JPS5818994B2 - How to manage electroless nickel plating film - Google Patents

How to manage electroless nickel plating film

Info

Publication number
JPS5818994B2
JPS5818994B2 JP54074292A JP7429279A JPS5818994B2 JP S5818994 B2 JPS5818994 B2 JP S5818994B2 JP 54074292 A JP54074292 A JP 54074292A JP 7429279 A JP7429279 A JP 7429279A JP S5818994 B2 JPS5818994 B2 JP S5818994B2
Authority
JP
Japan
Prior art keywords
plating film
plated
phosphorus
electroless nickel
nickel plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54074292A
Other languages
Japanese (ja)
Other versions
JPS56270A (en
Inventor
村岡明美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mazda Motor Corp
Original Assignee
Toyo Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Kogyo Co Ltd filed Critical Toyo Kogyo Co Ltd
Priority to JP54074292A priority Critical patent/JPS5818994B2/en
Publication of JPS56270A publication Critical patent/JPS56270A/en
Publication of JPS5818994B2 publication Critical patent/JPS5818994B2/en
Expired legal-status Critical Current

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  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 本発明は、無電解ニッケルめっき膜の硬度を管理する方
法に関し、特に上記めっき膜中の燐含有量を管理する方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for controlling the hardness of an electroless nickel plating film, and particularly to a method for controlling the phosphorus content in the plating film.

一般に硬さを必要とする部品、例えば摺動部品(ピニオ
ンシャフト、ビンアイドラー等)に行うめつき方法とし
て、次亜燐酸ナトリウムを還元剤とする無電解ニッケル
めっき浴に被めっき部品を浸漬してその表面にニッケル
被膜を形成する無電解ニッケルめっき方法はよく知られ
ており、このめっき方法ではニッケルめっき膜はめつき
浴のPHおよび還元剤の濃度により3〜15%の範囲で
燐含有量を調整することができるが、硬度の増大(例え
ばビッカース硬度1000以上)を図るには上記燐含有
量を一定範囲(例えば4・〜9%)に管理する必要があ
る。
Generally, the plating method for parts that require hardness, such as sliding parts (pinion shafts, bottle idlers, etc.), involves immersing the parts to be plated in an electroless nickel plating bath using sodium hypophosphite as the reducing agent. The electroless nickel plating method that forms a nickel film on the surface is well known, and in this plating method, the phosphorus content of the nickel plating film is adjusted within the range of 3 to 15% depending on the pH of the plating bath and the concentration of the reducing agent. However, in order to increase the hardness (for example, Vickers hardness of 1000 or more), it is necessary to control the phosphorus content within a certain range (for example, 4% to 9%).

そこで、従来、このような無電解ニッケルめっき膜中の
燐含有量を管理する場合には、被めっき部品そのものを
試料として使用し、酸で溶解して溶解液(試例液)中の
燐成分を定量分析測定するのであるが、実際には被めっ
き部品全部を溶解させるには非常に時間がかかり、現実
的でないので、めっき膜が適当に溶解したときに測定を
行っている。
Conventionally, when controlling the phosphorus content in such electroless nickel plating films, the parts to be plated are used as samples, and the phosphorus components in the solution (sample solution) are dissolved in acid. However, in reality, it takes a very long time to dissolve all the parts to be plated, which is impractical, so measurements are performed only when the plating film has been properly dissolved.

その場合−試料液中の燐成分には被めっき部品の母材中
の燐成分とめつき膜中の燐成分とが含まれており、両者
の区別が困難であるため、推定する方法として下記の計
算式により、めっき膜中の燐含有率Pが求められている
In that case, the phosphorus component in the sample solution includes the phosphorus component in the base material of the part to be plated and the phosphorus component in the plating film, and it is difficult to distinguish between the two, so the estimation method is as follows: The phosphorus content P in the plating film is determined by a calculation formula.

P%=FeXP(。P%=FeXP(.

ここで、 P′:試料液中の全燐量 Ni:試料液中のニッケル量 馬 :被めっき部品の母材から溶出 した燐量 Fe:試料液中の鉄量 Po:被めっき部品の母材の燐含有 率 すなわち、上記方法では、試料液中のニッケル量および
燐量の定量分析測定の他に鉄量を定量分析測定する必要
があり、この鉄量から被めっき部品母材中の燐量P/1
0 を推定するものである。
Here, P': Total amount of phosphorus in the sample solution Ni: Amount of nickel in the sample solution H: Amount of phosphorus eluted from the base material of the part to be plated Fe: Amount of iron in the sample solution Po: Base material of the part to be plated In other words, in the above method, in addition to quantitatively measuring the amount of nickel and phosphorus in the sample solution, it is necessary to quantitatively measure the amount of iron, and from this amount of iron, the amount of phosphorus in the base material of the part to be plated can be determined. P/1
0.

