate whose surface has been finished by optical RIJr polishing is placed in a molding machine (-J), and an acrylic resin or the like is injected into it to form a substrate 1 that will become an optical component. The base of this optical component is
It has a certain degree of surface accuracy, and there is a photocurable resin layer 2 on the surface.
is provided by a method such as coating. On the other hand, the prototype matrix, metal, glass, etc., was formed by optical
After providing the mold release agent layer 4 on the surface by coating, spraying, vacuum deposition, etc., A4. Ag,
A metal reflective film layer 5 of Or, Au, etc. is formed to a thickness of about 500 nm by vacuum evaporation, sputtering, ion plate ink, or the like. It is preferable that at least one of the plastic substrate 1 and the matrix 5 be made of a translucent material. Then, the body 1 and the matrix locus are shown in Figure 1 (B).
; After bonding the curable resin layer 2 and the metal reflective film layer 5 so that they are in close contact with each other, an active energy ray 6 such as ultraviolet rays is directed toward the photocurable resin layer 2. Then, the thin photocurable resin layer 2 is cured following the pattern of the IU matrix, and the metal reflective film layer 5 is transferred to the plastic substrate 1 via the photocurable resin layer 2. Therefore, plastic J, l;
Figure 1 (C) As shown in IC, IJ type: R')
Ir, t are exactly the same!耘? A reflective optical component with high surface precision can be obtained.

上記実施例rおける離型剤層4の次に、第2図に示すよ
うに、屈1フ[甲が約1.85のSiOの透明薄膜層7
を、厚さ+50nm程度に真空蒸着法、スパッタリング
法、イオンプレーテインク法等に3J:り設け、その次
に金属反射膜層5を設けJlは、出来上った光学部品の
表面には、透明WI’j I膜層7か形成されているの
で、これか金属反射膜層5のための保護膜として機能す
ることになる。
Next to the mold release agent layer 4 in Example R, as shown in FIG.
is applied to a thickness of approximately +50 nm using a vacuum evaporation method, a sputtering method, an ion plate ink method, etc., and then a metal reflective film layer 5 is provided on the surface of the completed optical component. Since the transparent WI'j I film layer 7 is formed, it functions as a protective film for the metal reflective film layer 5.

また、第5図に示すように、離型剤層4の上に、T 1
.02を厚さ60 nm程度に、さらにその上にMgF
2を厚さ’100 nm程度に形成して二層の透明薄膜
層7,8を設け、その上に金属反射膜層5を形成するこ
と匠」:す、増反射コートされた表面反射ミラーを得る
ことができる。
Further, as shown in FIG. 5, on the mold release agent layer 4, T 1
.. 02 to a thickness of about 60 nm, and then MgF on top of it.
2 to a thickness of about 100 nm, two transparent thin film layers 7 and 8 are provided, and a metal reflective film layer 5 is formed thereon. Obtainable.

さらに、第2図における透明薄膜層7の代りに、屈4)
?率が約2.0のIn705 f、厚さ約+40 nm
 fC形成して透明導電層とすることができる。これは
02ガス′雰囲気内でスパッタリング法などにより形成
される。そして、この透明導電層に微小な電流を流すこ
と((より、金属反射膜表面の保護と結露防11−の両
機能を持たせることができる。t8だ、第5図における
透明薄膜層7としてIn2O3を約140nmの厚さに
形成して導電層とし、その」−の透明薄膜層8ケMgF
2を約1100nの厚さに形成して誘電層とするこI−
により、金属反射膜5の保護と反射層1トと結露+f〕
月1・の三つの効果を持たせることができる。
Furthermore, instead of the transparent thin film layer 7 in FIG.
? In705 f with a modulus of approximately 2.0, thickness approximately +40 nm
fC can be formed to form a transparent conductive layer. This is formed by a sputtering method or the like in an atmosphere of 02 gas. Then, by passing a minute current through this transparent conductive layer, it can have both the functions of protecting the surface of the metal reflective film and preventing condensation. In2O3 is formed to a thickness of about 140 nm as a conductive layer, and 8 transparent thin film layers of MgF
2 to a thickness of about 1100 nm to form a dielectric layer.
Therefore, the protection of the metal reflective film 5, the reflective layer 1 and dew condensation +f]
It can have three effects: 1/month.

