JPS58201336A - 半導体装置における配線層幅の測定方法 - Google Patents
半導体装置における配線層幅の測定方法Info
- Publication number
- JPS58201336A JPS58201336A JP8432582A JP8432582A JPS58201336A JP S58201336 A JPS58201336 A JP S58201336A JP 8432582 A JP8432582 A JP 8432582A JP 8432582 A JP8432582 A JP 8432582A JP S58201336 A JPS58201336 A JP S58201336A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- wiring layer
- test
- width
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8432582A JPS58201336A (ja) | 1982-05-19 | 1982-05-19 | 半導体装置における配線層幅の測定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8432582A JPS58201336A (ja) | 1982-05-19 | 1982-05-19 | 半導体装置における配線層幅の測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58201336A true JPS58201336A (ja) | 1983-11-24 |
| JPS6226178B2 JPS6226178B2 (enrdf_load_stackoverflow) | 1987-06-08 |
Family
ID=13827357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8432582A Granted JPS58201336A (ja) | 1982-05-19 | 1982-05-19 | 半導体装置における配線層幅の測定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58201336A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002286780A (ja) * | 2001-03-23 | 2002-10-03 | Nippon Sheet Glass Co Ltd | 金属配線の検査方法および検査に適した半導体デバイスの構造 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02146980U (enrdf_load_stackoverflow) * | 1989-05-10 | 1990-12-13 |
-
1982
- 1982-05-19 JP JP8432582A patent/JPS58201336A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002286780A (ja) * | 2001-03-23 | 2002-10-03 | Nippon Sheet Glass Co Ltd | 金属配線の検査方法および検査に適した半導体デバイスの構造 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6226178B2 (enrdf_load_stackoverflow) | 1987-06-08 |
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