JPS5825036A - Exposure of color picture tube video screen - Google Patents

Abstract

PURPOSE:To increase the formation tolerance of BM film stripes, and the adhesive strength of phosphor film stripes formation by carrying out exposure during the formation of black matrix BM films with the diameter of a light source adjusted to be larger than that during the formation of phosphor film stripes. CONSTITUTION:A photoresist phosphor slurry 2 applied to the inner wall of a panel 1 is exposed and activated according to a slit pattern 5 provided in a shadow mask 4, by means of an exposure device including a mercury lamp used as a direct linear light source 3, so as to form black matrix BM film stripes 6 and phosphor PH film stripes 7. The width (C) of the BM film stripes 6 is made smaller than the slit width (B) of the slit pattern 5 in order to increase the purity tolerance. The width (E) of the PH film stripes 7 becomes larger than the slit width (B), but should not be so large that it protrudes into adjacent PH film stripes 7. As a result, the formation tolerance of the BM film stripes 6 is increased, and the adhesive strength of the PH film stripes 7 can be increased.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for exposing a color picture tube screen.

The exposure method for forming the fluorescent surface, which is the screen of the color picture tube, uses a black matrix film (hereinafter referred to as 8
A method in which the formation of the 8M film (hereinafter referred to as "M film") and the fluorescent film (hereinafter referred to as PH film) are performed under the same conditions eliminates the positional shift between the 8M film and the PH film, and also eliminates the need for correction. However, B.
The film thickness of photoresist during MM formation is very thin at 0.6 μm, whereas the film thickness of phosphor slurry during PH film formation is extremely thick at 30 μm, and the photoresist and phosphor slurry have different photosensitivity. Furthermore, the 8M film is smaller than the aperture of the shadow mask, and the PH film is larger than the aperture of the shadow mask due to film thickness.
If both are formed under the same conditions, the latitude for forming the BM film stripes will be reduced, and the adhesive strength (illuminance x time) for forming the PH film stripes will be unreliable.

The present invention has been made against the above background, and it is an object of the present invention to provide an exposure method for a color filter screen that can improve the tolerance for forming BM film stripes and the adhesive strength for forming PH film stripes. Purpose〇The present invention will be explained below with reference to the drawings.

As shown in Figure 1, the fluorescent surface formation of a color picture tube is
A slit pattern 5 formed on a shadow mask 4 was exposed to light on the photoresist coated on the inner surface of the panel I and the phosphor slurry 2 using an exposure device using a mercury lamp as direct linear light WI3, as shown in FIG. Like, BM
A film stripe 6 and a PH film stripe 7 are formed. At this time, the maximum exposure range Dmax and minimum exposure range 11Dmin of the light spot 8 are as follows: The diameter of the light source 3 is 81, the slit width of the slit pattern 5 is 81, the distance from the light source 3 to the shadow mask 4 is P1, the distance from the shadow mask 4 to the inner surface of the panel l Letting the distance to Q be Q, it is approximately geometrically expressed by the following equation.

D wax w (B + A) X” + BDm
in=(B-person)XQ+B This relationship is illustrated as shown in FIG.

Now, the width C of the BM film stripe 6 is formed to be smaller than the width of the electron beam, that is, smaller than the slit width B of the slit pattern 5, in order to improve the purity margin. This will be exposed to light as shown in FIG. That is, as the light source diameter A increases, D min decreases,
This is advantageous in forming small BM film stripes 6.

In order to form the PH film stripes 7, a sufficient amount of exposure is required since the phosphor slurry, which is as thick as 30 μm, is exposed to light. To explain this with reference to FIG. 3, increasing the exposure amount will result in exposure at Dmax. That is, the width E of the PH film stripe 7 is larger than the slit width B of the slit pattern 5, but the maximum width is set so that it does not protrude into the adjacent PH film stripes 7.

For this purpose, Dmaz should be as small as possible and D min
The smaller the difference between and Dmax, the more time-consuming it becomes. In order to satisfy this requirement, the smaller the light source diameter A is, the better.

Therefore, when forming the BM film stripe 6, by using an exposure device with a larger light source diameter than when forming the PH film stripe 7, the latitude for forming the BM film last stripe 6 can be improved, and the PH film stripe 7 can be formed. Improves adhesive strength. For example, the light source diameter A is 1 when forming the BM film stripe 6.
．． 5Wφ was used when forming the PH film stripe 7, and 0.9Wφ was used when forming the PH film stripe 7, and the distance @P from the light source 3 to the shadow mask 4 was made 0.3 m larger when forming the BM film stripe 6 than when forming the PH film stripe 7. When the exposure position shift was corrected, a good result and force S were obtained.

Here, each BM film stripe and PH due to the difference in light source diameter are
The exposure position deviation with respect to the film stripe 7 can be dealt with by changing the distance P as described above, but it can also be dealt with by changing the thickness of the correction lens and the glass plate (not shown).

By changing the light source tA in this way, the BM film last stripe 6 formation PHIIX) 5 (7'7% IE As shown in , it is necessary to erase the bridge section 9 in the longitudinal direction of the turn 5.In order to erase this bridge section 9, change the pitch of the bridge section 9 to the length of the F1 linear light source 3] Then, J-mu,
A bell-shaped light source 3 with a length of p is required.

However, if the length j of this linear light 1 [3 is exposed to the same length when forming the BM film stripe 6 and when forming the full stripe 7, the PH film stripe 7 will be more exposed than the BH film stripe 6. Since the effective surface is formed to be small in the longitudinal direction, non-luminous areas occur at the ends in the longitudinal direction, which is a drawback of the fluorescent surface. This is the length of the light source when exposing BM film stripe 6! Light source length I during exposure of PH film stripe 7
For example, by increasing the length by 3 to 4 m, the non-light emitting part could be removed.

In the above collection example, a stripe-type color receiver tube has been described, but the light source can also be applied to the formation of a fluorescent surface of a dot-type color receiver tube.

As is clear from the above explanation, according to the method of the present invention,
The latitude for forming BM film stripes is improved, and the adhesion strength of PH film stripes is improved.

[Brief explanation of drawings]

The figures show one embodiment of the method according to the present invention, FIG. 1 is an am explanation diagram of the exposure method, FIG. 4
The figure is a principle explanatory diagram showing the length of a linear light source for erasing the bridge portion of the Shadra mask. l... Panel, 2... Photoresist and phosphor slurry, 3... Linear light source, 4...
・Shadow mask, 5...Sleet pattern,
6...BM membrane stripe, 7...PH
Membrane stripe, 8 spots. Figure 1 Figure 2 Figure 3 Figure 4

Claims (1)

[Claims] Color tube film technology in which the photoresist and phosphor slurry coated on the inner surface of the panel are exposed to light from a light source through the apertures of a shadow mask to form a black matrix film and a phosphor film using separate exposure devices. A method for exposing a color tube film screen, characterized in that when forming the black matrix film, the diameter of the light source is made larger than when forming the fluorescent film.