JPS58203648A - Rotary disk exposure device - Google Patents

Abstract

PURPOSE:To perform drawing with high accuracy despite the generation of the revolving variance of a revolving stage and to increase a drawing speed, by detecting the revolving speed of the rotary stage, then feeding this detecting information back to an electronic optical lens barrel. CONSTITUTION:An X-Y table 9 is set in a sample room 1, and a rotary stage 10 is put on the table 9. Then a rotary disk (sample) 11 such as a digital-audio disk, etc. is put on the stage 10. The revolving speed of the stage 10 is obtained from the detecting information detected by a measuring optical system 13, and this revolving speed is fed back to a blanking deflector 3 of an electronic-optical lens barrel 6. As a result, the highly accurate exposure is ensured for the disk 11 despite a revolving error of the stage 10.

Description

[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a digital Φ audio disc (DAD).
) The present invention relates to a rotating disk exposure apparatus that forms a desired pattern on a rotating disk, and more particularly to a rotating disk optical system having a function of correcting rotational unevenness.

[Technical background of the invention and its problems]

When exposing a concentric dot pattern to a rotating disk such as a DAD, it is necessary to minimize rotational unevenness of a rotating stage on which the rotating disk is mounted. When exposing a rotating disk using light as in the conventional method, since the rotating stage can be used in the atmosphere, it is relatively easy to suppress rotational unevenness within an allowable range. However, when exposing a rotating disk using an electron beam, which has recently been attracting attention as a means of increasing storage capacity, the rotating stage must be used in a vacuum, so it is necessary to keep the rotation unevenness within an acceptable range. It is extremely difficult to suppress the Therefore, when exposing a rotating disk using an electron beam,
There has been a problem in that drawing accuracy deteriorates due to uneven rotation of the rotary stage. Further, as the rotation speed of the rotary stage is increased, rotational unevenness is more likely to occur, so it has been impossible to perform high-speed drawing while maintaining the necessary drawing accuracy.

[Purpose of the invention]

SUMMARY OF THE INVENTION An object of the present invention is to provide a rotating disk optical device that can perform drawing with high precision even if rotational unevenness or the like occurs in the rotating stage, and that can increase the drawing speed.

[Summary of the invention]

The gist of the present invention is to detect the rotational speed of the rotating stator and to pack this detected information into the electron optical lens barrel tlc7'.

That is, the present invention rotates a rotary stage on which a sample is placed, and irradiates the sample with an electron beam from an electron optical column to expose desired dots and turns on the sample. In the plate exposure apparatus, marks are provided radially and at intervals on the periphery of the rotary stage,
detecting the rotational speed of the one-turn stage from the timing when this mark passes the reference position, and feeding back this detected rotational speed to the electron optical lens barrel to control the timing or position of exposing the nine turns of dots; Alternatively, the beam deflection system is controlled so that the difference between the beam deflection speed and the circumferential speed of the rotary stage at the beam irradiation position is constant.

〔Effect of the invention〕

According to the present invention, the rotational speed of the rotary stage can be fed back to the electron optical lens barrel to compensate for rotational unevenness, so that the following effects (1) to (4) can be obtained.

(1) Even if vibration occurs in the rotary introduction machine to the vacuum and uneven rotation of the rotary stage occurs, good exposure can be performed, so electron beam exposure becomes OJ efficient.

(2) Since drawing can be performed with the necessary precision even before the rotary stage reaches a steady state, there is no wasted time before starting exposure, and throughput can be improved.

(3) As a result of electron beam exposure becoming possible, the dose per unit time can be increased, which also improves throughput.

(4) Since most of the rotation unevenness of the rotary stage can be focused, the rotation of the rotary stage can be sped up, and thereby the drawing speed can be increased.

[How to practice the invention]

FIG. 1 is a schematic diagram showing a schematic configuration of a rotating disk exposure apparatus according to one embodiment of the present invention. In the figure, 1 is an evacuated sample chamber, and above the sample chamber 1 is provided an electron optical lens barrel 6 consisting of an electron gun 2, a blanking deflector 3, a scanning deflector 4, an objective lens 5, etc. It is being The electron optical lens barrel 6 receives turn data from a nine-turn data circuit 7, and a control circuit 8 controls beam blanking and deflection scanning.