プラスチック基体1は、射11)成形法の他に、圧綿成
形法、射出圧縮成形法、注J、1ilJ、法なとの成形
法が用いられ、使用できる利イこ1としては、ポリメチ
ルメタクリレート樹脂、ポリカーボネート樹脂、スチロ
ール系樹脂、ABS樹脂、As樹脂ノ3cとのり41・
用塑性樹l旨およびジエチレングリコ−7レヒスアリ7
レ力−ボネート重合体(ppc社製商品名[;R59)
、エボギン樹脂などの熱硬化性樹脂かある。JC7(i
il!化性樹脂2としては、紫外線硬化樹脂の他、メタ
クリル酸エステルなどのr線により硬化するガラス化性
モノマーなど、先具外の放q・[線、?l尤F線等によ
って重合硬化するものも使用できる。加)1.す剤4ト
シては、ポリシメチルシロキづンケ]二体どするシリコ
ン系オイルなどが使用できる。透明薄膜層7.8として
ば、Sj、02 、 Sin、 At203. MgF
2. GaF 2+No3AtF6.TiO2,CeO
2,ZrO2,ZuSなとが利用できる。
In addition to the injection molding method (11), the plastic substrate 1 can be formed by a compression molding method, an injection compression molding method, or a molding method such as the injection compression molding method. Methacrylate resin, polycarbonate resin, styrene resin, ABS resin, As resin 3c and glue 41.
Plasticity resin and diethylene glyco-7 resin 7
Repower-bonate polymer (product name manufactured by ppc [;R59)]
, thermosetting resins such as Evogin resin. JC7(i
Il! In addition to ultraviolet curing resins, the curing resin 2 may include vitrifying monomers such as methacrylic acid esters that are cured by r-rays. It is also possible to use materials that are polymerized and cured by F-rays or the like. K) 1. As a cleaning agent, a silicone oil containing polymethylsiloxane or the like can be used. As the transparent thin film layer 7.8, Sj, 02, Sin, At203. MgF
2. GaF2+No3AtF6. TiO2, CeO
2, ZrO2, ZuS, etc. can be used.

これらの薄膜層は、[1的に応じ7てかlI /z [
組合わせて、何層にも形成することができる6、この発
明による方法は、反射膜をイJするソロ学部品全般に適
用できるが、第4図に示すようなマイクロダハミラーア
レイや、ダハミラー、コーナーギューブプリズム、回転
多面鏡、平面ミラー等て特に有効である。
These thin film layers are composed of [1 according to 7 or lI /z [
6. The method according to the present invention can be applied to all kinds of solar components that require a reflective film, but it can also be applied to micro-roof mirror arrays and roof mirrors as shown in Fig. 4. It is particularly effective for , corner gave prisms, rotating polygon mirrors, plane mirrors, etc.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この発明による光学部品製造方法の一例を示
す図、第2図および第5図は、この発明による光学部品
製造方法の他の例を示す図、第4図は、この発明の方法
により形成される光学部品の一例を示す図である。 1・・・プラスチンク基体、2・・・光硬化性樹脂層、
ろ・・・(廿型、4・・離型剤層、5・・・金属反射膜
層、61.・活性エネルギー線、7,8・・・透明薄膜
層。 く      鳴 161− (D
FIG. 1 is a diagram showing an example of the optical component manufacturing method according to the present invention, FIGS. 2 and 5 are diagrams showing other examples of the optical component manufacturing method according to the present invention, and FIG. 4 is a diagram showing an example of the optical component manufacturing method according to the present invention. FIG. 3 is a diagram showing an example of an optical component formed by the method. 1...Plastink base, 2...Photocurable resin layer,
Ro... (Mold, 4... Release agent layer, 5... Metal reflective film layer, 61. Active energy rays, 7, 8... Transparent thin film layer. Ku Mei 161- (D

