JPS5819188B2 - image sensor - Google Patents

image sensor

Info

Publication number
JPS5819188B2
JPS5819188B2 JP53041474A JP4147478A JPS5819188B2 JP S5819188 B2 JPS5819188 B2 JP S5819188B2 JP 53041474 A JP53041474 A JP 53041474A JP 4147478 A JP4147478 A JP 4147478A JP S5819188 B2 JPS5819188 B2 JP S5819188B2
Authority
JP
Japan
Prior art keywords
image sensor
charge
signal line
transfer gate
charge transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53041474A
Other languages
Japanese (ja)
Other versions
JPS54133823A (en
Inventor
伊藤雄一郎
森忠民
谷川邦広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP53041474A priority Critical patent/JPS5819188B2/en
Publication of JPS54133823A publication Critical patent/JPS54133823A/en
Publication of JPS5819188B2 publication Critical patent/JPS5819188B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明はイメージセンサに関し、さくに撮像機能と映像
信号の記憶機能を兼ね備えたイメージセンサに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an image sensor, and more particularly to an image sensor having both an imaging function and a video signal storage function.

光学情報処理用としてCTD(電荷転送装置)、MO8
構造のイメージセンサが従来いくつか提案されており、
これらイメージセンサで得た信号を2値以回路で対象物
の白および黒レベルに対応して2つの信号レベルに判別
した後別に設けたメモリに蓄えられる。
CTD (charge transfer device), MO8 for optical information processing
Several structural image sensors have been proposed,
The signals obtained by these image sensors are discriminated by a binary circuit into two signal levels corresponding to the white and black levels of the object, and then stored in a separately provided memory.

メモリに蓄えられた前述の信号は例えばコンピュータに
入力されて情報処理がなされる。
The above-mentioned signals stored in the memory are inputted to, for example, a computer and subjected to information processing.

ところで前述のように従来のイメージセンサを用いて情
報処理を行う場合、対象物から得た信号を蓄えるメモリ
を別に設ける必要があり、情報処理装置の構成が複雑と
なる欠点があった。
However, when information processing is performed using a conventional image sensor as described above, it is necessary to separately provide a memory for storing signals obtained from an object, which has the disadvantage of complicating the configuration of the information processing device.

本発明は前述の点に鑑みなされたもので、撮像機能と記
憶機能を兼ね備え、かつランダムアクセス(Rando
m ”Acc’ess )可能な新規なイメージセンサ
を提供するものである。
The present invention was made in view of the above-mentioned points, and has both an imaging function and a storage function, and also has a random access (Random access) function.
The present invention provides a novel image sensor capable of achieving a

以下図面を参照しながら本発明の好ましい実施例につき
詳細に説明する。
Preferred embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は本発明の〜実施例を示し、11,12゜13・
・・・・、21,22,23・・、・・・はマトリクス
状に配列された光電セルの電極である。
Figure 1 shows embodiments of the present invention, 11, 12° 13.
. . , 21, 22, 23, . . . are electrodes of photoelectric cells arranged in a matrix.

この光電セルはMO8構造を有し、半導体基板と透明電
極と、両者間の絶縁膜からなり、該電極に電圧を加えて
半導体基板に空乏層を作り、透明電極上方から光像を投
射すると該光像の明暗に応じた量の電荷が半導体基板に
発生し照射時間の経過に従って空乏層内に蓄積して行く
This photoelectric cell has an MO8 structure and consists of a semiconductor substrate, a transparent electrode, and an insulating film between the two. A voltage is applied to the electrode to create a depletion layer in the semiconductor substrate, and when a light image is projected from above the transparent electrode, a depletion layer is formed in the semiconductor substrate. An amount of charge corresponding to the brightness of the optical image is generated in the semiconductor substrate and accumulates in the depletion layer as the irradiation time progresses.