したがって、上記従来の方法では、無電解ニッケルめっ
き膜中の燐含有量を測定すると、非常にバラついた値と
なり、めっき膜の硬度管理を正確に且つ十分に行い得な
いとともに、鉄成分の含有量の測定を要するため、定量
分析測定に手間がかかるという不具合があった。
Therefore, when measuring the phosphorus content in an electroless nickel plating film using the conventional method described above, the values vary widely, making it impossible to accurately and sufficiently control the hardness of the plating film, and also preventing iron content from being contained. Since it is necessary to measure the amount, there was a problem in that quantitative analysis measurements were time-consuming.

本発明はかかる点に鑑みてなされたものであり、上記無
電解ニッケルめっき膜の硬度を管理するにおいて、ニッ
ケルおよび燐をほとんど含ま々い鉄系鋼材をテストピー
スとして、被めっき部品と一緒に無電解ニッケルめっき
し、このテストピースのみを酸で溶解して試料液として
用いることにより、つまり上記テストピースは小さいも
のであるので全部を酸溶解するにもさほど時間がかから
ず、しかも形状および材質の特定によりテストピース中
に含まれている鉄、燐およびニッケル量が予め判ってい
ることにより、試料液中の鉄量の測定を要することなく
ニッケル量および燐量の測定のみによってテストピース
のめつき膜中の燐含有量を正確に且つ簡易に算出するこ
とができ、これに基づいて被めっき部品のめつき膜の硬
度の管理を正確に且つ簡易に行うことができる無電解ニ
ッケルめっき膜の硬度の管理方法を提供するものである
3以下、本発明について詳細に説明するに、先ず、次亜
燐酸ナトリウムを還元剤とする無電解ニッケルめっき浴
(塩化ニッケル30g/lと次亜燐酸ナトリウム10g
/lとヒドロキシ酢酸ナトリウム50g/lとからなる
浴組成のもの)に被めっき部品を浸漬してその表面にニ
ッケル被膜を形成するにおいて、前もって被めっき部品
とは別個にテストピースを用意する。
The present invention has been made in view of this point, and in controlling the hardness of the electroless nickel plating film, an iron-based steel material containing almost no nickel and phosphorus is used as a test piece, and is coated with the parts to be plated. By electrolytically nickel plating and dissolving only this test piece in acid and using it as a sample solution, since the test piece is small, it does not take much time to dissolve all of it in acid, and the shape and material are Since the amount of iron, phosphorus, and nickel contained in the test piece is known in advance by specifying The phosphorus content in the electroless nickel plating film can be calculated accurately and easily, and based on this, the hardness of the plating film on the parts to be plated can be accurately and easily controlled. The present invention will be described in detail below.First, the present invention will be explained in detail using an electroless nickel plating bath using sodium hypophosphite as a reducing agent (30 g/l of nickel chloride and 10 g of sodium hypophosphite).
In forming a nickel film on the surface of a part to be plated by immersing it in a bath having a bath composition of 50 g/l and 50 g/l of sodium hydroxyacetate, a test piece is prepared in advance separately from the part to be plated.

このテストピースは合金元素としてゐニッケルおよび燐
を含まない鉄系鋼材から々す、例えばSPC材、SPH
材、SM材等の圧延鋼板材が用いられ、その大きさとし
ては厚さQ、 7 mvtで、約20mm×50mm9
度の薄板が好ましい。
This test piece is made from ferrous steel materials that do not contain nickel and phosphorus as alloying elements, such as SPC material, SPH material, etc.
A rolled steel plate material such as SM material or SM material is used, and its size is approximately 20 mm x 50 mm9 with a thickness of Q and 7 mvt.
A thin plate of 100% is preferred.

そして、上記テストピースを被めっき部品(例えばピニ
オンシャフト、ビンアイドラー、インターロックスリー
ブあるいはスラストワッシャ等)と共に上記めっき浴に
浸漬して両者の表面に同一のニッケル被膜を形成する。
Then, the test piece is immersed in the plating bath together with the parts to be plated (eg, pinion shaft, bottle idler, interlock sleeve, thrust washer, etc.) to form the same nickel coating on both surfaces.

