JPS58182287A - Double hetero junction type semiconductor laser - Google Patents
Double hetero junction type semiconductor laserInfo
- Publication number
- JPS58182287A JPS58182287A JP6559382A JP6559382A JPS58182287A JP S58182287 A JPS58182287 A JP S58182287A JP 6559382 A JP6559382 A JP 6559382A JP 6559382 A JP6559382 A JP 6559382A JP S58182287 A JPS58182287 A JP S58182287A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- layer
- type
- active layer
- light emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1078—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region with means to control the spontaneous emission, e.g. reducing or reinjection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
Abstract
Description
【発明の詳細な説明】 本発明はダブルヘテロ型半導体レーダに関する。[Detailed description of the invention] The present invention relates to a double hetero type semiconductor radar.
fI/!J1図は典型的なこの械し−ft#示し、(1
)は−主面が(100)面であるn型Gaム廖(ガリク
ム砒素)基板、(2)は該1板上に積層されたnpGa
l−xA/xムa(ガリクムアルl砒素](0<X<1
)からなるn型クラッド層、(33は該amクラッド
層上に積層されたノンドーyeat−YAl!Y人8(
0≦Y<1%纂>y)からなる活性層、(4)は該活性
層上に積−避れPW!G&1−Xム/xAsからなるP
gタラツド鳩、(5)は該クラッド層上に積Illされ
えpa!!Gt*sからなるキャップ層でIh伽%鎖キ
ャップ層辰び上記P型りラツr層(4)の一部はスジラ
イブ形状をなしてiる。また上記n型クラッド層(!J
のキャリア濃度はCL5〜1X10/j、P型クラッド
層(4)のキャリア濃度は墨−5XIG /−程度で
ある。fI/! The J1 diagram shows a typical machine-ft#, (1
) is an n-type Ga laminate (gallium arsenide) substrate whose main surface is a (100) plane, and (2) is an npGa layered on the first board.
l-xA/xmua (galicum al l arsenic) (0<X<1
), (33 is a non-doped eat-YAl! Y person 8 (
An active layer consisting of 0≦Y<1% y), (4) is deposited on the active layer and PW! P consisting of G&1-Xmu/xAs
(5) may be deposited on the cladding layer. ! A part of the above P-shaped layer (4) has a striped rib shape. In addition, the above n-type cladding layer (!J
The carrier concentration is CL5 to 1X10/j, and the carrier concentration of the P-type cladding layer (4) is approximately -5XIG/-.
断る半導体レーfにか−でキャップ層15)表面及び基
板口)裏面に犬々形成扁れたオー置ツク性の第1、$2
電極皓)【7)間に順方崗バイア負な印加するとキャッ
プ層15)慶びP型クラッド層(4Jによ勤電流が狭窄
されるえめ主える電流通路は第1電極(6)直下と攻る
。また、n型クラッド層(2)、展びP型クラッド層(
4)のムt:arxは活性層(3)のそれよ参大である
ため両クラッドjl (2)(4)は活性層【3ノより
禁止帯幅が広く、かり光屈折率が小となる。The cap layer 15) is formed on the front surface and the back surface of the semiconductor laser f.
When a negative voltage is applied between the cap layer 15) and the P-type cladding layer (4J), the main current path is directly under the first electrode (6). In addition, the n-type cladding layer (2) and the expanded p-type cladding layer (
Since the mu t:arx of 4) is larger than that of the active layer (3), both claddings jl (2) and (4) have a wider forbidden band width and a smaller optical refractive index than the active layer (3). Become.
従りて上記両1!極16)ff3間に注入された電子及
び正RはIII電極16)直下の活性II (3+内に
良好に閉じ込められ、かつ断る電子層び正孔の再結合に
よ砂生じ友し−f光4MIする活性層(87内に閉じ込
められることとなり、この結果低電流でシーf911発
振できる。Therefore, both 1 above! The electrons and positive R injected between the electrodes 16) and ff3 are well confined within the active II (3+) directly below the electrode 16), and are formed by the recombination of the electron layer and holes, which are rejected -f light. It is confined within the active layer (87) which has 4MI, and as a result, it is possible to oscillate the sea f911 with a low current.
ところが、上記従来の半導体レーザでは自然発光層が多
く、5Ija+として用−る場合、8/N比が小となる
、微小スボッ)径にしばり難い等の間―がありえ。However, the above-mentioned conventional semiconductor laser has many spontaneous light-emitting layers, and when used as 5Ija+, the 8/N ratio may be small, and it may be difficult to narrow down the diameter of the slit.