Sl、S2・・・・・・はこれら電極の同じ列のもの1
1,12・・・・・・、21,22・・・・・・を接続
する導体→ある。
Sl, S2... are those in the same row of these electrodes 1
There are conductors connecting 1, 12, 21, 22, and so on.

光電セルの各電極に対応して電荷転送用ゲート電極T、
11.T12.T13・・・・・・T21 、T22.
T23・・・・・・が設けられ、上記光電セルと同様M
O8構造を有する。
A charge transfer gate electrode T corresponding to each electrode of the photoelectric cell,
11. T12. T13...T21, T22.
T23...... is provided, and M
It has an O8 structure.

ただし感光機能はない。However, it does not have a photosensitive function.

B1.B2.B3・・・・・・は信号線であって浮遊拡
散層で形成されている。
B1. B2. B3... is a signal line and is formed of a floating diffusion layer.

Wl 、W2゜W3・・・・・・はゲート電極の同じ行
のものT11゜T21.T31・・・・・・、T12.
T22.T32・・・・・・、T13.T23.T33
・・・・・・を接続する導体である。
Wl, W2゜W3... are those of the same row of gate electrodes T11゜T21. T31..., T12.
T22. T32..., T13. T23. T33
It is a conductor that connects...

信号線B1 、 B2 、B3・・・・・・の各々には
再生回路が接続されており、第2図は前記信号線の1つ
B2を含む再生回路F2を示すもので、該再生回路F2
は光電セル21,22,23・・・・・・に投射された
光像に対応して得られた光電セルの電荷を導体Wl・・
・・・・Wnで選択して検出するとともに、該検出信号
レベルに対応した量の電荷を前記光電セルへ供給するた
めのものであって信号線B2リセット用FETQ2r、
出力用FETQ2o。
A reproducing circuit is connected to each of the signal lines B1, B2, B3, . . ., and FIG. 2 shows a reproducing circuit F2 including one of the signal lines B2.
is the electric charge of the photoelectric cells obtained corresponding to the optical image projected onto the photoelectric cells 21, 22, 23, . . .
. . . A signal line B2 reset FETQ2r for selecting and detecting with Wn and supplying an amount of charge corresponding to the detection signal level to the photoelectric cell,
Output FET Q2o.

コンデンサC2,出力用FETQ2oのソースに一接続
された抵抗R12値化回路NおよびスイッチSW2から
なる。
It consists of a capacitor C2, a resistor R1 connected to the source of an output FET Q2o, a binary conversion circuit N, and a switch SW2.

2値化回路Nの入力端子は出力用FETQ2oのソース
に接続され、該2値化回路の出力端子はスイッチSW2
および前記コンデンサC2を介して信号線B2に接続す
る。
The input terminal of the binarization circuit N is connected to the source of the output FET Q2o, and the output terminal of the binarization circuit is connected to the switch SW2.
and is connected to the signal line B2 via the capacitor C2.

前記2FETQ2oのドレインには一定電圧VDが加え
られている。
A constant voltage VD is applied to the drain of the 2FET Q2o.

次に第1図、第2図を参照しながらこの装置の動作を説
明する。
Next, the operation of this device will be explained with reference to FIGS. 1 and 2.

説明の便宜上基板の導電型はP型とする。For convenience of explanation, the conductivity type of the substrate is assumed to be P type.

また各スイシチSWiを閉にする。光ご電セル群の導体
81.S2・・・・・・にH(バイ)レベルの電圧を加
え、各電極11,12,13・・・・・・21.22,
23・・・・・・下の半導体基板に空乏層を形成させ、
かかる状態で光電セル群の全面に光像を投射すると、各
電極下の空乏層には該電極に照J射された光の強さ、従
って絵素の明暗に応じた量の信号電荷が発生する。
Also, each switch SWi is closed. Conductor 81 of photoelectric cell group. Applying H (bi) level voltage to S2......, each electrode 11, 12, 13...21.22,
23... Form a depletion layer in the underlying semiconductor substrate,
When a light image is projected onto the entire surface of the photocell group in such a state, a signal charge is generated in the depletion layer under each electrode in an amount corresponding to the intensity of the light irradiated to the electrode and, therefore, the brightness of the picture element. do.