On the other hand, an X-Y table 9 is provided in the wiping chamber J, and a rotary stage 10 is placed on this X-Y table 9. Then, DAD on this rotating stay
A rotating disk (sample) such as the following is placed. Further, a measuring optical system 13 is attached to the X-Y table 9 I/C via a support 12. Measurement optical system 13
As shown in FIG. 2, it is composed of a light source 14, a half mirror 15, a lens J6, and a photodetector J2.
The light from 4 is irradiated onto the front side of the rotary stage 1o, and the reflected light is detected by a photodetector 12.

Here, around the periphery of the rotary stage 10, black and white striped patterns 18 are provided radially at fathom intervals. and,
These striped patterns 11 and 18 are the light irradiation position fjkc reference position t
) is detected in time series by the measurement optical system 13, and this detection information is given to the control circuit 8. The control circuit 8 determines the rotational speed of the rotary stage 10 according to the detected information, and controls the deflection signal to the deflector 3.4 according to this rotational speed. The rotational speed of the rotary stage 100 is fed back to the electron optical lens barrel 6, and its beam deflection is controlled.

In the figure, reference numeral 19 indicates a step for driving the XY stage 9, and f-mo 4.20 indicates a motor for driving the rotation stage 10.

With such a configuration, the rotation speed of the rotation stay (100) is determined from the detection information detected by the measurement optical system 13, and this is fed back to the blanking deflector 3 of the electron optical lens barrel 6. Even if rotational deviation occurs in the rotating stage 10, the rotating disk 11 can be exposed with high precision. Therefore, the rotary stage 10 can be rotated at high speed, and the throughput can be greatly improved.

Further, by feeding the rotation speed of the rotary stage 1o obtained above to the scanning deflector 4 of the electron optical column 6, a pattern having a vertical cross-sectional shape can be obtained. Now, assume that the diameter of the electron beam is 0.5 [μmφ] and a beam current of 400 [nA] is generated. If the resist used is PMMA, doe, ei-100[
μe/? M? ], a mother turn with an approximately vertical cross-sectional shape can be obtained.

Therefore, the time t for the beam to move 0.5 [μm] on the rotating disk 11 is calculated from the force t - a, z5 Circumferential speed at the beam irradiation point of 11, (3/5ec) Rotating stereo 1 before Id
Since it is determined from the zero rotation speed and the distance from the rotation center to the beam irradiation point, if the beam is deflected and scanned at a moving speed of vbwx v, -80 (cfn/5ee), Lennost will always be 80 C.
It will be exposed at an apparent speed of cm/■eo'),
This makes it possible to form a pattern with a vertical cross-sectional shape.

Note that the present invention is not limited to the embodiments described above, and can be implemented with various modifications without departing from the gist thereof. For example, instead of the striped pattern as the mark, grooves may be provided radially around the rotary stage, and the number of marks may be determined as appropriate according to the specifications. Further, the sample is not limited to a DAD, but can be applied to various types of rotating disks.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic diagram showing the general configuration of a rotating disk exposure apparatus according to an embodiment of the present invention. J#i is a schematic diagram showing the main part configuration of the above embodiment device. DESCRIPTION OF SYMBOLS 1... Sample chamber, 2... Electronic mirror, 3... Blanking deflector, 4... Scanning deflector, 5... Objective lens, 6... Electron optical lens barrel, 7 ...Pattern data circuit, 8...fl]lJ control circuit, 9...X-Y stage, 10...Rotating stage, 11...Rotating circle & (sample), 13...Question j Constant optical system, 14... Light source, 15
...Half mirror-116...Lens, Noah...Photodetector, 18...Pattern (mark).

Claims (3)

[Claims] (1) In a rotating disk exposure apparatus that rotates a rotating stage on which a sample is placed, and irradiates the sample with an electron beam from an electron optical column to expose a door pattern on the sample. marks provided at radial intervals on the periphery; a means for detecting the passage of these i-line reference positions to detect the rotational speed of the rotary stage; 1. A rotating disk exposure device comprising means for providing feedback to a lens barrel. (2) The feedback means feeds back the detected rotational speed to a blanking system of the electron optical lens barrel to control the timing or position of exposing the dot pattern. A rotating disk exposure apparatus according to claim 1. (3) ANN feedback means transmits the detected rotational speed to the beam deflection system of the cocoon-distributing electron optical sharp tube, and calculates the difference between the beam deflection speed and the circumferential speed of the rotation stage at the beam irradiation point. 1. A rotating disk exposure apparatus according to claim 1 of the scope of Patent No. 114, characterized in that the exposure apparatus is controlled so that .