しかる後、上記ニッケル被膜が形成されたテストピース
を取出し、該テストピースを酸(例えば硝酸液)で溶解
して試料液をつくる。
Thereafter, the test piece on which the nickel film has been formed is taken out, and the test piece is dissolved in acid (for example, nitric acid solution) to prepare a sample solution.

この試料液を用いて、該試料液中のニッケル量Niをク
エン酸添加吸光光度法、原子吸光光度法あるいはEDT
A滴定法等により定量分析測定するとともに、上記試料
液中の全燐量yをモリブデン青吸光光度法あるいは中和
滴定法により定量分析測定する。
Using this sample solution, the amount of Ni in the sample solution can be determined using citric acid addition spectrophotometry, atomic absorption spectrophotometry, or EDT.
Quantitative analysis is carried out using A titration method or the like, and the total phosphorus amount y in the sample solution is quantitatively measured using molybdenum blue absorptiometry or neutralization titration method.

これらの測定量Ni、P’をもとにして下記の式により
、上記テストピースのめつき膜中の燐含有率Pを算出す
る。
Based on these measured amounts Ni and P', the phosphorus content P in the plating film of the test piece is calculated using the following formula.

ここで、P〃:試料液中に含まれる燐量のうちのテスト
ピース母材から溶出し た燐量 S :サンプリング量 Po:テストヒース母材の燐含有率 尚、上記テストピース母材の燐含有率P。
Here, P〃: Amount of phosphorus eluted from the test piece base material out of the amount of phosphorus contained in the sample liquid S: Sampling amount Po: Phosphorus content of the test heath base material Furthermore, phosphorus content of the test piece base material Rate P.

は上記の鉄・鋼中の燐の定量分析法(例えばモリブデン
青吸光光度法等)により予め求めておく。
is determined in advance by the quantitative analysis method for phosphorus in iron/steel (for example, molybdenum blue spectrophotometry).

このようにして算出された燐含有率Pは被めっき部品の
めつき膜中の燐含有率とほぼ同等であることにより、被
めっき部品のめつき膜の硬度を上記燐含有率Pによって
ほぼ正確に管理することができる。
Since the phosphorus content P calculated in this way is almost the same as the phosphorus content in the plating film of the part to be plated, the hardness of the plating film of the part to be plated can be almost accurately determined by the phosphorus content P. can be managed.

次に、本発明の実施例について述べると、テストピース
として厚さ0.7mmで、約20mm×50mmの5P
C−1板を用い、この5PC−1板を被めっき部品であ
る845Cピニオンシヤフトと共に無電解ニッケルめっ
きする。
Next, to describe an example of the present invention, a 5P test piece with a thickness of 0.7 mm and a size of approximately 20 mm x 50 mm was used.
Using a C-1 plate, electroless nickel plating is applied to this 5PC-1 plate along with the 845C pinion shaft, which is the part to be plated.

このめっきされた5PC−1板を以下の分析操作手順に
よりそのめっき膜中の燐含有率Pを測定する。
The phosphorus content P in the plated film of this plated 5PC-1 plate was measured by the following analysis procedure.

すなわち、■上記めっきされた5PC−1板を細かく切
って、約2〜3g(約20X20mmの大きさ)を30
0rfLlビーカーに正確に計り取る。
That is, ■ Cut the above plated 5PC-1 board into small pieces, and weigh about 2 to 3 g (about 20 x 20 mm size) into 30 pieces.
Measure accurately into a 0rfLl beaker.

■ HNO3(HNO3:H20=1:1(体積比))
401nlを加えて加熱溶解後、H(J!0440−を
加え、引き続き加熱蒸発して強く白煙を発生させ、上記
ビーカー内部が透明になりHCAO4がビーカー壁を伝
わって逆流する程度に5〜6分間保持する。
■ HNO3 (HNO3:H20=1:1 (volume ratio))
After adding 401 nl and heating and dissolving it, add H (J!0440-) and continue heating and evaporating to generate strong white smoke. Hold for a minute.

放冷後、本釣100−を加えて塩類を溶解し、200y
dのメスフラスコに移し入れ水で標線までうすめる。
After cooling, add 100 yen of hontsuri to dissolve the salts and heat for 200 y.
Transfer to volumetric flask (d) and dilute to the marked line with water.

