JPS5820230A - Apparatus for forming membrane - Google Patents

Abstract

PURPOSE:To form a membrane excellent in uniformity of surface properties and physical properties, by advancing discharge direction of glow discharge along the surface of a membrane support. CONSTITUTION:A first plate like electrode 10 electrically connected to a high frequency power source 9 through a rectifier 8 is provided to the outside of one end part of a reaction container 1 and a second earthing plate like electrode 11 is provided to the outside of the other end of said reaction container 1. In this condition, when a stock gas is received in the container 1 and a high frequency electric field is applied thereto, glow discharge is generated between the first and the second electrodes 10, 11 but, because both electrodes 10, 11 are positioned vertically to the surface of a support 2, discharge direction is directed along the surface of the membrane support 2. Therefore, the membrane surface hardly receives physical impact due to ion during formation of the membrane and the excellent membrane is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a film forming apparatus for forming an organic or inorganic film using a gas as a raw material through a glow discharge reaction.

This is a conventional film forming apparatus that forms a film on the membrane support by introducing a raw material gas into a reaction vessel equipped with a membrane support and decomposing the raw material gas using the discharge energy of glow discharge.

The one shown in FIG. 1 or 3 is used. In the apparatus shown in FIG. 1, a pair of electrodes bSeb1 are provided inside one reaction container car, vertically spaced apart from each other, one of which is grounded, and the other is electrically insulated from the reaction container a.
And it is connected to a high frequency power source C. In addition, the above electrode b
1.

Between b8, a membrane support d, which can be heated on the temperature side by a heater or the like, is provided in parallel with the electrodes bI and bl. Also,
In the apparatus shown in FIG. 2, a cylindrical membrane support d is rotatably provided around the axis of a cylindrical reaction vessel a, and is grounded to form an electrode. Further, a cylindrical electrode paired with the electrode b1 is formed on the peripheral wall of one reaction vessel 1, and is electrically insulated from the reaction vessel 1.

And it is connected to a high frequency power source C. and.

In these devices, a raw material bus is introduced into a reaction vessel through a gas inlet and a gas discharge is caused between electrodes bst' and membrane support while discharging the raw material gas from a gas outlet f. A film is formed on top.

However, in these devices, the electrodes ble eb,
and the membrane support wrap are located in parallel. That is, the membrane support -
Since the surface of the glow discharge is perpendicular to the discharge direction of the discharge, a high frequency electric field is applied perpendicularly to the surface of the membrane support 4, and ions in the plasma during the glow discharge reach the membrane support 4. However, since the film surface is physically bombarded by ions during film formation, it is possible to vibrate parallel to the surface of the formed d, but this method does not allow for uniform control of the f tsuzuma. There are many problems with this.

The present invention has been made based on the above-mentioned circumstances, and the object is to provide a film forming apparatus capable of forming a film having excellent uniformity in surface properties and physical properties. It is in.

An embodiment of the present invention will be described below with reference to FIG. 3 and FIG. 4φ. Figure 1 is a cylindrical reaction vessel made of an insulating material such as glass and closed at both ends.The center 62 of the reaction vessel 1 is made of, for example, aluminum!
A cylindrical membrane support 2 made of a metal material such as silver is housed coaxially with the reaction vessel 1, and is rotatably supported via a rotating shaft 1. Also,
The surface temperature of the membrane support 2 can be controlled by a single tap or the like (not shown).

Further, the side wall i2 of the reaction vessel 1 is provided with two rows each of a plurality of gas inlets 4- and a plurality of gas exhaust ports 5. These yx inlet ports 4 and - and gas outlet port 5
- intersects the axis of the membrane support 1 and is shifted from each other in the axial direction of the membrane support 2, that is, the gas inlet 4- and the gas outlet 5... are aligned with the axis of the membrane support 1. are arranged so that they are not located on the same plane perpendicular to . Also.

The gas introduction port 4- is a gas introduction pulp 6. having a flow rate control function. The gas discharge port 5 is connected to the gas supply system (not shown) via C through the gas discharge port 5--, which has a pressure control function.
, F to a gas exhaust system (not shown).