所定時間光像投射を行なった後前記光像に対応した信号
電荷の検出を行う。
After projecting a light image for a predetermined period of time, a signal charge corresponding to the light image is detected.

すなわち、信号を検出すべきゲート電極Tij(j=1
,2,3・・・・・・、i=1.2.3・・曲)に4接
続する導体WjにHレベルの電圧を加えて、該ゲート電
極下に光電セルの電極ij下の空乏層より深い空乏層を
形成すると、前記選択されたゲート電極Tijに対応す
る光電セルつまり電極ij下の空乏層に蓄えられている
電荷は該ゲート電極Tij下の空乏層を通って浮遊拡散
層で形成されている信号線Biに流入する。
That is, the gate electrode Tij (j=1
, 2, 3..., i = 1.2.3... songs) by applying an H level voltage to the conductor Wj connected to When a depletion layer deeper than the gate electrode Tij is formed, the charges stored in the photovoltaic cell corresponding to the selected gate electrode Tij, that is, the depletion layer under the electrode ij, pass through the depletion layer under the gate electrode Tij and are transferred to the floating diffusion layer. It flows into the formed signal line Bi.

こめ電荷流入に基因する信号線Biの電位変動が出力用
FETQi。
The potential fluctuation of the signal line Bi due to the inflow of charges causes the output FET Qi to change.

のゲートに加わり、これが該FETのソースから出力さ
れて2値化回路Nに入力される。
This is output from the source of the FET and input to the binarization circuit N.

この後リセット用FETQirのゲート電極に電圧Vr
を印加して該FETをオンにし、信号線Biを正電位に
してリセットを完了する。
After this, the voltage Vr is applied to the gate electrode of the reset FET Qir.
is applied to turn on the FET, and the signal line Bi is brought to a positive potential to complete the reset.

前記2値化回路では前述の光電セルijに照射された光
の強さ、従って光像の明暗に対応して信号線Biで検出
された信号の2値化を行う。
The binarization circuit binarizes the signal detected by the signal line Bi in accordance with the intensity of the light irradiated onto the photoelectric cell ij, and therefore the brightness and darkness of the optical image.

すなわち、前記光電セルに照射される光が強い場合、亘
い換えれば光像の明るい部分が光電セルに投射された場
合には、信号線BiにはコンデンサCiを介して前記2
値化回路から負の電圧が加えられる。
That is, when the light irradiated to the photocell is strong, in other words, when a bright part of the optical image is projected onto the photocell, the signal line Bi is connected to the signal line Bi via the capacitor Ci.
A negative voltage is applied from the value circuit.

それと同時にゲート電極Tijに正のHレベルの電圧が
加わるため、諌ゲート電極Tij下の空乏層には所定量
の電荷が流入する。
At the same time, a positive H-level voltage is applied to the gate electrode Tij, so a predetermined amount of charge flows into the depletion layer below the gate electrode Tij.

この電荷は隣接する光電セルに移される。This charge is transferred to an adjacent photocell.

つまり光電セルの電極ijにHレベルの電圧を加えると
同時にゲート電極Tijの電圧をHレベルからLレベル
に切換えると、ゲート電極Tij下の電荷は光電セルへ
移る。
That is, when an H level voltage is applied to the electrode ij of the photocell and at the same time the voltage of the gate electrode Tij is switched from the H level to the L level, the charge under the gate electrode Tij is transferred to the photocell.

このようにして光電セルに照射される光が強い場合は、
所定量の電荷が光電セルに蓄えられたことになる。
If the light irradiated to the photocell in this way is strong,
This means that a predetermined amount of charge has been stored in the photocell.