■ 上記■の液のうち2.0rILlを100dメスフ
ラスコに分取し、HCA041mA’および水を加えて
液量を約10m7とする。
(2) Take 2.0 rILl of the solution (2) above into a 100 d volumetric flask, and add HCA041 mA' and water to make a liquid volume of about 10 m7.

この液を用いてモリブデン青吸光光度法により燐含有量
yを定量する。
Using this solution, the phosphorus content y is determined by molybdenum blue absorption photometry.

すなわち、上記液に10%亜硫酸水素す) IJウム溶
液101nlを加えて振りまぜ沸騰水浴中で溶液が赤褐
色から殆ど無色になるまで90以内に加熱する。
That is, 101 nl of a 10% hydrogen sulfite (IJ) solution was added to the above solution, stirred, and heated in a boiling water bath until the solution changed from reddish brown to almost colorless within 90°C.

次に、呈色試薬溶液251rLlを加えて振りまぜ沸騰
水浴中で10分間加熱して完全に呈色させ、流水を用い
て室温まで冷却した抜水で標線まで希釈する。
Next, 251 rLl of coloring reagent solution is added, shaken and heated in a boiling water bath for 10 minutes to completely develop the color, and diluted to the marked line with drained water cooled to room temperature using running water.

この溶液の一部を光度計の吸光セルに取り、波長750
nm付近の吸光度を測定し、予め作成した検量線より
燐を定量する。
A portion of this solution was taken into the absorption cell of a photometer, and a wavelength of 750
Absorbance around nm is measured and phosphorus is quantified using a calibration curve prepared in advance.

■ また、上記■の液のうち1.07rLlを1001
rLlメスフラスコに分取し、水を加えて液量を約10
−とする。
■ Also, add 1.07 rLl of the liquid from ■ above to 1001
Pour into an rLl volumetric flask and add water to bring the volume to about 10
−.

この液を用いてクエン酸添加吸光光度法によりニッケル
含有量Niを定量する。
Using this solution, the nickel content Ni is determined by citric acid addition spectrophotometry.

すなわち、上記液に50%クエン酸溶液10m1を加え
て振りまぜ、次にアンモニア水10m1を加えて振りま
ぜながら流水で常温まで冷却した後沃素溶液10mA!
およびジメチルグリオキシム溶液3mlを加えて水で標
線までうすめる。
That is, add 10 ml of 50% citric acid solution to the above solution and shake it, then add 10 ml of ammonia water and cool it to room temperature under running water while shaking, and then add 10 mA of iodine solution!
Add 3 ml of dimethylglyoxime solution and dilute to the marked line with water.

この溶液の一部を光度計の吸光セルに取り、波長530
nm付近の吸光度を測定し、予め作成した検量線よりニ
ッケルを定量する。
A portion of this solution was taken into the absorption cell of a photometer, and a wavelength of 530
Absorbance around nm is measured, and nickel is quantified using a calibration curve prepared in advance.

■ 尚、前もってめっきしていない5PC−1板を細か
く切って約0.5gを200ゴビーカーに正確に計り取
り、上記■で述べた鉄・鋼中の燐の定量分析方法(モリ
ブデン青吸光光度法)によって5PC−1板母材の燐含
有率P。
■ In addition, cut the unplated 5PC-1 plate into small pieces, accurately weigh out approximately 0.5 g into a 200 gobeaker, and use the method for quantitative analysis of phosphorus in iron and steel (molybdenum blue absorption spectrophotometry) described in (■) above. ) is the phosphorus content P of the 5PC-1 board base material.

を求めておく。Let's find out.

■ 上記■〜■で求めた値F’、Ni、P□を上述した
計算式(1)および(2)に代入して、めっき膜中の燐
含有率Pを算出する。
(2) Substitute the values F', Ni, and P□ obtained in the above (1) to (2) into the above-mentioned calculation formulas (1) and (2) to calculate the phosphorus content P in the plating film.

このようにして得られた燐含有率Pの測定値(本発明例
、試料/16.8〜14)を従来の方法によって得られ
た燐含有率Pの測定値(従来例、試料/16.1〜7)
と比較して下記の表に示す。
The measured values of phosphorus content P obtained in this manner (inventive examples, samples/16.8 to 14) were compared to the measured values of phosphorus content P obtained by the conventional method (conventional examples, samples/16.8 to 14). 1-7)
A comparison is shown in the table below.