Claims (1)

【特許請求の範囲】 1 プラスチック基M<表面((光4’nIJ!化性樹
脂層を形成する工程と、 製造すべき〕C学部品のIJJlil+の表面にjj!
+’、 lli’j剤層および金属反射膜層をIll〔
i次形成する工程と、前記Jt、 (illi化性樹脂
層と金属反射膜層とを11;に接合しゾこ後、活性エネ
ルギー線を照q、■シて前記光硬化性樹脂層を硬化さぜ
る1°程と、前記INJ琴J、を])11記都型剤層を
介して1iit記プラスチック基体から分離する「程と
金β1むソ1′4学部品製造方法。 2、  MiJ記プラスデックJ、C(4\か射出成形
υ、−1削出圧縮成形法、圧&i成杉法等の成形法にl
Xす115成される特許+:l’j求の範囲第1頂記1
1νの方法。 6 前記プラスチノウ基体−またはl:J: 1114
)のうちの少なくとも 一方が光透過性イ′A利−r:
1し成されてい2〕特許1i1ノ求の範囲第11′l′
j記載の方法。 4 前記Iせ型に形成し、た離型剤層と金属反射膜層と
の間に、透明誘電体層を少なくとも一層形成した特許請
求の範囲第1項記載の方法。 5 前記透明誘電体層のうちの少なくとも一層を透明導
電体層Vrc行き替えた特許811ノ求の範囲第4項記
載の方法。
[Scope of Claims] 1 Plastic base M
+', lli'j agent layer and metal reflective film layer Ill[
The step of forming the Jt, (the illumination resin layer and the metal reflective film layer are bonded to 11), and then the photocurable resin layer is cured by irradiating active energy rays. [11] Separating the above-mentioned INJ Koto J from the plastic substrate through the 11-layer agent layer. 2. MiJ Plus deck J, C (4\ or injection molding υ, -1 for molding methods such as cutting compression molding method, pressure & i cedar method etc.
XS115 Patent to be created +: l'j range of first apex 1
1ν method. 6 Said plastino substrate - or l:J: 1114
) at least one of them has optical transparency.
1 and 2] Patent 1i1 Scope No. 11'l'
The method described in j. 4. The method according to claim 1, wherein at least one transparent dielectric layer is formed between the mold release agent layer and the metal reflective film layer formed in the I-shaped shape. 5. The method according to item 4 of the scope of Patent No. 811, wherein at least one of the transparent dielectric layers is replaced with a transparent conductor layer Vrc.
JP12861981A 1981-08-17 1981-08-17 Manufacture of optical part Pending JPS5829630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12861981A JPS5829630A (en) 1981-08-17 1981-08-17 Manufacture of optical part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12861981A JPS5829630A (en) 1981-08-17 1981-08-17 Manufacture of optical part

Publications (1)

Publication Number Publication Date
JPS5829630A true JPS5829630A (en) 1983-02-21

Family

ID=14989261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12861981A Pending JPS5829630A (en) 1981-08-17 1981-08-17 Manufacture of optical part

Country Status (1)

Country Link
JP (1) JPS5829630A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS624718U (en) * 1985-06-24 1987-01-12
US4743410A (en) * 1985-03-29 1988-05-10 Siemens Aktiengesellschaft Method for manufacturing a flat illumination unit
US4747981A (en) * 1985-10-07 1988-05-31 Robinson Jesse L Method of molding a urethane reflector
JP2006162933A (en) * 2004-12-07 2006-06-22 Sony Corp Prism and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4743410A (en) * 1985-03-29 1988-05-10 Siemens Aktiengesellschaft Method for manufacturing a flat illumination unit
JPS624718U (en) * 1985-06-24 1987-01-12
US4747981A (en) * 1985-10-07 1988-05-31 Robinson Jesse L Method of molding a urethane reflector
JP2006162933A (en) * 2004-12-07 2006-06-22 Sony Corp Prism and manufacturing method thereof

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