本発明は断る間IIに鎌みて1に8れたもので、自然発
光層の少ない半導体シーft−提供せんとするものであ
る。The present invention is an improvement of the above, and is intended to provide a semiconductor sheet with a small number of naturally emitting layers.
第2#Aは本発明者が行な9九−実験結果な示す。The second #A shows the results of 99 experiments conducted by the inventor.
断る実験は第1図半導体レーfに5PvhてP型クラッ
ド層+43のキャリア濃度と自然発光層とのM係を調べ
えものである。#1、図中横軸に中ヤヲァ濃度な、縦軸
に自然艷装置を夫々と穿てiる・第2図より明らかな如
く、キャリア濃度が1011/−以上となると自然発光
層が急激に減少することを見い出しえ。In the experiment, we can investigate the carrier concentration of the P-type cladding layer +43 and the M relationship with the spontaneous luminescent layer by applying 5Pvh to the semiconductor laser f in FIG. 1. #1. In the figure, the horizontal axis shows the medium concentration, and the vertical axis shows the natural light emitting device. As is clear from Fig. 2, when the carrier concentration becomes 1011/- or more, the spontaneous luminescent layer rapidly increases. Find a decrease.
プルへテロ型半導体シーfにか−でも、そのPgクラッ
ド層のキャリア濃[を101s〜以上とすると自然発光
層が減少することを見−出してiる。It has been found that even in a pull-hetero type semiconductor sheet, when the carrier concentration of the Pg cladding layer is increased to 101s or more, the spontaneous luminescence layer decreases.
本発明は祈る知見に基づいてな苫れえもので、型クラッ
ド層及びn製タラッ)層を備jtttダブルへテロ接合
製半尋体シーずにお−て上記PIllタラツr層のキャ
リア濃度を10 /−以上としたことである。The present invention is based on the knowledge and knowledge that it is possible to reduce the carrier concentration of the above-mentioned PIll flat layer by using a type cladding layer and a double heterojunction layer without a double heterojunction half-body sheath. 10/- or more.
以下−実總例としては第1図半導体レーずのP型りラッ
ド層(4)のキャリア濃度なMX10/−としたものに
おいて説明する。陶このときのP型不純物はG・(ゲル
マニクム)とし九参第i図はIII図半導体レーずにか
−てPI!クラ7Fml(4)e◆+yアmt*iwt
o /m巌び1×10、〜とLえときの電流−光出力
特性な■べえものである511m中実81.Iは大々P
型タラツF II (4)のキャリア濃度$1g1O/
−員びの
墨*10 /’Aと会のIIItIJIでaる。As an actual example, the carrier concentration of the P-type rad layer (4) of the semiconductor laser shown in FIG. 1 will be described below as MX10/-. The P-type impurity in this case is G. (germanicum), and Figure I of the ninth series is PI without the semiconductor laser of Figure III! Kula7Fml(4)e◆+yamt*iwt
o / m width 1 × 10, current-light output characteristics when L is 511 m solid 81. I is big P
Carrier concentration of type Taratu F II (4) $1g1O/
- Member's ink *10 / 'A and the meeting's IIItIJI aru.
第暴SI+ら明すか傘如(、PIIff97Fl!(4
Jaキャリア濃度t’!5X10”/−とし九ときの方
が自然発光酸が/J、’&かり九・
また、同図よJ7P型クラッド層(4)のキャリア濃f
fが5X10”/−のときの方−fi、低電流で高いシ
ーず出力が得られること(微分量子効率の向上)が判り
た。これは、キャリア濃度t−is X 10”/−と
高濃度としたため活性層【3)とのポテンシャルエネル
ギー差が大きくee、かつ光層折率も小となると共に正
孔の注入効果が高tg九ととに起因する。Part 1
Ja carrier concentration t'! 5X10"/- when the spontaneous luminescent acid is /J,'
It was found that when f is 5X10"/-, a high sheath output can be obtained at low current (improvement of differential quantum efficiency). This is due to the carrier concentration t-is X 10"/- and high Because of the concentration, the potential energy difference with the active layer [3] is large, ee, and the optical layer refractive index is small, and the hole injection effect is high, tg9.