また光電セルに照射される光が弱い場合、言い換えれば
光電セルに光像の暗い部分が投射された場合には2値化
回路Nの出力は零であるため、前記信号線Biからゲー
ト電極下の空乏層には電荷が供給されない。
Furthermore, when the light irradiated to the photoelectric cell is weak, in other words, when a dark part of the optical image is projected onto the photoelectric cell, the output of the binarization circuit N is zero, so that the output from the signal line Bi to the gate electrode is No charge is supplied to the depletion layer of .

従って光電セルに照射される光が弱い場合は該光電セル
には電荷が蓄えられない。
Therefore, when the light irradiated onto a photocell is weak, no charge is stored in the photocell.

このようにして光電セル群に照射される光像の明暗に対
応して、これら光電セルに蓄えられる電荷の有無が定ま
る。
In this way, the presence or absence of charge stored in these photocells is determined depending on the brightness or darkness of the light image irradiated onto the photocell group.

このため前記光電セルに蓄えられている信号を用いて情
報処理するに際して、これら信号レベルの不揃いに基因
する誤処理がなくなる。
Therefore, when information is processed using the signals stored in the photoelectric cells, erroneous processing due to unevenness of these signal levels is eliminated.

このようにして各光電セルに蓄えられた信号のうち特定
の光電セル電極ij下の信号を読出すためには、2値化
回路Nの出力端子に取付けられているスイッチSWiを
開状態にした後、ゲート電極を接続する導体WjにHレ
ベルの電圧を加えて光電セルの電荷を信号線Biに導入
し、該信号線Biの電位変動を出力用FETQioで検
出して2値化回路Nを通り2値化レベルで出力端子Pi
から取出す。
In order to read out the signal under a specific photocell electrode ij among the signals stored in each photocell in this way, the switch SWi attached to the output terminal of the binarization circuit N is opened. After that, an H level voltage is applied to the conductor Wj connecting the gate electrode to introduce the charge of the photoelectric cell into the signal line Bi, and the potential fluctuation of the signal line Bi is detected by the output FET Qio to convert the binarization circuit N. Output terminal Pi at normal binary level
Take it out.

なお前述の実施例では光電セルはマトリクス状に配置さ
れているが、本発明はこれに限定されず光電セルの配置
は任意であり、例えば1次元に直線状に配設してもよい
In the above embodiment, the photocells are arranged in a matrix, but the present invention is not limited to this, and the photocells may be arranged in any desired manner, for example, they may be arranged linearly in one dimension.

なおまた前述の実施例ではマトリクス状に配設された光
電セルおよび電荷転送用ゲート電極の各列ごと、つまり
各信号線Bl、B2.B3・・・・・・に再生回路が設
けられているものとしたが、本発明はこれに限定されず
再生回路は1つだけ設け、前記各信号線と該再生回路と
は切換えスイッチを介して選択的に接続するようにして
もよい。
Furthermore, in the above-described embodiment, each column of photocells and charge transfer gate electrodes arranged in a matrix, that is, each signal line B1, B2 . Although it is assumed that the reproducing circuit is provided in B3..., the present invention is not limited to this, and only one reproducing circuit is provided, and each of the signal lines and the reproducing circuit are connected via a changeover switch. Alternatively, the connection may be made selectively.

以上の説明で明らかなように本発明に係るイメージセン
サは撮像部と記憶部を兼用し、かつランダムアクセス可
能であるという利点があり、パターン識別等の情報処理
に用いて極めて有用である。
As is clear from the above description, the image sensor according to the present invention has the advantage of serving both as an imaging section and a storage section, and can be randomly accessed, and is extremely useful for use in information processing such as pattern identification.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す図、第2図は第1図の
出力部の要部を示す図である。 11.12,13・・・・・・21,22,23・・・
・・・:光電セル電極、T11.T12.T13・・・
・・・T 21 。 T22.T23・・・・・・:ゲート電極、B1.B2
゜B3・・・・・・:信号線、Qir 、Qio :F
ET、N:2値化回路。
FIG. 1 is a diagram showing an embodiment of the present invention, and FIG. 2 is a diagram showing a main part of the output section of FIG. 1. 11.12,13...21,22,23...
...: Photocell electrode, T11. T12. T13...
...T21. T22. T23...: Gate electrode, B1. B2
゜B3...: Signal line, Qir, Qio: F
ET, N: Binarization circuit.