上記表より、本発明例では従来例と比べて燐含有率Pの
測定値のバラツキが小さく、正確な値が得られることが
判る。
From the above table, it can be seen that in the example of the present invention, the variation in the measured value of the phosphorus content P is smaller than in the conventional example, and an accurate value can be obtained.

以上説明したように、本発明によれば、無電解ニッケル
めっき膜の硬度の管理方法において、被めつ、き部品と
共に合金元素としてのニッケルおよび燐を含まない鉄系
鋼材からなるテストピースを次亜燐酸ナトリウムを還元
剤とする無電解ニッケルめっき浴に浸漬して両者の表面
に同一のニッケル被膜を形成した後、該テストピースの
みを酸で溶解してテストピースのめつき膜中の燐含有量
を測定し、燐含有量が一定範囲内になるように浴を制御
し、被めっき部品の硬度を所定範囲内に管理するもので
あるので、従来の如き鉄量の測定を要さずに無電解ニッ
ケルめっき膜中の燐含有量を正確に且つ簡易に算出する
ことができ、よって被めっき部品の無電解ニッケルめっ
き膜の硬度の管理の正確化および簡易化を図ることがで
きる。
As explained above, according to the present invention, in the method for controlling the hardness of an electroless nickel plating film, a test piece made of iron-based steel material that does not contain nickel and phosphorus as alloying elements is used together with the overcoat and the plated parts. After immersing the test piece in an electroless nickel plating bath using sodium phosphite as a reducing agent to form the same nickel film on both surfaces, only the test piece is dissolved in acid to reduce the phosphorus content in the plating film of the test piece. The method measures the amount of iron, controls the bath so that the phosphorus content is within a certain range, and controls the hardness of the parts to be plated within a certain range, so there is no need to measure the amount of iron as in the past. The phosphorus content in the electroless nickel plating film can be calculated accurately and easily, and therefore the hardness of the electroless nickel plating film of the part to be plated can be accurately and easily managed.

Claims (1)

【特許請求の範囲】[Claims] 1 次亜燐酸ナトリウムを還元剤とする無電解ニッケル
めっき浴に被めっき部品を浸漬してその表面にニッケル
被膜を形成し、該ニッケル被膜中に含まれる燐含有量を
管理する無電解ニッケルめっき膜の硬度の管理方法にお
いて、上記波めっき部品と共に合金元素としてのニッケ
ルおよび燐を含まない鉄系鋼材からなるテストピースを
上記めっき浴に浸漬して両者の表面に同一のニッケル被
膜を形成した後、該テストピースのみを酸で溶解してテ
ストピースのめつき膜中の燐含有量を測定し、燐含有量
が一定範囲内になるように浴を制御し、被めっき部品の
硬度を所定範囲内に管理することを特徴とする無電解ニ
ッケルめっき膜の硬度の管理方法。
1 An electroless nickel plating film in which a part to be plated is immersed in an electroless nickel plating bath using sodium hypophosphite as a reducing agent to form a nickel film on the surface, and the phosphorus content contained in the nickel film is controlled. In the hardness control method, a test piece made of iron-based steel that does not contain nickel and phosphorus as alloying elements is immersed together with the wave-plated parts in the plating bath to form the same nickel film on the surfaces of both parts, and then The phosphorus content in the plating film of the test piece is measured by dissolving only the test piece in acid, and the bath is controlled so that the phosphorus content is within a certain range, and the hardness of the part to be plated is within a certain range. A method for controlling the hardness of an electroless nickel plating film, characterized by controlling the hardness of an electroless nickel plating film.
JP54074292A 1979-06-12 1979-06-12 How to manage electroless nickel plating film Expired JPS5818994B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54074292A JPS5818994B2 (en) 1979-06-12 1979-06-12 How to manage electroless nickel plating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54074292A JPS5818994B2 (en) 1979-06-12 1979-06-12 How to manage electroless nickel plating film

Publications (2)

Publication Number Publication Date
JPS56270A JPS56270A (en) 1981-01-06
JPS5818994B2 true JPS5818994B2 (en) 1983-04-15

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Country Status (1)

Country Link
JP (1) JPS5818994B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310533A (en) * 1976-07-16 1978-01-31 Kayaba Industry Co Ltd Device for taking out excavated earth and sand of shield excavator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310533A (en) * 1976-07-16 1978-01-31 Kayaba Industry Co Ltd Device for taking out excavated earth and sand of shield excavator

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JPS56270A (en) 1981-01-06

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