Sara? =, the outer girder at one end of the reaction vessel 1 is the matching vessel 1
A plate-shaped first electrically connected to the high frequency power source 9 via
A grounded plate-like second electrode 11 is provided on the outside of the other end of the electrode 10, and a high-frequency electric field is applied in a state where the raw material gas for film formation is contained in the reaction vessel l. This makes it possible to generate a dale discharge between the first and second electrodes 10.11. That is, the first and second electrodes III and 11 are located perpendicularly to the surface of the membrane support 2, and the discharge direction of the glow discharge is along the surface of the membrane support 20. According to this configuration, the ions in the plasma during gas discharge vibrate parallel to the surface of the membrane support 20, so that the physical impact of the ions between the layer surfaces during membrane formation is reduced.

A film with excellent uniformity in surface properties and physical properties can be formed.

Next, an experimental example will be explained. First, a membrane was formed in the following manner on a cylindrical membrane support 2 made of aluminum and having an outer diameter of 129 cm and which had been subjected to a surface oxidation treatment. That is, %S
l aa and Bm Hs were each diluted with H and the ratio of Be H to Smu4 was 120.
Using raw material gas with ppm, the total flow rate was 3 Q Q
txlhk (Standard state) 1 The pressure inside reaction vessel 1 is set to 0.
1 1 as T・re! A power of 00 W was applied to adjust the matching. And this is almost 7
By continuing for a long time, an amorphous silicon film could be formed on the membrane support 2. Next, the membrane support 2 on which the amorphous silicone membrane was formed was used as a photoreceptor of an electronic copying machine.

Image formation was performed by the Carlson method. As a result, the transferred image was transferred to a membrane support under similar conditions using the conventional apparatus shown in FIG.

Note that in the present invention, as shown in FIGS. 5 and 6, a plurality of cylindrical membrane supports 2.
You can also make it hurt the song.

By configuring it in this way, not only can the same effects as those of the above embodiments be obtained, but also the membrane can be formed on a plurality of membrane supports 2 at the same time, and the operation is simple and space is not taken up above. do not have.

(Since the configuration is the same as that of the above embodiment, corresponding parts are given the same reference numerals and explanations are omitted.) S l (C
Silicon compounds, boron compounds, and phosphorus compounds such as Hs ) a C/ may be replaced with elementary compounds, nitrogen, nitrogen compounds, carbon compounds, oxygen, oxides, and the like.

In addition, the material of the membrane support 2 is not limited to aluminum, but also stainless steel, iron alloy cape metal, surface-treated material of this metal, T-lass, ceramic cape, and insulating material such as organic polymer cape. Alternatively, a material in which a conductive film is formed on the surface of this insulating material may be used. Here, if the membrane support 2 is conductive, it is preferable to electrically insulate it.

Further, the membrane support 2 is not limited to a cylinder, and may be, for example, one or more flat plates.

Further, the electrodes 10 and 11 are not limited to being provided on the outside of the insulating reaction vessel 1, but may also be provided inside the reaction vessel 1, or may be provided on the entire reaction vessel 1 by making a part of the reaction vessel 1 metal. If it is made of metal, for example, the upper and lower surfaces may be covered with an insulating material, and these may be used as electrodes.

As explained above, according to the present invention, since the surface of the membrane support is disposed along the discharge direction of the glow discharge, ions in the plasma during the glow discharge vibrate parallel to the surface of the membrane support, thereby forming a film. During this process, the membrane surface receives less physical shock from ions, resulting in excellent uniformity of surface properties and physical properties.

[Brief explanation of drawings]

FIG. 1 is a longitudinal side view showing a conventional device, FIG. 2 is a longitudinal side view showing a different conventional device, FIG. 3 is a plan view showing an embodiment of the device of the present invention, and FIG. 4 is a longitudinal section of the same embodiment. Side - Figure, 5th
The figure is a flat view showing another embodiment of the present invention, and FIG. 6 is a longitudinal sectional side view of the same embodiment. 1...Membrane support applicant's agent Patent attorney Age Press Liao↓ Figure 4

Claims (1)

[Claims] In a device in which a film is formed on a membrane support by generating a glow discharge in a raw material gas for film formation, the discharge direction of the goo discharge is aligned along the surface of the membrane support. Characteristic film forming equipment.