Claims (1)

【特許請求の範囲】 1 半導体基板上に絶縁層を介して形成された透明電極
を有する複数の光電セルと、前記光電セル群に投射され
た光像に対応して得られた光電セルの電荷量を検出する
とともに、該検出信号レベルに対応した特定の量の電荷
を前記光電セルへ再供給する再生回路手段と、該手段と
前記光電セルの間に設けられた電荷転送用ゲート電極さ
からなることを特徴とするイメージセンサ。 2 前記光電セルおよび該光電セルに対応する電荷転送
用ゲート電極がマl−IJクス状に配設されたことを特
徴とする特許請求の範囲第1項に記載のイメージセンサ
。 3 前記マトリクス状に配設された電荷転送用ゲート電
極の行または列ごとに前記再生回路手段を設けたことを
特徴とする特許請求の範囲第2項に記載のイメージセン
サ。 4 前記再生回路手段が電荷転送ゲート電極下に蓄えら
れている電荷量に対応した電位を示す信号線き、前記信
号線の電位を取出す回路と、前記取出し回路の出力を入
力信号とし、出力端子がコンデンサを介して前記信号線
に接続された2値化回路からなることを特徴とする特許
請求の範囲第1項に記載のイメージセンサ。
[Scope of Claims] 1. A plurality of photocells having transparent electrodes formed on a semiconductor substrate via an insulating layer, and charges of the photocells obtained in response to an optical image projected onto the group of photocells. regeneration circuit means for detecting the amount of charge and resupplying the photoelectric cell with a specific amount of charge corresponding to the detected signal level; and a charge transfer gate electrode provided between the means and the photoelectric cell. An image sensor that is characterized by: 2. The image sensor according to claim 1, wherein the photoelectric cells and the charge transfer gate electrodes corresponding to the photoelectric cells are arranged in a matrix shape. 3. The image sensor according to claim 2, wherein the reproducing circuit means is provided for each row or column of the charge transfer gate electrodes arranged in a matrix. 4. The regeneration circuit means has a signal line indicating a potential corresponding to the amount of charge stored under the charge transfer gate electrode, a circuit for extracting the potential of the signal line, and an output terminal using the output of the extracting circuit as an input signal. 2. The image sensor according to claim 1, wherein the image sensor comprises a binarization circuit connected to the signal line via a capacitor.
JP53041474A 1978-04-07 1978-04-07 image sensor Expired JPS5819188B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53041474A JPS5819188B2 (en) 1978-04-07 1978-04-07 image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53041474A JPS5819188B2 (en) 1978-04-07 1978-04-07 image sensor

Publications (2)

Publication Number Publication Date
JPS54133823A JPS54133823A (en) 1979-10-17
JPS5819188B2 true JPS5819188B2 (en) 1983-04-16

Family

ID=12609350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53041474A Expired JPS5819188B2 (en) 1978-04-07 1978-04-07 image sensor

Country Status (1)

Country Link
JP (1) JPS5819188B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61150583A (en) * 1984-12-25 1986-07-09 Matsushita Electric Works Ltd Image pickup device
JPH01191979A (en) * 1988-01-27 1989-08-02 Hitachi Ltd Picture processor
JP2678062B2 (en) * 1989-06-14 1997-11-17 キヤノン株式会社 Photoelectric conversion device

Also Published As

Publication number Publication date
JPS54133823A (en) 1979-10-17

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