更vcP型りクツドI (4Jのキャリア濃度が5X1
o 18/dである半導体シーVの方が正孔の移一度の
温度依存性が純(なシ、発光強度の温度依存性が少なく
なることが判明した。Modified vcP type modified I (carrier concentration of 4J is 5X1
It has been found that the temperature dependence of the hole transfer rate is more pure in the semiconductor C V with o 18/d, and the temperature dependence of the emission intensity is smaller.
向、本案概例ではGtAjAll系材料からなるダブル
へテロ接合型半導体レーダにクーて説明したが、既述し
た如く本発明はG&ムgP、G亀ムZ A s P 、
I n P s I n A lム、sP等他の半導
体シー蓼材料からなるダブルへテロ接合型半導体シーず
にも適用可能である。In the general example of this invention, a double heterojunction semiconductor radar made of GtAjAll-based materials has been explained, but as mentioned above, the present invention is based on
It is also applicable to double heterojunction type semiconductor sheets made of other semiconductor sheet materials such as InPs, InAl, and SP.
また、本発明は第1図に示した構造の半導体レーザのみ
に適中できるものではなく%08P(チャネル テラス
かシーか ブレーナ)型T8(テラス テラス)シー)
型警の他の構造の半導体レ−fWcも適用可能である。Furthermore, the present invention is not applicable only to the semiconductor laser having the structure shown in FIG.
Semiconductor rays fWc having other structures are also applicable.
以上の説明から明らか1に如く、本発明の半導体シーず
では自然発光酸が少なくなるので、レーダ光@振時の8
7側比が大とな)、かクレーず光を微小スボツシ径に″
しばることも可能となるので大変有用で禿る。ま危付加
的効果としてキャリア及び光の閉じ込め効果、微分量子
効率、温度依存性llll−も良好となる。As clearly shown in 1 from the above explanation, since the semiconductor seed of the present invention has less naturally luminescent acid, the radar light @ 8
7 side ratio is large), or the clay light is transmitted to the minute diameter of the slit.
It is also very useful as it allows you to tie it up. Additionally, carrier and light confinement effects, differential quantum efficiency, and temperature dependence are also improved.
【図面の簡単な説明】
第1WJは典型IFJ&半導体半導体動−す断面図、第
2図紘P型′クラッド層のキャリア一度と自然発光層と
の関iを示す特性図、第3図は電流と光出力との関係な
示す特性図である。
(21−n型クラッド層、(8)−活性層、電4)−P
型りラッド鳩。
檗砥きV[Brief explanation of the drawings] 1st WJ is a cross-sectional view of a typical IFJ & semiconductor semiconductor, 2nd figure is a characteristic diagram showing the relationship i between carriers in the Hiro P-type cladding layer and the spontaneous luminescent layer, and 3rd figure is a current diagram. FIG. 3 is a characteristic diagram illustrating the relationship between and optical output. (21-n-type cladding layer, (8)-active layer, electrode 4)-P
Shaped rad pigeon. Hinoki honing V
Claims (1)
性層よp禁止帯幅が広くかつ光屈折率が小なるP型クラ
ッド層及びn型クラッド層を備考えダブルへテロ接合型
半導体レーfにか−て、上記PI!!クラッド噛のキャ
リア濃度が107−以上であることを特徴とするダブル
へチク接合型半導体レーず。(II. The active layer is a double heterojunction semiconductor, with a P-type cladding layer and an n-type cladding layer having a wider p-gband width and a smaller optical refractive index than the active layer above the active layer. A double helical junction type semiconductor laser is characterized in that the carrier concentration of the PI!! cladding layer is 10<7 > or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6559382A JPS58182287A (en) | 1982-04-19 | 1982-04-19 | Double hetero junction type semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6559382A JPS58182287A (en) | 1982-04-19 | 1982-04-19 | Double hetero junction type semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58182287A true JPS58182287A (en) | 1983-10-25 |
Family
ID=13291463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6559382A Pending JPS58182287A (en) | 1982-04-19 | 1982-04-19 | Double hetero junction type semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58182287A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56104488A (en) * | 1980-01-23 | 1981-08-20 | Hitachi Ltd | Semiconductor laser element |
-
1982
- 1982-04-19 JP JP6559382A patent/JPS58182287A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56104488A (en) * | 1980-01-23 | 1981-08-20 | Hitachi Ltd | Semiconductor laser element |
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